JPS6431417A - Reduction projection aligner - Google Patents

Reduction projection aligner

Info

Publication number
JPS6431417A
JPS6431417A JP18817287A JP18817287A JPS6431417A JP S6431417 A JPS6431417 A JP S6431417A JP 18817287 A JP18817287 A JP 18817287A JP 18817287 A JP18817287 A JP 18817287A JP S6431417 A JPS6431417 A JP S6431417A
Authority
JP
Japan
Prior art keywords
dust
exposure mask
detected
exposure
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18817287A
Other languages
Japanese (ja)
Inventor
Hisashi Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP18817287A priority Critical patent/JPS6431417A/en
Publication of JPS6431417A publication Critical patent/JPS6431417A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Abstract

PURPOSE:To inspect automatically dust accumulated on upper and lower surfaces of an exposure mask, by irradiating the lower surface of the exposure mask with exposure rays and by detecting scattered light from the dust by using a CCD camera. CONSTITUTION:A lower surface irradiating device 3 may insert a lens 3e located at the point of a whirling arm 3b between an exposure mask 2 and a reduced projection exposure lens 8 by rotating a rotation axis 3a. If there is dust 6u attached to an upper surface U of the exposure mask 2, scattered lights 5a are detected as images of a CCD camera 4. That is to say, as dust is detected on image plane scanning lines as luminant signals, control signals are automatically outputted to an alarm display or an air blower for blowing away dust when signals exceeding the prescribed level are detected. When dust 6 which is attached to a lower surface L of the exposure mask 2 is detected, lights emitted from a different light source are applied from the lens 3e to the lower surface L of the exposure mask 2 through a mirror 3c of the rotation axis 3a and the mirror 3d located at the point of the whirling arm 3b. If there is dust 6b, the scattered lights 7b are detected as the images of the CCD camera 4.
JP18817287A 1987-07-27 1987-07-27 Reduction projection aligner Pending JPS6431417A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18817287A JPS6431417A (en) 1987-07-27 1987-07-27 Reduction projection aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18817287A JPS6431417A (en) 1987-07-27 1987-07-27 Reduction projection aligner

Publications (1)

Publication Number Publication Date
JPS6431417A true JPS6431417A (en) 1989-02-01

Family

ID=16219019

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18817287A Pending JPS6431417A (en) 1987-07-27 1987-07-27 Reduction projection aligner

Country Status (1)

Country Link
JP (1) JPS6431417A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0430513A (en) * 1990-05-28 1992-02-03 Nec Kyushu Ltd Reduction projection aligner
US5399867A (en) * 1990-01-26 1995-03-21 Canon Kabushiki Kaisha Foreign particle inspection apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5399867A (en) * 1990-01-26 1995-03-21 Canon Kabushiki Kaisha Foreign particle inspection apparatus
JPH0430513A (en) * 1990-05-28 1992-02-03 Nec Kyushu Ltd Reduction projection aligner

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