JPS547275A - X-ray mask support and its manufacture - Google Patents

X-ray mask support and its manufacture

Info

Publication number
JPS547275A
JPS547275A JP7269277A JP7269277A JPS547275A JP S547275 A JPS547275 A JP S547275A JP 7269277 A JP7269277 A JP 7269277A JP 7269277 A JP7269277 A JP 7269277A JP S547275 A JPS547275 A JP S547275A
Authority
JP
Japan
Prior art keywords
ray mask
manufacture
mask support
film
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7269277A
Other languages
Japanese (ja)
Other versions
JPS5427711B2 (en
Inventor
Hideo Yoshihara
Toshiki Kadota
Hidefumi Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7269277A priority Critical patent/JPS547275A/en
Publication of JPS547275A publication Critical patent/JPS547275A/en
Publication of JPS5427711B2 publication Critical patent/JPS5427711B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To improve the productivity and reliability of a X-ray mask by obtaining a composite two-layer film in strain, by providing a frame-shaped Si3N4 film to the revarse surface of a Si substrate and by stacking and forming a Si3N4 film of less than 0.5μm in thickness and a SiC film of less than 5μm on its top surface.
COPYRIGHT: (C)1979,JPO&Japio
JP7269277A 1977-06-18 1977-06-18 X-ray mask support and its manufacture Granted JPS547275A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7269277A JPS547275A (en) 1977-06-18 1977-06-18 X-ray mask support and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7269277A JPS547275A (en) 1977-06-18 1977-06-18 X-ray mask support and its manufacture

Publications (2)

Publication Number Publication Date
JPS547275A true JPS547275A (en) 1979-01-19
JPS5427711B2 JPS5427711B2 (en) 1979-09-11

Family

ID=13496661

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7269277A Granted JPS547275A (en) 1977-06-18 1977-06-18 X-ray mask support and its manufacture

Country Status (1)

Country Link
JP (1) JPS547275A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57165033A (en) * 1981-04-03 1982-10-09 Fuji Debuison Kagaku Kk Hygroscopic agent and preparation thereof
JPS61251630A (en) * 1985-05-01 1986-11-08 Toa Nenryo Kogyo Kk Method of recovering lower olefin with adsorbent
US6649531B2 (en) 2001-11-26 2003-11-18 International Business Machines Corporation Process for forming a damascene structure

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57165033A (en) * 1981-04-03 1982-10-09 Fuji Debuison Kagaku Kk Hygroscopic agent and preparation thereof
JPH039767B2 (en) * 1981-04-03 1991-02-12 Fuji Davison Chemical
JPS61251630A (en) * 1985-05-01 1986-11-08 Toa Nenryo Kogyo Kk Method of recovering lower olefin with adsorbent
US6649531B2 (en) 2001-11-26 2003-11-18 International Business Machines Corporation Process for forming a damascene structure

Also Published As

Publication number Publication date
JPS5427711B2 (en) 1979-09-11

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