JPH04158360A - Photosensitive material processing device - Google Patents

Abstract

PURPOSE:To efficiently process a photosensitive material with a small quantity of a processing solution with no irregularity by processing the photosensitive material with the new processing solution uniformly fed to a processing tub, and holding it in the state that it can be reacted with the processing liquid after it leaves the processing tub. CONSTITUTION:The lower section of a developing solution feed roller 98 is dipped in the developing solution stored in a developing processing tub 96, thus the new developing solution scooped by the rotation is fed to the stored developing solution as the roller 98 is rotated. New developing solution is diffused on the carry-in side of a photosensitive material PM in the tub 96. When the developing solution is fed and the developing solution in a storage section 95 is increased, the quantity subtracted with the developing solution lost when the photosensitive material PM is carried out from the quantity corresponding to the newly fed developing solution flows to the outside through the through hole 126 of a periphery plate 120, and the quantity of the developing solution in the tub 96 is balanced. The photosensitive material PM is held in a state that it can be reacted with the processing solution after it leaves the processing tub 96.

Description

[Detailed description of the invention] [Industrial application field]

The present invention relates to a photosensitive material processing apparatus for processing silver salt type photosensitive materials such as photographic paper, photosensitive paper for direct plate making, or film.

[Conventional technology]

Conventionally, copy cameras that directly make printing plates for light printing use
The exposed photosensitive material was processed using a static developer. The photosensitive materials used for these purposes include, for example, a water-resistant base (paper) surface, a layer to prevent haley silon, and a silver salt emulsion layer that is sensitive to light. A hydrophilic layer mainly made of gelatin in which physical development nuclei such as silver are dispersed is formed. An emulsion layer changes its properties when exposed to light, but in an emulsion layer exposed to light, diffusion of reduced silver to the surface layer is inhibited even when a developer is applied. On the other hand, in the emulsion layer that has not been irradiated with light, silver halide is complexed and diffused into the surface layer, where it is physically developed to precipitate metallic silver and is sensitized. After that, if a stabilization treatment and a desensitization treatment are performed, only the areas where the metallic silver is deposited will show lipophilicity and the printing ink will be applied, so that a printing plate will be obtained. It is known that the reaction of these sensitive materials with processing solutions such as developing solutions proceeds in an extremely short period of time, so even if they are stopped in the processing solution for a short period of time, or even if the processing solution is rippled, uneven processing can occur. There is. Therefore, conventionally, a large tank is filled with a large amount of processing solution, and the photosensitive material is slowly conveyed through the stationary developer solution to avoid undulations.
was being used.

[Problem to be solved by the invention]

However, in devices using immersion development, it is necessary to store a large amount of processing solution in a processing tank, which may cause the processing solution to deteriorate depending on the number of sensitive materials to be processed, or the normally alkaline developer to oxidize. There was a problem in that changes in developing performance due to There is also the problem that it takes time for so-called warm-up to occur.In order to shorten the warm-up time, it is necessary to use a high-power heater for temperature adjustment.Furthermore, when using such immersion type development, However, there was a problem in that sludge generated during development or during the developer squeezing process accumulates on the bottom of the tank filled with processing solution and turns into sludge. This occurs due to the generation of chips from the photosensitive material during the process and the elution of gelatin that forms the surface layer of the photosensitive material.Sludge turns into sludge, so it cannot be washed away simply by draining the processing solution, and the processing tank must be washed with water. If washing with water was neglected, the leading edge of the photosensitive material carried into the processing tank would hit the sludge and its transport would be obstructed, resulting in uneven development.Furthermore, after the development process, the next process In order to prevent the developer from being brought into the processing tank, a squeezing roller is installed to squeeze out the developer, but the squeezed out old developer returns to the processing tank, accelerating the deterioration of the developer. By squeezing, sludge in the developing solution adheres to and accumulates on the squeezing roller, and eventually a step is formed on the outside of the width of the photosensitive material passing through the squeezing roller, which sometimes causes problems such as insufficient squeezing. The present invention has been made with the aim of solving the above-mentioned problems, making it possible to reduce the amount of processing liquid required, and making the apparatus maintenance-free.About the structure of the present invention that achieves this purpose This will be explained below.

[Means to solve problems] The sensitive material processing apparatus of the present invention includes: A processing device for processing silver halide type sensitive materials such as photographic paper, photosensitive paper or film for direct plate making, a processing tank that stores a processing solution for the photosensitive material; a photosensitive material carrying means that carries the photosensitive material into the processing solution of the processing tank; processing liquid dispersion means for uniformly sending new processing liquid into the processing liquid on the input side of the photosensitive material of the processing tank over the width direction of the photosensitive material; a carrying-out means for carrying out the sensitive material from the processing tank with the processing liquid attached to the surface; Reaction continuation means to hold and The main point is that the system is equipped with the following. [Effect]

In the photosensitive material processing apparatus of the present invention having the above configuration, new processing liquid is supplied by the processing liquid diffusion means to the processing tank that stores the processing liquid for the photosensitive material. The photosensitive material is uniformly fed into the side processing liquid over the width direction of the photosensitive material. Into the processing solution of this processing tank, by means of carrying a sensitive material,
Bring in the sensitive material. The carried-in photosensitive material is processed exclusively with a new processing liquid, and is carried out from the processing tank by a carrying-out means with the processing liquid attached to the surface. The carried out photosensitive material is maintained for a predetermined period of time by a reaction continuation means in a state where it can react with the attached processing liquid. That is, in the photosensitive material processing apparatus of the present invention, the photosensitive material is processed by the newly supplied processing liquid, and is maintained in a state in which it can react with the processing liquid even after leaving the processing tank. Therefore, the processing tank can be downsized, and only a small amount of processing liquid needs to be stored. Note that the photosensitive materials processed by the photosensitive material processing apparatus of the present invention include:
In addition to silver halide photosensitive paper for plate making and silver halide film for plate making, silver halide photographic paper is also covered.

【Example】

In order to further clarify the structure and operation of the present invention described above, preferred embodiments of the photosensitive material processing apparatus of the present invention will be described below. FIG. 1 is a block diagram of a developing processing apparatus which is an embodiment of the waste material processing apparatus, and FIG. 2 is a schematic block diagram showing a slit exposure type copying camera l incorporating this developing processing apparatus. The slit exposure type copying camera 1 is a device that copies an original to produce a printing plate for light printing. First, the overall configuration of the slit exposure type copying camera 1 will be explained with reference to FIG. As shown in the figure, this slit exposure type copying camera 1 incorporates a projection optical system and a development processing device, which will be described later, in a housing 2, and includes a console panel 4 provided on the top surface of the housing 2, and a A document holder 10 configured to be able to reciprocate in the horizontal direction (horizontal direction in the figure) along its upper surface, a photosensitive material conveying device 20 that conveys a sheet-like photosensitive material PM to an exposure position, and a document holder 1
a projection optical system 30 that irradiates light onto a document held within zero and projects the light reflected by the document onto the upper surface of a photosensitive material PM to expose it; and a development and stabilization process for the exposed photosensitive material PM. A drying unit 50 that dries the photosensitive material PM carried out from the development processing apparatus 40, and an electronic control unit 60 that controls the drive of various motors, electromagnetic valves, etc. to be described later. The console panel 4 is provided with various setting switches for setting exposure conditions, a power switch, a start switch, etc., and is operated by an operator. Each switch on the console panel 4 is connected to an electronic control device 60. The document holder 10 includes a document table 11 made of a transparent glass plate and a document cover 12 that can be opened and closed, and the document is held downward between the document table 11 and the document cover 12. The document holder 10 is reciprocated in the horizontal direction by a motor 13 provided in the housing 2 via a drive system (not shown) such as a sprocket, chain, belt, etc., and conveys the document to an irradiation light source for exposure. . The photosensitive material conveying device 20 includes a first photosensitive material roll 21 , a second photosensitive material roll 22 , and a pair of rollers 23 . A roller pair 24 dedicated to feeding the photosensitive material from the second photosensitive material roll 22 and two roller pairs 2 commonly used for feeding and ejecting the photosensitive material from each photosensitive material roll.
5.26, and feeds out the sheet-like photosensitive material PM from either one of the photosensitive material rolls 21 or 22 as required. In this example, the photosensitive material PM was Silver Master (product name 2, manufactured by Mitsubishi Paper Mills Co., Ltd., model number SLM-R2).
), but if it is a silver salt-based plate-making photosensitive paper, Super Master (product name: manufactured by Agfagewald, model 5P) is used.
P) etc. can also be used. FIG. 2 shows a state in which the photosensitive material PM is sequentially conveyed downstream from the first photosensitive material roll 21 by three pairs of rollers 23, 25, and 26. When using the photosensitive material PM of the second photosensitive material roll 22, the photosensitive material PM is transferred to the second photosensitive material roll 22 by a roller pair 24 replacing the roller pair 23 and two roller pairs 25 and 26.
Transported from. Note that the first photosensitive material roll 21 or the second photosensitive material roll 2
The feeding of the photosensitive material PM from 2 is performed in synchronization with the horizontal movement of the document holder 10. The photosensitive material PM conveyed in this manner is transported by two pairs of rollers 25.
The cutting device 2 is exposed at an exposure position set between 26 and 26, and is provided on the back side of the photosensitive material PM at this exposure position.
7, the console panel 4 is used to cut into the set dimensions. The projection optical system 30 that exposes the photosensitive material PM is connected to the original holder 10.
A light source 31 for irradiating light across the width direction of the document held in the interior, a mirror detail 32 consisting of three mirrors 32a, 32b, and 32c for reflecting the reflected light LB from the document, and a sensor for sensing the exposure position. It includes a projection lens 33 that forms an image of the original on the upper surface of the material PM, and a slit 34 that limits the width of the reflected light LB projected onto the upper surface of the photosensitive material PM. Projection lens 33
and mirrors 32 b, 32 constituting the mirror group 32
c refers to the mirror support plate 3 mounted on the tilting table 35.
6 and lens support stand 37, respectively.
The projection magnification in this projection optical system 30 is set to a value of 1. The positions of the mirror support plate 36 and the lens support stand 37 are adjusted on the tilt table 35 during projection magnification alignment, and the positions of the mirror support plate 36 and the lens support stand 37 are adjusted on the tilt table 35 after the alignment is completed.
Nationally established as 5th. The light irradiated from the light source 31 toward the original is reflected on the lower surface of the original, and this reflected light LB is sequentially reflected by each mirror of the mirror group 32, passes through the projection lens 33 and the slit 34, and then is reflected on the photosensitive material PM. The image is formed on the photosensitive surface. Therefore, a slit-shaped image extending across the width of the document is projected onto the photosensitive surface of the photosensitive material PM that is being transported. Since the conveyance of the photosensitive material PM is synchronized with the horizontal movement of the original holder 10, when the horizontal movement of the original holder 10 is completed, the exposure of the entire original is completed. A plurality of LEDs 38 are provided in a line below the roller pair 26 in order to uniformly expose the photosensitive material PM. Reflected light LB from the original when exposing
The peripheral portion of the photosensitive material PM that cannot be exposed to light is burned off as an unnecessary area for image formation. After that, the photosensitive material PM is cut into the cutting device 27.
disconnected by. The development processing device 40 is installed below the projection optical system 30 and performs development processing and stabilization processing on the photosensitive material PM introduced via the introduction roller 41. This development processing apparatus 40 can be equipped with a developer main tank 42 for storing a developer and a stabilizer main tank 43 for storing a stabilizer, and a processing unit 44 in which rollers and the like are integrally driven by a motor (not shown). configured as,
It is housed within the housing 2. The details of the configuration of the developing processing device 40 will be described later. A drying unit 50 is disposed downstream of the development processing device 40 along the conveyance path of the photosensitive material PM. This drying unit)
Reference numeral 50 denotes two pairs of rollers 51 and 52 that convey the photosensitive material PM processed in the development processing bag @ 40 while applying tension, a conveyance tray 53 provided between the pair of rollers 5I and 52, and A heater 54 and a fan 55 for drying the photosensitive material are provided at positions facing the transfer tray 53 across the transfer path for the photosensitive material PM, and an external tray 56 is attached to the outside of the housing 2 and stores the dried photosensitive material PM. Equipped with. Therefore, the exposed photosensitive material PM undergoes development and stabilization processing in the development processing device 40, is dried by the photosensitive material drying heater 54, and is sent to an external tray 56 outside the housing 2. In this way, the printing plate for offset printing is reproduced from the manuscript.
Created. Next, a description will be given of the development processing apparatus 40 that performs development O stabilization processing on the photosensitive material PM. In the description of the development processing apparatus 40, in addition to FIG. 1 showing its schematic configuration, perspective views (FIGS. 3 and 3)
4) and a cross-sectional view (FIG. 5) as appropriate. As shown in FIG. 1, this developing processing apparatus 40 includes a developing section 70 that develops exposed photosensitive material PM introduced from an introduction roller 41 using a developer in a developer main tank 42.
Then, a stabilization processing section (hereinafter referred to as
(referred to as a stable part) 72. The developing section 70 includes, as a developer supply system, a developer main tank 42 as well as a liquid level management cylinder 74 to which the developer main tank 42 is attached and detached, receives the developer from the main tank 42, and manages the liquid level at a constant level. and a conduit pipe 76 from the liquid level management cylinder 74.
A developer distern tank 78 into which the developer flows through
, an inflow electromagnetic valve 80 that opens and closes a conduit 79 for outflowing the developer from the developer distern tank 78, and a developer nozzle 82 that discharges the developer. This developer nozzle 82 includes a constriction portion (see FIG. 5), which limits the amount of developer discharged from the tip of the developer nozzle 82 during the opening period of the inflow electromagnetic valve 8o. The amount of developer discharged from the tip of the developer nozzle 82 is approximately determined by the pressure applied to the constricted portion, that is, the height of the liquid level in the liquid level management cylinder 74 and the diameter of the constricted portion. In this embodiment, since the liquid level is kept constant, the flow rate of the developer when the inflow solenoid valve 80 is opened is kept constant regardless of the amount of developer in the developer main tank 42. dripping A partition plate 84 is provided upright from the bottom of the developer distern tank 78 to divide the inside thereof into a liquid inflow chamber 78a and a liquid temperature retention chamber 78b. It is opened. On the other hand, the upper surface of the liquid temperature retention chamber 78b has a heater 86 inserted toward the bottom and a float 87 that moves up and down according to the amount of liquid in the tank, and controls the amount of liquid in the developer disturn tank 78. A float sensor 88 for detection is provided. Further, a mesh filter 90 is provided at the entrance of a conduit 79 communicating with the bottom of the developer distern tank 78 to remove dust and the like from the developer flowing out. Therefore, the cold developer flowing from the developer main tank 42 through the conduit pipe 76 first flows into the liquid inlet chamber 78a, passes over the upper end of the partition plate 84, and flows into the upper part of the liquid warming chamber 78b. The developer in the solution temperature retention chamber 78b is heated by the heater 86. The temperature of the developer by the heater 86 is controlled to a predetermined temperature by an electronic control device, which will be described later. The developer maintained at a predetermined temperature flows out from the developer nozzle 82 when the inflow solenoid valve 80 opens. Next, a developing tank 9 where the development of the photosensitive material PM is actually performed.
The general structure and function of the parts around 6 will be explained. Below the introducing roller 41 that introduces the photosensitive material PM into the developing section 70, there is provided an inlet roller pair 92 that rotates in the direction of the arrow X in FIG. A free roller 9 that guides the photosensitive material PM in contact with the photosensitive material PM and gives so-called stiffness to the photosensitive material PM during conveyance.
4 are arranged. The developing tank 96 has a substantially U-shaped cross section, has a width corresponding to the width of the photosensitive material PM, and forms a developer reservoir 95, as shown in FIG. A spongy developer supply roller 98 is disposed within the developing tank 96 at a position that extends in the width direction of the developing tank 96 and leaves a slight distance from the bottom surface of the developing tank 96 . Therefore, when the developer is stored in the storage section 95 of the development processing tank 96, the lower part of the developer supply roller 98 is partially immersed in the developer. The surface of the developer supply roller 98 is made of a spongy material, and the bubbles constituting the spongy material are individually independent bubbles (single bubbles). As shown in FIG. 4, the developer supply roller 98 has a developer storage section 1 that temporarily stores the developer dripping from the upper part between the developer supply roller 98 and the developer supply roller 98.
00 is installed. Furthermore, as shown in FIGS. 3 and 5, a bottom liquid reservoir chamber 101 is formed at the bottom of the developing tank 96, and a plurality of communication holes 102 opened at the bottom of the developing tank 96 form a bottom liquid storage chamber 101. , the developer can flow in. Bottom liquid reservoir chamber 101
Two rod-shaped heaters 103 for heating the developer are disposed inside. A drain solenoid valve 104 that opens and closes a pipe is connected to the center bottom of the bottom liquid storage chamber 101 to discharge the used developer into a waste liquid receiving tray 106.
A developer discharge pipe 108 is connected thereto. A guide plate 110 having a predetermined elevation angle α toward the stable portion 72 is disposed on the side of the developing tank 96 from which the photosensitive material PM is taken out. The guide plate 110 is formed of a corrugated plate in order to reduce the contact area with the photosensitive material PM (see FIG. 3), and guides the developed photosensitive material PM toward the squeeze roller pair 109 of the stabilizing section 72. Form an approach route. A planar heater 112 having a self-temperature adjustment function is attached to the lower surface of the guide plate 110. As shown in FIG. 3, the planar heater 112 is integrally fixed to the guide plate 110 by a mounting metal fitting 113 provided on the developing tank 96 side and other metal fittings (not shown). The detailed structure of the developing tank 96 will be explained. As shown in FIG. 3, the storage section 95 of the development processing tank 96 is
Approximately half-moon-shaped side plates 12 are provided on both sides of the curved peripheral plate 120.
2 (in the figure, the side plate on the left side is omitted) are respectively joined and fixed. A through hole 126 passing through the circumferential plate 120 is provided approximately at the center of the circumferential plate 120 on the guide plate 110 side. When the developer is supplied from the developer nozzle 82 and the amount of the developer in the reservoir 95 increases, the developer flows out from the through hole 126. Therefore, the liquid level of the developer in the storage section 95 is lower than that in the through hole 126.
is held at a height of Note that the discharge solenoid valve 104 directly below the development processing tank 96 has the following:
As shown in FIG. 1, a drip-proof cover 114 is provided,
This prevents the developer from falling from the developing tank 96 and the guide plate 110 from adhering. As shown in detail in FIGS. 4 and 5, the developer storage unit 100 includes two end plates 134 that abut against both end surfaces of the developer supply roller 98 while allowing the roller to rotate.
and a support plate 136 having a V-shaped cross section and having the end plate 134 fixed to both ends thereof. Further, a liquid passage hole 138 is provided at the center of the upper plate 136a constituting the support plate 136 at a position corresponding to the tip of the developer nozzle 82.
A back plate 136b constituting the support plate 136 is provided with a plate spring 140 made of a thin stainless steel plate that is urged toward the developer supply roller 98 and comes into contact with the outer periphery of the roller 98. Directly below the liquid passage hole 138, a liquid receiving plate 142 is connected from the center of the front end of the upper plate 136a toward the leaf spring 140. A small gap is provided between the tip of the plate 142 and the plate spring 140 in the liquid receiver. The developer supply roller 98, the end plate 134 in contact with both end surfaces thereof, and the roller 9
The area surrounded by the leaf spring 140 that is in contact with the outer peripheral surface of the developer 8 is dripped from the developer nozzle 82 due to the fact that the developer supply roller 98 rotates upward in this area. Developer solution can be stored temporarily. This part is called a liquid pool part 143. Note that the liquid receiver plate 142 supplies the developer to the developer supply roller 9.
Although the plate 142 plays the role of efficiently spreading the liquid in the axial direction of the developer supply roller 98, since the developer is temporarily collected in the liquid reservoir 143, it spreads in the axial direction of the developer supply roller 98. The developer dripping from the developer nozzle 82 passes through the liquid passage hole 138 and reaches the plate 142, as shown in FIGS. Leaf spring 140
It flows down along the surface of the leaf spring 140 through a small gap formed between the two. In other words, the developer spreads along the axial direction of the developer supply roller 98 and reaches the reservoir 143, where it is temporarily stored. A part of the developer stored in the liquid reservoir 143 is
The liquid is held in individual bubbles in a single cell layer on the surface of the developer supply roller 9-8, and pumped out as the developer supply roller 98 rotates in the direction of arrow Y in FIG. Since the lower part of the developer supply roller 98 is immersed in the developer stored in the development processing tank 96, the new developer pumped out as the roller 98 rotates is already drained. Supplied into the stored developer. The new developer will be diffused to the side where the photosensitive material PM is introduced in the development processing tank 96. When the developer is supplied and the developer in the storage section 95 increases, an amount of the developer (the amount corresponding to the newly supplied developer minus the developer lost when the photosensitive material PM is carried out) is increased. The old developer) flows out from the through hole 126 of the peripheral plate 120, and the amount of developer in the developing tank 96 is balanced. The developer also flows into the bottom liquid storage chamber 101, and is heated by two rod-shaped heaters 103 built therein. The heated developer fluid convects with the reservoir 95 through the communication hole 102 . Coupled with the fact that the energization of the rod-shaped heater 103 is feedback-controlled based on the temperature of the developer, the temperature of the developer in the development processing tank 96 is raised in a very short time and maintained at a predetermined temperature. When the photosensitive material PM passes through the developer reservoir 95 of the development processing tank 96, sludge mixes into the developer as the photosensitive material PM is developed. Such sludge flows into the bottom liquid storage chamber 101 from the storage part 95, and when the discharge solenoid valve 104 is opened, the waste liquid receiver is discharged together with the developer into the tray 106 via the developer discharge pipe 108. . Next, conveyance of the photosensitive material PM will be explained. The exposed photosensitive material PM sent by the pair of incoming rollers 92 enters the storage section 95 while being guided by the free rollers 94.
It passes through the storage portion 95 along the inner circumferential surface of the circumferential plate 120 . While passing through the storage section 95, it reacts with the developer stored there, and the development process is started. Developer supply roller 9
After passing through the gap between 8 and the peripheral plate 120 and passing through the storage part 95, the stable part 7 is moved along the inclined upper surface of the guide plate 110.
2 is sent out toward a pair of squeezing rollers 109 provided at the entrance of No. 2. Since the atmosphere above the guide plate 110 is heated to a predetermined temperature by the planar heater 112 having a temperature control function, the atmosphere on the guide plate 110 is kept close to a predetermined temperature. The developing process of the photosensitive material PM continues using the developing solution. The developer adhering to the surface of the photosensitive material PM is squeezed out and removed by a squeeze roller pair 109. Next, the stabilizing section 72, which is a system for stabilizing the photosensitive material PM using a stabilizing agent, will be explained with reference to FIG. Note that the description of members that are the same as those of the developing section 70 or those that have the same functions as those of the developing section 70 described above will be omitted, and will be represented by adding an auxiliary symbol A to the code (numerical value) used in the explanation of the developing section 70. do. The stabilizing section 72 serves as a stabilizer supply system for the developing section 7.
Similar to the developer supply system of No. 0, the stabilizer main tank 43
．． A stabilizer distern tank 78A has a liquid level management cylinder 74A to which the stabilizer main tank 43 is attached and detached, and a partition plate 84A erected inside. Liquid level management fi 74 A and stabilizer distern tank 7
8A, a stabilizer nozzle 82A interposed with an inflow solenoid valve 80A, and the like. In the stabilizer distern tank 78A, similarly to the developer distern tank 78, a float sensor 88A having a float 87A and a mesh filter 90A are also provided. When the stabilizer flows out from the stabilizer distern tank 78A via the inflow electromagnetic valve 80A and the stabilizer nozzle 82A, the stabilizer flows in the same amount from the conduction pipe 76A. The other components of the stabilizing section 72 will be briefly explained along the conveyance of the photosensitive material PM. The photosensitive material P that has passed through the squeezing roller pair 109 arranged at the upper end of the guide plate 110 of the developing section 70
M is guided by the guide cover 144 and the free roller 14B arranged along the transport path of the photosensitive material PM, and is carried into the stabilization treatment tank 96A. Stabilization treatment tank 96A
A free roller 94A is provided at the entrance of the photosensitive material PM to give a so-called stiffness to the photosensitive material PM. Similar to the development processing tank 96, the stabilization processing tank 96A that forms the stabilizing agent storage section 95A has a stabilization processing tank roller 98A made of sponge material and the stabilization processing tank roller 98A, which supplies the stabilizing agent liquid. Reservoir 14
A stabilizing agent storage section 100A forming a storage section 95A is provided, and the stabilizing agent is supplied to the storage section 95A on the loading side of the photosensitive material PM. On the other hand, at the bottom of the stabilization treatment tank 96A, the development treatment tank 9
6, a bottom liquid reservoir chamber 101A is provided. When the discharge solenoid valve 104A with the drip-proof cover 114A is opened, the used stabilizer is discharged from the stabilizing side discharge pipe 10.
8A, the waste liquid receiver is discharged from the bottom liquid storage chamber 101A to the tray 106A. Note that since the stabilizer does not require temperature control, no heater is provided in the bottom liquid reservoir chamber 101A. A guide plate 110A forming an entry path for the stabilized photosensitive material PM is arranged downstream of the stabilization treatment tank 96A along the conveyance path of the photosensitive material PM so as to be inclined upward from the stabilization treatment tank 96A. The upper end of the guide plate 110A has a first
Squeezing roller pair 109A rotates in the two directions of the arrow in the figure to convey the stabilized photosensitive material PM toward the roller pair 51 of the drying unit 50 (see FIG. 2) and squeezes out excess stabilizer from the surface of the photosensitive material. is installed. Note that the stabilizer supply roller 98A and each squeezing roller pair 109, 109A are driven by a common drive source and rotated in synchronization with each roller of the development processing tank 96 described above. Pairs of squeezing rollers 109, 109 rotate in the two directions of the arrows in FIG. 1 to convey the developed and stabilized photosensitive material PM and squeeze out excess developer and stabilizer from the surface of the photosensitive material PM.
As shown in the drawing, A is provided so that a plane passing through the center of each roller is inclined by an angle β in the counterclockwise direction in the drawing from a vertical plane passing through the center of the roller. Therefore, when the photosensitive material PM is sandwiched between the squeezing roller pair 109, 109A, the conveyance direction of the photosensitive material PM at the squeezing roller pair 109, 109A is directed downward by an angle corresponding to the angle β. As a result, the squeezed developer or stabilizer remains between the photosensitive material PM and the aperture roller pair 109, 109A while the photosensitive material PM is passing through, and does not drip onto the side of the photosensitive material PM. . - While feeding the photosensitive material PMWa, each squeeze roller pair 109. t
. The developer or stabilizer remaining at 9A is transmitted through the lower roller surface of the diaphragm roller pair 109 and 109A at the same time as the cut end surface of the photosensitive material PM passes through the diaphragm roller pair 109 or 109A. 109,
The waste liquid receiver falls onto the right squeeze liquid collection plate 152 or the left squeeze liquid collection plate 154 disposed below 109A, and the waste liquid receiver flows into the tray 106A. In addition, each squeeze roller pair 109,
109A, two scrapers 150 are each installed at a position where the leaf springs at the tips of the scrapers contact the rollers, and the sludge and waste liquid scraped off by the scrapers are also collected on the right side squeezed liquid collection plate 152 and the left side squeezed liquid collection plate 152. It falls onto the plate 154, and the waste liquid receiver is collected in the tray 106A. In addition,
Each waste liquid receiver of the developing section 70 and the stabilizing section 72 is provided with a tray 106,1.
06A is provided with a pipe 158 leading to a waste liquid tank 156, and the waste liquid collected in each tray 106, 106A is finally sent to the waste liquid tank 156 via the pipe 158.
will be collected. In the stabilizing section 72 configured as described above, the developed photosensitive material PM sent from the developing section 70 is transferred to the aperture roller pair 1.
09, the adhering developer is squeezed out, and the developer is transported into the storage section 95A while being guided by the free roller 94A and the like. When the photosensitive material PM enters the stabilizing agent in the storage section 95A, stabilization processing starts, and after passing through the storage section 95A, the stabilization processing continues even while being conveyed along the upper surface of the guide plate 110A. . When passing through the squeezing roller pair 109A, excess stabilizer is squeezed out from the upper surface of the photosensitive material PM, and then the photosensitive material PM is transferred to the drying unit 50 by the roller pair 51.
transported to. Next, the electronic control device 60, which controls the temperature in the developer displacer tank 78 and the like and the drive control of the developer supply roller 98 and the like, will be explained using the block diagram shown in FIG. As shown in FIG. 6, the electronic control device 60 includes a well-known CP
U162. ROM164. It is configured as an arithmetic and logic operation circuit mainly including a RAM 166 and a timer 168 that includes multiple self-running timer counters, and is connected to a common bus 17.
172.
It is provided with input/output interfaces such as a developer capo 4174 and a developer output boat 176. In addition, the electronic control device 6
The common bus 170 of No. 0 includes a temperature adjustment circuit 17 that adjusts the temperature of the developer in the storage section 95 and the developer in the developer distern tank 78 that communicates with the bottom liquid storage chamber 101.
8 is connected to a console panel 4 on which an operator makes various settings. The exposure output port 172 includes a motor 13 for driving the document holder 10 and a cutting device 2 for cutting the photosensitive material PM.
7, a light source 31 for irradiating light onto the original in the original holder 10, a motor 28 for sending out the photosensitive material PM from the first photosensitive material roll 21 or the second photosensitive material roll 22, and a photosensitive material PM. An LED 38 for uniformly exposing the photosensitive material and a drying unit 50 for drying the stabilized photosensitive material are connected. On the other hand, the development input boat 174 is connected to a float sensor 88 in the developer distern tank 78 and a float sensor 88A in the stabilizer distern tank 78A, and the development output boat 176 is connected to the float sensor 88 in the developer distern tank 78 and the float sensor 88A in the stabilizer distern tank 78A. unit 4
A drive motor 180 that synchronously drives each roller of No. 4;
An inflow solenoid valve 80 provided in the developer nozzle 82, an inflow solenoid valve 80A provided in the stabilizer nozzle 82A, and a discharge solenoid valve 104 provided in the developer discharge pipe 108.
A discharge electromagnetic valve 104A provided on the stabilizing agent discharge pipe 108A is connected to a planar heater 112 for heating the atmosphere near the guide plate 110 to a certain temperature. In addition, the temperature adjustment circuit 178 includes a heater 86 installed in the developer distern tank 78, a temperature sensor 85 that detects the temperature of the liquid in this tank, and two sensors installed in the bottom liquid storage chamber 101. A rod-shaped heater 103 and a temperature sensor 103a that detects the temperature of the liquid in the liquid reservoir chamber 101 are connected. This temperature adjustment circuit 178 controls the heating of each of the heaters to maintain the liquid temperature of the developer in the storage section 95 and the first developer in the developer disturn tank 78 within a predetermined temperature range, so that the liquid temperature reaches a predetermined temperature. A signal indicating whether or not it is maintained within the range is output to the CPU 162. Next, the processing executed by the electronic control device 60 will be explained using a flowchart. The processes executed by the slit exposure type copying camera 1 of the embodiment include an initial processing routine executed when the power is turned on, a standby processing routine that waits until it is ready for exposure and development, and exposure and development of the photosensitive material PM. It can be divided into exposure and development processing routines. FIG. 7 is a flowchart showing the initial processing routine;
This figure is a flowchart showing the standby processing routine, and FIG. 9 is a flowchart showing the exposure and development processing routine. When the slit exposure type copying camera l of this embodiment is powered on, the electronic control unit 60 first executes an initial processing routine shown in FIG. This process is executed only once when the slit exposure type copying camera starts to be used. When this routine is started, first the discharge solenoid valve 104.
Perform processing to open valve 104A (step 5IO),
The developer or stabilizer remaining in the development processing tank 96 and the stabilization processing tank 96A (hereinafter, both may be collectively referred to as the processing tank 96 as necessary) (hereinafter, both may be processed together as necessary) Wait a sufficient drain time for all liquid (also referred to as liquid) to drain (step 520). Since the amount of processing liquid stored in the processing tank 96 is fixed, it is easy to set the discharge time in advance. After waiting for the discharge time and closing the discharge solenoid valve 104.104A (step 530), the inflow solenoid valve 80 is then closed.
．． 8OA is opened (step 540),
Furthermore, a drive motor 180 is connected via a developing output boat 176.
A process is performed to start operation of the vehicle (step 550). When the inflow solenoid valve 80.80A opens, the processing liquid flows from the developer distern tank 78 and the stabilizer distern tank 78A to the developer nozzle 82. Stabilizer - nozzle 82A
The developer starts to flow out through the developer supply roller 98. by the drive motor 180. The processing liquid is supplied to the processing tank 96 by the rotation of the stabilizing side supply roller 98A. Since the processing liquid is gradually stored in the processing tank 96, after waiting for a preset storage time (time required for storage) (step 560), the process of closing the inflow solenoid valve 80.80A (step 560) is performed. step 570) and a process of stopping the drive motor 180 to stop the rotation of each roller (step 58).
0). As a result, each processing tank 96 is filled with the amount of processing liquid necessary for development and stabilization processing. After the storage of the processing liquid is completed in this way, an instruction to start adjusting the developer temperature is output to the temperature adjustment circuit 178 (step 59
0). Upon receiving this instruction, the temperature adjustment circuit 178 refers to the detection signals of the temperature sensors 85 and 103a and adjusts the temperature of the heater 8.
6,103, and the temperature of the developer in the developer distern tank 78 and the development processing tank 96 is controlled within the range of approximately 28°C to 31°C. Temperature adjustment circuit 178
When the developer is heated and controlled within this temperature range, it outputs a signal to CP0162 indicating that the temperature adjustment has been completed. Therefore, the system waits until this adjustment completion signal is input (step 5100), and when this signal is input, a display indicating that the warm-up has been completed is displayed on the console panel 4 (step 5110), and all initial processing is completed. Assuming that the process is completed, move on to the next standby process. By executing the initial processing described above, the development processing device 40 of the slit exposure type copying camera 1 can be installed in the development processing tank 96. The processing solution (developer and stabilizer) remaining in the stabilization processing tank 96A is discharged together with sludge, etc., and a new processing solution is supplied, and the temperature of the developer is adjusted to an appropriate temperature required for processing. In the standby process that is executed after the initial process is completed, as shown in FIG. Settings such as the degree of sheath exposure are made (step 5210). next,
The status of each float sensor 88, 88A of the developer distern tank 78 and the stabilizer distern tank 78A is read (step 5220), and the float sensor 88.
88A is on or not (step 5)
230). If the float sensors 88, 88A are off, that is, the liquid level of the developer distern tank 78 or the stabilizer distern tank 78A is low, an instruction to replenish the developer or stabilizer main tank 42, 43 is issued. Perform processing to display on console panel 4 (step 5)
235), repeating the process described above from step 200. On the other hand, if both the float sensors 88 and 88A are on (step 5230), it is then determined whether the temperature of the developer is appropriate (step 5240), and if it is appropriate, the exposure on the console panel 4 is further performed. It is determined whether or not the start key instructing the start of is turned on (step 5250). The temperature of the developer is regulated by the temperature adjustment circuit 178, and should be at an appropriate temperature after the initial processing (Fig. 7) is completed, but the temperature may drop due to a malfunction of the heater 86° 103. This is also possible, so we are checking again here. If the temperature is not appropriate or the start key is not turned on, the process is repeated from step 200 described above. When the start key is pressed and turned on, the exposure -
Move on to development processing. When the development and exposure process starts,
As shown in FIG. 9, various processes necessary to start exposure are first performed (step 5300). In this case, the exposure start processing includes the transportation of the document holder 10 on which the document is placed, the feeding of the photosensitive material PM in synchronization with this, and furthermore, the transportation of each roller in the processing unit 44 by the drive motor 180 that is the drive source of the processing unit 44. This is the process of starting rotation, etc. Next, the drying unit 50 is turned on to start blowing out high-temperature air (Step 5310), and the flag F indicating that exposure processing is in progress is set to the value 1 (Step 5320).
), and further starts the first timer counter Tl in the timer 168 that measures the time from the start of exposure (Ti
I4) is performed (step 8330). Next, timer counter TI and developer inflow start timing T
In step 5340), the timer counter T1 waits until the developer inflow start timing TAON is reached. When TI=TAON, the electromagnetic valve 80 for developer inflow is opened (step 5350), and supply of new developer to the developer supply roller 98 of the development processing tank 96 is started. That is, as shown in the timing chart of FIG.
The supply of the developer is started prior to the transport. Next, the timer counter T1 activates the stabilizer inflow solenoid valve 8.
It is determined whether the valve opening timing of 0A has reached "l'SON" (step 8360).Timer counter T
1 reaches the valve opening timing TSON, processing is performed to open the stabilizer inflow solenoid valve 80A (step 5370). Note that the process of opening the stabilizing side inflow solenoid valve 80A is not performed until the valve opening timing TSON is reached, and the process moves to the next process. As a result, the 10th
As shown in the figure, the supply of the stabilizer is started after a predetermined time has elapsed since the opening of the electromagnetic valve 80 for developer inflow and before the photosensitive material PM is carried into the stabilization treatment tank 96A. Next, it is determined whether the flag F indicating that exposure is in progress is 1 (step 8380). During the exposure process, the flag F has a value of 1 (step 5320
In this case, it is subsequently determined whether the exposure has ended (step 5390). When the document holder 10 has been conveyed a distance corresponding to the length of the document and the necessary exposure processing has been completed, an exposure completion process (step 5400) is executed. Here, the exposure termination process includes a process of ending the conveyance of the original holder 10 and returning the original holder 10 to the initial position, and stopping feeding of the photosensitive material PM and driving the cutting device 27 to remove the photosensitive material PM from the exposure. This process involves cutting at the end of the area. After the exposure completion process (step 5400) is executed, the exposure process is deemed to have been completed and the flag F is reset to the value O (step 5410). Thereafter, a process (T2←0) is performed to start the second timer counter T2 in the timer 168 that measures the time from the end of exposure (step 5420). Note that in the above description, the document has a length longer than a predetermined length, and the tip of the photosensitive material PM is placed in the stabilizing treatment tank 96A before the exposure process is completed.
Although the length of the document is short (it is also possible that the leading edge of the photosensitive material PM does not reach the stabilization processing tank 90A when the exposure process is completed. Step 8 before becomes rYEsJ
The judgment at 390 is rYEsJ, and the second timer counter T is activated before the stabilizer inflow solenoid valve 80A is opened.
2 will start. After starting timer counter T2 (step 542
0), the timer counter T2 is the solenoid valve 80 for developer inflow.
It is determined whether the valve closing timing TAOFF has been reached (step 5430). Valve closing timing TAO
If it has not reached FF, proceed to step 83 via connection point ■.
The above-described process is repeated from 60. On the other hand, when the timer counter T2 reaches the timing TAOFF, processing is performed to close the developer inflow solenoid valve 80 (step 5440). The valve closing timing T AOFF is a timing to ensure a time during which the developer supply roller 98 can supply the developer necessary for the terminal end of the photosensitive material PM to undergo development processing in the development processing tank 96 . Therefore, as shown in FIG. 10, the developer inflow solenoid valve 80 is closed after the exposure process is completed and before the end of the exposed photosensitive material PM leaves the development tank 96. . After the inflow solenoid valve 80 is closed or the timer counter T2
After the timer counter T2 exceeds the timing TAOFF, it is determined whether the timer counter T2 has reached the closing timing T5OFF of the stabilizer inflow solenoid valve 80A (
step 5450). If the timer counter T2 has not reached the valve closing timing TAOFF, step 430
Similar to the case determined in , step 8 via the connection point ■
From 360, the process described above is repeated. On the other hand, when the timer counter T2 reaches the timing T5OFF, processing is performed to close the stabilizer inflow solenoid valve 80A (step 8460). Valve closing timing T 5OFF
The stabilizing side supply roller 98 supplies the stabilizer necessary for the terminal end of the photosensitive material PM to undergo stabilization treatment in the stabilization treatment tank 96A.
This is the timing to secure the time that can be supplied by A. Therefore, as shown in FIG. 10, the solenoid valve 80A for stabilizing agent inflow is such that the terminal end of the exposed photosensitive material PM is connected to the stabilizing treatment tank 9.
The valve is closed prior to exiting 6A. After closing the stabilizer inflow solenoid valve 80A, time T3
(step 5470), when the photosensitive material PM has passed through the drying unit 50, the drying unit 5
0, the drive motor 180, etc. are turned off (step 8480). After that, return to the standby process (Figure 8),
The process is repeated from the point where the keys on the console panel 4 are manually operated. As explained above, this slit exposure copying camera 1
According to the development processing apparatus 40 of the embodiment incorporated in the development processing tank 96. In the stabilization treatment tank 96A, the photosensitive material PM
Since the developer and the stabilizer are uniformly supplied to the input side of the development tank 96. for development and stabilization processing. The sensitive material PM carried into the stabilization processing tank 96A is uniformly affected by the new processing solution, and constant development and stabilization processing is performed at all times. Moreover, since the photosensitive material PM that has left the development processing tank 96° stabilization processing tank 96A is still retained in a reactable state, it is possible to store silver for direct plate making by simply storing a small amount of developer and stabilizer. Salt type sensitive material PM
On the other hand, development and stabilization treatments can be carried out sufficiently. Therefore, each processing tank 96, 96A can be downsized, and the developing processing device 40 and, by extension, the slit exposure type copying camera 1 can be downsized. Furthermore, since the new developer is supplied to the inlet side of the photosensitive material PM, that is, the side where the development process starts, the new developer can be used preferentially to efficiently process the photosensitive material PM. We aim to further improve quality. be able to. According to this embodiment, there is no need to store a large amount of developer and stabilizer as in the conventional case, so that the developing ability is reduced due to deterioration of the developer in the developing processing tank 96 due to development and oxidation over time. It does not change, and the plate-making quality can always be kept stable. The amount of processing liquid used can also be reduced overall. Furthermore, since a large amount of developer and the like is not stored, sludge does not remain for a long period of time and become sludge. Therefore, there is no need to clean the developing tank 96, etc., and maintenance efforts such as washing with water, which are conventionally required, are also no longer necessary. Since sludge does not stick to the bottom of the developing tank 96 and obstruct the conveyance of the photosensitive material PM, there is a problem that the conveyance of the photosensitive material PM is obstructed and uneven development occurs on the developed photosensitive material PM. Nor. In addition, the problem of time lost in warming up until a large amount of developer can be adjusted to a processable temperature is eliminated, and power consumption is also achieved because only a small amount of processing solution needs to be warmed. Further, while spreading the developing solution discharged from the developing solution nozzle 82 along the axial direction of the developing solution supply roller 98,
Based on the rotation of the developer supply roller 98, the developer (new developer) held in the individual bubbles in the single bubble layer on the surface of the developer supply roller 98 is uniformly stored in the liquid reservoir 143 across the width direction of the developer supply roller 98. Since the developer is supplied to the storage section 95, disturbances such as ripples do not occur on the surface of the developer within the storage section 95. As a result, uneven development (irregular streaks that appear on the surface of the photosensitive material reflecting disturbances in the liquid level) due to disturbances (waves) in the developer surface does not occur. Note that the stabilization treatment tank 96A This has the same configuration except that it does not include a heater for heating, and it goes without saying that it has the effect of improving the processing quality by increasing the efficiency and stabilizing the processing. Although described above, the present invention is not limited to these embodiments (e.g., a configuration applied only to one of development processing or stabilization processing, a configuration in which the opening for supplying the processing liquid, and a single bubble layer in the A configuration in which a rough-surface polishing roller or a porous soft plastic roller is used instead of a regular one, a configuration in which feedback control is applied to the amount of developer supplied, and a configuration in which processing solution remaining in the development processing tank can be replaced only when the equipment is started up. Various modifications may be made without departing from the gist of the present invention, such as a configuration in which the processing is performed even when a predetermined area or number of treatments have been performed, or a configuration applied to a developing device for silver halide photographic paper or plate-making film. [Effects of the Invention] As detailed above, in the photosensitive material processing apparatus of the present invention, the photosensitive material can be processed by the new processing liquid uniformly supplied to the processing tank. It is maintained in a state where it can react with the processing solution even after it is processed and leaves the processing tank.Therefore, it is an excellent material that can process sensitive materials efficiently and evenly with a small amount of processing solution. It is effective. It also makes it possible to downsize the device. In addition, since there is no need to store large amounts of processing liquid,
There is also the advantage that the phenomenon of sticking of sludge that has turned into sludge does not occur, and maintenance of the treatment tank is not required. Further, even when it is necessary to control the temperature of the processing liquid, temperature control can be easily and power-savingly controlled, and the time required to complete the process can be shortened.

[Brief explanation of drawings]

Fig. 1 is a block diagram of a developing processing device according to an embodiment of the present invention, Fig. 2 is a schematic block diagram showing a slit exposure type copying camera 1 incorporating the developing processing device of the embodiment, and Fig. 3 is a developing processing device. 4 is a perspective view of the main parts of the tank 96, FIG. 4 is a perspective view of the developer supply roller 98 and the developer storage section 100, and FIG. 5 is the developer supply roller 98 in the development processing tank 96.
6 is a block diagram showing the configuration of the electronic control device 60, and FIG. 7 is a flowchart showing the initial and initial processing routines executed by the electronic control device 60. , FIG. 8 is a flowchart showing the standby processing routine, FIG. 9 is a flowchart showing the exposure/development processing routine, and FIG. 10 is a timing chart showing the transport of the photosensitive material PM and the operation timing of each part. 1... Slit exposure copying camera 4... Console panel 10... Document holder 30... Projection optical system 40.
...Development processing device 42...Developer main tank 43...Stabilizer main tank 44...Processing unit 50...Drying unit 60
...Electronic control device 70...Developing section 72...Stabilizing section 78...
Developer distern tank 78A...Stabilizer distern tank 80.80A.
...Inflow solenoid valve 82...Developer nozzle 82A...Stabilizer nozzle 96...Development processing tank 96A...Stabilization processing tank 9
8...Developer supply roller 98A...Stabilizing side supply roller 100...Developer solution storage section 100A...Stabilizer storage section 162...CPU 164...ROM 16
6...RAM 168...Timer PM...
・Sensitive material

Claims (1)

[Scope of Claims] 1. A processing device for processing a silver salt type sensitive material such as photographic paper, photosensitive paper for direct plate making, or film, comprising: a processing tank for storing a processing solution for the sensitive material; A photosensitive material carrying means for carrying the photosensitive material into a processing solution in the processing tank; and a new processing solution for introducing a new processing solution into the processing solution on the loading side of the photosensitive material in the processing tank over the width direction of the photosensitive material. a processing liquid dispersion means for distributing the processing liquid uniformly; a carrying-out means for carrying out the sensitive material from the processing tank with the processing liquid attached to the surface; A photosensitive material processing apparatus comprising reaction continuation means for maintaining a reaction-enabled state for a predetermined period of time.