JPH08148297A - Charged particle apparatus - Google Patents
Charged particle apparatusInfo
- Publication number
- JPH08148297A JPH08148297A JP28947994A JP28947994A JPH08148297A JP H08148297 A JPH08148297 A JP H08148297A JP 28947994 A JP28947994 A JP 28947994A JP 28947994 A JP28947994 A JP 28947994A JP H08148297 A JPH08148297 A JP H08148297A
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- electromagnet
- annular
- particle beam
- mounting surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Particle Accelerators (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は電子や陽子といった荷
電粒子を高エネルギーに輸送、加速または蓄積して、素
粒子の研究や癌細胞の殺傷などに用いる荷電粒子装置に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a charged particle device for transporting, accelerating or accumulating charged particles such as electrons and protons at high energy for use in elementary particle research and cancer cell killing.
【0002】[0002]
【従来の技術】図7は例えば特開平1−107500号
公報等に示されている従来の荷電粒子装置を示す斜視図
である。図において、(1)は電子や陽子などの荷電粒子
を発生し予備加速する入射器、(2)は入射器(1)からの荷
電粒子を輸送する注入ライン、(3)は注入ライン(2)中の
荷電粒子ビームを後述の環状部に導入する入射電磁石
で、これら入射器(1)、注入ライン(2)及び入射電磁石
(3)等で入射部(4)を構成する。2. Description of the Related Art FIG. 7 is a perspective view showing a conventional charged particle device disclosed in, for example, Japanese Patent Application Laid-Open No. 1-107500. In the figure, (1) is an injector that pre-accelerates by generating charged particles such as electrons and protons, (2) is an injection line that transports charged particles from the injector (1), and (3) is an injection line (2 ) Is an incident electromagnet that introduces the charged particle beam into the annular portion described later, and these injector (1), injection line (2) and incident electromagnet
The incident part (4) is constituted by (3) and the like.
【0003】(5)(5a)は荷電粒子を輸送する真空チャン
バ、(6)(6a)は真空チャンバ(5)(5a)に周設され、荷電粒
子を偏向する偏向電磁石、(7)(7a)は荷電粒子ビームを
収束させるための収束4極電磁石、(8)は荷電粒子を加
速する高周波加速空胴で、真空チャンバ(5)、偏向電磁
石(6)、収束4極電磁石(7)及び高周波加速空胴(8)等で
環状部(9)を構成する。(10)は真空チャンバ(5)中の荷電
粒子ビームを出射方向に導く出射電磁石で、真空チャン
バ(5a)、偏向電磁石(6a)及び収束4極電磁石(7a)とで環
状部(9)内の荷電粒子ビームを所望方向に曲げ出射する
出射部(11)を構成する。(12)は出射荷電粒子ビームであ
る。(5) and (5a) are vacuum chambers for transporting charged particles, (6) and (6a) are provided around the vacuum chambers (5) and (5a) for deflecting charged particles, and (7) (6) 7a) is a converging quadrupole electromagnet for converging the charged particle beam, and (8) is a high-frequency acceleration cavity for accelerating the charged particles, which includes a vacuum chamber (5), a deflection electromagnet (6), and a converging quadrupole electromagnet (7). The high frequency acceleration cavity (8) and the like form the annular portion (9). (10) is an output electromagnet that guides the charged particle beam in the vacuum chamber (5) in the output direction. The output of the vacuum chamber (5a), the deflection electromagnet (6a) and the converging quadrupole electromagnet (7a) is inside the annular part (9). An emission part (11) for bending and emitting the charged particle beam in (1) is formed. (12) is the outgoing charged particle beam.
【0004】次に動作について説明する。入射器(1)に
よってイオン化された荷電粒子は注入ライン(2)によっ
て入射電磁石(3)へと導かれる。入射電磁石(3)では入射
された荷電粒子が環状の真空チャンバ(5)内を周回する
よう軌道が修正される。環状部(9)の真空チャンバ(5)に
導入された荷電粒子は、収束4極電磁石(7)にてビーム
幅が絞り込まれ、さらに偏向電磁石(6)によってビーム
進行方向が曲げられる。これが順次繰り返されて荷電粒
子は環状部(9)の真空チャンバ(5)内を周回する。周回途
中でエネルギーの損失があるので、高周波加速空胴(8)
によってさらに加速される。このようにして荷電粒子が
真空チャンバ(5)内を所定回数周回した後、出射電磁石
(10)によってビーム進行方向が曲げられ出射部(11)の真
空チャンバ(5a)に導かれ、偏向電磁石(6a)で曲げられ収
束4極電磁石(7a)でビーム幅が絞られ所望方向に出射さ
れる。出射部(11)から出てきた出射ビーム(12)は目的と
する対象物に照射される。Next, the operation will be described. The charged particles ionized by the injector (1) are guided to the incident electromagnet (3) by the injection line (2). The orbit of the incident electromagnet (3) is modified so that the charged particles that have been incident orbit the circular vacuum chamber (5). The beam width of the charged particles introduced into the vacuum chamber (5) of the annular portion (9) is narrowed down by the converging quadrupole electromagnet (7), and the beam traveling direction is bent by the deflection electromagnet (6). This is sequentially repeated so that the charged particles circulate in the vacuum chamber (5) of the annular portion (9). High-frequency acceleration cavity (8) due to energy loss during orbit
Is further accelerated by. After the charged particles circulate in the vacuum chamber (5) a predetermined number of times in this way, the output electromagnet
The beam traveling direction is bent by (10) and guided to the vacuum chamber (5a) of the emitting part (11), bent by the deflection electromagnet (6a) and converged by the quadrupole electromagnet (7a), and the beam width is narrowed and emitted in a desired direction. To be done. The emission beam (12) emitted from the emission unit (11) is applied to the target object.
【0005】[0005]
【発明が解決しようとする課題】従来の荷電粒子装置は
以上のように構成されているので、出射ビームの取り出
し方向が固定で一つの対象物にしか照射できなかった。
また複数の対象物に照射するためには出射部からさらに
複数の分岐ラインを設けなければならない等の問題点が
あった。Since the conventional charged particle device is constructed as described above, the outgoing beam extraction direction is fixed and only one object can be irradiated.
Moreover, in order to irradiate a plurality of objects, a plurality of branch lines must be further provided from the emitting portion, which is a problem.
【0006】この発明は上記のような問題点を解消する
ためになされたもので、出射荷電粒子ビームを任意の方
向に取り出すことができる荷電粒子装置を得ることを目
的とする。The present invention has been made to solve the above problems, and an object thereof is to obtain a charged particle device capable of extracting an outgoing charged particle beam in an arbitrary direction.
【0007】また、異なった方向からの出射荷電粒子ビ
ームを一点に集中させることができる荷電粒子装置を得
ることをも目的としている。Another object of the present invention is to obtain a charged particle device capable of concentrating outgoing charged particle beams from different directions at one point.
【0008】[0008]
【課題を解決するための手段】この発明の請求項1記載
の荷電粒子装置は、回転可能の回転支持台に、入射部、
環状部及び出射部を一体に搭載したものである。The charged particle device according to claim 1 of the present invention comprises a rotatable support table, an entrance portion, and a rotary support table.
The annular portion and the emitting portion are integrally mounted.
【0009】この発明の請求項2記載の荷電粒子装置
は、請求項1記載の荷電粒子装置における回転支持台
を、入射部、環状部及び出射部の搭載面に直交する軸を
中心に回転可能としたものである。According to a second aspect of the present invention, in the charged particle apparatus according to the first aspect, the rotary support of the charged particle apparatus according to the first aspect can be rotated about an axis orthogonal to the mounting surface of the entrance portion, the annular portion and the exit portion. It is what
【0010】この発明の請求項3記載の荷電粒子装置
は、請求項2記載の荷電粒子装置における入射部、環状
部及び出射部の搭載面を水平面に、請求項4記載の荷電
粒子装置は上記搭載面を垂直面としたものである。According to a third aspect of the present invention, in the charged particle device according to the second aspect, the mounting surfaces of the incident part, the annular part and the emission part of the charged particle device according to the second aspect are horizontal, and the charged particle device according to the fourth aspect is the above. The mounting surface is a vertical surface.
【0011】この発明の請求項5記載の荷電粒子装置
は、請求項1記載の荷電粒子装置における回転支持台
を、入射部、環状部及び出射部の搭載面に沿った方向の
軸を中心に回転し得るようにした。According to a fifth aspect of the present invention, in the charged particle apparatus according to the first aspect, the rotary support of the charged particle apparatus according to the first aspect is centered on an axis in a direction along a mounting surface of the entrance portion, the annular portion and the exit portion. I was able to rotate.
【0012】この発明の請求項6記載の荷電粒子装置
は、請求項2、3、4または5に記載の荷電粒子装置に
おいて、荷電粒子出射方向が回転支持台の回転軸上の一
点に向かうよう出射部を配設したものである。A charged particle device according to a sixth aspect of the present invention is the charged particle device according to the second, third, fourth or fifth aspect, wherein the charged particle emission direction is directed to a point on the rotation axis of the rotary support. The emission part is arranged.
【0013】[0013]
【作用】この発明の請求項1に記載の発明によれば、入
射部、環状部及び出射部一体に搭載した支持台を回転可
能としたので、装置全体の回転により出射部も回動し、
出射荷電粒子ビームを任意の方向に取出すことができ
る。According to the invention described in claim 1 of the present invention, since the support base integrally mounted on the entrance portion, the annular portion and the exit portion is rotatable, the exit portion is also rotated by the rotation of the entire apparatus,
The outgoing charged particle beam can be extracted in any direction.
【0014】この発明の請求項2、3及び4に記載の発
明によれば、回転支持台を、水平面や垂直面である、入
射部、環状部及び出射部の搭載面に直交する軸を中心に
回転可能としたので、上記搭載面に沿って装置全体が回
転し、出射荷電粒子ビームをその水平、垂直等の搭載面
内の任意の角度方向に取出すことができる。According to the second, third and fourth aspects of the present invention, the rotary support is centered on an axis which is a horizontal plane or a vertical plane and which is orthogonal to the mounting surfaces of the entrance portion, the annular portion and the exit portion. Since the entire apparatus is rotated along the mounting surface, the outgoing charged particle beam can be taken out in an arbitrary angular direction within the mounting surface such as horizontal or vertical.
【0015】この発明の請求項5に記載の発明によれ
ば、回転支持台を、入射部、環状部及び出射部の搭載面
に沿った方向の軸を中心に回転し得るようにしたので、
上記搭載面に直交する面に沿って装置全体が回転し、出
射荷電粒子ビームをその搭載面に直交する面内の任意の
方向に取出すことができる。According to the invention of claim 5 of the present invention, the rotary support can be rotated about the axis in the direction along the mounting surface of the entrance portion, the annular portion and the exit portion.
The entire apparatus rotates along the plane orthogonal to the mounting surface, and the emitted charged particle beam can be taken out in any direction within the plane orthogonal to the mounting surface.
【0016】この発明の請求項6に記載の発明によれば
荷電粒子出射方向が回転支持台の回転軸上の一点に向か
うよう出射部を配設したので、出射荷電粒子ビームの方
向が変化しても常に一点に集束する。According to the sixth aspect of the present invention, since the emitting portion is arranged so that the charged particle emitting direction is directed to one point on the rotation axis of the rotary support, the direction of the emitted charged particle beam changes. But always focus on one point.
【0017】[0017]
実施例1.以下この発明の実施例1を図1について説明
する。図1は実施例1を示す斜視図である。図におい
て、(1)は入射器、(2)は注入ライン、(3)は入射電磁
石、(4)はこれら入射器(1)、注入ライン(2)及び
入射電磁石(3)等で構成される入射部、(5)(5a)は真空チ
ャンバ、(6)(6a)は偏向電磁石、(7)(7a)は収束4極電磁
石、(8)は高周波加速空胴、(9)は真空チャンバ(5)、偏
向電磁石(6)、収束4極電磁石(7)及び高周波加速空胴
(8)等で構成される環状部、(10)は出射電磁石、(11)は
出射電磁石(10)、真空チャンバ(5a)、偏向電磁石(6a)及
び収束4極電磁石(7a)とで構成される出射部、(12)は出
射荷電粒子ビームで、以上は図7で示した従来例と同様
のものである。Example 1. Embodiment 1 of the present invention will be described below with reference to FIG. FIG. 1 is a perspective view showing the first embodiment. In the figure, (1) is an injector, (2) is an injection line, (3) is an incident electromagnet, (4) is composed of these injectors (1), injection line (2) and incident electromagnet (3), etc. Incident part, (5) and (5a) are vacuum chambers, (6) and (6a) are deflection electromagnets, (7) and (7a) are focusing quadrupole electromagnets, (8) is a high-frequency acceleration cavity, and (9) is a vacuum. Chamber (5), deflection electromagnet (6), focusing quadrupole electromagnet (7) and high frequency acceleration cavity
An annular part composed of (8), etc., (10) an output electromagnet, (11) an output electromagnet (10), a vacuum chamber (5a), a deflection electromagnet (6a) and a converging quadrupole electromagnet (7a) An emitting portion, (12), is an emitted charged particle beam, and the above is the same as the conventional example shown in FIG.
【0018】(20)は入射部(4)、環状部(9)及び出射部(1
1)からなる全体装置を一体にそれの水平搭載面(21)に搭
載する水平回転支持台、(22)は水平搭載面(21)と直交す
る回転軸、(23)は回転力を発生するモータ等の駆動機、
(24)は駆動機(23)の回転力を回転支持台(20)に伝達する
回転伝達ローラ、(25)は回転支持台(20)を回転可能に支
持する支持ローラである。Reference numeral (20) denotes an entrance portion (4), an annular portion (9) and an exit portion (1
A horizontal rotary support that integrally mounts the entire device consisting of 1) on its horizontal mounting surface (21), (22) a rotary axis orthogonal to the horizontal mounting surface (21), and (23) generating rotational force. Drives such as motors,
Reference numeral (24) is a rotation transmission roller for transmitting the rotational force of the driving machine (23) to the rotation support base (20), and (25) is a support roller for rotatably supporting the rotation support base (20).
【0019】次に動作について説明する。入射器(1)か
らの荷電粒子は、注入ライン(2)によって入射電磁石(3)
へと導かれ軌道が修正されて、環状部(9)の真空チャン
バ(5)に導入され、収束4極電磁石(7)にてビーム幅が絞
り込まれ、さらに偏向電磁石(6)によって偏向され、高
周波加速空胴(8)によって加速されて環状部(9)の真空チ
ャンバ(5)内を周回する。このようにして荷電粒子が所
定回数周回した後、出射電磁石(10)によってビーム進行
方向が曲げられ出射部(11)の真空チャンバ(5a)に導か
れ、偏向電磁石(6a)で曲げられ収束4極電磁石(7a)でビ
ーム幅が絞られ所望方向に出射される。出射部(11)から
出てきた出射荷電粒子ビーム(12)は目的とする対象物に
照射される。以上は従来例と同様である。Next, the operation will be described. Charged particles from the injector (1) are injected by the injection line (2) into the incident electromagnet (3).
Is introduced into the vacuum chamber (5) of the annular portion (9), the beam width is narrowed by the converging quadrupole electromagnet (7), and further deflected by the deflection electromagnet (6). It is accelerated by the high-frequency acceleration cavity (8) and goes around in the vacuum chamber (5) of the annular portion (9). After the charged particles circulate a predetermined number of times in this way, the beam traveling direction is bent by the output electromagnet (10) and is guided to the vacuum chamber (5a) of the output unit (11), and is bent by the deflection electromagnet (6a) and converges. The beam width is narrowed down by the polar electromagnet (7a) and emitted in a desired direction. The emitted charged particle beam (12) emitted from the emission part (11) is applied to a target object. The above is the same as the conventional example.
【0020】次に、駆動機(23)を付勢し回転伝達ローラ
(24)の駆動によって水平回転支持台(20)を回転軸(22)を
中心に回転させると、それに合わせて入射部(4)、環状
部(9)及び出射部(11)全体が水平回転する。従って、出
射部(11)から出射される荷電粒子ビーム(12)の方向も変
わり、これを水平面内の任意の角度方向に向けることが
できる。Next, the driving machine (23) is urged to rotate the rotation transmitting roller.
When the horizontal rotation support base (20) is rotated about the rotation axis (22) by the drive of (24), the incident part (4), the annular part (9) and the emission part (11) are all horizontally rotated in accordance with the rotation. To do. Therefore, the direction of the charged particle beam (12) emitted from the emitting part (11) is also changed, and it can be directed to an arbitrary angular direction in the horizontal plane.
【0021】実施例2.図2は実施例2を示す斜視図
で、図において、(1)は入射器、(2)は注入ライン、(3)
は入射電磁石、(4)は入射部、(5)(5a)は真空チャンバ、
(6)(6a)は偏向電磁石、(7)(7a)は収束4極電磁石、(8)
は高周波加速空胴、(9)は環状部、(10)は出射電磁石、
(11)は出射部、(12)は出射荷電粒子ビーム、(23)は駆動
機、(24)は回転伝達ローラ、(25)は支持ローラで、以上
は図1で示した実施例1と同様で、これらの動作も実施
例1と同様なので説明を省略する。Example 2. FIG. 2 is a perspective view showing a second embodiment, in which (1) is an injector, (2) is an injection line, and (3).
Is an incident electromagnet, (4) is an incident part, (5) and (5a) are vacuum chambers,
(6) (6a) is a deflection electromagnet, (7) (7a) is a converging quadrupole electromagnet, (8)
Is a high frequency acceleration cavity, (9) is an annular part, (10) is an output electromagnet,
(11) is an emission part, (12) is an emitted charged particle beam, (23) is a driving machine, (24) is a rotation transmission roller, and (25) is a support roller. The above is the same as the first embodiment shown in FIG. Similarly, these operations are also the same as those in the first embodiment, and the description thereof will be omitted.
【0022】(26)は入射部(4)、環状部(9)及び出射部(1
1)からなる全体装置を一体にそれの垂直搭載面(27)に搭
載する垂直回転支持台、(28)は垂直搭載面(27)と直交す
る回転軸である。Reference numeral (26) denotes an entrance portion (4), an annular portion (9) and an exit portion (1
A vertical rotation support stand for integrally mounting the entire device consisting of 1) on its vertical mounting surface (27), and (28) is a rotation axis orthogonal to the vertical mounting surface (27).
【0023】以上の構成で、駆動機(23)を付勢し回転伝
達ローラ(24)の駆動によって垂直回転支持台(26)を回転
軸(28)を中心に回転させると、それに合わせて入射部
(4)、環状部(9)及び出射部(11)全体が垂直回転する。従
って、出射部(11)から出射される荷電粒子ビーム(12)の
方向も変わり、これを垂直面内の任意の角度方向に向け
ることができる。With the above structure, when the vertical rotation support base (26) is rotated about the rotation shaft (28) by energizing the driving machine (23) and driving the rotation transmission roller (24), the incident light is incident accordingly. Department
(4), the annular portion (9) and the emitting portion (11) as a whole rotate vertically. Therefore, the direction of the charged particle beam (12) emitted from the emission part (11) is also changed, and it can be directed to an arbitrary angular direction in the vertical plane.
【0024】実施例3.図3は実施例3を示す斜視図
で、図において、(1)は入射器、(2)は注入ライン、(3)
は入射電磁石、(4)は入射部、(5)(5a)は真空チャンバ、
(6)(6a)は偏向電磁石、(7)(7a)は収束4極電磁石、(8)
は高周波加速空胴、(9)は環状部、(10)は出射電磁石、
(11)は出射部、(12)は出射荷電粒子ビーム、(23)は駆動
機、(24)は回転伝達ローラ、(25)は支持ローラで、以上
は図1、2で示した実施例1、2と同様で、これらの動
作も実施例1、2と同様なので説明を省略する。Example 3. FIG. 3 is a perspective view showing a third embodiment, in which (1) is an injector, (2) is an injection line, and (3).
Is an incident electromagnet, (4) is an incident part, (5) and (5a) are vacuum chambers,
(6) (6a) is a deflection electromagnet, (7) (7a) is a converging quadrupole electromagnet, (8)
Is a high frequency acceleration cavity, (9) is an annular part, (10) is an output electromagnet,
(11) is an emission part, (12) is an emitted charged particle beam, (23) is a driving machine, (24) is a rotation transmission roller, and (25) is a support roller. The above is the embodiment shown in FIGS. The operations are the same as those of the first and second embodiments, and the operations thereof are also the same as those of the first and second embodiments, and therefore the description thereof is omitted.
【0025】(29)は入射部(4)、環状部(9)及び出射部(1
1)からなる全体装置を一体にそれの搭載面(30)に搭載す
る回転支持台、(31)は回転支持台(29)に設けられ、回転
支持台(29)を搭載面(30)に沿った方向の回転軸(32)を中
心に回転可能とする回転支持棒である。Reference numeral (29) denotes an entrance portion (4), an annular portion (9) and an exit portion (1
A rotation support stand for integrally mounting the entire device consisting of 1) on its mounting surface (30), (31) is provided on the rotation support stand (29), and the rotation support stand (29) is mounted on the mounting surface (30). This is a rotation support rod that is rotatable around a rotation axis (32) in the direction along the rotation axis.
【0026】以上の構成で、駆動機(23)を付勢し回転伝
達ローラ(24)の駆動によって回転支持棒(31)を回転させ
ることによって、回転支持台(29)を回転軸(32)を中心に
回転させると、それに合わせて入射部(4)、環状部(9)及
び出射部(11)全体が搭載面(30)に直交する面に沿って回
転する。従って、出射部(11)から出射される荷電粒子ビ
ーム(12)の方向も変わり、これを搭載面(30)に直交する
面内の任意の角度方向に向けることができる。With the above structure, the rotary support rod (31) is rotated by urging the driving machine (23) to drive the rotation transmission roller (24), thereby rotating the rotary support base (29) to the rotary shaft (32). When it is rotated about, the incident part (4), the annular part (9), and the emitting part (11) are all rotated correspondingly along a plane orthogonal to the mounting surface (30). Therefore, the direction of the charged particle beam (12) emitted from the emitting part (11) is also changed, and it can be directed to an arbitrary angular direction in the plane orthogonal to the mounting surface (30).
【0027】以上の実施例1及び2においては、回転支
持台を水平又は垂直面に沿って、実施例3においては搭
載面に直交する面に沿って回転させたが、水平と垂直間
の任意角度の傾斜面に沿って回転させるようにすること
も、搭載面と任意角度傾斜した軸を中心に回転させるこ
とも可能である。また、回転支持台を互に直交する2本
の回転軸を中心に回転可能に支持することによって、3
次元的な回転も可能となる。In the first and second embodiments described above, the rotary support was rotated along the horizontal or vertical plane, and in the third embodiment along the plane orthogonal to the mounting surface. It is possible to rotate along an inclined surface of an angle or to rotate about an axis inclined at an arbitrary angle with the mounting surface. In addition, by supporting the rotation support base so as to be rotatable about two rotation axes that are orthogonal to each other,
Dimensional rotation is also possible.
【0028】実施例4.図4は実施例4を示す斜視図
で、図において、(1)は入射器、(2)は注入ライン、(3)
は入射電磁石、(4)は入射部、(5)(5a)は真空チャンバ、
(6)(6a)は偏向電磁石、(7)(7a)は収束4極電磁石、(8)
は高周波加速空胴、(9)は環状部、(10)は出射電磁石、
(11)は出射部、(12)は出射荷電粒子ビーム、(20)は水平
回転支持台、(21)は水平搭載面、(22)は回転軸、(23)は
駆動機、(24)は回転伝達ローラ、(25)は支持ローラで、
以上は図1で示した実施例1と同様で、これらの動作も
実施例1と同様なので説明を省略する。Example 4. FIG. 4 is a perspective view showing Embodiment 4, in which (1) is an injector, (2) is an injection line, and (3).
Is an incident electromagnet, (4) is an incident part, (5) and (5a) are vacuum chambers,
(6) (6a) is a deflection electromagnet, (7) (7a) is a converging quadrupole electromagnet, (8)
Is a high frequency acceleration cavity, (9) is an annular part, (10) is an output electromagnet,
(11) is an output unit, (12) is an output charged particle beam, (20) is a horizontal rotary support, (21) is a horizontal mounting surface, (22) is a rotary shaft, (23) is a drive machine, (24) Is a rotation transmission roller, (25) is a support roller,
The above is the same as that of the first embodiment shown in FIG.
【0029】(6b)は出射荷電粒子ビーム(12)を回転軸(2
2)上の一点であるビーム集束点(33)の方向に偏向する偏
向電磁石、(34)は荷電粒子をビーム集束点(33)の方向に
輸送し出射する出射ビーム輸送ラインで、出射部(11)の
一部を構成する。(6b) shows the outgoing charged particle beam (12) with the rotation axis (2
2) A deflecting electromagnet that deflects in the direction of the beam focusing point (33), which is one of the above points, and (34) is an exit beam transport line that transports and emits charged particles in the direction of the beam focusing point (33). It forms part of 11).
【0030】以上の構成で、駆動機(23)を付勢し回転伝
達ローラ(24)の駆動によって水平回転支持台(20)を回転
軸(22)を中心に回転させ、荷電粒子ビーム(12)の出射方
向を変更させても、その荷電粒子ビーム(12)は回転軸(2
2)上の一点であるビーム集束点(33)に向けて出射される
ので、荷電粒子ビーム(12)は水平回転支持台(20)の回転
位置に関係なく常にビーム集束点(33)に向けられ、多方
向から一点に集束される。従って、放射線治療等におい
て患部を集束点(33)に合わせ回転照射すれば、病巣部に
は高線量が照射されるが、他の部分への照射は水平面内
に分散し、正常組織への被爆を最小限にとどめることが
できる。With the above structure, the driving machine (23) is energized and the rotation transmission roller (24) is driven to rotate the horizontal rotation support base (20) about the rotation shaft (22), and the charged particle beam (12) is rotated. ), The charged particle beam (12) still has a rotation axis (2
2) The charged particle beam (12) is always directed toward the beam focusing point (33) regardless of the rotation position of the horizontal rotary support (20) because it is emitted toward the beam focusing point (33) which is one point on the top. It is focused from multiple directions. Therefore, in radiation therapy, etc., if the affected area is rotated and irradiated at the focal point (33), a high dose is irradiated to the lesion area, but the irradiation to other areas is dispersed in the horizontal plane, and normal tissue is exposed to radiation. Can be kept to a minimum.
【0031】実施例5.図5は実施例5を示す斜視図
で、図において、(1)は入射器、(2)は注入ライン、(3)
は入射電磁石、(4)は入射部、(5)(5a)は真空チャンバ、
(6)(6a)は偏向電磁石、(7)(7a)は収束4極電磁石、(8)
は高周波加速空胴、(9)は環状部、(10)は出射電磁石、
(11)は出射部、(12)は出射荷電粒子ビーム、(23)は駆動
機、(24)は回転伝達ローラ、(25)は支持ローラ、(26)は
垂直回転支持台、(27)は垂直搭載面、(28)は回転軸で、
以上は図2で示した実施例2と同様で、これらの動作も
実施例2と同様なので説明を省略する。また、(33)は回
転軸(28)上の一点であるビーム集束点、(6b)は出射荷電
粒子ビーム(12)をビーム集束点(33)の方向に偏向する偏
向電磁石、(34)は出射ビーム輸送ラインで図4に示した
実施例4と同様である。Example 5. FIG. 5 is a perspective view showing Example 5, in which (1) is an injector, (2) is an injection line, and (3).
Is an incident electromagnet, (4) is an incident part, (5) and (5a) are vacuum chambers,
(6) (6a) is a deflection electromagnet, (7) (7a) is a converging quadrupole electromagnet, (8)
Is a high frequency acceleration cavity, (9) is an annular part, (10) is an output electromagnet,
(11) is an output unit, (12) is an output charged particle beam, (23) is a driving machine, (24) is a rotation transmission roller, (25) is a support roller, (26) is a vertical rotation support, (27) Is the vertical mounting surface, (28) is the rotation axis,
The above is the same as that of the second embodiment shown in FIG. Further, (33) is a beam focusing point that is one point on the rotation axis (28), (6b) is a deflecting electromagnet that deflects the outgoing charged particle beam (12) in the direction of the beam focusing point (33), and (34) is The outgoing beam transport line is similar to that of the fourth embodiment shown in FIG.
【0032】以上の構成で、駆動機(23)を付勢し回転伝
達ローラ(24)の駆動によって垂直回転支持台(26)を回転
軸(28)を中心に回転させ、荷電粒子ビーム(12)の出射方
向を変更させても、その荷電粒子ビーム(12)は回転軸(2
8)上の一点であるビーム集束点(33)に向けて出射される
ので、荷電粒子ビーム(12)は垂直回転支持台(26)の回転
位置に関係なく常にビーム集束点(33)に向けられ、多方
向から一点に集束される。従って、放射線治療等におい
て患部を集束点(33)に合わせ回転照射すれば、病巣部に
は高線量が照射されるが、他の部分への照射は垂直面内
に分散し、正常組織への被爆を最小限にとどめることが
できる。With the above construction, the driving machine (23) is energized and the rotation transmission roller (24) is driven to rotate the vertical rotation support base (26) about the rotation axis (28), and the charged particle beam (12) ), The charged particle beam (12) still has a rotation axis (2
8) The charged particle beam (12) is always directed toward the beam focusing point (33) regardless of the rotation position of the vertical rotation support (26) because it is emitted toward the beam focusing point (33) which is one point on the above. It is focused from multiple directions. Therefore, in radiation treatment, etc., if the affected area is rotated and irradiated at the focal point (33), a high dose is irradiated to the lesion area, but the irradiation to other areas is dispersed in the vertical plane, and the normal tissue is irradiated. The exposure can be kept to a minimum.
【0033】実施例6.図6は実施例6を示す斜視図
で、(1)は入射器、(2)は注入ライン、(3)は入射電磁
石、(4)は入射部、(5)(5a)は真空チャンバ、(6)(6a)は
偏向電磁石、(7)(7a)は収束4極電磁石、(8)は高周波加
速空胴、(9)は環状部、(10)は出射電磁石、(11)は出射
部、(12)は出射荷電粒子ビーム、(23)は駆動機、(24)は
回転伝達ローラ、(25)は支持ローラ、(29)は回転支持
台、(30)は搭載面、(31)は回転支持棒、(32)は回転軸
で、以上は図3で示した実施例3と同様で、これらの動
作も実施例3と同様なので説明を省略する。また、(33)
はビーム集束点、(6b)は偏向電磁石、(34)は出射ビーム
輸送ラインで図4に示した実施例4と同様である。Example 6. FIG. 6 is a perspective view showing Example 6, (1) is an injector, (2) is an injection line, (3) is an incident electromagnet, (4) is an incident part, (5) and (5a) are vacuum chambers, (6) (6a) is a deflection electromagnet, (7) (7a) is a converging quadrupole electromagnet, (8) is a high frequency acceleration cavity, (9) is an annular part, (10) is an exit electromagnet, and (11) is an exit. , (12) is an outgoing charged particle beam, (23) is a driving machine, (24) is a rotation transmission roller, (25) is a support roller, (29) is a rotation support base, (30) is a mounting surface, and (31) ) Is a rotary support rod, and (32) is a rotary shaft. The above is the same as that of the third embodiment shown in FIG. Also (33)
Is a beam focusing point, (6b) is a deflecting electromagnet, and (34) is an outgoing beam transport line, which is similar to that of the fourth embodiment shown in FIG.
【0034】以上の構成で、駆動機(23)を付勢し回転伝
達ローラ(24)の駆動によって回転支持棒(31)を回転させ
ることによって、回転支持台(29)を回転軸(32)を中心に
回転させて荷電粒子ビーム(12)の出射方向を変更させて
も、その荷電粒子ビーム(12)は回転軸(32)上の一点であ
るビーム集束点(33)に向けて出射されるので、荷電粒子
ビーム(12)は回転支持台(29)の回転位置に関係なく常に
ビーム集束点(33)に向けられ、多方向から一点に集束さ
れる。従って、放射線治療等において患部を集束点(33)
に合わせ回転照射すれば、病巣部には高線量が照射され
るが、他の部分への照射は搭載面に直交する面内に分散
し、正常組織への被爆を最小限にとどめることができ
る。With the above structure, the rotation support bar (31) is rotated by urging the driving machine (23) to drive the rotation transmission roller (24), thereby rotating the rotation support base (29) to the rotation shaft (32). Even if the charged particle beam (12) is rotated about its center to change the emitting direction of the charged particle beam (12), the charged particle beam (12) is emitted toward the beam focusing point (33), which is one point on the rotation axis (32). Therefore, the charged particle beam (12) is always directed to the beam focusing point (33) regardless of the rotation position of the rotary support (29), and is focused from one direction to another. Therefore, the affected area should be focused on
High-dose irradiation will be applied to the lesion area by rotating according to the above, but irradiation to other areas will be dispersed in the plane orthogonal to the mounting surface, and exposure to normal tissue can be minimized. .
【0035】[0035]
【発明の効果】請求項1に記載の発明によれば、回転可
能の回転支持台に、入射部、環状部及び出射部を一体に
搭載したので、装置全体の回転により出射部も回動し、
出射荷電粒子ビームを任意の方向に取出すことができ、
複数の対象物への照射が容易に行える等の効果がある。According to the first aspect of the present invention, since the incident part, the annular part and the emitting part are integrally mounted on the rotatable rotary support, the emitting part is also rotated by the rotation of the entire apparatus. ,
The outgoing charged particle beam can be extracted in any direction,
There is an effect that it is possible to easily irradiate a plurality of objects.
【0036】請求項2、3及び4に記載の発明によれ
ば、回転支持台を、水平面や垂直面である、入射部、環
状部及び出射部の搭載面に直交する軸を中心に回転可能
としたので、上記搭載面に沿って装置全体が回転し、出
射荷電粒子ビームをその水平、垂直等の搭載面内の任意
の角度方向に取出すことができ、上記搭載面内における
複数の対象物への照射が容易に行える等の効果がある。According to the second, third and fourth aspects of the present invention, the rotary support table can be rotated about an axis which is a horizontal plane or a vertical plane and which is orthogonal to the mounting surface of the entrance portion, the annular portion and the exit portion. Therefore, the entire apparatus rotates along the mounting surface, and the emitted charged particle beam can be taken out in any angle direction within the mounting surface such as horizontal or vertical, and a plurality of objects in the mounting surface can be extracted. There is an effect that it can be easily irradiated.
【0037】請求項5に記載の発明によれば、回転支持
台に入射部、環状部及び出射部の搭載面に沿った方向の
回転軸を中心に回転し得るようにしたので、上記搭載面
に直交する面に沿って装置全体が回転し、出射荷電粒子
ビームを搭載面に直交する面内の任意の方向に取出すこ
とができ、上記搭載面に直交する面内における複数の対
象物への照射が容易に行える等の効果がある。According to the fifth aspect of the present invention, the rotation support base is configured to be rotatable about the rotation axis in the direction along the mounting surface of the entrance portion, the annular portion and the exit portion. The entire apparatus rotates along a plane orthogonal to the, and the emitted charged particle beam can be taken out in an arbitrary direction within a plane orthogonal to the mounting surface. There is an effect that irradiation can be performed easily.
【0038】請求項6に記載の発明によれば、荷電粒子
出射方向が回転支持台の回転軸上の一点に向かうよう出
射部を配設したので、出射荷電粒子ビームの方向が変化
しても常に一点に集束し、放射線治療等において患部を
集束点に合わせ回転照射すれば、病巣部には高線量が照
射されるとともに他の部分への照射は回転面内に分散
し、正常組織への被爆を最小限にとどめることができる
等の効果がある。According to the sixth aspect of the invention, since the emitting portion is arranged so that the charged particle emitting direction is directed to one point on the rotation axis of the rotary support, even if the direction of the emitted charged particle beam changes. Always focus on one point, and if the affected area is rotated and irradiated during radiation treatment, etc., the lesion area will be irradiated with a high dose and the irradiation to other areas will be dispersed in the rotating plane, and This has the effect of minimizing exposure to radiation.
【図1】この発明の実施例1を示す斜視図である。FIG. 1 is a perspective view showing a first embodiment of the present invention.
【図2】この発明の実施例2を示す斜視図である。FIG. 2 is a perspective view showing a second embodiment of the present invention.
【図3】この発明の実施例3を示す斜視図である。FIG. 3 is a perspective view showing a third embodiment of the present invention.
【図4】この発明の実施例4を示す斜視図である。FIG. 4 is a perspective view showing a fourth embodiment of the present invention.
【図5】この発明の実施例5を示す斜視図である。FIG. 5 is a perspective view showing a fifth embodiment of the present invention.
【図6】この発明の実施例6を示す斜視図である。FIG. 6 is a perspective view showing Embodiment 6 of the present invention.
【図7】従来の荷電粒子装置を示す斜視図である。FIG. 7 is a perspective view showing a conventional charged particle device.
4 入射部、5 真空チャンバ、9 環状部、11 出
射部、12 出射荷電粒子ビーム、20 水平回転支持
台、21 水平搭載面、22 水平回転軸、26 垂直
回転支持台、27 垂直搭載面、28 垂直回転軸、2
9 回転支持台、30 搭載面、32 回転軸、33
ビーム集束点。4 injection part, 5 vacuum chamber, 9 annular part, 11 exit part, 12 output charged particle beam, 20 horizontal rotation support, 21 horizontal mounting surface, 22 horizontal rotation axis, 26 vertical rotation support, 27 vertical mounting surface, 28 Vertical axis of rotation, 2
9 rotation support base, 30 mounting surface, 32 rotation shaft, 33
Beam focus point.
Claims (6)
送、加速または蓄積を行う環状部と、イオン化された荷
電粒子を上記環状部に導入する入射部と、上記環状部内
の荷電粒子のビーム進行方向を所定角度曲げて荷電粒子
を出射する出射部とを備えた荷電粒子装置において、上
記入射部、環状部及び出射部を、回転可能の回転支持台
に一体に搭載し、上記出射部の荷電粒子出射方向を可変
としたことを特徴とする荷電粒子装置。1. An annular portion for transporting, accelerating or accumulating charged particles in an annular vacuum chamber, an entrance portion for introducing ionized charged particles into the annular portion, and a beam traveling of the charged particles in the annular portion. In a charged particle device provided with an emitting unit that bends a direction by a predetermined angle and emits charged particles, the incident unit, the annular unit, and the emitting unit are integrally mounted on a rotatable rotary support, and the charging of the emitting unit is performed. A charged particle device having a variable particle emission direction.
部の搭載面と直交する軸を中心に回転可能としたことを
特徴とする請求項1記載の荷電粒子装置。2. The charged particle device according to claim 1, wherein the rotary support is rotatable about an axis orthogonal to the mounting surface of the entrance portion, the annular portion and the exit portion.
平面とした請求項2記載の荷電粒子装置。3. The charged particle device according to claim 2, wherein the mounting surfaces of the entrance portion, the annular portion and the exit portion are horizontal surfaces.
直面とした請求項2記載の荷電粒子装置。4. The charged particle device according to claim 2, wherein the mounting surfaces of the entrance portion, the annular portion and the exit portion are vertical surfaces.
部の搭載面に沿った方向の軸を中心に回転し得るように
したことを特徴とする請求項1記載の荷電粒子装置。5. The charged particle device according to claim 1, wherein the rotary support is configured to be rotatable about an axis in a direction along a mounting surface of the entrance portion, the annular portion and the exit portion.
上の一点に向かうよう出射部を配設したことを特徴とす
る請求項2、3、4または5の何れかに記載の荷電粒子
装置。6. The charged particle according to claim 2, wherein the emitting portion is arranged so that the charged particle emitting direction is directed to one point on the rotation axis of the rotary support. apparatus.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28947994A JPH08148297A (en) | 1994-11-24 | 1994-11-24 | Charged particle apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP28947994A JPH08148297A (en) | 1994-11-24 | 1994-11-24 | Charged particle apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08148297A true JPH08148297A (en) | 1996-06-07 |
Family
ID=17743814
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP28947994A Pending JPH08148297A (en) | 1994-11-24 | 1994-11-24 | Charged particle apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08148297A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016115477A (en) * | 2014-12-12 | 2016-06-23 | 国立研究開発法人量子科学技術研究開発機構 | Particle beam irradiation apparatus |
WO2018204579A1 (en) | 2017-05-03 | 2018-11-08 | The General Hospital Corporation | System and method for gantry-less particle therapy |
CN110582234A (en) * | 2017-12-21 | 2019-12-17 | 中以康联国际医疗科技有限公司 | radiation therapy system and method |
-
1994
- 1994-11-24 JP JP28947994A patent/JPH08148297A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016115477A (en) * | 2014-12-12 | 2016-06-23 | 国立研究開発法人量子科学技術研究開発機構 | Particle beam irradiation apparatus |
WO2018204579A1 (en) | 2017-05-03 | 2018-11-08 | The General Hospital Corporation | System and method for gantry-less particle therapy |
EP3618922A4 (en) * | 2017-05-03 | 2021-02-24 | The General Hospital Corporation | System and method for gantry-less particle therapy |
US11350516B2 (en) | 2017-05-03 | 2022-05-31 | The General Hospital Corporation | System and method for gantry-less particle therapy |
CN110582234A (en) * | 2017-12-21 | 2019-12-17 | 中以康联国际医疗科技有限公司 | radiation therapy system and method |
CN110582234B (en) * | 2017-12-21 | 2023-03-10 | 中以康联国际医疗科技有限公司 | Radiation therapy system and method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2824363B2 (en) | Beam supply device | |
JP3472657B2 (en) | Particle beam irradiation equipment | |
TWI430819B (en) | Charged particle line irradiation device | |
US3360647A (en) | Electron accelerator with specific deflecting magnet structure and x-ray target | |
US4767930A (en) | Method and apparatus for enlarging a charged particle beam | |
US20090065706A1 (en) | Particle beam therapy system | |
JP2015066449A (en) | Charged hadron beam delivery | |
JP2006346120A (en) | Device for forming irradiation field | |
WO2020200848A1 (en) | Compact rotational gantry for proton radiation systems | |
JP4452848B2 (en) | Charged particle beam irradiation apparatus and rotating gantry | |
JP3079346B2 (en) | 3D particle beam irradiation equipment | |
CN108478941A (en) | Radiotherapy unit | |
US4198565A (en) | Charged particle beam scanning apparatus | |
JPH08148297A (en) | Charged particle apparatus | |
JP2000202047A (en) | Charged particle beam irradiation method and apparatus | |
US20230310894A1 (en) | Radiation therapy devices, photoflash therapy systems, and ultra-high energy electron flash therapy systems | |
JP2001178834A (en) | Charged particle irradiation system | |
JP2000075100A (en) | Charged particle irradiation device | |
JP7169163B2 (en) | Particle beam irradiation system | |
CN115569308A (en) | Radiation device and method for generating ultrahigh-dose-rate X-rays | |
JPH06154349A (en) | Radiotherapy device | |
JP2838950B2 (en) | Radiation irradiation device | |
JPH05264797A (en) | Method and device for beam irradiation | |
JPH11142596A (en) | Charged particle beam emission device | |
JP3096547B2 (en) | Therapeutic microtron device |