JP6341328B1 - Novel compound having isocyanuric skeleton and composition containing the same - Google Patents

Abstract

（Ｒ^１はポリエーテル鎖を含む一価の有機基；Ｘ^１及びＸ^２は各々独立に一価の基；上記ポリエーテル鎖は、−（ＯＣ_６Ｆ_１２）_ｍ１１−（ＯＣ_５Ｆ_１０）_ｍ１２−（ＯＣ_４Ｆ_８）_ｍ１３−（ＯＣ_３Ｘ^１０ _６）_ｍ１４−（ＯＣ_２Ｆ_４）_ｍ１５−（ＯＣＦ_２）_ｍ１６−；ｍ１１〜ｍ１６は各々独立に０以上の整数；Ｘ^１０は独立にＨ、Ｆ又はＣｌ；各繰り返し単位の存在順序は任意である）
【選択図】なしThe present invention provides a novel compound that can be suitably used as an antifouling agent.
A compound represented by the following formula:

(R ¹ is a monovalent organic group containing a polyether chain; X ¹ and X ² are each independently a monovalent group; the polyether chain is — (OC ₆ F ₁₂ ) _m11- (OC ₅ F ₁₀ ) _{m12 - (OC 4 F 8)} m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -; m11~m16 are each independently an integer of 0 or ^{more; X 10} is independently H, F, or Cl; the order of presence of each repeating unit is arbitrary)
[Selection figure] None

Description

The present invention relates to a novel compound having an isocyanuric skeleton and a composition containing the same.

It is known that certain fluorine-containing silane compounds can provide excellent water repellency, oil repellency, antifouling properties and the like when used for surface treatment of a substrate. A layer obtained from a surface treatment agent containing a fluorine-containing silane compound (hereinafter also referred to as “surface treatment layer”) is applied as a so-called functional thin film to various substrates such as glass, plastic, fiber, and building materials. Has been.

Patent Document 1 describes an antifouling coating agent containing an isocyanuric acid compound represented by the following formula.

(Wherein R ₁ , R ₂ , R ₃ and R ₄ are independently an alkyl group having 1 to 6 carbon atoms, n and m are each independently an integer of 0 to 2 and q is an integer of 1 to 20) )

Korean Published Patent No. 10-2014-0018556

However, new antifouling agents for imparting excellent antifouling properties to a wide variety of substrates are always in demand.

This invention makes it a subject to provide the novel compound which can be utilized suitably for an antifouling agent in view of the said present condition.

The present invention is a compound represented by the formula (1).

Formula (1):

(In the formula, R ¹ is a monovalent organic group containing a polyether chain, X ¹ and X ² independently represent a monovalent group, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or ^{more, X 10} are independently H, F or Cl, and the order of the repeating units is arbitrary) in Is a chain represented)

At least one or both of X ¹ and X ² are independently a monovalent organic group containing a polyether chain, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or ^{more, X 10} are independently H, F or Cl, and the order of the repeating units is arbitrary) in It is preferable that the chain is represented.

X ¹ is preferably a monovalent crosslinkable group.

X ² is preferably a monovalent crosslinkable group.

X ¹ and X ² are preferably independently a monovalent crosslinkable group.

X ¹ is a monovalent crosslinkable group containing a polyether chain, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or ^{more, X 10} are independently H, F or Cl, and the order of the repeating units is arbitrary) in It is preferable that the chain is represented.

X ² is a monovalent crosslinkable group containing a polyether chain, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or ^{more, X 10} are independently H, F or Cl, and the order of the repeating units is arbitrary) in It is preferable that the chain is represented.

X ¹ and X ² are each independently a monovalent crosslinkable group containing a polyether chain, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or ^{more, X 10} are independently H, F or Cl, and the order of the repeating units is arbitrary) in It is preferable that the chain is represented.

The crosslinkable group is a monovalent Si-containing group, acryloyl group, methacryloyl group, epoxy group, glycidyl group, oxetane group, isocyanate group, vinyl group, allyl group, vinyloxy group, carboxyl group, mercapto group, amino group, hydroxy group. Group, phosphonyl group, cyclic acid anhydride group, lactone group, lactam group, -OC (O) Cl group, triazine group, imidazole group, conjugated olefin group, acetylene group, diazo group, aldehyde group, ketone group, alkyl boron group , An alkylaluminum group, an alkyltin group, an alkylgermanium group, an alkylzircon group, and at least one crosslinkable group selected from the group consisting of monovalent groups containing any of these groups.

X ¹ is H, alkyl group, halogenated alkyl group, alkyl ester group, halogenated alkyl ester group, alkyl ether group, halogenated alkyl ether group, alkylamide group, halogenated alkylamide group, uryl group, halogenated uryl halide Group, urea group, halogenated urea group, —OCOOR ^j (R ^j is an alkyl group or halogenated alkyl group), —CONR ^k COR ^l (R ^k and R ^l are independently H, alkyl group or halogenated alkyl group) , Sugar chain-containing groups, alkylene polyether groups, arene groups, halogenated arene groups, heterocycle-containing groups, aryl groups, halogenated aryl groups, silicone residues (excluding those having reactive groups) and silyl Less selected from the group consisting of sesquioxane residues (except those having reactive groups) It is preferable that both are one.

X ² is H, alkyl group, halogenated alkyl group, alkyl ester group, halogenated alkyl ester group, alkyl ether group, halogenated alkyl ether group, alkylamide group, halogenated alkylamide group, uryl group, halogenated uryl halide Group, urea group, halogenated urea group, —OCOOR ^j (R ^j is an alkyl group or halogenated alkyl group), —CONR ^k COR ^l (R ^k and R ^l are independently H, alkyl group or halogenated alkyl group) , Sugar chain-containing groups, alkylene polyether groups, arene groups, halogenated arene groups, heterocycle-containing groups, aryl groups, halogenated aryl groups, silicone residues (excluding those having reactive groups) and silyl Less selected from the group consisting of sesquioxane residues (except those having reactive groups) It is preferable that both are one.

X ¹ and X ² are independently H, an alkyl group, a halogenated alkyl group, an alkyl ester group, a halogenated alkyl ester group, an alkyl ether group, a halogenated alkyl ether group, an alkylamide group, a halogenated alkylamide group, Uryl group, halogenated uryl group, urea group, halogenated urea group, -OCOOR ^j (R ^j is an alkyl group or a halogenated alkyl group), -CONR ^k COR ^l (R ^k and R ^l are independently H, alkyl group) Or a halogenated alkyl group), a group containing a sugar chain, an alkylene polyether group, an arene group, a halogenated arene group, a group containing a heterocyclic ring, an aryl group, a halogenated aryl group, or a silicone residue (but having a reactive group) Group) and silsesquioxane residues (excluding those having a reactive group) It is preferably at least one selected.

Since the novel compound of the present invention has the above-described structure, it exhibits excellent antifouling properties and can be suitably used as an antifouling agent. Moreover, it exhibits excellent releasability and can be suitably used as a release agent.

Hereinafter, the present invention will be specifically described.

The compound of the present invention is represented by the formula (1).

（式中、Ｒ^１はポリエーテル鎖を含む一価の有機基、Ｘ^１及びＸ^２は、独立に、一価の基を表し、上記ポリエーテル鎖は、
式：−（ＯＣ_６Ｆ_１２）_ｍ１１−（ＯＣ_５Ｆ_１０）_ｍ１２−（ＯＣ_４Ｆ_８）_ｍ１３−（ＯＣ_３Ｘ^１０ _６）_ｍ１４−（ＯＣ_２Ｆ_４）_ｍ１５−（ＯＣＦ_２）_ｍ１６−
（式中、ｍ１１、ｍ１２、ｍ１３、ｍ１４、ｍ１５およびｍ１６は、独立に、０又は１以上の整数、Ｘ^１０は独立にＨ、Ｆ又はＣｌ、各繰り返し単位の存在順序は任意である）で表される鎖である） Formula (1):

(In the formula, R ¹ is a monovalent organic group containing a polyether chain, X ¹ and X ² independently represent a monovalent group, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or ^{more, X 10} are independently H, F or Cl, and the order of the repeating units is arbitrary) in Is a chain represented)

R ¹ is preferably a monovalent organic group containing a polyether chain (excluding those containing a urethane bond).

The X ^10, F is preferred.
m11 to m16 are each preferably an integer of 0 to 200, and more preferably an integer of 0 to 100. m11 to m16 are preferably an integer of 1 or more, more preferably an integer of 5 or more, and still more preferably an integer of 10 or more. m11 to m16 are preferably an integer of 200 or less in total, and more preferably an integer of 100 or less. m11 to m16 are, in total, preferably an integer of 10 to 200, and more preferably an integer of 10 to 100.

In the polyether chain, each repeating unit may be linear or branched, but is preferably linear. For _{example, - (OC 6 F 12)} - _{is, - (OCF 2 CF 2 CF} 2 CF 2 CF 2 CF 2) -, - (OCF (CF 3) CF 2 CF 2 CF 2 CF 2) -, - (OCF _{2 CF (CF 3) CF 2} CF 2 CF 2) -, - (OCF 2 CF 2 CF (CF 3) CF 2 CF 2) -, - (OCF 2 CF 2 CF 2 CF (CF 3) CF 2) - , — (OCF ₂ CF ₂ CF ₂ CF ₂ CF (CF ₃ )) — or the like may be used, but — (OCF ₂ CF ₂ CF ₂ CF ₂ CF ₂ CF ₂ ) — is preferable. - _{(OC 5 F} 10) - _{is, - (OCF 2 CF 2 CF} 2 CF 2 CF 2) -, - (OCF (CF 3) CF 2 CF 2 CF 2) -, - (OCF 2 CF (CF 3) CF ₂ CF ₂ ) —, — (OCF ₂ CF ₂ CF (CF ₃ ) CF ₂ ) —, — (OCF ₂ CF ₂ CF ₂ CF (CF ₃ )) —, etc. may be used, but preferably — ( _{OCF 2 CF 2 CF 2 CF 2} CF 2) - a. - _{(OC 4} F 8) - _{is, - (OCF 2 CF 2 CF} 2 CF 2) -, - (OCF (CF 3) CF 2 CF 2) -, - (OCF 2 CF (CF 3) CF 2) - _{, - (OCF 2 CF 2 CF} (CF 3)) -, - (OC (CF 3) 2 CF 2) -, - (OCF 2 C (CF 3) 2) -, - (OCF (CF 3) CF ( CF ₃ ))-,-(OCF (C ₂ F ₅ ) CF ₂ )-and-(OCF ₂ CF (C ₂ F ₅ ))-may be used, but preferably-(OCF ₂ CF ₂ CF ₂ CF ₂₎ - a. -(OC ₃ F ₆ )-may be any of-(OCF ₂ CF ₂ CF ₂ )-,-(OCF (CF ₃ ) CF ₂ )-and-(OCF ₂ CF (CF ₃ ))-. good, preferably _{- (OCF 2 CF 2 CF 2} ) - a. Further,-(OC ₂ F ₄ )-may be either-(OCF ₂ CF ₂ )-or-(OCF (CF ₃ ))-, preferably-(OCF ₂ CF ₂ )-. is there.

In one embodiment, the polyether chain is a chain represented by — (OC ₃ F ₆ ) _m14 — (wherein m14 is an integer of 1 to 200). The polyether chain is preferably a chain represented by — (OCF ₂ CF ₂ CF ₂ ) _m14 — (wherein m14 is an integer of 1 to 200) or — (OCF (CF ₃ ) CF ₂ ). _m14 − (where m14 is an integer of 1 to 200), and more preferably — (OCF ₂ CF ₂ CF ₂ ) _m14 — (where m14 is an integer of 1 to 200) It is a chain represented by m14 is preferably an integer of 5 to 200, and more preferably an integer of 10 to 200.

In another embodiment, the polyether _{chain, - (OC 4 F 8)} m13 - (OC 3 F 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 - ( wherein, the m13 and m14 And m15 and m16 are each an integer of 1 to 200. m13 to m16 are an integer of 5 or more in total. It is a chain represented by m15 and m16 are each preferably an integer of 5 to 200, and more preferably an integer of 10 to 200. m13 to m16 are preferably integers of 10 or more in total. The polyether _{chain, - (OCF 2 CF 2 CF} 2 CF 2) m13 - (OCF 2 CF 2 CF 2) m14 - (OCF 2 CF 2) m15 - is preferably - _{(OCF 2) m16.} In one embodiment, the polyether _{chain, - (OC 2 F 4)} m15 - (OCF 2) m16 -. ( Wherein, the m15 and m16, respectively, an integer of 1 to 200 the presence of the repeating units The order may be arbitrary). m15 and m16 are each preferably an integer of 5 to 200, and more preferably an integer of 10 to 200.

In still another embodiment, the polyether chain is a group represented _by- (R ^m1 -R ^m2 ) _m17- . In the formula, R ^m1 is OCF ₂ or OC ₂ F ₄ , preferably OC ₂ F ₄ . In which R ^m2 is a group selected from OC ₂ F ₄ , OC ₃ F ₆ , OC ₄ F ₈ , OC ₅ F ₁₀ and OC ₆ F ₁₂ , or is independently selected from these groups Is a combination of 2 or 3 groups. Preferably, R ^m1 is a group selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ , or from OC ₃ F ₆ , OC ₄ F ₈ , OC ₅ F ₁₀ and OC ₆ F ₁₂ A selected group or a combination of two or three groups independently selected from these groups. The combination of 2 or 3 groups independently selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ is not particularly limited. For example, —OC ₂ F ₄ OC ₃ F ₆ —, —OC _{2 F 4 OC 4 F 8 -} , - OC 3 F 6 OC 2 F 4 -, - OC 3 F 6 OC 3 F 6 -, - OC 3 F 6 OC 4 F 8 -, - OC 4 F 8 OC 4 F _{8 -, - OC 4 F 8} OC 3 F 6 -, - OC 4 F 8 OC 2 F 4 -, - OC 2 F 4 OC 2 F 4 OC 3 F 6 -, - OC 2 F 4 OC 2 F 4 OC _{4 F 8 -, - OC 2} F 4 OC 3 F 6 OC 2 F 4 -, - OC 2 F 4 OC 3 F 6 OC 3 F 6 -, - OC 2 F 4 OC 4 F 8 OC 2 F 4 -, _{-OC 3 F 6 OC 2 F 4} OC 2 F 4 -, - OC 3 F 6 OC 2 _{F 4 OC 3 F 6 -,} - OC 3 F 6 OC 3 F 6 OC 2 F 4 -, and _{-OC 4 F 8 OC 2 F 4} OC 2 F 4 - , and the like. M17 is an integer of 2 or more, preferably an integer of 3 or more, more preferably an integer of 5 or more, an integer of 100 or less, and preferably an integer of 50 or less. In the above formula, OC ₂ F ₄ , OC ₃ F ₆ , OC ₄ F ₈ , OC ₅ F ₁₀ and OC ₆ F ₁₂ may be either linear or branched, preferably linear. . In this embodiment, the polyether chain comprises _{preferably, - (OC 2 F 4 -OC} 3 F 6) m17 - or _{- (OC 2 F 4 -OC 4} F 8) m17 - a.

In the polyether chain, the ratio of m15 to m16 (hereinafter referred to as “m15 / m16 ratio”) is 0.1 to 10, preferably 0.2 to 5, and more preferably 0.2 to 2. More preferably, it is 0.2-1.5, More preferably, it is 0.2-0.85. By setting the m15 / m16 ratio to 10 or less, the slipperiness, friction durability and chemical resistance (for example, durability against artificial sweat) of the surface treatment layer are further improved. The smaller the m15 / m16 ratio, the more the slipperiness and friction durability of the surface treatment layer are improved. On the other hand, when the m15 / m16 ratio is 0.1 or more, the stability of the compound can be further increased. The greater the m15 / m16 ratio, the better the stability of the compound.

The polyether chain is
Formula ^{_{:-( OCF 2 CF 2 CX 11 2}} ) n11 (OCF 2 CF (CF 3)) n12 (OCF 2 CF 2) n13 (OCF 2) n14 (OC 4 F 8) n15 -
(Wherein, n11, n12, n13, n14 and n15 are independently 0 or an integer of 1 or ^{more, X 11} is independently H, F or Cl, and the order of the repeating units is arbitrary) is represented by Chain and
Formula ^{_{:-( OC 2 F 4 -R 11)}} f -
(Wherein R ¹¹ is a group selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ , and f is an integer of 2 to 100). It may be at least one selected chain.

X ¹¹ is preferably F.
n11 to n15 are each preferably an integer of 0 to 200. n11 to n15 are preferably an integer of 2 or more in total, more preferably an integer of 5 to 300, still more preferably an integer of 10 to 200, and an integer of 10 to 100. Is particularly preferred.

R ¹¹ is a group selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ , or a combination of 2 or 3 groups independently selected from these groups. The combination of 2 or 3 groups independently selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ is not particularly limited. For example, —OC ₂ F ₄ OC ₃ F ₆ —, —OC _{2 F 4 OC 4 F 8 -} , - OC 3 F 6 OC 2 F 4 -, - OC 3 F 6 OC 3 F 6 -, - OC 3 F 6 OC 4 F 8 -, - OC 4 F 8 OC 4 F _{8 -, - OC 4 F 8} OC 3 F 6 -, - OC 4 F 8 OC 2 F 4 -, - OC 2 F 4 OC 2 F 4 OC 3 F 6 -, - OC 2 F 4 OC 2 F 4 OC _{4 F 8 -, - OC 2} F 4 OC 3 F 6 OC 2 F 4 -, - OC 2 F 4 OC 3 F 6 OC 3 F 6 -, - OC 2 F 4 OC 4 F 8 OC 2 F 4 -, _{-OC 3 F 6 OC 2 F 4} OC 2 F 4 -, - OC 3 F 6 OC 2 _{F 4 OC 3 F 6 -,} - OC 3 F 6 OC 3 F 6 OC 2 F 4 -, and _{-OC 4 F 8 OC 2 F 4} OC 2 F 4 - , and the like. Said f is an integer of 2-100, Preferably it is an integer of 2-50. In the above formula, OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ may be either linear or branched, preferably linear. In this embodiment, the formula: — (OC ₂ F ₄ —R ¹¹ ) _f — is preferably the formula: — (OC ₂ F ₄ —OC ₃ F ₆ ) _f — or the formula: — (OC ₂ F ₄ —OC ₄ F ₈ ) _f −.

In the compound of the present invention, the number average molecular weight of the polyether chain moiety is not particularly limited, but is, for example, 500 to 30,000, preferably 1,500 to 30,000, more preferably 2,000 to 10 , 000. The number average molecular weight is a value measured by ¹⁹ F-NMR.

In another embodiment, the polyether chain moiety has a number average molecular weight of 500 to 30,000, preferably 1,000 to 20,000, more preferably 2,000 to 15,000, and even more preferably 2,000 to 2,000. It can be 10,000, for example 3,000 to 6,000.

In another embodiment, the polyether chain moiety may have a number average molecular weight of 4,000 to 30,000, preferably 5,000 to 10,000, more preferably 6,000 to 10,000.

R ¹ is represented by the formula: R ³ — (OR ² ) _a -L — ((OR ² ) _a is the polyether chain, R ³ is an alkyl group or a fluorinated alkyl group, L is a single bond or a divalent linkage. It is preferable that it is a monovalent organic group represented by (Group).

The number of carbon atoms of R ^3, 1 to 16 are preferred, 1-8 being preferred.
R ³ may be linear or branched, and is preferably a linear or branched alkyl group having 1 to 16 carbon atoms or a fluorinated alkyl group. A branched chain alkyl group having 1 to 8 carbon atoms or a fluorinated alkyl group is more preferable, and a straight chain or branched chain alkyl group having 1 to 6 carbon atoms or a fluorinated alkyl group is still more preferable. And more preferably a linear or branched alkyl group having 1 to 3 carbon atoms or a fluorinated alkyl group, particularly preferably a linear alkyl group having 1 to 3 carbon atoms or a fluorinated alkyl group. preferable.

R ³ is preferably a fluorinated alkyl group having 1 to 16 carbon atoms, more preferably a CF ₂ H—C _1-15 fluoroalkylene group or a perfluoroalkyl group having 1 to 16 carbon atoms, More preferably, it is a perfluoroalkyl group of formula 1-16.

The perfluoroalkyl group having 1 to 16 carbon atoms may be linear or branched, and preferably has 1 to 6 carbon atoms, particularly 1 to 3 carbon atoms, which are linear or branched. More preferably a linear perfluoroalkyl group having 1 to 3 carbon atoms, specifically —CF ₃ , —CF ₂ CF ₃ , or —CF ₂ CF ₂ CF ₃ .

L is a single bond or a divalent linking group directly bonded to the ring of the formula (1). L is preferably a single bond, an alkylene group, or a divalent group containing at least one bond selected from the group consisting of an ether bond and an ester bond, a single bond, an alkylene group having 1 to 10 carbon atoms, Or a C1-C10 bivalent hydrocarbon group containing at least 1 sort (s) of a bond selected from the group which consists of an ether bond and an ester bond is more preferable.

As L,
Formula _{^{:-( CX 121 X 122) o -}} (L 1) p - (CX 123 X 124) q -
(Wherein X ^{121 to} X ¹²⁴ are independently H, F, OH, or —OSi (OR ¹²¹ ) ₃ (three R ¹²¹ are independently an alkyl group having 1 to 4 carbon atoms), and L ¹ is , -C (= O) NH-, -NHC (= O)-, -O-, -C (= O) O-, -OC (= O)-, -OC (= O) O-, or A group represented by —NHC (═O) NH— (the left side of each bond is bonded to CX ¹²¹ X ¹²² ), o is an integer of 0 to 10, p is 0 or 1, and q is an integer of 1 to 10. Further preferred.
L ¹ is preferably —O— or —C (═O) O—.
As L,
Formula _{:-( CF 2) m11 - (CH} 2) m12 -O- (CH 2) m13 -
(Wherein m11 is an integer of 1 to 3, m12 is an integer of 1 to 3, and m13 is an integer of 1 to 3),
Formula _{:-( CF 2) m14 - (CH} 2) m15 -O-CH 2 CH (OH) - (CH 2) m16 -
Wherein m14 is an integer of 1 to 3, m15 is an integer of 1 to 3, and m16 is an integer of 1 to 3,
Formula _{:-( CF 2) m17 - (CH} 2) m18 -
(Wherein m17 is an integer of 1 to 3, and m18 is an integer of 1 to 3), or
Formula _{:-( CF 2) m19 - (CH} 2) m20 -O-CH 2 CH (OSi (OCH 3) 3) - (CH 2) m21 -
(Wherein m19 is an integer of 1 to 3, m20 is an integer of 1 to 3, and m21 is an integer of 1 to 3).

As L, but are not limited to, _{specifically, -C 2 H 4 -, -} C 3 H 6 -, - C 4 H 8 -O-CH 2 -, - CO-O-CH 2 -CH (OH ) —CH ₂ —, — (CF ₂ ) _n — (n is an integer of 0 to 4), —CH ₂ —, —C ₄ H ₈ —, — (CF ₂ ) _n — (CH ₂ ) _m — (n , an _integer), independently both by 0-4 are _{m - CF 2 CF 2 CH 2} OCH 2 CH (OH) CH 2 -, - CF 2 CF 2 CH 2 OCH 2 CH (OSi (OCH 3) 3) CH ₂ — and the like can be mentioned.

At least one or both of X ¹ and X ² may independently be a monovalent organic group containing the polyether chain. A suitable group of the organic group is the same as R ¹ .

X ¹ may be a monovalent crosslinkable group.

X ² may be a monovalent crosslinkable group.

X ¹ and X ² may independently be a monovalent crosslinkable group.

The said crosslinkable group contributes to adhesiveness with a base material, or contributes to a crosslinking reaction. The crosslinkable group may chemically react with the material of the base material. Moreover, the said crosslinkable group may react with the said crosslinkable groups, and may react with curable resin, a curable monomer, etc. which are mentioned later.

The crosslinkable group is preferably a monovalent crosslinkable group having thermal crosslinkability or photocrosslinkability.

The crosslinkable group is a monovalent Si-containing group, acryloyl group, methacryloyl group, epoxy group, glycidyl group, oxetane group, isocyanate group, vinyl group, allyl group, vinyloxy group, carboxyl group, mercapto group, amino group, hydroxy group. Group, phosphonyl group, cyclic acid anhydride group, lactone group, lactam group, -OC (O) Cl group, triazine group, imidazole group, conjugated olefin group, acetylene group, diazo group, aldehyde group, ketone group, alkyl boron group It is preferably at least one crosslinkable group selected from the group consisting of an alkylaluminum group, an alkyltin group, an alkylgermanium group, an alkylzircon group, and a monovalent group containing any of these groups, Monovalent Si-containing group, acryloyl group, epoxy group, glycidyl group, vinyl group, ant Group, hydroxy group, a ketone group, and, more preferably at least one crosslinkable group selected from the group consisting of monovalent radicals containing one of these groups.

“Monovalent group containing any of these groups” refers to a monovalent crosslinkable group containing a hydrocarbon chain containing any of these groups at the end of the side chain or the main chain, and any of these groups Examples thereof include monovalent crosslinkable groups including a polyether chain containing such at the end of the side chain or the end of the main chain.

That is, X ¹ may be a monovalent crosslinkable group containing the polyether chain.

X ² may be a monovalent crosslinkable group containing the polyether chain.

X ¹ and X ² may independently be a monovalent crosslinkable group containing the polyether chain.

The polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or ^{more, X 10} are independently H, F or Cl, and the order of the repeating units is arbitrary) in The chain represented.
The polyether chain is
Formula ^{_{:-( OCF 2 CF 2 CX 11 2}} ) n11 (OCF 2 CF (CF 3)) n12 (OCF 2 CF 2) n13 (OCF 2) n14 (OC 4 F 8) n15 -
(Wherein, n11, n12, n13, n14 and n15 are independently 0 or an integer of 1 or ^{more, X 11} is independently H, F or Cl, and the order of the repeating units is arbitrary) is represented by Chain and
Formula ^{_{:-( OC 2 F 4 -R 11)}} f -
(Wherein R ¹¹ is a group selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ , and f is an integer of 2 to 100). It may be at least one selected chain.

A chain suitable as the polyether chain is the same as R ¹ .

The Si-containing group is preferably at least one group selected from the group consisting of a silane-containing reactive crosslinking group, a silicone residue, a silsesquioxane residue, and a silazane group.

As the silane-containing reactive crosslinking group,
Formula: -L ^2- {Si (R ^a ) _s (R ^b ) _t (R ^c ) _u (R ^d ) _v } _n
(Wherein L ² is a single bond or a divalent linking group, R ^a , R ^b and R ^c are the same or different and are hydrogen, halogen, an alkoxy group having 1 to 10 carbon atoms, amino having 1 to 10 carbon atoms, Group, an acetoxy group having 1 to 10 carbon atoms, an allyl group having 3 to 10 carbon atoms, or a glycidyl group having 3 to 10 carbon atoms, and R ^d is the same or different and is —O—, —NH—, or —C. ≡C— or a silane bond, s, t and u are the same or different and are 0 or 1, v is an integer of 0 to 3, and n is an integer of 1 to 20. When 1, s + t + u is 3, and v is 0. When n is 2-20, s + t + u is the same or different 0-2, v is the same or different 0-2, When v is an integer greater than or equal to 1, at least two Si are linear, ladder-type, cyclic, or via R ^d A group represented by the following formula: is preferable. R ^a , R ^b and R ^c are monovalent groups bonded to Si. R ^d is a divalent group bonded to two Si atoms.

R ^a , R ^b and R ^c are the same or different, and at least one is hydrogen, halogen, an alkoxy group having 1 to 10 carbon atoms, or an amino group having 1 to 10 carbon atoms; It is preferably an acetoxy group having 10 to 10 carbon atoms, an allyl group having 3 to 10 carbon atoms, or a glycidyl group having 3 to 10 carbon atoms, and more preferably an alkoxy group having 1 to 4 carbon atoms. When n is 2 to 20, s + t + u is the same or different and is 0 to 2, and v is preferably 0 to 2.

In R ^a , R ^b and R ^c , the halogen is preferably Cl, Br or I, and more preferably Cl.

In R ^a , R ^b and R ^c , the alkoxy group preferably has 1 to 5 carbon atoms. The alkoxy group may be chained, cyclic or branched. Moreover, the hydrogen atom may be substituted with a fluorine atom or the like. As an alkoxy group, a methoxy group, an ethoxy group, a propyloxy group, or a butoxy group is preferable, More preferably, it is a methoxy group or an ethoxy group.

R ^d is the same or different and is —O—, —NH—, —C≡C—, or a silane bond. R ^d is preferably —O—, —NH—, or —C≡C—. R ^d is a divalent group which is bonded to two Si, that two or more silicon atoms by R ^d via a R ^d, binds a linear, ladder-type, cyclic, or double cyclic Can do. When n is an integer of 2 or more, silicon atoms may be bonded to each other.

R ^d may be the same or different and may be a group represented by —Z—SiR ^d1 _{p ′} R ^d2 _{q ′} R ^d3 _{r ′} .

In formula, Z is the same or different and represents a single bond or a bivalent coupling group.

As Z, _{particularly, -C 2 H 4 -, -} C 3 H 6 -, - CO-O-CH 2 -CH (OH) -CH 2 -, - CH 2 -, - C 4 H 8 - Etc.

In the formula, R ^d1 is the same or different and represents R ^{d ′} . R ^{d ′} has the same meaning as R ^d .

In R ^d , the maximum number of Si linked in a straight chain via the Z group is 5. That is, in the above R ^d , when at least one R ^d1 is present, there are two or more Si atoms linearly linked through the Z group in R ^d , but the R ^d1 is directly bonded through the Z group. The maximum number of Si atoms connected in a chain is five. The "number of Si atoms linearly linked via a Z group in R ^d" is equal to -Z-Si- repeating number of which is connected to a linear during R ^d.

For example, an example in which the Si atoms are linked via a group Z in a R ^d below.

In the above formula, * means a site bonded to Si of the main chain, and ... means that a predetermined group other than ZSi is bonded, that is, all three bonds of Si atoms are ... In this case, it means the end point of ZSi repetition. The number on the right shoulder of Si means the number of appearances of Si connected in a straight line through the Z group counted from *. That is, the chain in which ZSi repeat is completed in Si ² has “the number of Si atoms linearly linked through the Z group in R ^d ”, and similarly, Si ³ , Si ⁴ And the chain in which the ZSi repetition is completed in Si ⁵ has “number of Si atoms linearly linked through Z group in R ^d ” of 3, 4 and 5, respectively. As is clear from the above formula, there are a plurality of ZSi chains in R ^d , but these do not necessarily have the same length, and may be of any length.

In a preferred embodiment, as shown below, “the number of Si atoms linearly linked via the Z group in R ^d ” is 1 (left formula) or 2 (right) in all chains. Formula).

In one embodiment, the number of Si atoms connected in a straight chain via a Z group in R ^d is 1 or 2, preferably 1.

In the formula, R ^d2 is the same or different and represents a hydroxyl group or a hydrolyzable group. The hydroxyl group is not particularly limited, but may be a group produced by hydrolysis of a hydrolyzable group.

Preferably, R ^d2 is —OR (wherein R represents a substituted or unsubstituted C _1-3 alkyl group, more preferably a methyl group).

In the formula, R ^d3 is the same or different and represents a hydrogen atom or a lower alkyl group. The lower alkyl group is preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and still more preferably a methyl group.

In the formula, p is the same or different and is an integer of 0 to 3; q is the same or different and is an integer of 0 to 3; r is the same or different and is an integer of 0 to 3. However, the sum of p ′, q ′ and r ′ is 3.

In a preferred embodiment, ^{'(if R d'} is absent, ^{R d)} end of ^{R d} in ^{R d} in the above q 'is preferably 2 or more, for example 2 or 3, more preferably 3 .

In a preferred embodiment, R ^d has at least one —Si (—Z—SiR ^d2 _{q ′} R ^d3 _{r ′} ) ₂ or —Si (—Z—SiR ^d2 _{q ′} R ^d3 _{r ′} ) _{3 at the terminal end} , Preferably, it may have —Si (—Z—SiR ^d2 _{q ′} R ^d3 _{r ′} ) ₃ . Wherein, - the unit of _{^{(Z-SiR d2 q 'R}} d3 r') is preferably a ^{(-Z-SiR d2} _3). In a further preferred embodiment, it is preferred that all terminal portions of R ^d are —Si (—Z—SiR ^d2 _{q ′} R ^d3 _{r ′} ) ₃ , more preferably —Si (—Z—SiR ^d2 ₃ ) ₃ . possible.

From the viewpoint of improving the crosslinkability, the silane-containing reactive crosslinking group preferably has an allyl group having 1 to 5 carbon atoms, a glycidyl group having 1 to 5 carbon atoms, an acryl group, or a methacryl group. That is, in the silane-containing reactive crosslinking group, at least one of R ^a , R ^b and R ^c is an allyl group having 1 to 5 carbon atoms, a glycidyl group having 1 to 5 carbon atoms, an acryl group, or a methacryl group. It is preferable.

L ² is a single bond or a divalent linking group directly bonded to the ring of the formula (1). L ² is preferably a single bond, an alkylene group, or a divalent group containing at least one bond selected from the group consisting of an ether bond and an ester bond, and is a single bond or an alkylene group having 1 to 10 carbon atoms. Or a C1-C10 bivalent hydrocarbon group containing at least 1 sort (s) selected from the group which consists of an ether bond and an ester bond is more preferable.

As L ² , specifically, —C ₂ H ₄ —, —C ₃ H ₆ —, —C ₄ H ₈ —O—CH ₂ —, —CO—O—CH ₂ —CH (OH) —CH _{2 -, - CH 2 -, -} C 4 H 8 - , and the like.

Examples of the silane-containing reactive crosslinking group include -L ² -SiR ⁵ ₃ , -L ² -Si (OR ⁶ ) ₃ , -L ² -Si (NR ⁶ ₂ ) ₃ , and -L ² -Si (OCOR ⁶ ). ₃ (wherein, ^{L 2} is as described above, ^{R 5} is a halogen atom, ^{R 6} is an alkyl group having 1 to 4 carbon atoms independently) include.

Examples of the silicone residue include the following groups.

(In each formula, L ² is a single bond or a divalent linking group, n is an integer of 1 to 20, m is an integer of 0 to 10, and R ³¹ is each independently a monovalent group, At least one of R ^{31 in} the group is a reactive group)

The plurality of R ³¹ contained in each group are each independently a monovalent group, and may be the reactive group or a group other than the reactive group. However, at least one of the plurality of R ³¹ contained in each group is the reactive group.

Examples of the reactive group include H, a halogen atom, or —OR ³² (R ³² is an alkyl group having 1 to 4 carbon atoms or an aryl group having 6 to 20 carbon atoms), —L ³ —SiR ⁵ ₃ (L ³ is a single atom). A bond or an alkylene group having 1 to 10 carbon atoms, R ⁵ is a halogen atom), -L ³ -Si (OR ⁶ ) ₃ (L ³ is as described above, R ⁶ is independently an alkyl group having 1 to 4 carbon atoms) , -L ³ -Si (NR ⁶ ₂ ) ₃ (L ³ and R ⁶ are as described above), -L ³ -Si (OCOR ⁶ ) ₃ (L ³ and R ⁶ are as described above) and At least one selected from the group consisting of any group is preferred.

Examples of groups other than the reactive group include alkyl groups, halogenated alkyl groups, alkyl ester groups, halogenated alkyl ester groups, alkyl ether groups, halogenated alkyl ether groups, alkylamide groups, halogenated alkylamide groups, and uryl groups. , A halogenated uryl group, a urea group, a halogenated urea group, -CONR ^k COR ^l (R ^k and R ^l are each independently H, an alkyl group or a halogenated alkyl group), a group containing a sugar chain, an alkylene polyether group, At least one selected from the group consisting of an arene group, a halogenated arene group, a group containing a heterocycle, an aryl group, and a halogenated aryl group is preferable.

L ² is a single bond or a divalent linking group directly bonded to the ring of the formula (1). Suitable as L ^{2 is} as described above.

Examples of the silicone residue also include the following groups.

(In each formula, L ² is a single bond or a divalent linking group, R ³⁴ is each independently a monovalent group, and at least one of R ^{34 in} each group is a reactive group)

The plurality of R ³⁴ contained in each group are each independently a monovalent group, and may be the reactive group or a group other than the reactive group. However, at least one of the plurality of R ³⁴ contained in each group is the reactive group.

Examples of the reactive group include -H, -OR ³⁵ (R ³⁵ is an alkyl group having 1 to 4 carbon atoms), a halogen atom, -OH, -O-CR ³⁵ = CH ₂ (R ³⁵ is as described above), -OCOR ³⁵ (R ³⁵ is as described above), -OCOOR ^j (R ^j is an alkyl group or a halogenated alkyl group), -NR ³⁵ ₂ (R ³⁵ is as described above) and a group containing any of these groups At least one selected from the group consisting of

Examples of groups other than the reactive group include alkyl groups, halogenated alkyl groups, alkyl ester groups, halogenated alkyl ester groups, alkyl ether groups, halogenated alkyl ether groups, alkylamide groups, halogenated alkylamide groups, and uryl groups. , A halogenated uryl group, a urea group, a halogenated urea group, -CONR ^k COR ^l (R ^k and R ^l are each independently H, an alkyl group or a halogenated alkyl group), a group containing a sugar chain, an alkylene polyether group, At least one selected from the group consisting of an arene group, a halogenated arene group, a group containing a heterocycle, an aryl group, and a halogenated aryl group is preferable.

L ² is a single bond or a divalent linking group directly bonded to the ring of the formula (1). Suitable as L ^{2 is} as described above.

Examples of the silsesquioxane residue include the following groups.

(In each formula, L ² is a single bond or a divalent linking group, R ³⁷ is each independently a monovalent group, and among R ³⁷ each group has, at least one is a reactive group, p is independently an integer of 0 to 5000)

The plurality of R ³⁷ contained in each group are each independently a monovalent group, and may be the reactive group or a group other than the reactive group. However, at least one of the plurality of R ³⁷ contained in each group is the reactive group.

Examples of the reactive group include -H, -OR ³⁵ (R ³⁵ is an alkyl group having 1 to 4 carbon atoms), a halogen atom, -OH, -O-CR ³⁵ = CH ₂ (R ³⁵ is as described above), -OCOR ³⁵ (R ³⁵ is as described above), -OCOOR ^j (R ^j is an alkyl group or a halogenated alkyl group), -NR ³⁵ ₂ (R ³⁵ is as described above) and a group containing any of these groups At least one selected from the group consisting of

Examples of groups other than the reactive group include alkyl groups, halogenated alkyl groups, alkyl ester groups, halogenated alkyl ester groups, alkyl ether groups, halogenated alkyl ether groups, alkylamide groups, halogenated alkylamide groups, and uryl groups. , A halogenated uryl group, a urea group, a halogenated urea group, -CONR ^k COR ^l (R ^k and R ^l are each independently H, an alkyl group or a halogenated alkyl group), a group containing a sugar chain, an alkylene polyether group, At least one selected from the group consisting of an arene group, a halogenated arene group, a group containing a heterocycle, an aryl group, and a halogenated aryl group is preferable.

L ² is a single bond or a divalent linking group directly bonded to the ring of the formula (1). Suitable as L ^{2 is} as described above.

Either one or both of X ¹ and X ² may be a group different from the monovalent organic group including the above-described polyether chain and the crosslinkable group.

That is, X ¹ is H, alkyl group, halogenated alkyl group, alkyl ester group, halogenated alkyl ester group, alkyl ether group, halogenated alkyl ether group, alkylamide group, halogenated alkylamide group, uryl group, halogen Uryl group, urea group, urea group, halogenated urea group, —OCOOR ^j (R ^j is an alkyl group or halogenated alkyl group), —CONR ^k COR ^l (R ^k and R ^l are independently H, alkyl group or alkyl halide) Group), a group containing a sugar chain, an alkylene polyether group, an arene group, a halogenated arene group, a group containing a heterocyclic ring, an aryl group, a halogenated aryl group, a silicone residue (excluding those having a reactive group) And a silsesquioxane residue (excluding those having a reactive group) It may be at least one kind.

X ² is H, alkyl group, halogenated alkyl group, alkyl ester group, halogenated alkyl ester group, alkyl ether group, halogenated alkyl ether group, alkylamide group, halogenated alkylamide group, uryl group, halogen Uryl group, urea group, urea group, halogenated urea group, —OCOOR ^j (R ^j is an alkyl group or halogenated alkyl group), —CONR ^k COR ^l (R ^k and R ^l are independently H, alkyl group or alkyl halide) Group), a group containing a sugar chain, an alkylene polyether group, an arene group, a halogenated arene group, a group containing a heterocyclic ring, an aryl group, a halogenated aryl group, a silicone residue (excluding those having a reactive group) And a silsesquioxane residue (excluding those having a reactive group) There may be at least one.

X ¹ and X ² are independently H, alkyl group, halogenated alkyl group, alkyl ester group, halogenated alkyl ester group, alkyl ether group, halogenated alkyl ether group, alkylamide group, halogenated alkylamide. Group, uryl group, halogenated uryl group, urea group, halogenated urea group, -OCOOR ^j (R ^j is an alkyl group or a halogenated alkyl group), -CONR ^k COR ^l (R ^k and R ^l are independently H, Alkyl group or halogenated alkyl group), sugar chain-containing group, alkylene polyether group, arene group, halogenated arene group, heterocycle-containing group, aryl group, halogenated aryl group, silicone residue (however, reactive group) And silsesquioxane residues (excluding those having a reactive group). It may be at least one selected from the group.

Examples of the silicone residue (excluding those having a reactive group) include the following groups. Incidentally, the above reactive group, those exemplified as the reactive group capable of constituting the R ^37.

(In each formula, L ⁴ is a single bond or a divalent linking group, and R ⁴¹ is each independently a group other than a monovalent reactive group)

Examples of groups other than the reactive group include alkyl groups, halogenated alkyl groups, alkyl ester groups, halogenated alkyl ester groups, alkyl ether groups, halogenated alkyl ether groups, alkylamide groups, halogenated alkylamide groups, and uryl groups. , A halogenated uryl group, a urea group, a halogenated urea group, -CONR ^k COR ^l (R ^k and R ^l are each independently H, an alkyl group or a halogenated alkyl group), a group containing a sugar chain, an alkylene polyether group, At least one selected from the group consisting of an arene group, a halogenated arene group, a group containing a heterocycle, an aryl group, and a halogenated aryl group is preferable.

L ⁴ is a single bond or a divalent linking group directly bonded to the ring of the formula (1). L ⁴ is preferably a single bond, an alkylene group, or a divalent group containing at least one bond selected from the group consisting of an ether bond and an ester bond, and is a single bond or an alkylene group having 1 to 10 carbon atoms. Or a C1-C10 bivalent hydrocarbon group containing at least 1 sort (s) selected from the group which consists of an ether bond and an ester bond is more preferable.

As L ⁴ , specifically, —C ₂ H ₄ —, —C ₃ H ₆ —, —C ₄ H ₈ —O—CH ₂ —, —CO—O—CH ₂ —CH (OH) —CH ₂ -Etc. are mentioned.

Examples of the silsesquioxane residue (excluding those having a reactive group) include the following groups. Incidentally, the above reactive group, those exemplified as the reactive group capable of constituting the R ^37.

(In each formula, L ⁴ is a single bond or a divalent linking group, R ⁴¹ is each independently a group other than a monovalent reactive group, and p is independently an integer of 0 to 5000)

Examples of groups other than the reactive group include alkyl groups, halogenated alkyl groups, alkyl ester groups, halogenated alkyl ester groups, alkyl ether groups, halogenated alkyl ether groups, alkylamide groups, halogenated alkylamide groups, and uryl groups. , A halogenated uryl group, a urea group, a halogenated urea group, -CONR ^k COR ^l (R ^k and R ^l are each independently H, an alkyl group or a halogenated alkyl group), a group containing a sugar chain, an alkylene polyether group, At least one selected from the group consisting of an arene group, a halogenated arene group, a group containing a heterocycle, an aryl group, and a halogenated aryl group is preferable.

L ⁴ is a single bond or a divalent linking group directly bonded to the ring of the formula (1). Suitable as L ⁴ are, as described above.

Examples of the silazane group include the following groups.

(In each formula, L ⁵ is a single bond or a divalent linking group, m is an integer of 2 to 100, n is an integer of 100 or less, and R ⁴² is independently H, alkyl having 1 to 10 carbon atoms. Group, alkenyl group, cycloalkyl group having 5 to 12 carbon atoms, aryl group having 6 to 10 carbon atoms, alkylsilyl group, alkylcyano group, alkoxy group having 1 to 4 carbon atoms)

L ⁵ is a single bond or a divalent linking group directly bonded to the ring of the formula (1). L ⁵ is preferably a single bond, an alkylene group, or a divalent group containing at least one bond selected from the group consisting of an ether bond and an ester bond, and is a single bond or an alkylene group having 1 to 10 carbon atoms. Or a C1-C10 bivalent hydrocarbon group containing at least 1 sort (s) selected from the group which consists of an ether bond and an ester bond is more preferable.

As L ⁵ , specifically, —C ₂ H ₄ —, —C ₃ H ₆ —, —C ₄ H ₈ —O—CH ₂ —, —CO—O—CH ₂ —CH (OH) —CH ₂ -Etc. are mentioned.

Specific examples of the silazane group include the following groups.

In the compound of the present invention, the average molecular weight of R ¹ is not particularly limited, but is 500 to 30,000, preferably 1,500 to 30,000, more preferably 2,000 to 10,000. .

The compound of the present invention is not particularly limited, and may have an average molecular weight of 5 × 10 ² to 1 × 10 ⁵ . Of these, an average molecular weight of preferably 2,000 to 30,000, more preferably 2,500 to 12,000 is preferable from the viewpoint of UV resistance and friction durability. In the present invention, “average molecular weight” refers to number average molecular weight, and “average molecular weight” is a value measured by ¹⁹ F-NMR.

Next, the manufacturing method of the compound of this invention is demonstrated. The compounds of the present invention have the formula:

（式中、Ｘ^１及びＸ^２は上述したとおり、Ｌ^２１は単結合又は二価の連結基）で表されるイソシアヌル酸誘導体化合物と、式：Ｒ^２１−Ｘ^２１（式中、Ｒ^２１は、−Ｏ−Ｌ^２１−とともに、上述したＲ^１を構成する一価の有機基、Ｘ^２１はＣｌ、Ｂｒ又はＩ）とを、反応させることにより製造できる。

(Wherein, X ¹ and X ² are as described above, L ²¹ is a single bond or a divalent linking group) and an isocyanuric acid derivative compound represented by the formula: R ²¹ -X ²¹ (wherein R ²¹ is , -OL ²¹ -and the monovalent organic group constituting R ¹ described above, X ²¹ can be produced by reacting with Cl, Br or I).

Since R ²¹ constitutes R ¹ described above together with —O—L ²¹ —, it naturally includes the polyether chain. According to this reaction, a monovalent organic group represented by R ²¹ —OL ²¹ — is generated. The _{^{R 21, R 3 - (OR}} 2) a -L 22 - ((OR 2) a is the polyether chain, ^{R 3} is an alkyl group or a fluorinated alkyl ^{group, L} 22 is, ^{-O-L 21} - In addition, a monovalent organic group represented by the above-described single bond or divalent linking group constituting L) is more preferable.

The compounds of the present invention also have the formula:

（式中、Ｘ^１及びＸ^２は上述したとおり、Ｌ^２３は単結合又は二価の連結基）で表されるイソシアヌル酸誘導体化合物と、式：Ｒ^２２−ＣＯＯＨ（式中、Ｒ^２２は、−ＣＯＯ−ＣＨ_２ＣＨ（ＯＨ）−Ｌ^２３−とともに、上述したＲ^１を構成する一価の有機基）とを、反応させることにより製造できる。

(Wherein, X ¹ and X ² are as described above, L ²³ is a single bond or a divalent linking group) and an isocyanuric acid derivative compound represented by the formula: R ²² —COOH (wherein R ²² is It can be produced by reacting —COO—CH ₂ CH (OH) —L ²³ — with the above-described monovalent organic group constituting R ¹ .

R ²² _{is, -COO-CH 2 CH (OH} ) -L 23 - with, since constituting ^{R 1} described above, include the polyether chain is natural. According to this reaction, a monovalent organic group represented by R ²² —COO—CH ₂ CH (OH) —L ²³ — is generated. The _{^{R 22, R 3 - (OR}} 2) a -L 24 - ((OR 2) a is the polyether chain, ^{R 3} is an alkyl group or a fluorinated alkyl ^{group, L} 24 is, _-COO-CH 2 _CH A monovalent organic group represented by (OH) —L ²³ — and the above-described single bond or divalent linking group constituting L) is preferable.

The compounds of the present invention also have the formula:

（式中、Ｘ^１及びＸ^２は上述したとおり、Ｌ^２５は単結合又は二価の連結基、Ｘ^２５はＣｌ、Ｂｒ又はＩ）で表されるイソシアヌル酸誘導体化合物と、式：Ｒ^２３−ＯＨ（式中、Ｒ^２３は、−Ｏ−Ｌ^２５−とともに、上述したＲ^１を構成する一価の有機基）とを、反応させることにより製造できる。

(Wherein, as ^{X 1} and ^{X 2} are as described ^{above, L 25} represents a single bond or a divalent linking ^{group, X 25} is Cl, Br or I) and isocyanuric acid derivative compound represented by the ^{formula: R 23} - It can be produced by reacting OH (wherein R ²³ is a monovalent organic group constituting R ¹ described above together with —O—L ²⁵ —).

Since R ²³ constitutes R ¹ described above together with —O—L ²⁵ —, it naturally includes the polyether chain. According to this reaction, a monovalent organic group represented by R ²³ —OL ²⁵ — is generated. The _{^{R 23, R 3 - (OR}} 2) a -L 26 - ((OR 2) a is the polyether chain, ^{R 3} is an alkyl group or a fluorinated alkyl ^{group, L} 26 is, ^{-O-L 25} - In addition, a monovalent organic group represented by the above-described single bond or divalent linking group constituting L) is more preferable.

The compounds of the present invention also have the formula:

（式中、Ｘ^１及びＸ^２は上述したとおり、Ｌ^２７は単結合又は二価の連結基）で表されるイソシアヌル酸誘導体化合物と、式：Ｒ^２４−ＯＨ（式中、Ｒ^２４は、−Ｏ−ＣＨ_２ＣＨ（ＯＨ）−Ｌ^２７−とともに、上述したＲ^１を構成する一価の有機基）とを、反応させることにより製造できる。

(Wherein X ¹ and X ² are as described above, L ²⁷ is a single bond or a divalent linking group) and an isocyanuric acid derivative compound represented by the formula: R ²⁴ —OH (where R ²⁴ is It can be produced by reacting —O—CH ₂ CH (OH) —L ²⁷ — with the above-described monovalent organic group constituting R ¹ .

R ²⁴ _{is, -O-CH 2 CH (OH} ) -L 27 - with, since constituting ^{R 1} described above, include the polyether chain is natural. According to this reaction, a monovalent organic group represented by R ²⁴ —O—CH ₂ CH (OH) —L ²⁷ — is generated. As R ²⁴ , R ³ — (OR ² ) _a -L ²⁸ — ((OR ² ) _a is the polyether chain, R ³ is an alkyl group or a fluorinated alkyl group, and L ²⁸ is —O—CH ₂ CH. A monovalent organic group represented by (OH) —L ²⁷ — and the above-described single bond or divalent linking group constituting L) is preferable.

The compounds of the present invention also have the formula:

（式中、Ｘ^１及びＸ^２は上述したとおり、Ｌ^２９は単結合又は二価の連結基）で表されるイソシアヌル酸誘導体化合物と、式：Ｒ^２５−Ｏ−ＳＯ_２Ｒ^２６（式中、Ｒ^２５は、−Ｌ^２９−とともに、上述したＲ^１を構成する一価の有機基、Ｒ^２６は、アルキル基又はフッ素化アルキル基）、又は、Ｒ^２５−Ｘ^２６（式中、Ｒ^２５は上述したとおり、Ｘ^２６はＣｌ、Ｂｒ又はＩ）とを、反応させることにより製造できる。

(Wherein X ¹ and X ² are as described above, L ²⁹ is a single bond or a divalent linking group) and an isocyanuric acid derivative compound represented by the formula: R ²⁵ —O—SO ₂ R ²⁶ (wherein , ^{R 25} is ^{-L 29} - along with a monovalent organic group constituting ^{R 1} described ^{above, R 26} is an alkyl group or a fluorinated alkyl group), ^or, R 25 ^{-X 26 (wherein, R 25} is as described ^{above, X 26} is Cl, Br or I) and can be prepared by reacting.

R ²⁵ is, ^{-L 29} - with, since constituting ^{R 1} described above, include the polyether chain is natural. According to this reaction, a monovalent organic group represented by R ²⁵ -L ^29- is generated. As R ²⁵ , R ³ — (OR ² ) _a -L ³⁰ — ((OR ² ) _a is the above polyether chain, R ³ is an alkyl group or a fluorinated alkyl group, L ³⁰ is —L ²⁹ —, A monovalent organic group represented by the above-described single bond or divalent linking group constituting L) is more preferable.

When either one or both of X ¹ and X ² are the crosslinkable group, even if any of the above reactions, the crosslinkable group and another compound may be reacted after completion of the reaction. Good. For example, when X ¹ is a group containing a double bond (preferably an allyl group), the double bond of X ¹ and the formula: H- {Si (R ^a ) _s (R ^b ) _t (R ^c ) _u (R ^d ) _v } _n (wherein R ^a , R ^b , R ^c , R ^d , s, t, u, v, and n are as described above) and a compound represented by the formula: : -L ^2- {Si (R ^a ) _s (R ^b ) _t (R ^c ) _u (R ^d ) _v } _n (where L ² , R ^a , R ^b , R ^c , R ^d , s, A structure represented by t, u, v and n as described above can be introduced into a compound.
Moreover, among the manufacturing methods described above, a monovalent organic group represented by R ²² —COO—CH ₂ CH (OH) —L ²³ — or R ²⁴ —O—CH ₂ CH (OH) —L ²⁷ In the method of generating a monovalent organic group represented by-, a compound represented by the formula: H- {Si (R ^a ) _s (R ^b ) _t (R ^c ) _u (R ^d ) _v } _n Since it also reacts with the OH group in the organic group, a structure represented by —O— {Si (R ^a ) _s (R ^b ) _t (R ^c ) _u (R ^d ) _v } _n can be introduced into the compound. .
In addition, when X ¹ is a group containing a double bond (preferably an allyl group), oxidation using an oxidizing agent such as metachloroperbenzoic acid, peracetic acid, hydrogen peroxide, or direct air using a catalyst. By carrying out oxidation and epoxidizing the double bond of X ^1, a group containing an epoxy group can be introduced into the compound.
Further, when X ¹ is a group containing a double bond (preferably an allyl group), a group containing acryloyl group or a methacryloyl group by reacting X ¹ double bond with hydroxyalkyl (meth) acrylate. A group containing can be introduced into the compound.

The compounds of the present invention can be used in a variety of applications. Next, examples of uses of the compound of the present invention will be described.

The compounds of the present invention can be used with polymerizable coating monomer. A composition comprising the above-mentioned compound and a polymerizable coating agent monomer is also one aspect of the present invention (sometimes referred to herein as composition (a)). Since the composition (a) has the above-described configuration, it has a large static contact angle with respect to water or n-hexadecane, is transparent, has excellent releasability, is difficult to have a fingerprint, and even if a fingerprint is attached, it is completely wiped off. A coating film is obtained.

In the composition (a), among the above compounds, those in which X ¹ is a monovalent crosslinkable group having photocrosslinkability are suitable.

As the polymerizable coating agent monomer, a monomer having a carbon-carbon double bond is preferable.

Examples of the polymerizable coating agent monomer include, but are not particularly limited to, monofunctional and / or polyfunctional acrylates and methacrylates (hereinafter, acrylates and methacrylates are collectively referred to as “(meth) acrylates”), It means a composition containing a compound that is a monofunctional and / or polyfunctional urethane (meth) acrylate, a monofunctional and / or polyfunctional epoxy (meth) acrylate. The composition for forming the matrix is not particularly limited, but is a composition generally used as a hard coating agent or an antireflection agent, for example, a hard coating agent containing a polyfunctional (meth) acrylate. Or the antireflection agent containing a fluorine-containing (meth) acrylate is mentioned. The hard coating agent is, for example, from Arakawa Chemical Industries, Ltd. as Beam Sets 502H, 504H, 505A-6, 550B, 575CB, 777, 1402 (trade names), from Daicel Cytec Co., Ltd. as EBECRYL 40 (trade names), and HR300. It is commercially available from Yokohama Rubber Co., Ltd. as a system (trade name). The antireflection agent is commercially available, for example, from Daikin Industries, Ltd. as OPTOOL AR-110 (trade name).

The composition (a) is further composed of antioxidants, thickeners, leveling agents, antifoaming agents, antistatic agents, antifogging agents, ultraviolet absorbers, pigments, dyes, inorganic fine particles such as silica, aluminum paste, talc. Further, a filler such as glass frit and metal powder, a polymerization inhibitor such as butylated hydroxytoluene (BHT) and phenothiazine (PTZ) may be included.

It is preferable that the composition (a) further contains a solvent. Examples of the solvent include a fluorine-containing organic solvent or a fluorine-free organic solvent.

Examples of the fluorine-containing organic solvent include perfluorohexane, perfluorooctane, perfluorodimethylcyclohexane, perfluorodecalin, perfluoroalkylethanol, perfluorobenzene, perfluorotoluene, perfluoroalkylamine (Fluorinert (trade name) Etc.), perfluoroalkyl ether, perfluorobutyltetrahydrofuran, polyfluoroaliphatic hydrocarbon (Asahiklin AC6000 (trade name)), hydrochlorofluorocarbon (Asahiklin AK-225 (trade name), etc.), hydrofluoroether (Novec) (Trade name), HFE-7100 (trade name), HFE-7300 (trade name), etc.), 1,1,2,2,3,4,4-heptafluorocyclopentane, fluorine-containing alcohol, Fluoroalkyl bromide, perfluoroalkyl iodide, perfluoropolyether (Crytox (trade name), demnam (trade name), Fomblin (trade name), etc.), 1,3-bistrifluoromethylbenzene, 2-methacrylic acid 2- (Perfluoroalkyl) ethyl, 2- (perfluoroalkyl) ethyl acrylate, perfluoroalkylethylene, Freon 134a, and hexafluoropropene oligomer.

Examples of the fluorine-free organic solvent include acetone, methyl isobutyl ketone, cyclohexanone, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol. Monobutyl ether acetate, dipropylene glycol dimethyl ether pentane, hexane, heptane, octane, dichloromethane, chloroform, carbon tetrachloride, dichloroethane, carbon disulfide, benzene, toluene, xylene, nitrobenzene, diethyl ether, dimethoxyethane, diglyme, triglyme, ethyl acetate , Butyl acetate, dimethylformamide Dimethyl sulfoxide, 2-butanone, acetonitrile, benzonitrile, butanol, 1-propanol, 2-propanol, ethanol, methanol, and diacetone alcohol.

Among them, the solvent is preferably methyl isobutyl ketone, propylene glycol monomethyl ether, hexadecane, butyl acetate, acetone, 2-butanone, cyclohexanone, ethyl acetate, diacetone alcohol or 2-propanol.

The said solvent may be used individually by 1 type, and may be used in combination of 2 or more type.

It is preferable that the said solvent is used in the range of 30-95 mass% in a composition (a). More preferably, it is 50-90 mass%.

For example, an antifouling layer can be formed by applying the composition (a) to a substrate. Moreover, it is also possible to form an antifouling layer by polymerizing after coating. Examples of the substrate include resins (particularly non-fluorine resins), metals, metal oxides, and the like.

Examples of the metal oxide include glass.

If the substrate is glass, from the viewpoint of adhesion between the substrate and the antifouling layer is preferably either or both of X ¹ and X ² are the crosslinkable group. More preferably, one or both of X ¹ and X ² are monovalent Si-containing groups, and more preferably one or both of X ¹ and X ² are silane-containing reactive crosslinking groups.

The compound of the present invention can be used together with a curable resin or a curable monomer. A composition containing the above-described compound and a curable resin or a curable monomer is also one aspect of the present invention (sometimes referred to as a composition (b) in the present specification). Since the composition (b) has the above-described configuration, it is difficult to attach a fingerprint, and a coating film that can be completely wiped off even when a fingerprint is attached is obtained.

The curable resin may be either a photocurable resin or a thermosetting resin, and is not particularly limited as long as it has heat resistance and strength, but a photocurable resin is preferable, and an ultraviolet curable resin is preferable. More preferred.

Examples of the curable resin include acrylic polymers, polycarbonate polymers, polyester polymers, polyamide polymers, polyimide polymers, polyethersulfone polymers, cyclic polyolefin polymers, fluorine-containing polyolefin polymers (PTFE, etc.), Fluorine-containing cyclic amorphous polymer (Cytop (registered trademark), Teflon (registered trademark) AF, etc.) and the like.

Specific examples of the curable resin or the monomer constituting the curable resin include alkyl vinyl ethers such as cyclohexyl methyl vinyl ether, isobutyl vinyl ether, cyclohexyl vinyl ether, and ethyl vinyl ether, glycidyl vinyl ether, vinyl acetate, vinyl pivalate, and various types (meth). Acrylates: Phenoxyethyl acrylate, benzyl acrylate, stearyl acrylate, lauryl acrylate, 2-ethylhexyl acrylate, allyl acrylate, 1,3-butanediol diacrylate, 1,4-butanediol diacrylate, 1,6-hexanediol diacrylate , Trimethylol, propane triacrylate, pentaaerythritol triacrylate, dipentaerythritol Hexahexaacrylate, ethoxyethyl acrylate, methoxyethyl acrylate, glycidyl acrylate, tetrahydrofurfuryl acrylate, diethylene glycol diacrylate, neopentyl glycol diacrylate, polyoxyethylene glycol diacrylate, tripropylene glycol diacrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 4-hydroxybutyl vinyl ether, N, N-diethylaminoethyl acrylate, N, N-dimethylaminoethyl acrylate, N-vinylpyrrolidone, dimethylaminoethyl methacrylate silicon-based acrylate, maleic anhydride, vinylene carbonate, Chain side chain polyacrylate, cyclic side chain polyacrylate polyno Bornene, poly norbornadiene, polycarbonate, polysulfone amide, fluorine-containing cyclic non-crystalline polymer (Cytop (TM) and Teflon (Registered Trademark) AF, etc.) and the like.

The curable monomer may be either a photocurable monomer or a thermosetting monomer, but an ultraviolet curable monomer is preferable.
Examples of the curable monomer include (a) urethane (meth) acrylate, (b) epoxy (meth) acrylate, (c) polyester (meth) acrylate, (d) polyether (meth) acrylate, and (e) silicon. (Meth) acrylate, (f) (meth) acrylate monomer, etc. are mentioned.

Specific examples of the curable monomer include the following.
(A) As urethane (meth) acrylate, poly [(meth) acryloyloxyalkyl] isocyanurate represented by tris (2-hydroxyethyl) isocyanurate diacrylate and tris (2-hydroxyethyl) isocyanurate triacrylate Can be mentioned.
(B) Epoxy (meth) acrylate is obtained by adding a (meth) acryloyl group to an epoxy group, and generally uses bisphenol A, bisphenol F, phenol novolak, and an alicyclic compound as starting materials.
(C) Polyhydric alcohol constituting the polyester part of the polyester (meth) acrylate includes ethylene glycol, 1,4-butanediol, 1,6-hexanediol, diethylene glycol, trimethylolpropane, dipropylene glycol, polyethylene glycol, Examples of the polybasic acid include phthalic acid, adipic acid, maleic acid, trimellitic acid, itaconic acid, succinic acid, terephthalic acid, and alkenyl succinic acid.
Examples of (d) polyether (meth) acrylate include polyethylene glycol di (meth) acrylate, polypropylene glycol di (meth) acrylate, and polyethylene glycol-polypropylene glycol di (meth) acrylate.
(E) Silicon (meth) acrylate is a dimethylpolysiloxane having a molecular weight of 1,000 to 10,000 having one end or both ends modified with a (meth) acryloyl group. Illustrated.

(F) As the (meth) acrylate monomer, methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, isopropyl (meth) acrylate, n-butyl (meth) acrylate, isobutyl (meth) acrylate , Sec-butyl (meth) acrylate, t-butyl (meth) acrylate, n-pentyl (meth) acrylate, 3-methylbutyl (meth) acrylate, n-hexyl (meth) acrylate, 2-ethyl-n-hexyl (meth) ) Acrylate, n-octyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, benzyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate 3-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, 6-hydroxyhexyl (meth) acrylate, 4-hydroxycyclohexyl (meth) acrylate, neopentyl glycol Mono (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) acrylate, (1,1-dimethyl-3-oxobutyl) (meth) acrylate, 2-acetoacetoxyethyl (meth) acrylate, 2-methoxyethyl (Meth) acrylate, 2-ethoxyethyl (meth) acrylate, neopentyl glycol mono (meth) acrylate, 3-chloro-2-hydroxypropyl (meth) acrylate, glycerin mono (meth) acrylate, ester Examples include lenglycol diacrylate, propylene glycol diacrylate, 1,6-hexanediol diacrylate, 1,9-nonanediol diacrylate, 1,10-decanediol diacrylate, trimethylolpropane triacrylate, pentaerythritol tetraacrylate, etc. Is done.

Among the curable resins and curable monomers, the following are preferable examples that can be obtained from the market.

Examples of the curable resin include silicon resins PAK-01, PAK-02 (manufactured by Toyo Gosei Chemical), nanoimprint resin NIF series (manufactured by Asahi Glass Co., Ltd.), nanoimprint resin OCNL series (manufactured by Tokyo Ohka Kogyo Co., Ltd.), NIAC 2310 (Daicel Chemical Industries, Ltd.), epoxy acrylate resins EH-1001, ES-4004, EX-C101, EX-C106, EX-C300, EX-C501, EX-0202, EX-0205, EX-5000, etc. (Kyoeisha Chemical Co., Ltd.) Manufactured), hexamethylene diisocyanate-based polyisocyanates, Sumidur N-75, Sumidur N3200, Sumidur HT, Sumidur N3300, Sumidur N3500 (manufactured by Sumitomo Bayern Urethane Co., Ltd.), and the like.

Among the curable monomers, silicone acrylate resins include Silaplane FM-0611, Silaplane FM-0621, Silaplane FM-0625, Dual-end (meth) acrylic Silaplane FM-7711, Silaplane. FM-7721, Silaplane FM-7725, etc., Silaplane FM-0411, Silaplane FM-0421, Silaplane FM-0428, Silaplane FM-DA11, Silaplane FM-DA21, Silaplane-DA25, single-ended type ( Meta) acrylic silaplane FM-0711, silaplane FM-0721, silaplane FM-0725, silaplane TM-0701, silaplane TM-0701T (manufactured by JCN) and the like.
As polyfunctional acrylates, A-9300, A-9300-1CL, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A-TMM-3LM-N, A -TMPT, A-TMMT (manufactured by Shin-Nakamura Kogyo Co., Ltd.) and the like.
Examples of polyfunctional methacrylates include TMPT (manufactured by Shin-Nakamura Kogyo Co., Ltd.).
Examples of the alkoxysilane group-containing (meth) acrylate include 3- (meth) acryloyloxypropyltrichlorosilane, 3- (meth) acryloyloxypropyltrimethoxysilane, 3- (meth) acryloyloxypropyltriethoxysilane, 3- ( (Meth) acryloyloxypropyl triisopropoxysilane (also known as (triisopropoxysilyl) propyl methacrylate (abbreviation: TISMA) and triisopropoxysilyl) propyl acrylate), 3- (meth) acryloxyisobutyltrichlorosilane, 3- (meth) Examples include acryloxyisobutyltriethoxysilane, 3- (meth) acryloxyisobutyltriisopropoxy 3- (meth) acryloxyisobutyltrimethoxysilane silane, and the like.

It is also preferable that the composition (b) contains a crosslinking catalyst. Examples of the crosslinking catalyst include radical polymerization initiators and acid generators.
The radical polymerization initiator is a compound that generates radicals by heat or light, and examples thereof include a radical thermal polymerization initiator and a radical photopolymerization initiator. In the present invention, the radical photopolymerization initiator is preferable.

Examples of the radical thermal polymerization initiator include diacyl peroxides such as benzoyl peroxide and lauroyl peroxide, dialkyl peroxides such as dicumyl peroxide and di-t-butyl peroxide, diisopropyl peroxydicarbonate, Peroxycarbonates such as bis (4-t-butylcyclohexyl) peroxydicarbonate, peroxide compounds such as alkyl peresters such as t-butylperoxyoctoate and t-butylperoxybenzoate, and azobisiso Examples include radical-generating azo compounds such as butyronitrile.

Examples of the radical photopolymerization initiator include -diketones such as benzyl and diacetyl, acyloins such as benzoin, acyloin ethers such as benzoin methyl ether, benzoin ethyl ether, and benzoin isopropyl ether, thioxanthone, 2,4- Thioxanthones such as diethylthioxanthone and thioxanthone-4-sulfonic acid, benzophenones, benzophenones such as 4,4′-bis (dimethylamino) benzophenone, 4,4′-bis (diethylamino) benzophenone, acetophenone, 2- (4- Toluenesulfonyloxy) -2-phenylacetophenone, p-dimethylaminoacetophenone, 2,2′-dimethoxy-2-phenylacetophenone, p-methoxyacetophenone, 2-methyl [4- (methyl A) Phenyl] -2-morpholino-1-propanone, acetophenones such as 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, anthraquinone, 1,4-naphthoquinone, etc. Quinones, ethyl 2-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate (n-butoxy), isoamyl 4-dimethylaminobenzoate, 2-ethylhexyl 4-dimethylaminobenzoate And the like, aminobenzoic acids such as phenacyl chloride, halogen compounds such as trihalomethylphenylsulfone, acylphosphine oxides, peroxides such as di-t-butyl peroxide, and the like.

The following are illustrated as a commercial item of the said radical photoinitiator.
IRGACURE 651: 2,2-dimethoxy-1,2-diphenylethane-1-one,
IRGACURE 184: 1-hydroxy-cyclohexyl-phenyl-ketone,
IRGACURE 2959: 1- [4- (2-hydroxyethoxy) -phenyl] -2-hydroxy-2-methyl-1-propan-1-one
IRGACURE 127: 2-Hydroxy-1- {4- [4- (2-hydroxy-2-methyl-propionyl) -benzyl] phenyl} -2-methyl-propan-1-one,
IRGACURE 907: 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one,
IRGACURE 369: 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butanone-1,
IRGACURE 379: 2- (dimethylamino) -2-[(4-methylphenyl) methyl] -1- [4- (4-morpholinyl) phenyl] -1-butanone,
IRGACURE 819: bis (2,4,6-trimethylbenzoyl) -phenylphosphine oxide,
IRGACURE 784: bis (η5-2,4-cyclopentadien-1-yl) -bis (2,6-difluoro-3- (1H-pyrrol-1-yl) -phenyl) titanium,
IRGACURE OXE 01: 1,2-octanedione, 1- [4- (phenylthio)-, 2- (O-benzoyloxime)],
IRGACURE OXE 02: ethanone, 1- [9-ethyl-6- (2-methylbenzoyl) -9H-carbazol-3-yl]-, 1- (0-acetyloxime),
IRGACURE261, IRGACURE369, IRGACURE500,
DAROCUR 1173: 2-hydroxy-2-methyl-1-phenyl-propan-1-one,
DAROCUR TPO: 2,4,6-trimethylbenzoyl-diphenyl-phosphine oxide,
DAROCUR1116, DAROCUR2959, DAROCUR1664, DAROCUR4043,
IRGACURE 754 oxyphenylacetic acid: a mixture of 2- [2-oxo-2-phenylacetoxyethoxy] ethyl ester and oxyphenylacetic acid, 2- (2-hydroxyethoxy) ethyl ester,
IRGACURE 500: mixture of IRGACURE 184 and benzophenone (1: 1),
IRGACURE 1300: mixture of IRGACURE 369 and IRGACURE 651 (3: 7),
IRGACURE 1800: mixture of CGI403 and IRGACURE 184 (1: 3),
IRGACURE 1870: a mixture of CGI403 and IRGACURE 184 (7: 3),
DAROCUR 4265: A mixture of DAROCUR TPO and DAROCUR 1173 (1: 1).
IRGACURE is manufactured by BASF, and DAROCUR is manufactured by Merck Japan.

When a radical photopolymerization initiator is used as the crosslinking catalyst, diethylthioxanthone, isopropylthioxanthone, or the like can be used in combination as a sensitizer, and DAROCUR EDB (ethyl-4-dimethylaminobenzoate) can be used as a polymerization accelerator. ), DAROCUR EHA (2-ethylhexyl-4-dimethylaminobenzoate) or the like may be used in combination.

When the sensitizer is used, the amount of the sensitizer is preferably 0.1 to 5 parts by mass with respect to 100 parts by mass of the curable resin or the curable monomer. More preferably, it is 0.1-2 mass parts.
Moreover, as a compounding quantity of the polymerization accelerator in the case of using the said polymerization accelerator, it is preferable that it is 0.1-5 mass parts with respect to 100 mass parts of the said curable resin or the said curable monomer. More preferably, it is 0.1-2 mass parts.

The acid generator is a material that generates an acid by applying heat or light, and examples thereof include a thermal acid generator and a photoacid generator. In the present invention, a photoacid generator is preferred.
Examples of the thermal acid generator include benzoin tosylate, nitrobenzyl tosylate (particularly 4-nitrobenzyl tosylate), and alkyl esters of other organic sulfonic acids.

The photoacid generator is composed of a chromophore that absorbs light and an acid precursor that becomes an acid after decomposition. By irradiating the photoacid generator having such a structure with light of a specific wavelength, The acid generator is excited and acid is generated from the acid precursor portion.
Examples of the photoacid generator include diazonium salts, phosphonium salts, sulfonium salts, iodonium salts, CF ₃ SO ₃ , p-CH ₃ PhSO ₃ , and p-NO ₂ PhSO ₃ (where Ph is a phenyl group). Examples thereof include salts, organic halogen compounds, orthoquinone-diazide sulfonyl chloride, and sulfonic acid esters. Other photoacid generators include 2-halomethyl-5-vinyl-1,3,4-oxadiazole compounds, 2-trihalomethyl-5-aryl-1,3,4-oxadiazole compounds, 2-trihalo Examples include methyl-5-hydroxyphenyl-1,3,4-oxadiazole compounds.
The organic halogen compound is a compound that forms hydrohalic acid (for example, hydrogen chloride).

The following are illustrated as a commercial item of the said photo-acid generator.
WPAG-145 [bis (cyclohexylsulfonyl) diazomethane], WPAG-170 [bis (t-butylsulfonyl) diazomethane], WPAG-199 [bis (p-toluenesulfonyl) diazomethane], WPAG-281, manufactured by Wako Pure Chemical Industries, Ltd. [Triphenylsulfonium trifluoromethanesulfonate], WPAG-336 [diphenyl-4-methylphenylsulfonium trifluoromethanesulfonate], WPAG-367 [diphenyl-2,4,6-trimethylphenylsulfonium p-toluenesulfonate], Ciba Specialty IRGACURE PAG103 [(5-propylsulfonyloxymino-5H-thiophen-2-ylidene)-(2-methylphenyl) acetonitrile] manufactured by Chemicals, IRG ACURE PAG108 [(5-octylsulfonyloxymino-5H-thiophen-2-ylidene)-(2-methylphenyl) acetonitrile)], IRGACURE PAG121 [(5-p-toluenesulfonyloxymino-5H-thiophen-2-ylidene) )-(2-methylphenyl) acetonitrile], IRGACURE PAG203, CGI725, TFE-triazine [2- [2- (furan-2-yl) ethenyl] -4,6-bis (trichloromethyl) manufactured by Sanwa Chemical Co., Ltd. -S-triazine], TME-triazine [2- [2- (5-methylfuran-2-yl) ethenyl] -4,6-bis (tri-chloromethyl) -s-triazine] MP-triazine [2- (Methoxyphenyl) -4,6-bis (trichloromethyl) -s-to Azine, dimethoxy [2- [2- (3,4-dimethoxyphenyl) ethenyl] -4,6-bis (tri - chloromethyl) -s-triazine.

As a compounding quantity of the said crosslinking catalyst, it is preferable that it is 0.1-10 mass parts with respect to 100 mass parts of the said curable resin or the said curable monomer. In such a range, a sufficient cured product can be obtained. More preferably, it is 0.3-5 mass parts as a compounding quantity of the said crosslinking catalyst, More preferably, it is 0.5-2 mass parts.

Moreover, when using the said acid generator as said crosslinking catalyst, you may control the spreading | diffusion of the acid generate | occur | produced from the said acid generator by adding an acid scavenger as needed.
The acid scavenger is not particularly limited, but a basic compound such as an amine (particularly an organic amine), a basic ammonium salt, or a basic sulfonium salt is preferable. Among these acid scavengers, organic amines are more preferable because of excellent image performance.

Specific examples of the acid scavenger include 1,5-diazabicyclo [4.3.0] -5-nonene, 1,8-diazabicyclo [5.4.0] -7-undecene, 1,4- Diazabicyclo [2.2.2] octane, 4-dimethylaminopyridine, 1-naphthylamine, piperidine, hexamethylenetetramine, imidazoles, hydroxypyridines, pyridines, 4,4'-diaminodiphenyl ether, pyridinium p-toluenesulfonate 2,4,6-trimethylpyridinium p-toluenesulfonate, tetramethylammonium p-toluenesulfonate, tetrabutylammonium lactate, triethylamine, tributylamine and the like. Among these, 1,5-diazabicyclo [4.3.0] -5-nonene, 1,8-diazabicyclo [5.4.0] -7-undecene, 1,4-diazabicyclo [2.2.2] Organic amines such as octane, 4-dimethylaminopyridine, 1-naphthylamine, piperidine, hexamethylenetetramine, imidazoles, hydroxypyridines, pyridines, 4,4′-diaminodiphenyl ether, triethylamine, and tributylamine are preferred.

The amount of the acid scavenger is preferably 20 parts by mass or less, more preferably 0.1 to 10 parts by mass, and still more preferably 0.5 to 100 parts by mass with respect to 100 parts by mass of the acid generator. 5 parts by mass.

The composition (b) may contain a solvent. Examples of the solvent include water-soluble organic solvents, organic solvents (particularly oil-soluble organic solvents), water, and the like.
Examples of the water-soluble organic solvent include acetone, methyl ethyl ketone, methyl amyl ketone, ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate (PGMEA), dipropylene glycol, dipropylene glycol monomethyl ether, and dipropylene. Glycol dimethyl ether, dipropylene glycol monomethyl ether acetate, dipropylene glycol diacetate, tripropylene glycol, 3-methoxybutyl acetate (MBA), 1,3-butylene glycol diacetate, cyclohexanol acetate, dimethylformamide, dimethyl sulfoxide, methyl cellosolve , Cellosolve acetate, butyl cellosolve, butylcal , Carbitol acetate, ethyl lactate, isopropyl alcohol, methanol, ethanol and the like.
Examples of the organic solvent include chloroform, HFC141b, HCHC225, hydrofluoroether, pentane, hexane, heptane, octane, cyclohexane, benzene, toluene, xylene, petroleum ether, tetrahydrofuran, 1,4-dioxane, methyl isobutyl ketone, acetic acid. Examples include butyl, 1,1,2,2-tetrachloroethane, 1,1,1-trichloroethane, trichloroethylene, perchloroethylene, tetrachlorodifluoroethane, trichlorotrifluoroethane, and the like.
These solvents may be used alone or in combination of two or more.
As the solvent, PGMEA and MBA are particularly preferable from the viewpoints of solubility and safety of components contained in the resist composition.

It is preferable that the said solvent is used in 30-95 mass% in a composition (b). More preferably, it is 50-90 mass%.

For example, a resist film can be formed by applying the composition (b) to a substrate. Examples of the material for the substrate include silicon, synthetic resin, glass, metal, and ceramic.

Examples of the synthetic resin include cellulose resins such as triacetyl cellulose (TAC), polyolefins such as polyethylene, polypropylene, ethylene-propylene copolymer, and ethylene-vinyl acetate copolymer (EVA), cyclic polyolefin, and modified Polyolefin, polyvinyl chloride, polyvinylidene chloride, polystyrene, polyamide, polyimide, polyamideimide, polycarbonate, poly- (4-methylpentene-1), ionomer, acrylic resin, polymethyl methacrylate, acrylic-styrene copolymer (AS Resin), butadiene-styrene copolymer, ethylene-vinyl alcohol copolymer (EVOH), polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polycyclohexane terephthalate. Polyester such as PCT, polyether, polyetherketone (PEK), polyetheretherketone (PEEK), polyetherimide, polyacetal (POM), polyphenylene oxide, modified polyphenylene oxide, polyarylate, aromatic polyester (liquid crystal Polymer), polytetrafluoroethylene, polyvinylidene fluoride, other fluororesins, styrene, polyolefin, polyvinyl chloride, polyurethane, fluororubber, chlorinated polyethylene, and other thermoplastic elastomers, epoxy resins, phenols Resins, urea resins, melamine resins, unsaturated polyesters, silicone resins, polyurethanes, etc., or copolymers, blends, polymer alloys, etc. mainly comprising these, It can be used in combination of two or more (e.g., as a laminate of two or more layers).

The resist film can be used for nanoimprinting. For example, a step of pressing a mold having a fine pattern formed on the surface of the resist film to transfer the fine pattern, a step of curing the resist film on which the transfer pattern is formed to obtain a resist cured product having a transfer pattern, And the resist transfer material by which pattern transfer was carried out can be obtained by the manufacturing method including the process of releasing the resist cured material from the mold.

The compounds of the present invention can be used with a solvent. A composition containing the above-mentioned compound and a solvent is also one aspect of the present invention (sometimes referred to as composition (c) in the present specification).

In the composition (c), the concentration of the compound is preferably 0.001 to 1% by mass, more preferably 0.005 to 0.5% by mass, and still more preferably 0.01 to 0.2% by mass.

As the solvent, a fluorinated solvent is preferable. Examples of the fluorine-based inert solvent include perfluorohexane, perfluoromethylcyclohexane, perfluoro-1,3-dimethylcyclohexane, dichloropentafluoropropane (HCFC-225), and the like.

The composition (c) also preferably contains a fluorine-containing oil. As the fluorine-containing oil,
_{^{Wherein: R 111 - (R 112 O}} ) m -R 113
(R ¹¹¹ and R ¹¹³ are independently F, an alkyl group having 1 to 16 carbon atoms, a fluorinated alkyl group having 1 to 16 carbon atoms, -R ¹¹⁴ -X ¹¹¹ (R ¹¹⁴ is a single bond or 1 to 1 carbon atoms) 16 alkylene ^group, X ₁₁₁ is _{-NH 2, -OH, -COOH, -CH} = CH 2, -OCH 2 CH = CH 2, halogen, phosphoric acid, phosphoric acid esters, carboxylic acid esters, thiols, thioethers, alkyl A compound represented by ether (which may be substituted with fluorine), aryl, aryl ether, amide), R ¹¹² is a fluorinated alkylene group having 1 to 4 carbon atoms, and m is an integer of 2 or more is more preferable.

R ¹¹¹ and R ¹¹³ are independently F, an alkyl group having 1 to 3 carbon atoms, a fluorinated alkyl group having 1 to 3 carbon atoms, or —R ¹¹⁴ —X ¹¹¹ (where R ¹¹⁴ and X ¹¹¹ are as described above). F, a fully fluorinated alkyl group having 1 to 3 carbon atoms, or —R ¹¹⁴ —X ¹¹¹ (R ¹¹⁴ is a single bond or an alkylene group having 1 to 3 carbon atoms, X ¹¹¹ is —OH or —OCH ₂ CH═ CH ₂ ) is more preferred.

As m, an integer of 300 or less is preferable, and an integer of 100 or less is more preferable.

R ¹¹² is preferably a fully fluorinated alkylene group having 1 to 4 carbon atoms. As -R ¹¹² O-, for example,
Formula _{^{:-( CX 112 2 CF 2 CF 2}} O) n111 (CF (CF 3) CF 2 O) n112 (CF 2 CF 2 O) n113 (CF 2 O) n114 (C 4 F 8 O) n115 -
(N111, n112, n113, n114 and n115 are independently 0 or an integer of 1 or ^{more, X 112} is H, F or Cl, and the order of the repeating units is arbitrary in a) those represented by,
Formula _{^{:-( OC 2 F 4 -R 118)}} f -
(R ¹¹⁸ is a group selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ , and f is an integer of 2 to 100).

n111 to n115 are each preferably an integer of 0 to 200. n111 to n115 are preferably 1 or more in total, more preferably 5 to 300, still more preferably 10 to 200, and particularly preferably 10 to 100.

R ¹¹⁸ is a group selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ , or a combination of 2 or 3 groups independently selected from these groups. The combination of 2 or 3 groups independently selected from OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ is not particularly limited. For example, —OC ₂ F ₄ OC ₃ F ₆ —, —OC _{2 F 4 OC 4 F 8 -} , - OC 3 F 6 OC 2 F 4 -, - OC 3 F 6 OC 3 F 6 -, - OC 3 F 6 OC 4 F 8 -, - OC 4 F 8 OC 4 F _{8 -, - OC 4 F 8} OC 3 F 6 -, - OC 4 F 8 OC 2 F 4 -, - OC 2 F 4 OC 2 F 4 OC 3 F 6 -, - OC 2 F 4 OC 2 F 4 OC _{4 F 8 -, - OC 2} F 4 OC 3 F 6 OC 2 F 4 -, - OC 2 F 4 OC 3 F 6 OC 3 F 6 -, - OC 2 F 4 OC 4 F 8 OC 2 F 4 -, _{-OC 3 F 6 OC 2 F 4} OC 2 F 4 -, - OC 3 F 6 OC 2 _{F 4 OC 3 F 6 -,} - OC 3 F 6 OC 3 F 6 OC 2 F 4 -, and _{-OC 4 F 8 OC 2 F 4} OC 2 F 4 - , and the like. Said f is an integer of 2-100, Preferably it is an integer of 2-50. In the above formula, OC ₂ F ₄ , OC ₃ F ₆ and OC ₄ F ₈ may be either linear or branched, preferably linear. In this embodiment, the formula: — (OC ₂ F ₄ —R ¹¹⁸ ) _f — is preferably the formula: — (OC ₂ F ₄ —OC ₃ F ₆ ) _f — or the formula: — (OC ₂ F ₄ —OC ₄ F ₈ ) _f −.

The fluoropolyether preferably has a weight average molecular weight of 500 to 100,000, more preferably 50000 or less, still more preferably 10,000 or less, and particularly preferably 6000 or less. The weight average molecular weight can be measured by gel permeation chromatography (GPC).

Examples of the commercially available fluoropolyether include demnum (manufactured by Daikin Industries), fomblin (manufactured by Solvay Specialty Polymers Japan), varielta (manufactured by NOK Kluber), and Krytox (manufactured by DuPont). Can be mentioned.

A release layer can be formed on the substrate using the composition (c). The release layer is a method of immersing the substrate in the composition (c), a method of exposing the substrate to vapor of the composition (c) and vapor-depositing, and printing the composition (c) on the substrate. And a method of applying the composition (c) to the substrate using an inkjet. You may dry after the said immersion, the said vapor deposition, the said printing, and the said application | coating. As the substrate, a mold having a concavo-convex pattern can be used, and the mold having a release layer can be used for nanoimprinting.

When either one or both of X ¹ and X ^{2 is} the crosslinkable group, the release layer can be firmly bonded to the substrate.
Moreover, when both X ¹ and X ² are groups different from the crosslinkable group, the release layer can be easily removed from the substrate. For example, if the mold release layer is formed on the mold and used for nanoimprinting, the compound can be attached to the transferred material to provide mold release properties.

Examples of the substrate include metals, metal oxides, polymer resins such as quartz and silicone, semiconductors, insulators, and composites thereof.

This invention is also an antifouling agent characterized by including the above-mentioned compound or the above-mentioned composition.

The antifouling agent can be used by being applied to a substrate such as resin (particularly non-fluorine resin), metal, glass or the like.

The antifouling agent can be used for various articles (particularly optical materials) that require surface antifouling properties and swelling properties. Examples of articles include PDP, LCD display front protection plate, antireflection plate, polarizing plate, anti-glare plate, cellular phone, portable information terminal and other devices, touch panel sheet, DVD disc, CD-R, MO, etc. , Eyeglass lenses, and optical fibers.

An optical material such as an optical disk is used in a carbon-carbon double bond-containing composition or a polymer composed of a carbon-carbon double bond-containing composition, a carbon-carbon double bond-containing composition, and a carbon-carbon double bond. It is preferable that the surface coating is performed by a film formed by adding the perfluoropolyether (PFPE) content in the polymer of the contained monomer so as to be 0.01 wt% to 10 wt%. When the content is from 0.01% by weight to 10% by weight, the characteristic physical properties (antifouling, etc.) of PFPE addition appear, the surface hardness is high, and the transmittance is high.

This invention is also a mold release agent characterized by including the above-mentioned compound or the above-mentioned composition.

A release layer can be formed on the substrate from the release agent. The release layer includes a method of immersing the substrate in the release agent, a method of exposing the substrate to vapor of the release agent and vapor-depositing, a method of printing the composition on the substrate, and an inkjet. And a method of applying the composition to the substrate. You may dry after the said immersion, the said vapor deposition, the said printing, and the said application | coating. As the substrate, a mold having a concavo-convex pattern can be used, and the mold having a release layer can be used for nanoimprinting.

Examples of the substrate include metals, metal oxides, polymer resins such as quartz and silicone, semiconductors, insulators, and composites thereof.

Next, the present invention will be described with reference to examples, but the present invention is not limited to such examples. In this example, the chemical formulas shown below all show an average composition, and the repeating units constituting the perfluoropolyether (for example, —CF ₂ CF ₂ CF ₂ O—, —CF ₂ CF ₂ O—, — The order in which CF ₂ O— is present is arbitrary.

Each numerical value of the examples was measured by the following method.

(Static contact angle)
The static contact angle was measured by the following method using a fully automatic contact angle meter DropMaster 700 (manufactured by Kyowa Interface Science Co., Ltd.).
<Measurement method of static contact angle>
The static contact angle was determined by dropping 2 μL of water or n-hexadecane from a microsyringe onto a horizontally placed substrate and taking a still image one second after dropping with a video microscope.

Example 1 Production Method of Perfluoropolyether (PFPE) -containing Compound (A) CF ₃ CF ₂ CF ₂ O— (CF ₂ CF ₂ CF ₂ O) ₁₁ —CF ₂ CF ₂ CH ₂ OH 34 g and 1 , 3-diallyl-5- (2-chloroethyl) isocyanurate (6 g) was dissolved in a mixed solvent of m-hexafluoroxylene and diethylene glycol dimethyl ether. 20 g of a 20% by weight aqueous solution of potassium hydroxide and 4 g of tetrabutylammonium bromide were added and heated with stirring. The end point of the reaction was confirmed by ¹⁹ F-NMR and ¹ H-NMR. The reaction solution was concentrated and extracted to obtain a PFPE-containing compound (A).
PFPE-containing compound (A):

Example 2 Process for producing perfluoropolyether (PFPE) -containing compound (B) 1,3-diallyl-5- (2-chloroethyl) isocyanurate of Example 1 was converted to 1,3-diallyl-5-glycidyl isocyanurate. A PFPE-containing compound (B) was obtained in the same manner as in Example 1 except that the amount was changed to 6.2 g.
PFPE-containing compound (B):

Example 3 Production Method of Perfluoropolyether (PFPE) -containing Compound (C) 2.0 g of 1,3-diallyl-isocyanuric acid was dissolved in a mixed solvent of m-hexafluoroxylene and dimethylformamide. 1.0 g of potassium carbonate was added and heated with stirring. m- hexafluoro-xylene dissolved _{CF 3 CF 2 CF 2 O- (} CF 2 CF 2 CF 2 O) 23 -CF 2 CF 2 CH 2 - continued added trifluoromethanesulfonic acid ester 4.0g further heating and stirring It was. The end point of the reaction was confirmed by ¹⁹ F-NMR and ¹ H-NMR. PFPE-containing compound (C) was obtained by adding pure water to the reaction liquid and separating the liquid.
PFPE-containing compound (C):

Example 4 Production Method of Perfluoropolyether (PFPE) -containing Compound (D) CF ₃ CF ₂ CF ₂ O— (CF ₂ CF ₂ CF ₂ O) ₂₃ —CF ₂ CF ₂ CH ₂ —Trifluoromethane of Example 3 except for changing the sulfonic acid ester _{4.0g CF 3 CF 2 CF 2 O-} (CF 2 CF 2 CF 2 O) 11 -CF 2 CF 2 CH 2 Cl, to 8.0g, the same procedure as in example 3 A PFPE-containing compound (D) was obtained.

Example 5 Production Method of Perfluoropolyether (PFPE) -containing Compound (E) 30 ml of m-hexafluoroxylene and 11.1 g of metachloroperbenzoic acid were placed in a reactor and heated to 60 ° C. with stirring. To this was added dropwise PFPE-containing compound (D) 10 g dissolved in 10 ml of m-hexafluoroxylene. Then, it stirred at 60 degreeC. The end point of the reaction was confirmed by ¹⁹ F-NMR and ¹ H-NMR. The reaction solution was returned to room temperature, the precipitated white solid was filtered off, and the filtrate was concentrated to 20 ml. The precipitated white solid was dissolved by adding 10 ml of diethyl ether, and the lower oil component was collected. The residual solvent was distilled off from the oil to obtain a PFPE-containing compound (E).
PFPE-containing compound (E):

Example 6 Production Method of Perfluoropolyether (PFPE) -containing Compound (F) 2.0 g of 2-hydroxyethyl acrylate was dissolved in a mixed solvent of m-hexafluoroxylene and dimethylformamide. Potassium carbonate 1.0g was added, and it heated up at 40 degreeC and stirred. To this reaction solution, 4.0 g of a PFPE-containing compound (E) dissolved in m-hexafluoroxylene was added, and the mixture was further heated and stirred. The end point of the reaction was confirmed by ¹⁹ F-NMR and ¹ H-NMR. PFPE-containing compound (F) was obtained by adding pure water to the reaction liquid and separating the liquid.
PFPE-containing compound (F):

<Characteristic evaluation of cured film>
Beamset 575CB (made by Arakawa Chemical Industries) 6.0g, Irgacure 907 (made by BASF) 120mg, PFPE containing compound (A), (B), (D), (E), (F) ) Was added to 2% by mass of the whole, and the mixture was stirred overnight with a rotary mixer under light shielding to obtain PFPE-containing hard coat materials 1 to 5. Hard coat material obtained in the same manner as above except that the PFPE-containing compound (A), (B), (D), (E), (F) was changed to DAC-HP (manufactured by Daikin Industries, Ltd.) Was designated as Comparative Example 1. A hard coat material consisting only of a beam set 575CB (made by Arakawa Chemical Industries, Ltd.) containing no PFPE-containing compound was used as Comparative Example 2.
10 μL of each hard coat material was placed on a slide glass, and a uniform coating film was formed with a bar coater. This was irradiated with a light beam containing 365 nm UV light in a nitrogen atmosphere at an intensity of 500 mJ / cm ² to cure each hard coat material to obtain a cured film. The static contact angles of these cured films were measured.
(appearance)
The appearance of the cured film was confirmed visually. Evaluation was based on the following criteria.
○: Transparent ×: Whitening (releasability)
The releasability of the cured film was evaluated by a tape peeling test. Evaluation was based on the following criteria.
○: Easily peels off or does not stick.
X: The adhesive layer of a tape adheres.
(Fingerprint adhesion)
A finger was pressed against the cured film, and the ease of fingerprint attachment was visually determined. Evaluation was based on the following criteria.
○: Fingerprints are not easily attached or fingerprints are not conspicuous even if attached.
X: A fingerprint is clearly attached.
(Fingerprint wiping property)
After the above fingerprint adhesion test, the attached fingerprint was wiped 5 times with Kimwipe (trade name, manufactured by Tojo Kimberley Co., Ltd.), and the ease of wiping the attached fingerprint was visually determined. Evaluation was based on the following criteria.
○: Fingerprints can be completely wiped off.
X: The fingerprint wiping trace spreads and is difficult to remove.
Table 1 shows the results obtained in each evaluation.

Example 7 Production Method of Perfluoropolyether (PFPE) -containing Compound (G) 10.1 g of PFPE-containing compound (C), 40 g of m-hexafluoroxylene, 0.04 g of triacetoxymethylsilane, and 1 of trichlorosilane .93 g was charged and stirred at 10 ° C. for 30 minutes. Subsequently, 0.115 ml of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, followed by stirring with heating for 4 hours. Then, after distilling off volatile components under reduced pressure, a mixed solution of 0.23 g of methanol and 6.1 g of trimethyl orthoformate was added, followed by heating and stirring for 3 hours. Thereafter, purification was performed to obtain 9.9 g of the following PFPE-containing compound (G) having a trimethoxysilyl group at the terminal.
PFPE-containing compound (G):

Example 8 Production Method of Perfluoropolyether (PFPE) -containing Compound (H) 10.0 g of PFPE-containing compound (A), 30 g of m-hexafluoroxylene, 0.06 g of triacetoxymethylsilane, and 3 of trichlorosilane .85 g was charged and stirred at 10 ° C. for 30 minutes. Subsequently, 0.210 ml of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, followed by stirring with heating for 3 hours. Then, after distilling off volatile components under reduced pressure, a mixed solution of 0.31 g of methanol and 7.5 g of trimethyl orthoformate was added, followed by heating and stirring for 3 hours. Thereafter, purification was performed to obtain 9.8 g of the following PFPE-containing compound (H) having a trimethoxysilyl group at the terminal.
PFPE-containing compound (H):

Example 9 Production Method of Perfluoropolyether (PFPE) -containing Compound (I) The PFPE-containing compound (A) of Example 8 was changed to a PFPE-containing compound (B), and the amount of trichlorosilane charged was changed to 4.75 g. PFPE containing compound (I) was obtained like Example 8 except having carried out.
PFPE-containing compound (I):

Example 10 Production Method of Perfluoropolyether (PFPE) -containing Compound (J) 10.2 g of PFPE-containing compound (D), 30 g of m-hexafluoroxylene, 0.06 g of triacetoxymethylsilane, and 3 of trichlorosilane .85 g was charged and stirred at 10 ° C. for 30 minutes. Subsequently, 0.220 ml of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, followed by stirring with heating for 4 hours. Then, after distilling off volatile components under reduced pressure, a mixed solution of 0.30 g of methanol and 7.5 g of trimethyl orthoformate was added, followed by stirring with heating for 3 hours. Thereafter, purification was performed to obtain 10.0 g of the following PFPE-containing compound (J) having a trimethoxysilyl group at the terminal.
PFPE-containing compound (J):

Example 11 Production Method of Perfluoropolyether (PFPE) -containing Compound (L) CF ₃ O— (CF ₂ CF ₂ O) _m (CF ₂ O) _n CF ₂ CH ₂ OH (m = 22, n) = 19) 33 g and 7.1 g of 1,3-diallyl-5- (2-chloroethyl) isocyanurate were dissolved in a mixed solvent of m-hexafluoroxylene and diethylene glycol dimethyl ether. 15 g of a 20 wt% potassium hydroxide aqueous solution and 3 g of tetrabutylammonium bromide were added and heated with stirring. The end point of the reaction was confirmed by ¹⁹ F-NMR and ¹ H-NMR. The reaction solution was concentrated and extracted to obtain a PFPE-containing compound (K).
PFPE-containing compound (K):

Subsequently, the following PFPE-containing compound (L) having a trimethoxysilyl group at the terminal was obtained in the same manner as in Example 7 except that the PFPE-containing compound (C) in Example 7 was changed to the PFPE-containing compound (K). 9.6 g was obtained.
PFPE-containing compound (L):

Example 12 Production Method of Perfluoropolyether (PFPE) -containing Compound (N) 2.0 g of 1,3-diallyl-isocyanuric acid was dissolved in a mixed solvent of m-hexafluoroxylene and dimethylformamide. 1.0 g of potassium carbonate was added and heated with stirring. _CF 3 _O-dissolved in m- hexafluoro-xylene _{(CF 2 CF 2 O) m} (CF 2 O) n CF 2 CH 2 - trifluoromethanesulfonic acid ester (m = 22, n = 19 ) 4.0g was added Further heating and stirring were continued. The end point of the reaction was confirmed by ¹⁹ F-NMR and ¹ H-NMR. PFPE-containing compound (M) was obtained by adding pure water to the reaction liquid and separating the liquid.
PFPE-containing compound (M):

Subsequently, the following PFPE-containing compound (N) having a trimethoxysilyl group at the terminal was obtained in the same manner as in Example 7 except that the PFPE-containing compound (C) in Example 7 was changed to the PFPE-containing compound (M). 9.8 g was obtained.
PFPE-containing compound (N):

Example 13 Production Method of Perfluoropolyether (PFPE) -containing Compound (P) 10.0 g of PFPE-containing compound (C), 40 g of m-hexafluoroxylene, 0.04 g of triacetoxymethylsilane, and 1 of trichlorosilane .93 g was charged and stirred at 10 ° C. for 30 minutes. Subsequently, 0.115 ml of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, followed by stirring with heating for 4 hours. Then, after distilling off volatile components under reduced pressure, 15 g of m-hexafluoroxylene was added, and after adding 22 ml of tetrahydrofuran solution containing 1.0 mol / L of allylmagnesium chloride in an ice bath, the temperature was raised to room temperature. Stir at this temperature for 10 hours. Thereafter, the mixture was cooled to 5 ° C., 3 ml of methanol was added, perfluorohexane was added, and the mixture was stirred for 30 minutes. Thereafter, the perfluorohexane layer was separated with a separatory funnel. Subsequently, volatile components were distilled off under reduced pressure to obtain 9.4 g of a PFPE-containing compound (O) having an allyl group at the terminal.
PFPE-containing compound (O):

Subsequently, 9.0 g of PFPE-containing compound (O), 30 g of m-hexafluoroxylene, 0.08 g of triacetoxymethylsilane, and 5.60 g of trichlorosilane were charged and stirred at 10 ° C. for 30 minutes. Subsequently, 0.297 ml of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, followed by stirring with heating for 4 hours. Then, after distilling off volatile components under reduced pressure, a mixed solution of 0.57 g of methanol and 14.1 g of trimethyl orthoformate was added, followed by heating and stirring for 3 hours. Thereafter, purification was performed to obtain 9.1 g of the following PFPE-containing compound (P) having a trimethoxysilyl group at the terminal.
PFPE-containing compound (P):

Example 14 Production Method of Perfluoropolyether (PFPE) -containing Compound (R)
10.0 g of PFPE-containing compound (M), 45 g of m-hexafluoroxylene, 0.04 g of triacetoxymethylsilane, and 1.41 g of dichloromethylsilane were charged and stirred at 10 ° C. for 30 minutes. Subsequently, 0.136 ml of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, followed by heating and stirring. Then, after distilling off volatile components, 15 ml of vinylmagnesium chloride (1.6M THF solution) was added and stirred at room temperature. Thereafter, purification was performed to obtain 9.5 g of the following PFPE-containing compound (Q) having a methyldivinylsilyl group at the terminal.
PFPE-containing compound (Q):

Subsequently, 9.5 g of PFPE-containing compound (Q), 42 g of m-hexafluoroxylene, 0.04 g of triacetoxymethylsilane, and 2.30 g of trichlorosilane were charged and stirred at 10 ° C. for 30 minutes. Subsequently, 0.230 ml of a xylene solution containing 2% of a Pt complex of 1,3-divinyl-1,1,3,3-tetramethyldisiloxane was added, followed by stirring with heating for 4 hours. Then, after distilling off volatile components, a mixed solution of 0.30 g of methanol and 7.56 g of trimethyl orthoformate was added, followed by heating and stirring. Thereafter, purification was performed to obtain 9.6 g of the following PFPE-containing compound (R) having a trimethoxysilyl group at the terminal.
PFPE-containing compound (R):

Examples 15-22
The PFPE-containing compounds (G), (H), (I), (J), (L), (N), (P), and (R) obtained in Examples 7 to 14 have a concentration of 1 mass%. As described above, surface treatment agents (1) to (8) were prepared by dissolving in hydrofluoroether (manufactured by 3M, Novec HFE-7300).

Comparative Examples 3-5
PFPE-containing compounds (G), (H), (I), (J), (L), (N), (P), and (R) are used instead of the following control compounds (1) to (3). Comparative surface treatment agents (1) to (3) were prepared in the same manner as in Examples 15 to 22 except that the above were observed.
Control compound (1)

Control compound (2)

Control compound (3)

The surface-treating agents (1) to (8) prepared above and the comparative surface-treating agents (1) to (3) were chemically tempered glass (made by Corning, “Gorilla” glass, thickness 0.7 mm) using a spin coater. It was applied on top.
The spin coating conditions were 300 rpm for 3 seconds and 2000 rpm for 30 seconds. The coated substrate was heated in the thermostatic chamber at 140 ° C. for 30 minutes in the atmosphere to form a cured film.

<Characteristic evaluation of cured film>
(Initial evaluation)
First, as an initial evaluation, after forming a cured film, the static contact angle of water was measured in a state where nothing was touched on the surface.

(Evaluation after wiping ethanol)
Next, the cured film was sufficiently impregnated with ethanol in Kimwipe (trade name, manufactured by Tojo Kimberley Co., Ltd.), wiped 5 times, and then dried, and then the static contact angle of water was measured.
(Fingerprint adhesion)
Next, a finger was pressed against the cured film, and the ease of fingerprint attachment was visually determined. Evaluation was based on the following criteria.
○: Fingerprints are not easily attached or fingerprints are not conspicuous even if attached.
Δ: There is little adhesion of fingerprints, but the fingerprints can be sufficiently confirmed.
X: A fingerprint adheres as clearly as an untreated glass substrate.
(Fingerprint wiping property)
After the above fingerprint adhesion test, the attached fingerprint was wiped 5 times with Kimwipe (trade name, manufactured by Tojo Kimberley Co., Ltd.), and the ease of wiping the attached fingerprint was visually determined. Evaluation was based on the following criteria.
○: Fingerprints can be completely wiped off.
Δ: A fingerprint wiping trace remains.
X: The fingerprint wiping trace spreads and is difficult to remove.
The series of evaluation results are summarized in Table 2 below.

As described in Table 2, the cured films of Examples 15 to 22 had high initial water repellency, no change after wiping with ethanol, and very good results for fingerprint adhesion and fingerprint wiping. there were.

Claims (9)

A compound represented by the formula (1):
Formula (1):

(In the formula, R ¹ is a monovalent organic group containing a polyether chain (excluding those containing urethane bond), X ¹ is Si-containing crosslinkable groups of the monovalent, X ² represents a monovalent group The polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or more, M11～m16 is the sum, integer 10 to 200, ^{X 10} are independently H, F or Cl, the order of presence of each repeating unit is arbitrary) X ² is a monovalent organic group containing a port Rieteru chains, the polyether chains,
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or more, M11～m16 is the sum, integer 10 to 200, ^{X 10} are independently H, F or The compound according to claim 1, wherein the compound is a chain represented by Cl, the order of presence of each repeating unit is arbitrary. The compound according to claim 1 or 2, wherein X ² is a monovalent crosslinkable group. X ¹ is a monovalent crosslinkable group containing a polyether chain, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or more, M11～m16 is the sum, integer 10 to 200, ^{X 10} are independently H, F or The compound according to claim 1, wherein the compound is a chain represented by Cl, the order of presence of each repeating unit is arbitrary. X ² is a monovalent crosslinkable group containing a polyether chain, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or more, M11～m16 is the sum, integer 10 to 200, ^{X 10} are independently H, F or The compound according to claim 1 or 2, wherein the compound is a chain represented by Cl and the order in which each repeating unit is present. X ¹ and X ² are independently a monovalent crosslinkable group containing a polyether chain, and the polyether chain is
Formula _{:-( OC 6 F 12) m11 -} (OC 5 F 10) m12 - (OC 4 F 8) m13 - (OC 3 X 10 6) m14 - (OC 2 F 4) m15 - (OCF 2) m16 -
(Wherein, m11, m12, m13, m14, m15 and m16 are independently 0 or an integer of 1 or more, M11～m16 is the sum, integer 10 to 200, ^{X 10} are independently H, F or The compound according to claim 1, wherein the compound is a chain represented by Cl, the order of presence of each repeating unit is arbitrary. X ² is H, alkyl group, halogenated alkyl group, alkyl ester group, halogenated alkyl ester group, alkyl ether group, halogenated alkyl ether group, alkylamide group, halogenated alkylamide group, uryl group, halogenated uryl halide Group, urea group, halogenated urea group, —OCOOR ^j (R ^j is an alkyl group or halogenated alkyl group), —CONR ^k COR ^l (R ^k and R ^l are independently H, alkyl group or halogenated alkyl group) , Sugar chain-containing groups, alkylene polyether groups, arene groups, halogenated arene groups, heterocycle-containing groups, aryl groups, halogenated aryl groups, silicone residues (excluding those having reactive groups) and silyl Less selected from the group consisting of sesquioxane residues (except those having reactive groups) The compound according to claim 1 or 2, wherein both are one. The Si-containing crosslinkable group is at least one selected from the group consisting of a silane-containing reactive crosslinkable group, a silicone residue, a silsesquioxane residue, and a silazane group. Compound. The silane-containing reactive crosslinking group is
Formula: -L ² -{Si (R ^a ) _s (R ^b ) _t (R ^c ) _u (R ^d ) _v } _n
(Where L ² Is a single bond or a divalent linking group, R ^a , R ^b And R ^c Are the same or different and are hydrogen, halogen, an alkoxy group having 1 to 10 carbon atoms, an amino group having 1 to 10 carbon atoms, an acetoxy group having 1 to 10 carbon atoms, an allyl group having 3 to 10 carbon atoms, or 3 carbon atoms. 10 to 10 glycidyl groups. R ^d Are the same or different and are —O—, —NH—, —C≡C—, or a silane bond. s, t and u are the same or different and are 0 or 1, v is an integer of 0 to 3, and n is an integer of 1 to 20. When n is 1, s + t + u is 3 and v is 0. When n is 2 to 20, s + t + u is the same or different and 0 to 2, v is the same or different 0 to 2, and when v is an integer of 1 or more, at least two Si are R ^d Are connected to each other through a straight chain, a ladder, a ring, or a double ring. The compound of Claim 8 which is group represented by this.