JPS626254A - Photosensitive composition - Google Patents

Abstract

PURPOSE:To enhance dyeing resistance, to improve adhesion to a base and a dyed layer, and transmittance of the visible light and near UV rays, and the like, and to enable a dyeing-resistant insulating layer workable with the visible light and near UV rays by forming a photosensitive composition compound containing a sensitizing dye and a polymer having specified repeating units obtained by polymerizing a specified compound under conditions of an acid concentration <=1X10<-3>mol per l in the reaction system. CONSTITUTION:The photosensitive composition contains the sensitizing dye and the polymer having at least both of repeating units each represented by formulae (I) and (II), and the polymer can be obtained by copolymerizing the compounds represented by formula (III), such as glycidyl (meth)acrylate, and (IV), under conditions of an acid concentration <=1X10<-3>mol per l in the reaction system, and the compound of formula (IV) is obtained by reacting hydroxyethyl (meth)acrylate with cinnamoyl halide or its derivative in a solvent in the presence of a base.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a photosensitive composition that can be satisfactorily used as a dye-resistant layer of an organic color filter.

[Conventional technology]

The method of installing color filters can be broadly classified into one of the following.

(2) For example, a method in which a color-separating organic color filter is manufactured directly on a solid-state image pickup device, which is a silicon wafer or the like on which a photodetector is provided (hereinafter referred to as a "direct-mounting type").

■ A solid-state image sensor and a color-separating organic color filter are manufactured separately, and then aligned and bonded together using a suitable adhesive (hereinafter referred to as the "bonded type").

The photosensitive composition of the present invention is particularly useful when applied to direct-mount color filters, which are considered to be excellent in mass production.

When manufacturing a direct-mounting color filter, the surface of the solid-state photodiode is usually flattened, and one layer of polymer (hereinafter referred to as a "flattening" layer) is added to obtain a distortion-free color filter.
Apply. After that, a photosensitive material layer is formed on top of it to form a layer to be dyed, and then, ■ a patterned resist is provided on the layer to be dyed, and the exposed portion of the layer to be dyed is dyed to form the dyed layer. After formation, the resist is peeled off, and then the next dyed layer is formed in the same manner. (A method of dyeing a single layer to be dyed into multiple dyed parts.) ■ The layer to be dyed is exposed to light in a predetermined pattern, developed and dyed to form a dyed layer, and then a transparent stain-resistant insulation layer is formed. After applying the nuclide layer, the next dyeing layer is formed on top of it in the same manner.

The method (2) above has problems such as color bleeding at the boundaries of each dyed portion, and the method (2) is generally widely used.

In the color filter obtained by method (■) above,
The selection of a dye-resistant insulating layer is important.

The dye-resistant insulating layer serves as a dye-resistant layer for the dyed layer of the first color that has already been dyed during dyeing of the second and subsequent colors.
It plays an important role in preventing color bleeding between the dyed layers of the finished color filter over time. In addition, the stain-resistant insulating layer is basically required to have good stain resistance, adhesion to the substrate and the dyed layer, colorless transparency, development resistance, and coating properties.

However, it is difficult to select a material that satisfies all of these properties. That is, for example, a water-soluble photosensitive substance such as a mixture of gelatin, casein, grue, polyvinyl alcohol, etc. and weight salt is usually used as the layer to be dyed, and a water-soluble dye is used for dyeing. Ru. Therefore, the stain-resistant insulating layer is required to be highly lipophilic from the perspective of stain resistance, but it is required to be highly hydrophilic from the perspective of adhesion to the dyed layer. This is because certain characteristics are required.

The present inventors have discovered a photosensitive composition containing a polymer having repeating units represented by the following formulas (I) and (11) and a sensitizer as a photosensitive polymer that resolves this contradiction, and has developed a photosensitive composition that contains a sensitizer and a polymer having repeating units represented by the following formulas (I) and (11). (Patent application 1986-1/θII<z).

(1) C-R" (II) (wherein R1 and R2 represent a hydrogen atom or a methyl group, Ra represents a hydrogen atom or a phenyl group, 14 represents a hydrogen atom, a phenyl group, or a cyano group, and R' and R@ represents a hydrogen atom, a halogen atom, a nitro group, or a methoxy group.) [Problems to be solved by the invention] The above polymer is a compound represented by the following formula (1), that is, an acrylic acid or a glycidyl ester of methacrylic acid, a compound represented by the following formula (IT), i.e., co-hydroxyethyl acrylate or -monohydroxyethyl methacrylate represented by the following formula (Vl), and cinnamon represented by the following formula (■). It consists of a compound obtained by radical copolymerization of a reaction product with acid chloride or its derivative according to a known method using a radical initiator such as azobisisobutyronitrile or benzoyl peroxide.

-O ■ (1) C-13(Vl) (■
)1: (In the formula, R1 to R6 represent the same meanings as above, and X represents a halogen atom.) However, the compound represented by formula (■) is extremely susceptible to hydrolysis, so it may not be exposed to air during storage. The generated formula ( The compound represented by mV) usually contains some amount of the formula (V) and its derivatives as impurities.

Since this impurity has properties similar to those of the compound represented by formula (IT), the actual situation is that it cannot be sufficiently removed by normal operations such as washing with alkaline water.

If the polymerization reaction is carried out in such a state that the acid is still contained in the 7mer, the glycidyl group of the compound represented by formula (1) may undergo a crosslinking reaction due to the catalytic action of the acid during the reaction. Even if gelation does not occur, the acid is incorporated into the resulting polymer because it is difficult to separate it from the polymer under normal conditions.

The resin obtained in this way has poor storage stability, and gelation slightly progresses over a period of several days to several weeks. There were problems such as the Kp paper becoming clogged and having to be replaced frequently.

[Means to solve the problem]

As a result of various studies to solve the above-mentioned drawbacks, the present inventors have found that when reacting the compounds represented by formulas (1) and (IV), the concentration of acid in the reaction system is /X/(7'' ″”
We completed the present invention by discovering that a photosensitive resin with significantly improved storage stability than K could be produced by polymerizing under conditions of mol/A or less.

That is, the gist of the present invention is at least the following formula % () (wherein R1 and V represent a hydrogen atom or a methyl group,
R3 represents a hydrogen atom or a phenyl group; R4 represents a hydrogen atom, a phenyl group, or a cyano group;
is a photosensitive composition containing a sensitizer and a polymer having a repeating unit represented by 6) representing a hydrogen atom, a halogen atom, a nitro group, or a methoxy group, the polymer having the following formula (IN) and the following formula ( 1. A photosensitive composition obtained by polymerizing the compound represented by IV) under conditions in which the acid concentration in the reaction system is /X/0-'' mol/Z or less.

C electron 0 (in the formula, R1 to B6 represent the same meanings as above).

The present invention will be explained in more detail.

The compound represented by formula (1) is a glycidyl ester of acrylic acid or a glycidyl ester of methacrylic acid, and commercially available compounds can be conveniently used.

Next, the compound represented by formula (IV) can be synthesized according to the following formula.

(Vl) (Vll) (IV) That is, hydroxyethyl acrylate or hydroxyethyl methacrylate (■) and cinnamic acid halide or its derivative (VIA) are reacted in a solvent in the presence of a base. The base is to capture the hydrochloric acid generated as the reaction progresses, and any base can be used, but usually tertiary organic amines such as triethylamine, heterocyclic basic compounds such as pyridine, and tetramethylammonium hydroxide. Strong organic bases such as tertiary ammonium hydroxide such as diazabicycloundecene, and inorganic bases such as sodium hydroxide and sodium carbonate are preferably used.

These bases do not necessarily have to exist in a solution state, but may exist in a suspended state.

As a solvent, for example, tetrahydrofuran (THF
), ether solvents such as dioxane and diethyl ether, ketone solvents such as acetone, methyl ethyl ketone, and cyclohexane, hydrocarbons such as pentane and hexane, aromatic hydrocarbons such as toluene, halogenated hydrocarbons such as dichloroethane, or pyridine, etc. A basic solvent with low nucleophilicity can also be used as it also acts as a base.

The reaction temperature is 0°C to 10°C, preferably -j°C to +ro.
It takes place between C. Since this reaction is extremely exothermic, it is usually not mixed all at once (■), or the base is added dropwise afterwards and the reaction is controlled by the rate of addition. The dropping time may be adjusted so that the reaction temperature can be controlled within the above range while taking into account heat removal.

After the dropwise addition is completed, the reaction is allowed to proceed for 1-S hours to complete the reaction. After the reaction, it is convenient to separate the hydrochloride produced by F and remove it by distillation or, if a water-soluble solvent is used, add water to phase separate the product and extract the desired product from K.

This crude product usually contains a trace amount (approx. 71) It is difficult to completely remove the corresponding acid even after repeated washing with alkaline water, and if it is directly carried into polymerization, it will cause a decrease in the storage stability of the produced polymer. One method for completely removing the acid is to pass the crude product through a column of porous inorganic carrier such as silica gel or alumina. The developing solvent may be any solvent as long as the rate of acid development is sufficiently slow, such as hydrocarbons such as hexane, aromatic hydrocarbons such as toluene and benzene, halogenated hydrocarbons such as chloroform and methylene chloride, or mixed solvents thereof. is preferably used.

(IV) and (I) thus obtained, and if necessary, other hexamers are mixed, dissolved in a solvent, and polymerized using a radical initiator.

There are no particular restrictions on the solvent as long as it has a sufficiently small radical chain transfer constant and is neutral, but aromatic hydrocarbons such as benzene and toluene, ether solvents such as tetrahydrofuran and dioxane, and ketone solvents such as acetone and methyl ethyl ketone can be used. . Alcohol solvents such as methanol and ethanol are preferably used.

As the radical initiator, peroxides such as benzoyl peroxide and t-butyl peroxide, and azo initiators such as azobisisobutyronitrile are preferably used.

The concentration of acid or base present in the reaction system is I×10-”m
olμ or less, preferably tX/0-' mol/
so that it is as follows. These conditions can be easily achieved by synthesizing and purifying (IV) using the method described above.

The reaction temperature and reaction time vary depending on the initiator and solvent used, but are usually JO°C to iro°C, preferably IIO°C to /
The reaction is carried out at JO°C for 1 hour to 30 hours, preferably 3 hours to 10 hours.

After the reaction is completed, the polymer can be isolated by adding a poor solvent such as m-hexane or n-pentane to the reaction solution to precipitate the polymer, or by removing the solvent by distillation. If necessary, the polymer may be further purified by a reprecipitation method or the like.

The polymer of the present invention is tetrahydrofuran (THF)
Intrinsic viscosity at 30C is usually 0.0.1~. 7 d
t/P, preferably 0. /-1,ocit/? , particularly preferably 0. A range of dl/9 is preferred. Various known sensitizers can be used. For example, anthrone, benzophenone, phenanthrene, Michleran, conitrofluorene, S-nitroacenaphthene, chrysene, p-nitroaniline, copensoylmethylene-3-methylnaphthothiazoline, colabenzoylmethylene-3-methylnaphtho So-called triplet sensitizers such as thiazoline, benzyl, N-acetyl-tei-nitrol-naphthylamine, and anthraquinone are preferably used. The amount of sensitizer used is 0.1-10% by weight, preferably 0.5-10% by weight, based on the weight of the polymer.

Usually, a solvent that dissolves both the polymer and the sensitizer is used, such as cellosolve solvents such as ethylcelonorp and methyl cellosolve, ester solvents such as butyl acetate, or dimethylformamide (DMF), dimethyl sulfoxide (DMSO), N - Dissolved in a solvent such as methylpyrrolidone and provided as a photosensitive solution.

The photosensitive liquid itself often has a yellow color due to the sensitizer used in the process, but a thin film is created on the substrate using spin coating, casting, dipping, etc. After exposure. When developed, the sensitizer is easily washed out, and a colorless and transparent polymer layer can be obtained.

Hereinafter, an example of a color filter using the photosensitive composition of the present invention will be explained in more detail with reference to the drawings.

FIGS. 1(&) to (j) are explanatory diagrams showing an example of the manufacturing process of a direct-mounted color filter.

In the figure, l is a silicon wafer, - is a photodetector, J is a protective film, da is a flattening layer, S is a layer to be dyed, 6 is a mask, ri is a dye-resistant insulating layer, S is a bonding pad, 9 indicates the layer to be dyed, and io indicates the surface layer.

In the case of a direct-mounted color filter, the color filter is provided directly on the surface of the solid-state image sensor, and the solid-state image sensor that serves as the base is, for example, a silicon wafer as shown in Figure 1 (,) for light detection. It has a structure in which a protective film 3 made of phosphor glass, quartz, etc. is provided on the upper surface of the protective film 3. The solid-state image sensor is also provided with a scanning line, a light-shielding film, etc., but these are omitted in the drawing.

The color filter of the present invention is formed on the upper surface of the solid-state image sensor as described above, and will be explained in the order of the steps.

A flattening layer is coated on the retentive film J of the solid-state image pickup device to a thickness of about O, C to C, θμ. This leveling layer is preferably the same as the stain-resistant insulating layer described later.

This layer flattens the surface of the photodetection area, making it the layer to be dyed! , it becomes easy to form a dye-resistant insulating layer, etc., and color distortions caused by uneven thickness of the layer 5 to be dyed are reduced. Next, predetermined bonding pads and the like are formed on this flattened layer (FIG. 1(b)).

The material of this flattening layer and the method of processing the bonding pad will be described in detail later along with the explanation of the dye-resistant insulating layer.

Next, gelatin, casein, gris,
A photosensitive material layer for forming the dyed layer 5 is formed by coating a mixture of a water-soluble polymer such as albumin or a synthetic polymer such as polyvinyl alcohol and a dichromate such as ammonium dichromate. (Figure 1 (C))
.

The photosensitive material layer for constituting the dyed layer S is usually Q
, /~koμ.

Next, the photosensitive material layer for constituting the layer j to be dyed is exposed to light through a mask 6 having a predetermined pattern (FIG. 1(d)). Since the photosensitive material constituting the layer S to be dyed is normally made to have photosensitivity to '1140 to J t Oam , exposure is performed using a high-pressure water lamp or the like having a wavelength in this range as a light source.

Next, it is developed with water to form a portion constituting the dyed layer j in a predetermined pattern (Fig. 1 ()), and is dyed using a known method with a first color dye having predetermined spectral characteristics. A dyed layer 5 is formed.

Next, a photosensitive resin composition for forming a dye-resistant insulating layer is coated (FIG. 1(f)). In the present invention, a composition of a copolymer having units represented by formulas (1), (It), and (I) and a sensitizer is used to form the dye-resistant insulation W17. After forming the layer S to be dyed, apply a predetermined pattern (see FIG. 1(f)),
That is, a mask 6 having a pattern or the like in which the bonding pad portion is made light-year transparent is used to perform mist light (FIG. 1(g)). For fog light, a high-pressure mercury lamp or the like having a wavelength that the sensitizer absorbs may be used. In the exposed composition, the energy absorbed by the sensitizer is transferred to the cinnamoyl group in the polymer, and the excited cinnamoyl group forms a cyclobutane ring with a comolecule, and crosslinking progresses, resulting in insolubilization. .

Next, sometimes three types of ethyl cellosolve and methyl ethyl are used, and sometimes three strains of complementary colors of cyan, green, and yellow are used. In this case, for example, a first yellow dyed layer may be formed so as to partially overlap the first cyan dyed layer, and a third color green may be obtained in the overlapped portion. .

Usually, a surface area of 10 is provided on the uppermost layer to be dyed in order to smooth the surface or protect the dyed layer.

The surface layer 10 is required to have strength, transparency, adhesion to the intermediate layer and the dyed layer, and workability for bonding pads, etc., and any material that satisfies these requirements may be used, but the photosensitive composition described above may be used. You may also use

The surface layer IO is usually provided to have a thickness of 0, i-μ, and is further exposed and developed to form predetermined bonding pads and the like (FIG. 1(j)).

The color filter of the present invention can be obtained by pressing as described above, but the flattening layer or stain-resistant insulating layer of the color filter of the present invention has perfect stain resistance and has no adhesion to the substrate or the dye layer. The quality is good, and therefore clear images can be obtained.

In the present invention, the above-mentioned special photosensitive composition is used as the leveling layer and/or the stain-resistant insulating layer, but in the present invention, at least one layer made of the above photosensitive composition is provided, and other It is also possible to use other resin layers or the like, and the layer may be selected and determined as appropriate depending on the application. However, in view of the physical properties of the photosensitive composition, it is preferable to use it as a dye-resistant insulating layer rather than a leveling layer. Other photosensitive resins include polyglycidyl methacrylate, polymethyl methacrylate,
Polymethyl isopropenyl ketone, methyl methacrylamide, polyhexafluorobutyl methacrylate, and polybutene-1-sulfone tubes can be used.

〔Example〕

The present invention will be explained in more detail with reference to Examples below.

Example 1 [Synthesis of monomer] Hydroxyethyl methacrylate 3J? And pyridine Koda? Dissolve in 1 m of tetrahydrofuran. Cinnamate chloride SO? A go-solution of tetrahydrofuran was added dropwise to the above solution over 30 minutes while stirring.

The reaction temperature at this time is controlled between 5 and IQ°C. After the dropping is completed, the reaction is carried out at the above temperature for a certain period of time to complete the reaction.

After the reaction, the pyridine hydrochloride produced is removed by filtration. Then, 300 ml of demineralized water is added to the reaction solution which is separated from each other to cause phase separation from the product.

Then, tetramethylammonium hydroxide t
Repeat washing 3 times with 300% aqueous solution, and then 3 times with demineralized water.
The crude product can be removed by washing with t-00 and cycling 3 times.

The yield at this time is J4. Of (yield zsqb).

The above crude product-01 was applied to a silica gel (!r00?) column with chloroform/! -Hexane (-da//w
t) Develop and purify with a mixed solvent. The effluent is analyzed by thin layer chromatography, and a fraction in which no cinnamic acid is detected is collected, and the developing solvent is removed by vacuum distillation to obtain the desired product.

Yield tt, rPc! (S) [Polymer synthesis] Glycidyl methacrylate/? ,,t f, the aforementioned minnamoyloxyethyl methacrylate 70.7t is
-Dioxane I! Dissolve rOmlK and bubble with nitrogen for 30 minutes. Then, while maintaining the snow atmosphere, it was heated to AOC and azobisisobutyronitrile θ37? add boc
Let it react for 6 hours. The concentration of acid and base in the reaction system is 1
It was less than Xto'molμ.

After the reaction is completed, the reaction mixture is mixed with II! Omt is added dropwise to n-hexane to precipitate the polymer, and after separation of F, the precipitated polymer is dissolved in 9S- acetone, dropped into JOO- methanol to reprecipitate, and after being separated, it is dried under reduced pressure.

Accomplished fxr, 4Ly (glI, 1%) WSP/c-0
，! re (30CC-0 in THF, koLf/1fj) [
Preparation of photosensitizer] The polymer heda synthesized in Synthesis Example 1? Kodipenzoylmethylene-3-methylnaphthothiazolinda coda was added as a sensitizer to the mixture, dissolved in cyclohexanone, the whole was made up to 10f, and filtered through a 0.1μ Millipia filter to obtain a photosensitive solution. This photosensitive solution is coated with a 2 inch φ oxide film (SIO,!r0
00 rpm) onto a silicon wafer with a thickness of 80 μm using a spin coating method (00 rpm).
Sensitivity, resolution, and adhesion were evaluated using the methods described below. In addition, it is stain resistant.

Regarding transparency, 0. instead of Silicon Unino -.
The evaluation was performed on a glass substrate made of Tempax with a thickness of 5LIII coated in the same manner as in the case of a silicon wafer.

(1) Sensitivity: A made by Eastman Kodak ■
After exposure using a costep tablet and mask aligner MA-10 manufactured by Mikasa ■, 7:/(vol/v) of methyl isobutyl ketone and isopropyl alcohol was used.
ol) Spray development was carried out for 7 minutes using a mixed solvent, and rinsing was further carried out for 1 minute using methyl isobutyl ketone. The film thickness obtained at each step was measured using a Tencor ■ film thickness meter α-step, and a sensitivity curve was prepared M[7.

(2) Resolution...Using a resolution caster chart manufactured by Trapan ■, the image obtained after exposure and development using Mikasa ■ Exhibition Mask Aligner-MA-io was examined using an optical microscope ( The width of the minimum line and space being resolved was defined as the resolution.

(3) Transparency...mask aligner made by Mikasa■
After the entire surface was exposed using MA-10 and developed, the spectral transmittance of 310 to 7 rOnm was determined using a spectrophotometer--g manufactured by Hitachi.

(4) Staining resistance: The same substrate used to evaluate transparency was dyed yellow or cyan under the same conditions as the color filter to be applied later, and the transparency was evaluated after rinsing. Spectral transmittance was determined.

(5) Adhesion: Adhesion to glass was evaluated by adhering adhesive tape (cellophane tape) well with finger pressure and peeling it off. Further, a dyed layer of gelatin was formed on the top surface of the flattened layer in the same manner as in the examples, and the adhesive strength was evaluated using an adhesive tape in the same manner as above. The evaluation criteria are as shown below.

○: No peeling at all, but some peeling is observed (6) Storage stability: In order to check the progress of gelation, the gel was passed through O0-μ again. The number of days during which filtration became impossible due to clogging was determined. Summarize the results in table/K.

Comparative Example A crude product of cinnamoyloxyethyl methacrylate was obtained in the same manner as in Example 1. As a result of acid-base titration of this substance, it was found that it contained approximately 2% by weight of cinnamic acid.
I made it clear. This product was copolymerized with glycidyl methacrylate in the same manner as in Example 1 without being purified. The concentration of acid in the reaction system was g x / 0-'' mol/L, and the concentration of base was lo-4 d/l. Using the resulting polymer, a photosensitive solution was prepared and evaluated in the same manner as in Examples. The results are summarized in Table 1.

Table 1 Example: A photosensitive composition prepared in the same manner as in Example 1 was spin-coated onto a solid-state image sensor substrate consisting of a large number of photodetectors and a drive circuit for driving them so that the film thickness was 2μ. A resin layer for forming a flattening layer was formed by coating the resin layer. The applied resin layer was yellowish. A mask having a predetermined pattern such as a bonding pad is passed through the resin layer forming the flattening layer using a mask aligner-MA/ (Type 7 (manufactured by Mikasa)) equipped with a high-pressure mercury lamp at 300 millijoules/-. After exposure with an energy amount of・The flattened layer that had been processed into the pad part, etc., lost its yellowish color and was a transparent layer.

Subsequently, it was heat cured by post-baking at 150° C. for 1S minutes.

Next, a water bath solution of gelatin-ammonium dichromate (t (y: t1 weight ratio)) is applied onto this leveling layer by spin coating to a film thickness of 1μ to form a photosensitive material layer. The photosensitive material layer forming the layer to be dyed was exposed to light through a mask having a predetermined pattern at an energy amount of 200 millijoules/d using the same equipment as above, and then exposed to light with an energy amount of 200 mJ/d using 11.tU of water. The gelatin film was developed for 75 minutes at 1° C. to harden the gelatin film.

Ichiryoku Yanol Yellow wra whose pH was adjusted to Da with acetic acid
A layer to be dyed was formed by immersing the sample in an aqueous solution of about O, tS of p (Nippon Kayaku ■ff) (Kayanolu is a trade name of Nippon Kayaku ■) at Kts° C. for 1 minute to form a dyed layer.

Next, a photosensitive composition having the same composition as the leveling layer was coated with a film thickness of O,
This was applied by spin coating so as to have Sμ, and exposed, developed and heat cured in the same manner as the leveling layer to form a transparent dye-resistant insulating layer with bonding pads and other processed parts.

Next, a gelatin-ammonium dichromate layer was formed on this dye-resistant insulating layer in the same manner as described above, and after exposure and development in the same manner as described above, Turtle Diaclone Turquoise Blue, whose pH was adjusted to Da with acetic acid, was formed. GF# (manufactured by Mitsubishi Chemical Industries ■) (Guiacron is a registered trademark of Mitsubishi Chemical Industries ■) approximately 0
．． A layer to be dyed was formed by staining with a tSC aqueous solution for 11 minutes.

Next, as a protective film, the same photosensitive composition as the leveling layer was applied to a film thickness of 0. It was coated with spin coach ink so as to have the same color as above, exposed and developed under the same conditions as above to form a transparent surface layer with bonding pads, etc., and a color filter was directly attached. A solid-state color image sensor was obtained.

〔Effect of the invention〕

As described above, the composition of the present invention has excellent stain resistance, good adhesion to the substrate and dyed layer, colorless transparency against visible and near ultraviolet rays, and can be processed using visible light and near ultraviolet rays. A dye-resistant insulating layer can be formed.

[Brief explanation of the drawing]

FIG. 7(J) is an explanatory diagram showing an example of the manufacturing process of a direct-mounted color filter. In the figure, l is a silicon wafer, c is a photodetector, 3 is a protective film, and 4! - represents a leveling layer, j represents a dyed layer, 6 a mask, 7 a dye-resistant insulating layer, t a bonding pad, t a dyed layer, and io a surface layer. Figure 1 Figure 1

Claims (3)

[Claims] (1) At least the following formulas (I) and (II) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(I)▲There are mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, R^1 and R ^2 represents a hydrogen atom or a methyl group, R^3 represents a hydrogen atom or a phenyl group, R^
4 represents a hydrogen atom, a phenyl group or a cyano group, and R^
5 and R^6 represent a hydrogen atom, a halogen atom, a nitro group or a methoxy group. ) A photosensitive composition comprising a sensitizer and a polymer having a repeating unit represented by ×10^-^3mo
1. A photosensitive composition obtained by polymerization under conditions of 1/l or less. ▲There are mathematical formulas, chemical formulas, tables, etc.▼(III) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(IV) (In the formula, R^1 to R^8 represent the same meanings as above.) (2) The photosensitive composition according to claim 1, wherein the acid is represented by the following formula (V). ▲There are mathematical formulas, chemical formulas, tables, etc.▼(V) (In the formula, R^3 to R^6 represent the same meanings as above.) (3) The compound represented by formula (IV) is obtained by reacting the compounds represented by the following formula (VI) and the following formula (VII), followed by purification treatment using a porous inorganic carrier. The photosensitive composition according to claim 1. ▲There are mathematical formulas, chemical formulas, tables, etc.▼(VI) ▲There are mathematical formulas, chemical formulas, tables, etc.▼(VII) (In the formula, R^2 to R^6 represent the same meanings as above, and X represents a halogen atom. .)