JPS6443562A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
JPS6443562A
JPS6443562A JP19992087A JP19992087A JPS6443562A JP S6443562 A JPS6443562 A JP S6443562A JP 19992087 A JP19992087 A JP 19992087A JP 19992087 A JP19992087 A JP 19992087A JP S6443562 A JPS6443562 A JP S6443562A
Authority
JP
Japan
Prior art keywords
group
formula
compound
specified
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19992087A
Other languages
Japanese (ja)
Inventor
Nobuhiko Suga
Hideo Ai
Satoshi Ogiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP19992087A priority Critical patent/JPS6443562A/en
Priority to US07/228,416 priority patent/US5019482A/en
Priority to CA000574437A priority patent/CA1331243C/en
Publication of JPS6443562A publication Critical patent/JPS6443562A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain a heat-resistant photosensitive composition which has high photosensitive when exposed through a G line stepper, by mixing a specified polymer with a specified oxime compound and a specified coumarin compound. CONSTITUTION:A photosensitive composition comprising a polymer having (A) repeating units of formula I [wherein X is a (2+n)-valent carbocyclic or heterocyclic group or Y is a (2+m)-valent carboxylic or heterocyclic group, Z is a group of formula II, III or IV, R* is a group having a -C=C- bond, W is a group capable of forming a ring by reaction with a carbonyl group of formula V, n is 1 or 2, m is 0, 1 or 2, and the group of formulas V and Z are ortho or peri to each other], an oxime compound (B) of formula VI (wherein R1, R2 and R3 are each H, a 1-6C alkyl, an alkoxyl, or NO2, R4 is a 6-10C aromatic acyl, a 1-6C aliphatic acyl, a 1-6C alkoxycarbonyl or the like, and R5 is a 1-6C alkyl, a 6-10C aromatic group or the like) (e.g., compound of formula VII) and a coumarin compound (C) of formula VIII (wherein R6 is CH3 or C2H5, and R7 is a 1-4C aliphatic group or a 6-10C aromatic group), e.g., a compound of formula IX.
JP19992087A 1987-08-12 1987-08-12 Photosensitive composition Pending JPS6443562A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP19992087A JPS6443562A (en) 1987-08-12 1987-08-12 Photosensitive composition
US07/228,416 US5019482A (en) 1987-08-12 1988-08-05 Polymer/oxime ester/coumarin compound photosensitive composition
CA000574437A CA1331243C (en) 1987-08-12 1988-08-11 Photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19992087A JPS6443562A (en) 1987-08-12 1987-08-12 Photosensitive composition

Publications (1)

Publication Number Publication Date
JPS6443562A true JPS6443562A (en) 1989-02-15

Family

ID=16415798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19992087A Pending JPS6443562A (en) 1987-08-12 1987-08-12 Photosensitive composition

Country Status (1)

Country Link
JP (1) JPS6443562A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT410547B (en) * 1998-06-26 2003-05-26 Ciba Sc Holding Ag NEW O-ACYLOXIM PHOTO STARTER
JP2011525480A (en) * 2008-06-06 2011-09-22 ビーエーエスエフ ソシエタス・ヨーロピア Oxime ester photoinitiator

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT410547B (en) * 1998-06-26 2003-05-26 Ciba Sc Holding Ag NEW O-ACYLOXIM PHOTO STARTER
US6596445B1 (en) 1998-06-26 2003-07-22 Ciba Specialty Chemicals Corporation O-acyloxime photoinitiators
JP2011525480A (en) * 2008-06-06 2011-09-22 ビーエーエスエフ ソシエタス・ヨーロピア Oxime ester photoinitiator

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