JP5500354B2 - Membrane structure measuring method and surface shape measuring apparatus - Google Patents

Description

  The present invention relates to a film structure measuring method and a surface shape measuring apparatus.

  A transparent film (transparent film) is formed on the surface of the printed board for the purpose of insulation, for example. For such a transparent film, for example, by using a surface shape measuring device using a white interference method, the shape data of the surface of the transparent film can be obtained from the measurement light reflected on the surface of the transparent film, Moreover, the shape data (interface shape data) of this interface can be obtained from the measurement light that is transmitted through the transparent film and reflected at the interface between the transparent film and the printed circuit board surface (see, for example, Patent Document 1).

Japanese Examined Patent Publication No. 6-54217

  However, the interface shape data measured by the light transmitted through the transparent film is affected by the surface shape. In other words, the crystal is observed with a deviation from the actual interface shape due to the refractive index of the transparent film. When the refractive index of the transparent film is accurately known, an accurate interface shape can be obtained by calculation. However, the conditions when the transparent film is formed (such as the manufacturing process and coating process of the transparent film material) Since the refractive index may change due to subsequent secular change or the like, there is a problem that an accurate interface shape cannot be obtained. An ellipsometer is used as such a film thickness measurement, but basically it is a point measurement. For example, when a defective portion of a transparent film needs to be investigated, such as when performing a failure analysis, An efficient analysis cannot be performed.

  The present invention has been made in view of such problems, and a film capable of obtaining the refractive index of the measurement target film from the surface shape data and the interface shape data measured by irradiating the measurement target film with light. It is an object of the present invention to provide a structure measuring method and a surface shape measuring apparatus for measuring the film structure of a measurement target film by the film structure measuring method.

In order to solve the above problems, a film structure measuring method according to the present invention is a film structure measuring method for irradiating light to a measurement target film formed on an object and measuring the film structure of the measurement target film, Measuring surface shape data which is the shape of the surface of the measurement target film from the light and interface shape data which is the shape of the interface between the measurement target film and the object, and a difference between the surface shape data and the surface shape data The first reference surface having an average value of approximately zero is calculated and this difference is calculated as corrected surface shape data. The average value of the difference between the interface shape data and the interface shape data is approximately zero. Calculating a second reference plane and calculating the difference as corrected interface shape data, calculating a correlation coefficient between the corrected surface shape data and the corrected interface shape data , and calculating the correlation coefficient of The condition that pair value is minimized, and a step of calculating a refractive index of the measurement target film.

  In such a film structure measuring method, it is preferable that the reference plane is a straight plane.

により算出することができる。 Further, in such a film structure measuring method, when the corrected surface shape data is S _C and the corrected interface shape is K _C ′, the refractive index n is given by

Can be calculated.

  Moreover, it is preferable that such a film | membrane structure measuring method further has the step which calculates the film thickness distribution of the said measuring object film | membrane from the said surface shape data, the said interface shape data, and the said refractive index.

  Further, the surface shape measuring apparatus according to the present invention irradiates light to the object and the measurement target film formed on the surface of the object, and the surface shape data which is the shape of the surface of the measurement target film and the measurement target film and the object An imaging device that acquires interface shape data that is the shape of the interface of the film, and a control processor that calculates the film structure of the measurement target film by any of the above-described film structure measurement methods.

  According to the film structure measuring method and the surface shape measuring apparatus using this method according to the present invention, from the surface shape data and the interface shape data measured by irradiating light to the film to be measured, the refractive index of the film to be measured Further, using this refractive index, true interface shape data and film thickness distribution can be obtained.

It is explanatory drawing which shows the structure of a surface shape measuring apparatus. It is explanatory drawing which shows the optical system of the said surface shape measuring apparatus. It is explanatory drawing which shows the relationship between a sample and a measurement result, (a) shows sectional drawing of the sample in which the transparent film was formed on the printed circuit board, (b) shows the measurement result. It is a flowchart which shows a film | membrane structure measuring method. It is explanatory drawing which shows perpendicular | vertical plane correction | amendment, Comprising: (a) shows the relationship between surface data and interface data, and an orthogonal plane, (b) shows the result of an orthogonal plane correction. It is explanatory drawing which shows the relationship between the refractive index of a transparent film, surface shape data, and interface shape data.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. First, using FIG. 1 and FIG. 2, the configuration of a surface shape measuring apparatus using a white light interferometry will be described as an example of a surface shape measuring apparatus that measures the surface shape and interface shape of a measurement target film formed on an object. To do. The surface shape measuring device 100 scans a sample 105 to acquire an image of the sample 105, controls the operation of the imaging device 109, and samples the film structure (refractive of transparent film) from the acquired image. A control processor 110 that calculates a rate, a surface, an interface shape, and the like) and a display device 111 that displays a processing result by the control processor 110.

  The imaging device 109 has an imaging camera 101 in which an imaging device 14 is built, a microscope barrel device 102 in which an optical system is stored, a piezo element 16, and drives the objective lens unit 15 to vertically scan the sample 105. A piezoelectric drive device 103, a microscope objective lens 104 in which an objective lens unit 15 is stored, a microscope sample stage 106 on which a sample 105 is placed, and a light source 1 that emits white light to illuminate the sample 105 are stored. The microscope illumination device 107 and the microscope base device 102 and the microscope base 108 that supports the microscope illumination device 107 are configured. The drive control of the piezo element 16 and the processing of the signal output from the image sensor 14 are performed by the control processor 110 described above.

  Further, the optical system of the surface shape measuring apparatus 100 includes an illumination optical system 2 that collects the light emitted from the light source 1 and irradiates the sample 105, and the light from the sample 105 that collects the light from the sample 105. And an imaging optical system 3 that forms an image on the imaging surface of the imaging device 14.

  The illumination optical system 2 in order from the light source 1 side, a condenser lens 4 that converts light emitted from the light source 1 into substantially parallel light, and forms an image of the substantially parallel light once, and further relays it as substantially parallel light. The first relay lens 6 and the second relay lens 8, a half mirror (or half prism) 9 that reflects a part of the substantially parallel light emitted from the second relay lens 8 toward the sample 105, and the half mirror 9 The objective lens unit 15 is configured to collect and irradiate the reflected light on the sample 105. An aperture stop 7 is provided between the first relay lens 6 and the second relay lens 8, and a field stop 5 is provided between the second relay lens 8 and the half mirror 9.

  On the other hand, the imaging optical system 3 includes, in order from the sample 105 side, an objective lens unit 15 that collects the light reflected by the sample 105, a half mirror 9 that transmits part of the light from the objective lens unit 15, The imaging lens 13 is configured to collect the light transmitted through the half mirror 9 and form an image on the imaging surface of the imaging device 14.

  Here, the objective lens unit 15 includes an objective lens 10, a half mirror (or half prism) 11 that transmits a part of the light emitted from the objective lens 10 and guides it to the sample 105, and reflects the remaining light. A reference mirror 12 that is disposed at a position conjugate with the focal point on the sample 105 side of the lens 10 and reflects light reflected by the half mirror 11 is integrally formed. The objective lens unit 15 is vibrated along the optical axis of the objective lens 10 by the piezo element 16.

  According to the surface shape measuring apparatus 100 having such a configuration, the light emitted from the light source 1 is guided to the objective lens unit 15 by the illumination optical system 2 and condensed by the objective lens 10. The light collected by the objective lens 10 enters the half mirror 11, a part of the light is transmitted and collected on the sample 105, and the remaining light is reflected and collected on the reference mirror 12. . Then, the light reflected by the sample 105 (this light is referred to as “measurement light”) is incident again on the half mirror 11 and part of it is transmitted, and the light reflected by the reference mirror 12 (this light is referred to as “reference light”). The light is again incident on the half mirror 11 and part of the light is reflected to the image sensor 14 side, so that these measurement light and reference light are superimposed and incident on the objective lens 10, and the imaging optical system 3. As a result, an image of the sample 105 is formed on the imaging surface of the imaging device 14.

  In the objective lens unit 15, since the focal plane of the objective lens 10 and the reflection surface of the reference mirror 12 are conjugate as described above, the measurement light and the reference light superimposed by the half mirror 11 interfere with each other. For this reason, when the objective lens unit 15 is vibrated in the optical axis direction by the piezo element 16, the measurement light emitted from the sample 105 at the focal plane of the objective lens 10 is strengthened, and the measurement light emitted from the other is weakened. In the image of the sample 105 obtained by the image sensor 14, the portion in the focal plane of the objective lens 10 becomes bright and the other portion becomes dark (forms an interference fringe). Therefore, the height information of the sample 105 can be calculated from this image and its shape can be measured. In the objective lens unit 15 of the surface shape measuring apparatus 100 according to the present embodiment, the interference between the measurement light and the reference light is a Michelson type, but a Mirau type or a Linnic type configuration may be used. .

  Here, as shown in FIG. 3A, the sample 105 has a transparent film (measurement target film) 105b formed on the surface of the printed circuit board (object) 105a, and the surface of the transparent film 105b. 105c and the surface of the printed circuit board 105a, that is, the case where the shape of the interface 105d between the printed circuit board 105a and the transparent film 105b is measured will be described. For simplicity of explanation, it is assumed that the interface 105d is a flat plane and is disposed so as to be orthogonal to the optical axis of the objective lens 10.

  A measured value (hereinafter referred to as “surface shape data”) of the shape of the surface 105c of the transparent film 105b calculated using the image of the sample 105 output from the imaging device 14 of the surface shape measuring apparatus 100 is S (i, j) and the measured value of the shape of the interface 105d (hereinafter referred to as “interface shape data”) is K ′ (i, j), the interface shape data K ′ (i, j) obtained by the measurement is the transparent film. Since it is influenced by the refractive index n of 105b, the true interface shape data K (i, j) is obtained by the following equation (1). Note that (i, j) is the coordinates of the imaging surface of the image sensor 14 (or the image of the sample 105 imaged by the image sensor 14). Here, it is assumed that the imaging surface of the imaging element 14 is arranged so as to be orthogonal to the optical axis of the objective lens 10. Further, as shown in FIG. 3B, the surface shape data S (i, j), the interface shape data K (i, j), K ′ (i, j) are in the optical axis direction of the objective lens 10, The traveling direction of the light irradiated on the sample 105 is represented as positive.

  In this equation (1), the second term (K ′ (i, j) −S (i, j)) is expressed by the surface 105c and the interface 105d corresponding to the coordinates (i, j) in the sample 105. Represents the optical distance. From this equation (1), in order to calculate the true interface shape data K at the coordinates (i, j) and the thickness of the transparent film 105b, an accurate value of the refractive index n of the transparent film 105b is required. In order to measure the accurate value of the refractive index n of the transparent film 105b, as described above, for example, there is a method of measuring with a dedicated device based on the principle of ellipsometry, but for each measurement point of the surface shape, It is complicated to measure the refractive index with another apparatus, and the efficiency of the measurement work is reduced. Therefore, a film structure measuring method for obtaining the refractive index n of the transparent film 105b at the location from the surface shape data S (i, j) obtained by the surface shape measuring apparatus 100 and the measured interface shape data K ′ (i, j). Is described below based on the flowchart shown in FIG. In the following description, the coordinates (i, j) are omitted. The following processing is executed by the control processor 110 in the present embodiment.

  First, the control processor 110 operates the piezo element 16 to scan the surface of the sample 105 in the optical axis direction (piezo scan), and obtains an image of the sample 105 by the image sensor 14 (step S200). Then, surface shape data S is calculated from this image (step S210), and interface shape data K ′ is further calculated (step S220).

Next, the corrected surface shape data S _C and interface shape data K _C ′ are calculated by correcting each of the surface shape data S and interface shape data K ′ obtained by measurement with a reference surface (step S230). ). Specifically, as shown in FIG. 5A, straight planes S ₀ and K ₀ ′ whose average value corrected as a reference plane is almost 0 are obtained by the least square method or the like, and FIG. As shown in (b), the corrected surface shape data S _C and interface shape data K _C ′ are obtained from the difference between the surface shape data S and interface shape data K ′ and the plane planes S ₀ and K ₀ ′. FIG. 5B shows the relationship between the corrected surface shape data S _C and interface shape data K _C ′ with respect to the plane O.

Here, when the correlation coefficient C between the corrected surface shape data S _C and the true interface shape data K _C corrected by the same method is obtained, it is expressed by the following equation (2). In Equation (2), S _C with a bar and K _C with a bar are average values of the corrected surface shape data S _C and true interface shape data K _C , respectively. Further, Σ indicates the total sum of data represented by coordinates (i, j).

In this equation (2), when the true interface shape data K is replaced by the above equation (1) and represented by K ′, the correlation coefficient C is represented by the following equation (3). In this equation (3), the average value of the corrected surface shape data S _C and interface shape data K _C , K _C ′ is 0 as described above.

Here, as shown in FIG. 6, assuming that the surface 105c of the transparent film 105b is convex toward the objective lens 10, the refractive index n of the transparent film, the surface shape data S, and the measured interface shape data K. ′ And the interface shape data calculated by the expression (1) coincides with the true interface shape data K when the refractive index n is a true value, but the surface when the refractive index n is larger than the true value. Convex to the 105c side (K + in FIG. 6), conversely, when the refractive index n is smaller than the true value, it is convex to the opposite side to the surface 105c (K− in FIG. 6). As a result, the absolute value of the correlation coefficient _C between the corrected surface shape S _C and the corrected true interface shape K _C may be minimized when the refractive index n of the transparent film 105b is a true value. I understand. Therefore, the true refractive index of the transparent film 105b can be obtained by obtaining the value of the refractive index n that minimizes the square of the correlation coefficient C represented by the expression (3). Specifically, as shown in the following equation (4), the value obtained by partial differentiation of the square of the correlation coefficient C with the refractive index n is 0.

  As described above, since the correlation coefficient C changes when the refractive index n is changed across the true value, the partial differential value (∂C / ∂n) of the correlation coefficient C by the refractive index n is 0. is not. Therefore, in formula (4), the refractive index n at which the correlation coefficient C is 0 is a true value. That is, it is expressed as the following equation (5) with the correlation coefficient C of equation (3) set to 0.

  And if refractive index n is calculated | required from this Formula (5), it will represent like following Formula (6).

As described above, the refractive index n of the transparent film 105b in the region imaged by the image sensor 14 is obtained by substituting the surface shape data S _C and the interface shape data K _C ′ corrected by the straight plane into the equation (6). (Step S240). Then, the film thickness distribution of the transparent film 105b and the true interface shape K are calculated from the refractive index n thus obtained (step S250), and the result is given to the display device 111 by the control processor 110, for example. It is displayed (step S260).

As shown in FIG. 3B, when the surface shape data S has a convex shape on the objective lens 10 side, the interface shape data K ′ measured with respect to the interface 105 d on the plane is opposite to the objective lens 10. It becomes convex. That is, when the correction value S _C of the surface shape data becomes negative, the measured correction value K _C ′ of the interface shape data becomes positive, and conversely, when the correction value S _C of the surface shape data becomes positive. Since the correction value K _C ′ of the measured interface shape data is negative, the numerator of the second term in Equation (6) is negative. For this reason, the entire second term of the equation (6) is also negative, and the refractive index n obtained from the equation (6) is larger than 1. That is, since the refractive index of the substance is larger than 1, it can be said that this equation (6) matches this characteristic.

  In the above description, the case where the surface shape and the interface shape are measured using white interference has been described. However, the present invention is not limited to the surface shape measuring apparatus having this configuration. For example, the present invention is applied to a confocal microscope or the like. Can also be applied. Further, in the film structure measuring method, the case where the surface shape data S and the interface shape data K ′ obtained by the measurement are corrected with a straight plane has been described. However, it is also possible to correct with a quartic curved surface.

105a Printed circuit board (object) 105b Transparent film (measuring film)
109 Imaging device 110 Control processor

Claims (5)

A film structure measuring method for measuring the film structure of the measurement target film by irradiating light to the measurement target film formed on the object,
Measuring surface shape data that is the shape of the surface of the measurement target film from the light and interface shape data that is the shape of the interface between the measurement target film and the object;
A first reference surface with an average difference between the surface shape data and the surface shape data of approximately zero is calculated to calculate the difference as corrected surface shape data, and to the interface shape data On the other hand, calculating a second reference surface in which the average value of the difference with the interface shape data is approximately 0 and calculating the difference as corrected interface shape data ;
Calculating a correlation coefficient between the corrected surface shape data and the corrected interface shape data , and calculating a refractive index of the measurement target film from a condition in which an absolute value of the correlation coefficient is minimized. A method for measuring a film structure.   The film structure measuring method according to claim 1, wherein the reference plane is a plane. When the corrected surface shape data is S _C and the corrected interface shape is K _C ′, the refractive index n is given by

The film structure measuring method according to claim 1 or 2, calculated by:   The film structure measuring method according to any one of claims 1 to 3, further comprising a step of calculating a film thickness distribution of the measurement target film from the surface shape data, the interface shape data, and the refractive index. Irradiating light to an object and a measurement target film formed on the surface of the object, surface shape data that is a shape of the surface of the measurement target film and interface shape data that is a shape of an interface between the measurement target film and the object An imaging device for acquiring
A surface shape measurement apparatus comprising: a control processor that calculates a film structure of the measurement target film by the film structure measurement method according to claim 1.

Images