JP5413304B2 - Touch panel sensor and laminate for producing touch panel sensor - Google Patents

Description

  The present invention relates to a touch panel sensor and a laminate for producing a touch panel sensor.

  Today, touch panel devices are widely used as input means. The touch panel device includes a touch panel sensor, a control circuit that detects a contact position on the touch panel sensor, wiring, and an FPC (flexible printed circuit board). In many cases, the touch panel device is used together with the display device as an input means for various devices including a display device such as a liquid crystal display or a plasma display (for example, a ticket vending machine, an ATM device, a mobile phone, a game machine). ing. In such a device, the touch panel sensor is disposed on the display surface of the display device, thereby enabling the touch panel device to perform a very direct input to the display device. The area | region which faces the display area of the display apparatus among touch panel sensors is transparent, This area | region of a touch panel sensor comes to comprise the active area which can detect a contact position (approach position).

  The touch panel device can be classified into various types based on the principle of detecting a contact position (approach position) on the touch panel sensor. In recent years, capacitive touch panel devices have attracted attention because they are optically bright, have good design properties, have a simple structure, and are superior in function. In a capacitively coupled touch panel device, a strange capacitance is newly generated when an external conductor (typically a finger) whose position is to be detected contacts (approaches) the touch panel sensor via a dielectric. The position of the object on the touch panel sensor is detected using the change in capacitance. The capacitive coupling method includes a surface type and a projection type. The projection type is attracting attention because it is suitable for multi-touch recognition (multi-point recognition) (for example, Patent Document 1).

  A projected capacitively coupled touch panel sensor includes a dielectric and first and second sensor electrodes formed in different patterns on both sides of the dielectric. Typically, the first sensor electrode and the second sensor electrode have transparent conductors arranged in a grid, and are generated when an outer conductor (typically a finger) contacts or approaches the touch panel sensor. The position of the transparent conductor is detected based on electromagnetic change or capacitance change.

  Such a projected capacitively coupled touch panel sensor generally includes a first film in which a first transparent conductive layer is formed on a first transparent substrate via a first undercoat layer, and a second undercoat on a second transparent substrate. It is produced by bonding a second film on which a second transparent conductive layer is formed via a coat layer with an adhesive layer (for example, Patent Document 2). In Patent Document 2, each undercoat layer is composed of a laminate including a low refractive index layer and a high refractive index layer having a higher optical refractive index than the low refractive index layer.

  In a projected capacitively coupled touch panel sensor, generally, the optical refractive index of a transparent conductor is relatively large. For this reason, the region where the transparent conductor is arranged in the touch panel sensor and the transparent conductor are not arranged. There may be a case where a difference in light transmittance and reflectance between the regions becomes large. Thus, when the difference of the transmittance | permeability and the reflectance of light between area | regions is large, the pattern of a transparent conductor will be visually recognized from the user of a touch panel sensor, and it is unpreferable from a design viewpoint. In order to solve such a problem, for example, Patent Document 2 proposes a touch panel sensor in which a difference in light reflectance between regions is reduced by appropriately adjusting a light refractive index of a material used as an adhesive layer. ing.

Special Table 2007-533044 JP 2008-98169 A

  By the way, in recent years, thinning and improvement of optical characteristics are desired for touch panel devices and touch panel sensors. However, in the touch panel sensor described in Patent Document 2, two film sensors are bonded together, and an adhesive layer (OCA, Optical Compensation Adhesive) is interposed between the two film sensors. Not only is the thickness increased, but the number of interfaces that can exert an optical effect on the transmitted light is increased. As a result, the transmittance of the image light from the display device is lowered, and the image quality of the image displayed by the display device is deteriorated. In addition, the manufacturing cost is increased by using a large amount of the adhesive layer.

  An object of this invention is to provide the laminated body used in order to produce the touchscreen sensor which can solve such a subject effectively, and a touchscreen sensor.

  A touch panel sensor according to the present invention includes a base film and a first transparent conductor patterned on a surface on one side of the base film, and the base film includes a transparent film main body and a film main body. A first undercoat layer provided on the surface on the first transparent conductor side; a first high refractive index layer provided on the surface on the first transparent conductor side of the first undercoat layer; A first low refractive index layer provided on a surface of the refractive index layer on the first transparent conductor side, and the light refractive index of the first transparent conductor is the first high refractive index layer of the base film. Of the first low refractive index layer and the first undercoat layer of the base film, and the first high refractive index layer has a thickness of 3.6-8. The light refractive index is within the range of 3 nm and the light refractive index is 550 nm. The touch panel is in the range of 2.18 + 0.22 / −0.26, and is in the range of 2.36 + 0.22 / −0.26 for light having a wavelength of 400 nm. It is a sensor.

  In the touch panel sensor according to the present invention, preferably, the first transparent conductor has a thickness in a range of 12 to 23 nm, and a light refractive index of 1.97 + 0. It is within the range of 13 / −0.25, and is within the range of 2.12 + 0.13 / −0.25 with respect to light having a wavelength of 400 nm.

  In the touch panel sensor according to the present invention, preferably, the first low refractive index layer has a thickness in the range of 41 to 87 nm and a light refractive index in the range of 1.30 to 1.67. It has become.

  In the touch panel sensor according to the present invention, preferably, the first undercoat layer has a thickness in the range of 600 to 10000 nm and a light refractive index in the range of 1.35 to 1.67. Yes.

  The laminate used for producing the touch panel sensor according to the present invention includes a base film and a first transparent conductive layer provided on the surface of one side of the base film, A transparent film body, a first undercoat layer provided on the surface of the film body on the first transparent conductor side, and a first undercoat layer provided on the surface of the first undercoat layer on the first transparent conductive layer side. 1 high refractive index layer and a first low refractive index layer provided on the first transparent conductive layer side surface of the first high refractive index layer, and the optical refractive index of the first transparent conductive layer is The first high refractive index layer is smaller than the optical refractive index of the first high refractive index layer of the base film and larger than the optical refractive index of the first low refractive index layer and the first undercoat layer of the base film. Has a thickness in the range of 3.6 to 8.3 nm and its optical refractive index. It is in the range of 2.18 + 0.22 / −0.26 for light with a wavelength of 550 nm, and is in the range of 2.36 + 0.22 / −0.26 for light with a wavelength of 400 nm. It is the laminated body characterized by this.

  The touch panel sensor according to the present invention includes a base film, a first transparent conductor patterned on one side of the base film, and a second transparent patterned on the other side of the base film. And a base film is a transparent film body, a first undercoat layer provided on a surface of the film body on the first transparent conductor side, and the first undercoat layer first. A first high refractive index layer provided on the surface of the transparent conductor, a first low refractive index layer provided on the first transparent conductor side of the first high refractive index layer, and the film body A second undercoat layer provided on the second transparent conductor side surface, a second high refractive index layer provided on the second transparent conductor side surface of the second undercoat layer, and a second high refractive index. Second layer provided on the surface of the second transparent conductor side of the rate layer A refractive index layer, wherein the first transparent conductor has a light refractive index smaller than that of the first high refractive index layer of the base film, and the first low refractive index layer of the base film and The light refractive index of the second transparent conductor is larger than the light refractive index of the first undercoat layer, the light refractive index of the second high refractive index layer of the base film, and the second low refractive index of the base film. It is larger than the optical refractive index of the refractive index layer and the second undercoat layer, and the first high refractive index layer and the second high refractive index layer have a thickness in the range of 3.6 to 8.3 nm, The optical refractive index is in the range of 2.18 + 0.22 / −0.26 for light with a wavelength of 550 nm, and 2.36 + 0.22 / −0.26 for light with a wavelength of 400 nm. It is a touch panel sensor characterized by being in the range.

  In the touch panel sensor according to the present invention, preferably, the first transparent conductor and the second transparent conductor have a thickness in a range of 12 to 23 nm and a light refractive index of light having a wavelength of 550 nm. In contrast, it is in the range of 1.97 + 0.13 / −0.25, and in the range of 2.12 + 0.13 / −0.25 for light having a wavelength of 400 nm.

  In the touch panel sensor according to the present invention, preferably, the first low refractive index layer and the second low refractive index layer have a thickness in the range of 41 to 87 nm and a light refractive index of 1.30. It is in the range of ˜1.67.

  In the touch panel sensor according to the present invention, preferably, the first undercoat layer and the second undercoat layer have a thickness in the range of 600 to 10000 nm and an optical refractive index of 1.35 to 1.67. It is within the range.

  The laminate used for producing the touch panel sensor according to the present invention includes a base film, a first transparent conductive layer provided on the surface of one side of the base film, and the other side of the base film. A second transparent conductive layer provided on the surface, the base film is a transparent film body, and a first undercoat layer provided on the surface of the film body on the first transparent conductor side, A first high refractive index layer provided on a surface of the first undercoat layer on the first transparent conductive layer side; and a first high refractive index layer provided on a surface of the first high refractive index layer on the first transparent conductive layer side. 1 low refractive index layer, a second undercoat layer provided on the surface of the film body on the second transparent conductor side, and a second undercoat layer provided on the surface of the second transparent conductive layer side On the surface of the second high refractive index layer and the second transparent conductive layer side of the second high refractive index layer The first transparent conductive layer has a light refractive index smaller than that of the first high refractive index layer of the base film, and the first refractive index layer of the base film. 1 is higher than the optical refractive index of the low refractive index layer and the first undercoat layer, the optical refractive index of the second transparent conductive layer is smaller than the optical refractive index of the second high refractive index layer of the base film, and The thickness of the first high refractive index layer and the second high refractive index layer is in the range of 3.6 to 8.3 nm, which is larger than the optical refractive index of the second low refractive index layer and the second undercoat layer of the material film. And its optical refractive index is in the range of 2.18 + 0.22 / −0.26 for light having a wavelength of 550 nm, and 2.36 + 0.22 for light having a wavelength of 400 nm. It is a laminate characterized by being in the range of /−0.26.

  According to the present invention, the touch panel sensor includes a base film and a first transparent conductor patterned on the surface on one side of the base film. Among these, the base film is a transparent film body, a first undercoat layer provided on the surface of the film body on the first transparent conductor side, and a surface of the first undercoat layer on the first transparent conductor side. And a first low refractive index layer provided on the first transparent conductor side surface of the first high refractive index layer. The light refractive index of the first transparent conductor is smaller than the light refractive index of the first high refractive index layer of the base film, and the light of the first low refractive index layer and the first undercoat layer of the base film. It is larger than the refractive index. The first high refractive index layer has a thickness in the range of 3.6 to 8.3 nm, and its optical refractive index is 2.18 + 0.22 / −0 with respect to light having a wavelength of 550 nm. .26 and within a range of 2.36 + 0.22 / −0.26 for light having a wavelength of 400 nm. For this reason, the difference of the transmittance | permeability and the reflectance of light between the area | region where the 1st transparent conductor is patterned and the area | region where it is not patterned among film sensors can be made small. Thereby, it can prevent that the pattern of a 1st transparent conductor is visually recognized from the exterior of a film sensor, and, thereby, the design property of a film sensor can be improved.

FIG. 1 is a diagram for explaining an embodiment according to the present invention, and schematically shows a touch panel device together with a display device. 2 is a cross-sectional view showing the touch panel sensor of the touch panel device of FIG. 1 together with a display device. The cross section shown in FIG. 2 generally corresponds to the cross section taken along the line II-II in FIG. FIG. 3A is a top view showing a touch panel sensor of the touch panel device. 3B is a cross-sectional view taken along line III-III in FIG. 3A. Fig.4 (a) is a figure which shows the specific example of the base film contained in a touchscreen sensor, and FIG.4 (b) is that the spectrum of the transmitted light is made flat in each wavelength range by the functional layer of a base film. FIG. FIGS. 5A, 5B, 5C, and 5D are views for explaining a method of manufacturing a laminated body used for manufacturing a touch panel sensor. FIG. 6A is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. 6B is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6C is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6D is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6E is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6F is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6G is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6H is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6I is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6J is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6K is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 6L is a diagram for explaining a method of manufacturing the touch panel sensor of FIG. 3. FIG. 7 is a flowchart for explaining a method of manufacturing the touch panel sensor of FIG. FIG. 8 is a diagram for explaining the progress of etching in the process shown in FIG. 6F. FIG. 9A is a diagram corresponding to FIG. 6I (a) and is a diagram for explaining a modification of the method for manufacturing the touch panel sensor. FIG. 9B is a diagram corresponding to FIG. 6J (a) and is a diagram for explaining a modification of the method for manufacturing the touch panel sensor. 10 (a) and 10 (b) are diagrams corresponding to FIGS. 6C (a) and 6C (b), respectively, for explaining a modification of the manufacturing method of the touch panel sensor. . FIG. 11 is a diagram corresponding to FIG. 3 for explaining a modification of the transparent conductor. FIG. 12 is a cross-sectional view corresponding to FIG. 3B and showing a conventional touch panel sensor. FIG. 13 is a diagram illustrating an example of the wavelength dependence of the refractive index in the high refractive index layer and the transparent conductor of the touch panel sensor according to the present invention. FIG. 14A is a diagram showing a reflection spectrum in Example 1. FIG. FIG. 14B is a diagram showing a difference in reflectance in Example 1. FIG. 15A is a diagram showing a transmission spectrum in Example 1. FIG. FIG. 15B is a diagram illustrating a difference in transmittance in Example 1. FIG. 16A is a diagram showing a difference in reflectance in Comparative Example 1. FIG. FIG. 16B is a diagram illustrating the reflectance difference in Comparative Example 1 together with the reflectance difference in Example 1. FIG. 17A is a diagram showing a transmittance difference in Comparative Example 1. FIG. FIG. 17B is a diagram illustrating the transmittance difference in Comparative Example 1 together with the reflectance difference in Example 1. FIG. 18 is a diagram illustrating the relationship between the amount of displacement of the optical refractive index of the high refractive index layer and ΔY (reflection), ΔY (transmission), and b * in Example 2. FIG. 19 is a diagram illustrating the relationship between the thickness of the high refractive index layer and ΔY (reflection), ΔY (transmission), and b * in Example 3. FIG. 20 is a diagram illustrating the relationship between the amount of displacement of the refractive index of the transparent conductor and ΔY (reflection), ΔY (transmission), and b * in Example 4. FIG. 21 is a diagram illustrating the relationship between the thickness of the transparent conductor and ΔY (reflection), ΔY (transmission), and b * in Example 5. FIG. 22 is a diagram illustrating the relationship between the optical refractive index of the low refractive index layer and ΔY (reflection), ΔY (transmission), and b * in Example 6. FIG. 23 is a diagram illustrating the relationship between the thickness of the low refractive index layer and ΔY (reflection), ΔY (transmission), and b * in Example 7. 24 is a graph showing the relationship between the optical refractive index of the undercoat layer and ΔY (reflection), ΔY (transmission), and b * in Example 8. FIG. FIG. 25 is a diagram showing the relationship between the thickness of the undercoat layer and ΔY (reflection), ΔY (transmission), and b * in Example 9.

  Embodiments of the present invention will be described below with reference to the drawings.

  In the drawings attached to the present specification, for the sake of illustration and ease of understanding, the scale, the vertical / horizontal dimension ratio, and the like are appropriately changed and exaggerated from those of the actual ones.

  Further, in the present case, the terms “sheet”, “film”, and “plate” are not distinguished from each other based only on the difference in names. Therefore, for example, a “sheet” is a concept that includes members and portions that can also be called films, plates, and the like.

Touch Panel Device First, the entire touch panel device 20 will be described with reference to FIGS. 1 and 2. The touch panel device 20 shown in FIGS. 1 and 2 is configured as a projected capacitive coupling method, and is configured to be able to detect the contact position of an external conductor (for example, a human finger) to the touch panel device 20. Yes. In addition, when the detection sensitivity of the capacitively coupled touch panel device 20 is excellent, it is possible to detect which region of the touch panel device the external conductor is approaching just by approaching the external conductor. Can do. Along with such a phenomenon, the “contact position” used here is a concept including an approach position that is not actually in contact but can be detected.

  As shown in FIGS. 1 and 2, the touch panel device 20 is used in combination with a display device (for example, a liquid crystal display device) 15 and constitutes an input / output device 10. The illustrated display device 15 is configured as a flat panel display. The display device 15 includes a display panel 16 having a display surface 16 a and a display control unit 17 connected to the display panel 16. The display panel 16 includes a display area A1 that can display an image, and a non-display area (also referred to as a frame area) A2 that is disposed outside the display area A1 so as to surround the display area A1. . The display control unit 17 processes information regarding the video to be displayed, and drives the display panel 16 based on the video information. The display panel 16 displays a predetermined image on the display surface 16a according to a control signal from the display control unit 17. That is, the display device 15 plays a role as an output device that outputs information such as characters and drawings as video.

  As illustrated in FIG. 1, the touch panel device 20 includes a touch panel sensor 30 disposed on the display surface 16 a of the display device 15 and a detection control unit 25 connected to the touch panel sensor 30. Of these, the touch panel sensor 30 is bonded to the display surface 16 a of the display device 15 via an adhesive layer 19 as shown in FIG. 2. As described above, the touch panel device 20 is configured as a projected capacitively coupled touch panel device, and plays a role as an input device for inputting information.

  As shown in FIG. 2, the touch panel device 20 further includes a protective cover 12 having translucency that functions as a dielectric on the viewer side of the touch panel sensor 30, that is, the side opposite to the display device 15. Have. The protective cover 12 is bonded onto the touch panel sensor 30 via the adhesive layer 14. The protective cover 12 functions as an input surface (touch surface, contact surface) to the touch panel device 20. That is, information can be input from the outside to the touch panel device 20 by bringing a conductor such as a human finger 5 into contact with the protective cover 12. The protective cover 12 forms the most observer side of the input / output device 10, and also functions as a cover for protecting the touch panel device 20 and the display device 15 from the outside in the input / output device 10.

  In addition, as the adhesive layers 14 and 19 described above, layers made of materials having various adhesive properties can be used. In this specification, “adhesion (layer)” is used as a concept including adhesion (layer).

  The detection control unit 25 of the touch panel device 20 is connected to the touch panel sensor 30 and processes information input via the protective cover 12. Specifically, the detection control unit 25 can specify the contact position of the conductor 5 with the protective cover 12 when the conductor (typically a human finger) 5 is in contact with the protective cover 12. The circuit (detection circuit) comprised in this is included. Further, the detection control unit 25 is connected to the display control unit 17 of the display device 15 and can transmit the processed input information to the display control unit 17. At this time, the display control unit 17 can create video information based on the input information and display a video corresponding to the input information on the display panel 16.

  Note that the terms “capacitive coupling” and “projection type” capacitive coupling have the same meaning as that used in the technical field of touch panels, and are used in this case. The “capacitive coupling” method is also referred to as “capacitance” method or “capacitance coupling” method in the technical field of touch panels. It is treated as a term synonymous with the “capacitive coupling” method. A typical capacitively coupled touch panel device includes a conductor layer, and an external conductor (typically a human finger) comes into contact with the touch panel, whereby the external conductor and the conductor layer of the touch panel device are contacted. A capacitor (capacitance) is formed between the two. Based on the change in the electrical state accompanying the formation of the capacitor, the position coordinates of the position where the external conductor is in contact on the touch panel are specified. The “projection type” capacitive coupling method is also referred to as “projection type” capacitive coupling method in the technical field of touch panel, and in this case, the term is synonymous with this “projection type” capacitive coupling method. handle. The “projection type” capacitive coupling method typically includes sensor electrodes arranged in a lattice pattern, and can be contrasted with a “surface type” capacitive coupling method having film-like electrodes.

Touch Panel Sensor Next, the touch panel sensor 30 will be described in detail with reference to FIGS. As shown in FIG. 2, the touch panel sensor 30 includes a base film 32 and a first transparent conductor 40 provided in a predetermined pattern on a surface 32 a on one side (observer side) of the base film 32. And a second transparent conductor 45 provided in a predetermined pattern on the surface 32b on the other side (the display device 15 side) of the base film 32.

  Among these, the base film 32 functions as a dielectric in the touch panel sensor 30. As shown in FIG. 3A, the base film 32 includes an active area Aa1 corresponding to a region where the touch position can be detected, and an inactive area Aa2 adjacent to the active area Aa1. Of these, the active area Aa1 occupies the area facing the display area A1 of the display device 15 as shown in FIG. 1, while the inactive area Aa2 extends from the four sides to the rectangular active area Aa1. In other words, it is formed in a frame shape so as to surround it. The inactive area Aa2 is formed in a region facing the non-display region A2 of the display device 15.

  As described above, the base film 32 is provided with the first transparent conductor 40 and the second transparent conductor 45, and among these, the first transparent conductor 40 provided in the active area Aa1 of the base film 32 and The second transparent conductor 45 forms a first sensor electrode 36a and a second sensor electrode 37a that can form capacitive coupling with the outer conductor 5 (see FIG. 3A). As will be described later, each of the base film 32, the first transparent conductor 40, and the second transparent conductor 45 has a light-transmitting property, so that the observer can display on the display device 15 through these. Can be observed.

  On the other hand, as shown in FIG. 3A, the first transparent conductor 40 and the second transparent conductor 45 provided in the non-active area Aa2 of the base film 32 are connected to the first sensor electrode 36a and the second sensor electrode 37a. A first extraction wiring 36b and a second extraction wiring 37b each having an electrical connection are formed. The extraction wirings 36b and 37b are connected to the sensor electrodes 36a and 37a at one end, and are detected by a detection control unit 25 configured to detect the contact position of the external conductor 5 with respect to the display surface 16a at the other end. It is electrically connected to the circuit.

  As shown in FIGS. 3A and 3B, the first extraction wiring 36 b may further include a first extraction conductor 43 provided on a part of the first transparent conductor 40. Similarly, the second extraction wiring 37 b may further include a second extraction conductor 48 (shown later in FIG. 5D) provided on a part of the second transparent conductor 45. Here, the specific resistance of the first extraction conductor 43 is smaller than the specific resistance of the first transparent conductor 40, and the specific resistance of the second extraction conductor 48 is higher than the specific resistance of the second transparent conductor 45. Is also getting smaller. For this reason, the first extraction wiring 36b and the second extraction wiring 37b further include the first extraction conductor 43 and the second extraction conductor 48, thereby more efficiently detecting the electric signals from the sensor electrodes 36a and 37a. It can be conducted to 25 detection circuits.

  Further, as shown in FIG. 3B, a first intermediate layer 61 may be interposed between the first transparent conductor 40 and the first extraction conductor 43 in the first extraction wiring 36 b. Similarly, in the second extraction wiring 37b, a second intermediate layer 66 (shown later in FIG. 5D) may be interposed between the second transparent conductor 45 and the second extraction conductor 48. . Further, as shown in FIG. 3B, a first protective layer 62 may be provided on the first extraction conductor 43 in the first extraction wiring 36b. Similarly, a second protective layer 67 (shown later in FIG. 5D) may be provided on the second extraction conductor 48 in the second extraction wiring 37b.

  Next, each element constituting the touch panel sensor 30 will be described in detail.

Transparent conductor First, the first transparent conductor 40 and the second transparent conductor 45 will be described in detail. The first transparent conductor 40 and the second transparent conductor 45 are made of a conductive material, and are detected by the detection control unit 25 configured to detect the contact position of the outer conductor 5 with the protective cover 12. It is electrically connected to the circuit. The first transparent conductor 40 is connected to a plurality of first sensor parts (first sensor conductors, sensor electrodes) 41 arranged in the active area Aa1 of the base film 32 and the first sensor parts 41, respectively. And a large number of first connection portions (first terminal conductors) 42 disposed in the inactive area Aa2 of the material film 32. Similarly, the second transparent conductor 45 is provided in each of the second sensor units (second sensor conductors, sensor electrodes) 46 arranged in the active area Aa1 of the base film 32 and each second sensor unit 46. A large number of second connection portions (second terminal conductors) 47 that are connected and arranged in the inactive area Aa2 of the base film 32.

  The first sensor portion 41 of the first transparent conductor 40 is arranged in a predetermined pattern on the surface 32 a on one side (observer side) of the base film 32. In addition, the second sensor unit 46 of the second transparent conductor 45 is formed on the surface 32b of the other side of the base film 32 (the display device 15 side) of the first sensor unit 41 of the first transparent conductor 40. They are arranged in a predetermined pattern different from the pattern. More specifically, as shown in FIG. 3A, the first sensor portion 41 of the first transparent conductor 40 is configured as a linear conductor arranged in one direction along the film surface of the base film 32. Has been. In addition, the second sensor unit 46 of the second transparent conductor 45 is configured as a linear conductor arranged side by side in the other direction along the film surface of the base film 32 intersecting with the one direction. As illustrated in FIG. 3A, one direction that is the arrangement direction of the first sensor units 41 and the other direction that is the arrangement direction of the second sensor units 46 are orthogonal to each other on the film surface of the base film 32.

  As shown in FIG. 3A, each of the linear conductors forming the first sensor portion 41 extends linearly in a direction intersecting with the arrangement direction (the one direction). Similarly, each of the linear conductors forming the second sensor unit 46 extends linearly in a direction intersecting with the arrangement direction (the other direction). In particular, in the illustrated example, the first sensor unit 41 extends linearly along a direction (the other direction) orthogonal to the arrangement direction (the one direction), and the second sensor unit 46 is arranged in the arrangement direction. It extends linearly along a direction (the one direction) orthogonal to (the other direction).

  In the present embodiment, each first sensor portion 41 includes a line portion 41a extending linearly and a bulging portion 41b bulging from the line portion 41a. In the example illustrated, the line portion 41 a extends linearly along a direction that intersects the arrangement direction of the first sensor portions 41. The bulging portion 41 b is a portion that bulges from the line portion 41 a along the film surface of the base film 32. Therefore, the width of each first sensor portion 41 is thicker at the portion where the bulging portion 41b is provided. As shown in FIG. 3A, in the present embodiment, each first sensor portion 41 has an outer contour that is substantially square in plan view at the bulging portion 41b.

  The second sensor unit 46 included in the second transparent conductor 45 is configured similarly to the first sensor unit 41 included in the first transparent conductor 40. That is, each second sensor 46 included in the second transparent conductor 45 has a linearly extending line portion 46a and a bulging portion 46b bulging from the line portion 46a. In the illustrated example, the line portion 46 a extends linearly along a direction that intersects with the arrangement direction of the second sensor portions 46. The bulging portion 46 b is a portion that bulges from the line portion 46 a along the film surface of the base film 32. Therefore, the width of each second sensor portion 46 is thicker at the portion where the bulging portion 46b is provided. As shown in FIG. 3A, in the present embodiment, each second sensor portion 46 has an outer contour that is substantially square in plan view at the bulging portion 46b.

  As shown in FIG. 3A, when observed from the normal direction of the film surface of the base film 32 (that is, in plan view), each first sensor unit 41 included in the first transparent conductor 40 is 2 crosses a large number of second sensor portions 46 included in the transparent conductor 45. As shown in FIG. 3A, the bulging portion 41 b of the first transparent conductor 40 is disposed on the first sensor portion 41 between the intersections of two adjacent second sensor portions 46. Similarly, when observed from the normal direction of the film surface of the base film 32, each second sensor unit 46 included in the second transparent conductor 45 includes a large number of first sensors included in the first transparent conductor 40. Crosses the part 41. The bulging portion 46 b of the second transparent conductor 45 is also disposed on the second sensor portion 46 between the intersections of two adjacent first sensor portions 41. Furthermore, in this Embodiment, the bulging part 41b of the 1st sensor part 41 contained in the 1st transparent conductor 40 and the bulging part 46b of the 2nd sensor part 46 contained in the 2nd transparent conductor 45 are The base film 32 is disposed so as not to overlap when observed from the normal direction of the film surface. That is, when observed from the normal direction of the film surface of the base film 32, the first sensor unit 41 included in the first transparent conductor 40 and the second sensor unit 46 included in the second transparent conductor 45 are: They intersect only at the line portions 41 a and 46 a of the sensor portions 41 and 46.

  As described above, the first transparent conductor 40 has the first connection portion 42 connected to such a first sensor portion 41. The first connection part 42 is provided at one or both ends of each of the first sensor parts 41 according to the contact position detection method. Each first connection portion 42 extends linearly from the end portion of the corresponding first sensor portion 41. Similarly, the second transparent conductor 45 has a second connection portion 47 connected to the second sensor portion 46. The second connection portion 47 is provided at one end or both ends of each of the second sensor portions 46 according to the contact position detection method. Each second connecting portion 47 extends linearly from the end of the corresponding second sensor portion 46. As shown in FIG. 3A, in the present embodiment, the first connection portion 42 is integrally formed from the same material as the first sensor portion 41, and the second connection portion 47 is the same material as the first sensor portion 46. Is formed integrally.

  As the material of the first transparent conductor 40 and the second transparent conductor 45, a material having transparency and required conductivity is used. Examples of such materials include indium tin oxide (ITO), zinc oxide, indium oxide, antimony-added tin oxide, fluorine-added tin oxide, aluminum-added zinc oxide, potassium-added zinc oxide, silicon-added zinc oxide, and zinc oxide-oxide Examples thereof include metal oxides such as tin-based, indium oxide-tin oxide-based, and zinc oxide-indium oxide-magnesium oxide-based, and two or more of these metal oxides may be combined. The formation method of the 1st transparent conductor 40 and the 2nd transparent conductor 45 is not specifically limited, Sputtering method, a vacuum evaporation method, an ion plating method, CVD method, a coating method, a printing method etc. can be used. In the present embodiment, the first transparent conductor 40 and the second transparent conductor 45 are made of ITO formed by a sputtering method.

  The light refractive index of the transparent conductors 40 and 45 made of ITO is, for example, 1.94 near the light wavelength of 550 nm. Although the calculation method of a photorefractive index is not specifically limited, For example, it calculates from the measurement using an ellipsometer. Moreover, also in each layer of the base film 32 described later, the optical refractive index in the vicinity of the light wavelength of 550 nm of each layer is calculated from, for example, measurement using an ellipsometer.

  The thickness of the transparent conductors 40 and 45 made of ITO is preferably 20 nm or less, for example, 18 nm each. When the film thickness is small, for example, 40 nm or less, generally, the smaller the thickness of the transparent conductors 40 and 45, the smaller the reflectance of light derived from the transparent conductors 40 and 45, and the less the influence of the absorption term. Increases transmittance.

  When an index matching layer (described later) is not interposed between the transparent conductors 40 and 45 and the film body 33, generally, the smaller the light reflectance in the transparent conductors 40 and 45, the more transparent the touch panel sensor 30 is. The difference in light reflectance between the region where the conductors 40 and 45 are patterned and the region where the transparent conductors 40 and 45 are not patterned is also reduced. For this reason, by making the thickness of the transparent conductors 40 and 45 smaller, the area of the touch panel sensor 30 where the transparent conductors 40 and 45 are patterned and the area where the transparent conductors 40 and 45 are not patterned are provided. The difference in the reflectance of light between the two can be reduced, whereby the pattern of the transparent conductors 40 and 45 can be prevented from being visually recognized by the user of the touch panel sensor 30.

  On the other hand, when an index matching layer is interposed between the transparent conductors 40 and 45 and the film body 33, the reflectance in the region where the transparent conductors 40 and 45 are patterned in the touch panel sensor 30, and the transparent conductor 40. , 45 in the region where the patterning is not performed changes. At this time, by appropriately designing the index matching layer, either the reflectance in the region where the transparent conductors 40 and 45 are patterned or the reflectance in the region where the transparent conductors 40 and 45 are not patterned is selected. One of them can be changed more greatly.

  When the index matching layer is not interposed, the reflectance in the region where the transparent conductors 40 and 45 are patterned is generally larger than the reflectance in the region where the transparent conductors 40 and 45 are not patterned. . Here, by interposing the index matching layer, for example, both the reflectance in the region where the transparent conductors 40 and 45 are patterned and the reflectance in the region where the transparent conductors 40 and 45 are not patterned are reduced. In this case, by appropriately designing the index matching layer, the degree of the decrease in the reflectance in the region where the transparent conductors 40 and 45 are patterned is patterned. It is possible to make it larger than the degree of the decrease in the reflectance in the unexposed area. Thereby, the difference in light reflectance between the region where the transparent conductors 40 and 45 are patterned in the touch panel sensor 30 and the region where the transparent conductors 40 and 45 are not patterned can be reduced.

  Here, the index matching layer is a layer including at least a pair of a high refractive index layer and a low refractive index layer. When such an index matching layer is interposed between the transparent conductors 40 and 45 and the film body 33, an effect of thin film interference occurs, whereby the transparent conductors 40 and 45 of the touch panel sensor 30 are patterned. The difference in light reflectance and transmittance between the region where the transparent conductors 40 and 45 are not patterned can be reduced. In the present embodiment, an index matching layer (a first functional layer 70 described later) is formed between the first transparent conductor 40 and the film body 33 by a first high refractive index layer 72 and a first low refractive index layer 73 described later. ), And an index matching layer (second functional layer described later) between the second transparent conductor 45 and the film body 33 by a second high refractive index layer 77 and a second low refractive index layer 78 described later. 75) is configured.

  In the present embodiment, the thickness of the transparent conductors 40 and 45 is made smaller, and an index matching layer is interposed between the transparent conductors 40 and 45 and the film body 33, so that the touch panel sensor 30 Of these, it is intended to reduce the difference in light reflectance and transmittance between the region where the transparent conductors 40 and 45 are patterned and the region where the transparent conductors 40 and 45 are not patterned.

Incidentally, in general, the smaller the thickness of the transparent conductors 40 and 45, the greater the electrical resistance of the transparent conductors 40 and 45. When the electrical resistance of the transparent conductors 40 and 45 is increased, it is conceivable that an electrical signal sent from the sensor electrodes 36a and 37a including the transparent conductors 40 and 45 to the detection circuit of the detection control unit 25 is inhibited. For this reason, when the thickness of the transparent conductors 40 and 45 is made smaller than before, the specific resistance as the material of the transparent conductors 40 and 45 is smaller than the conventional one so that the electrical resistance of the transparent conductors 40 and 45 does not become excessive. It is preferable to use a material. For example, the specific resistance of the transparent conductors 40 and 45 is preferably 4 × 10 ⁻⁶ Ωm (23 ° C., 55% RH) or less.

Takeoff conductors will be described in detail for the first extraction conductor 43, and second extraction conductor 48. As described above, the first extraction conductor 43 is disposed on a part of the first transparent conductor 40 via the first intermediate layer 61, and the second extraction conductor 48 is the second transparent conductor 45. The second intermediate layer 66 is disposed on a part of the first intermediate layer 66. More specifically, the first extraction conductor 43 is disposed on a part of the first connection portion 42 of the first transparent conductor 40 via the first intermediate layer 61, and the second extraction conductor 48 is The second transparent conductor 45 is disposed on a part of the second connection portion 47 via the second intermediate layer 66. That is, the first extraction conductor 43 is disposed in the inactive area Aa2 on the surface 32a on one side of the base film 32, and the second extraction conductor 48 is on the other side of the base film 32. The surface 32b is disposed in the inactive area Aa2.

  As shown in FIG. 3A, the first connection portion 42 of the first transparent conductor 40 and the second connection portion 47 of the second transparent conductor 45 are formed in a linear shape. And the 1st extraction conductor 43 is a line with the same pattern as the said part on the part other than the part of the connection location to the 1st sensor part 41 among the 1st connection parts 42 formed in linear form. It extends in a shape. Similarly, the second extraction conductor 48 is linear in the same pattern as the part on the part other than the vicinity of the connection part to the second sensor part 46 in the second connection part 47 formed in a linear shape. It extends to.

  Further, as shown in FIG. 3B, the first extraction conductor 43 is disposed on the first transparent conductor 40 so as to be separated from the base film 32. That is, the first extraction conductor 43 is not in contact with the base film 32. As a result, the portion of the first transparent conductor 40 that is covered by the first extraction conductor 43 is exposed laterally between the base film 32 and the first extraction conductor 43. In particular, in the present embodiment, the width of the first extraction conductor 43 is the same as the width of the first connection portion 42 of the first transparent conductor 40 covered by the first extraction conductor 43 or It is a little narrower.

  Similarly, although not shown, the second extraction conductor 48 is configured in the same manner as the first extraction conductor 43. That is, the second extraction conductor 48 is disposed on the second transparent conductor 45 so as to be separated from the base film 32 and is not in contact with the base film 32. As a result, the portion of the second transparent conductor 45 covered by the second extraction conductor 48 is exposed to the side between the base film 32 and the second extraction conductor 48. In particular, in the present embodiment, the width of the second extraction conductor 48 is the same as the width of the second connection portion 47 of the second transparent conductor 45 covered by the second extraction conductor 48 or It is a little narrower.

  The first extraction conductor 43 includes a first extraction conductor 36 b for connecting the first sensor electrode 36 a including the first sensor unit 41 of the first transparent conductor 40 to the detection control unit 25, and the first transparent conductor 40. The first connecting portion 42 is configured. In addition, the second extraction conductor 48 includes a second extraction wiring 37b for connecting the second sensor electrode 37a including the second sensor unit 46 of the second transparent conductor 45 to the detection control unit 25. The second connecting portion 47 of the body 45 is configured. Since the first extraction conductor 43 and the second extraction conductor 48 are arranged in the non-active area Aa2, it is not necessary to be formed from a light-transmitting material, and has high conductivity. It can be formed from materials such as metals. As shown in FIG. 3A, the width of the first extraction wiring 36b including the first connection portion 42 and the first extraction conductor 43 is larger than the width of the first sensor electrode 36a at the connection portion with the first sensor electrode 36a. Is also formed to be large. Similarly, the width of the second extraction wiring 37b including the second connection portion 47 and the second extraction conductor 48 is larger than the width of the second sensor electrode 37a at the connection portion with the second sensor electrode 37a. It is formed as follows. As shown in FIG. 3A, the widths of the connection terminal portions 36c and 37c with the detection control unit 25 in the extraction wirings 36b and 37b are larger than the widths of the other portions of the extraction wirings 36b and 37b.

  In the touch panel sensor 30 having such a configuration, the extraction wirings 36b and 37b including the connection portions 42 and 47 of the extraction conductors 43 and 48 and the transparent conductors 40 and 45 are detected and controlled via an external connection wiring (not shown). Connected to the unit 25. In this case, even if the touch panel sensor 30 is deformed by bending or the like, the connecting portions 42 and 47 of the extraction conductors 43 and 48 and the transparent conductors 40 and 45 are connected to each other as described below. Thus, stable conduction between the sensor electrodes 36a and 37a and the detection control unit 25 can be ensured.

  The extraction conductors 43 and 48 made of metal or the like having high conductivity have a certain degree of adhesion to the intermediate layers 61 and 66, but low adhesion to the base film 32 made of resin or glass. I only have power. Therefore, for example, as shown in FIG. 12, when the high-conductivity conductor is in contact with a base material made of resin, glass or the like, this contact position forms the starting point of peeling, and the base material as shown by a two-dot chain line When the is deformed, the high conductivity conductor is easily peeled off from the substrate. In particular, when the high-conductivity conductor covers the entire transparent conductor, the rigidity of the high-conductivity conductor and the transparent conductor as a whole increases, and deforms following the deformation of the substrate. It becomes difficult. Also from this point, when the base material is deformed, the high conductivity conductor is easily peeled off from the base material.

  On the other hand, according to the present embodiment, since the extraction conductors 43 and 48 are separated from the base film 32, the base point of the separation of the extraction conductors 43 and 48 from the base film 32 cannot be formed. Further, the extraction conductive layers 43 and 48 are merely placed on the intermediate layers 61 and 66, and do not cover the transparent conductors 40 and 45 and the intermediate layers 61 and 66 from the side. Therefore, the transparent conductors 40 and 45 are easily deformed following the deformation of the base film 32, and the transparent conductors 40 and 45 are also difficult to peel from the base film 32. Thus, according to the touch panel sensor 30 of the present embodiment, even if the touch panel sensor 30 is deformed due to bending or the like, the connection between the extraction conductors 43 and 48, the intermediate layers 61 and 66, and the transparent conductors 40 and 45 is achieved. The portions 42 and 47 are kept connected to each other, and stable conduction can be ensured between the sensor electrodes 36a and 37a and the detection control unit 25.

  Further, as shown in FIG. 3B, in the touch panel sensor 30 configured as described above, the extraction conductors 43 and 48 are arranged on the connection portions 42 and 47 of the intermediate layers 61 and 66 and the transparent conductors 40 and 45, respectively. However, it does not extend to the side of the connecting portions 42 and 47 of the transparent conductors 40 and 45. Accordingly, the overall line width of the extraction wirings 36b and 37b including the protective layers 62 and 67, the extraction conductors 43 and 48, the intermediate layers 61 and 66, and the connection portions 42 and 47 of the transparent conductors 40 and 45 is reduced. Can do. Thereby, the extraction wirings 36b and 37b having the same conductivity can be arranged at a shorter pitch, and the arrangement space of the extraction wirings 36b and 37b, that is, the area of the inactive area Aa2 can be reduced.

  Next, materials for forming the first extraction conductor 43 and the second extraction conductor 48 will be described in detail. The first extraction conductor 43 and the second extraction conductor 48 are made of a material having a higher conductivity (electrical conductivity) than the material forming the first transparent conductor 40 and the second transparent conductor 45. Specifically, it has a light shielding property and has a much higher conductivity than the transparent conductors 40 and 45 such as ITO, for example, metals such as aluminum, molybdenum, palladium, silver, chromium, copper, or these An alloy formed by mixing two or more metals, for example, a silver alloy is used as a material. Among these, a silver alloy has a smaller specific resistance than chromium generally used as a wiring material, and is preferable as a material of the first extraction conductor 43 and the second extraction conductor 48. As an example of such a silver alloy, an APC alloy containing silver, palladium, and copper can be given.

  By the way, the adhesion force between the silver conductor and the transparent conductors 40 and 45 made of a transparent conductor such as ITO is larger than the adhesion force between chromium, which is a general wiring material, and the transparent conductors 40 and 45. Generally small. When the adhesion between the extraction conductors 43 and 48 made of silver alloy and the transparent conductors 40 and 45 is small, the extraction conductor 43 made of silver alloy when some impact is applied to the extraction wirings 36b and 37b. , 48 may be peeled off from the transparent conductors 40, 45. For this reason, when the extraction conductors 43 and 48 made of a silver alloy are provided on the transparent conductors 40 and 45, the transparent conductors 40 and 45 and the extraction conductors 43 and 48 are provided between the transparent conductors 40 and 45 and the extraction conductors 43 and 48. It is preferable to have a certain degree of adhesion to each of the extraction conductors 43 and 48 and to interpose a conductive layer. In the present embodiment, as described above, the intermediate layers 61 and 66 are interposed between the transparent conductors 40 and 45 and the extraction conductors 43 and 48.

Intermediate layer will be described in detail below intermediate layer 61 and 66. As described above, the intermediate layers 61 and 66 have a certain degree of adhesion to each of the transparent conductors 40 and 45 and the extraction conductors 43 and 48 and have conductivity.

  First, the adhesion between the intermediate layers 61 and 66 will be described. The adhesion between the first intermediate layer 61 and the first transparent conductor 40 and the adhesion between the first intermediate layer 61 and the first extraction conductor 43 are the same as the first transparent conductor 40 and the first extraction conductor 43. It is larger than the adhesion between the conductor 43. Similarly, the adhesive force between the second intermediate layer 66 and the second transparent conductor 45 and the adhesive force between the second intermediate layer 66 and the second extraction conductor 48 are the same as those of the second transparent conductor 45 and It is larger than the adhesion force between the second extraction conductor 48. Here, “high adhesion” means, for example, that when a predetermined adhesive tape (not shown) is applied to the upper surfaces of the extraction wirings 36b and 37b, and then the adhesive tape is peeled off at a predetermined speed, the transparent conductor 40 , 45 and the extraction conductors 43 and 48, the extraction conductors 43 and 48 are not peeled off, but the transparent conductors 40 and 45 and the extraction conductors 43 and 48 are not separated. When the intermediate layers 61 and 66 are not interposed between the lead conductors 43 and 48, it means that the extraction conductors 43 and 48 are peeled off.

  Next, the conductivity of the intermediate layers 61 and 66 will be described. The role of conducting electrical signals from the sensor electrodes 36a, 37a to the detection circuit of the detection control unit 25 in the extraction wirings 36b, 37b is mainly played by the extraction conductors 43, 48. For this reason, the intermediate layers 61 and 66 do not need to have conductivity superior to that of the extraction conductors 43 and 48, and are electrically connected between the transparent conductors 40 and 45 and the extraction conductors 43 and 48 with low resistance. What is necessary is just to have the electroconductivity of the grade to connect. For this reason, the specific resistances of the intermediate layers 61 and 66 are larger than the specific resistances of the extraction conductors 43 and 48, respectively. Moreover, the thickness of the intermediate | middle layers 61 and 66 is smaller than the thickness of the extraction conductors 43 and 48, respectively, for example, when the thickness of the extraction conductors 43 and 48 is in the range of 15-25 nm, The thickness of the layers 61 and 66 is in the range of 4 to 6 nm.

  The material of the intermediate layers 61 and 66 is not particularly limited as long as the material has good adhesion to the transparent conductors 40 and 45 and the extraction conductors 43 and 48. For example, a metal such as molybdenum (Mo) alloy is used. . Examples of the Mo alloy include MoNb, which is an alloy of Mo and niobium (Nb).

Protective layer will be described in detail below second protective layer 67 provided on the first protective layer 62, and a second takeoff conductor 48 provided on the first extraction conductor 43. The protective layers 62 and 67 are provided to prevent the extraction conductors 43 and 48 from being oxidized, and are layers having oxidation resistance, water resistance, and the like. The material of the protective layers 62 and 67 is not particularly limited as long as the material has appropriate oxidation resistance. For example, a metal such as a Mo alloy is used. Examples of the Mo alloy include MoNb which is an alloy of Mo and Nb. The thickness of the protective layers 62 and 67 is in the range of 10 to 30 nm, for example.

Base Film Next, the base film 32 will be described in detail with reference to FIGS. In this Embodiment, the base film 32 is comprised from several layers so that it may mention later. Here, each layer of the base film 32 is integrally formed by sputtering, for example, without using bonding via an adhesive layer. In addition, the method of forming each layer of the base film 32 is not limited to sputtering, and a method such as coating can be appropriately used depending on the configuration of each layer.

  FIG. 4A is a diagram showing a cross section of the base film 32 in the active area Aa1. As shown to Fig.4 (a), the base film 32 is the transparent film main body 33 and the 1st under provided on the surface 33a by the side of the 1st transparent conductor 40 (one side) of the film main body 33. As shown in FIG. The coating layer 71, the first high refractive index layer 72 provided on the first transparent conductor 40 side (one side) surface 71 a of the first undercoat layer 71, and the first high refractive index layer 72 The first low refractive index layer 73 provided on the surface 72a on the first transparent conductor 40 side (one side) and the surface 33b on the second transparent conductor 45 side (the other side) of the film body 33 are provided. The second undercoat layer 76, the second high refractive index layer 77 provided on the surface 76b of the second undercoat layer 76 on the second transparent conductor 45 side (the other side), and the second high refractive index. Second low refraction provided on the surface 77b of the index layer 77 on the second transparent conductor 45 side (the other side). It has a layer 78, a. Among these, the first high refractive index layer 72 and the first low refractive index layer 73 constitute the first functional layer 70, and the second high refractive index layer 77 and the second low refractive index layer 78 constitute the second functional layer. 75 is configured.

  Hereinafter, each layer which comprises the base film 32 is explained in full detail. First, the film body 33 will be described in detail.

(Film body)
The material of the film body 33 is preferably a highly transparent material, for example, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polyethersulfone (PES), polyetheretherketone (PEEK), polycarbonate (PC). ), Polypropylene (PP), polyamide (PA), acrylic resin, epoxy resin, phenol resin, aliphatic cyclic polyolefin, norbornene-based thermoplastic transparent resin, and the like. In the present embodiment, the film body 33 is formed of PET having a light refractive index of 1.66. The thickness of the film main body 33 made of PET is not particularly limited, but is, for example, in the range of 50 to 200 μm.

(Undercoat layer)
Next, the first undercoat layer 71 and the second undercoat layer 76 will be described in detail. The undercoat layers 71 and 76 are layers for preventing a low molecular polymer (oligomer) generated in the film main body 33 from entering the high refractive index layers 72 and 77, and are made of, for example, an acrylic resin. . The light refractive index of the undercoat layers 71 and 76 made of acrylic resin is, for example, 1.51, and the thickness thereof is, for example, 3000 nm.

  The oligomer of the film main body 33 is generally generated when the base film 32 is heated in the step of forming the transparent conductors 40 and 45 described later.

(Functional layer)
Next, the first functional layer 70 and the second functional layer 75 will be described in detail. First, the purpose of providing the first functional layer 70 and the second functional layer 75 will be described.

(Purpose of functional layer)
As described above, there is a difference of about 0.3 in the optical refractive index between the film body 33 and the transparent conductors 40 and 45. Thus, when the difference of the optical refractive index of the film main body 33 and the transparent conductors 40 and 45 is large, generally, the area | region where the transparent conductors 40 and 45 are provided among the base film 32, and the area | region where it is not provided It is conceivable that the reflectance and transmittance of light differ greatly. Moreover, since the transparent conductors 40 and 45 made of ITO generally have a characteristic of absorbing a short wavelength of 450 nm or less, the spectrum of light transmitted through the region of the base film 32 where the transparent conductors 40 and 45 are provided. It is also possible that the yellowing. The 1st functional layer 70 and the 2nd functional layer 75 are layers provided in order to solve such a subject.

(Configuration of functional layer)
Next, the configuration of the first functional layer 70 and the second functional layer 75 will be described. As described above, the functional layers 70 and 75 include the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78. Of these, the refractive index of the high refractive index layers 72 and 77 is larger than the refractive index of the transparent conductors 40 and 45, and the refractive index of the low refractive index layers 73 and 78 is the transparent conductor 40. , 45 is smaller than the optical refractive index. By providing the functional layers 70 and 75 having such a configuration between the film body 33 and the transparent conductors 40 and 45, the transparent conductors 40 and 45 are provided in the active area Aa1 of the base film 32. The reflectance of light in the region (the reflectance of light in the region indicated by arrows (1) and (3) in FIG. 4A) and the reflectance of light in the region where the transparent conductors 40 and 45 are not provided. (The reflectance of light in the region indicated by arrows (2) and (4) in FIG. 4A) can be reduced. Similarly, by providing the functional layers 70 and 75, the light transmittance in the region where the transparent conductors 40 and 45 are provided, and the light transmittance in the region where the transparent conductors 40 and 45 are not provided, , The difference can be reduced.

  Further, by providing the functional layers 70 and 75 having the above-described configuration, the spectrum of light transmitted through the region where the transparent conductors 40 and 45 are provided in the base film 32 is changed to a flat spectrum in each wavelength region. can do. The spectrum shown on the left side in FIG. 4B is a spectrum of transmitted light when the functional layers 70 and 75 are not provided, and the spectrum shown on the right side in FIG. 4B is provided with the functional layers 70 and 75. It is the spectrum of the transmitted light when As shown in FIG. 4B, by providing the functional layers 70 and 75 between the film main body 33 and the transparent conductors 40 and 45, it becomes possible to realize uniform transmittance in each wavelength region. . In this way, it is possible to prevent only the yellow component from being excessive in the transmitted light. In this case, the absolute value of b * when the transmitted light is expressed in the L * a * b * color system is, for example, It is 1.5 or less.

(Function layer design method)
Next, a method for designing the functional layers 70 and 75 having the above functions will be described. First, a target of optical characteristics in the touch panel sensor 30 is determined. For example, in the active area Aa1 of the base film 32, the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are provided, and the light in the region where the transparent conductors 40 and 45 are not provided. The difference between the reflectance and the transmittance is 1% or less, respectively, and the absolute value of b * of the light transmitted through the region of the base film 32 where the transparent conductors 40 and 45 are provided is 1.5. The following is the target of optical characteristics.

  In the L * a * b * color system, L * represents lightness, and a * and b * are quantities representing hue and saturation. For a * and b *, the hue is close to an achromatic color in a value region where the absolute value is small. When b * exceeds +1.5, the transmitted color becomes yellowish, and when it is less than −1.5, the transmitted color becomes bluish. In these areas, the color of the transparent conductors 40 and 45 adversely affects the color display of the display device 15. Therefore, it is necessary to indicate the value of the achromatic region where the absolute value of b * is 1.5 or less.

  Next, based on the thickness and optical refractive index of each layer of the base film 32 and the thickness and optical refractive index of the transparent conductors 40 and 45, the values of reflectance, transmittance, and b * are obtained by simulation. Then, using the thicknesses of the high-refractive index layers 72 and 77 and the low-refractive index layers 73 and 78 and the optical refractive index as variable parameters, a parameter that achieves the above-described optical characteristic target is searched. Accordingly, the appropriate ranges of the thickness and the optical refractive index of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 are calculated, and thus the functional layer 70 that can obtain the target optical characteristics. , 75 are designed. As a simulation tool, for example, thin film design software (OPTAS-FILM) manufactured by Cybernet Systems Co., Ltd. can be used.

In addition, when the present inventors repeated experiments, in designing the functional layers 70 and 75, the wavelength dependency of the light refractive indexes of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 is considered. In particular, it has been found that it is important to consider the wavelength dependence of the optical refractive index of the high refractive index layers 72 and 77. More specifically, as supported by the experimental results in the examples described later, the above-mentioned optical characteristics target is achieved in the wavelength region near the light wavelength 550 nm, and the short wavelength region near the light wavelength 400 nm. It has also been found that it is important to calculate an appropriate range of the thicknesses of the high refractive index layers 72 and 77 and the optical refractive index so as to achieve the above-described optical property target. For example, the base film 32 and the transparent conductors 40 and 45 capable of obtaining the above-described target optical characteristics have the configurations shown in Table 1 below.

Next, the materials of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 will be described in detail. The material of the high refractive index layers 72 and 77 is not particularly limited as long as the material has a light refractive index capable of achieving the target optical characteristics. Thus, niobium pentoxide (Nb ₂ O ₅ ) having an optical refractive index of 2.18 for light having a wavelength of 550 nm is used. Further, the material of the low refractive index layers 73 and 78 is not particularly limited as long as it is a material having a light refractive index capable of achieving a target optical characteristic. For example, silicon dioxide having a light refractive index of 1.46. (SiO ₂ ) is used.

  Next, a method of manufacturing the touch panel sensor 30 configured as described above according to the flowchart shown in FIG. 7 will be described with reference to FIGS. 5 and 6A to 6L. 6A to 6L, FIG. 6A shows the touch panel sensor (laminated body) being manufactured in a cross section corresponding to the cross section along the line VV in FIG. 3A. Moreover, in each figure of FIG. 6A-FIG. 6L, a figure (b) is a top view which shows the touch panel sensor (laminated body) in preparation from one side (the upper side in the paper surface of each figure (a)).

First, with reference to FIG. 5, the process (process S1 in FIG. 7) which forms the laminated body (it is also called blanks) 50 as a base material for producing the touch panel sensor 30 is demonstrated. As will be described later, the touch panel sensor 30 can be obtained by performing processing (processing) such as film formation and patterning on the laminated body 50.
Laminate formation process

  First, the film body 33 is prepared, and then the first undercoat layer 71 and the second undercoat layer 76 are formed on the surface 33a on one side and the surface 33b on the other side of the film body 33, respectively (FIG. 5). (See (a)). The undercoat layers 71 and 76 are formed by coating, for example. In this case, the film body 33 and the undercoat layers 71 and 76 may be integrated.

  Next, as shown in FIG. 5B, the first functional layer 70 is formed on the surface 71 a on one side of the first undercoat layer 71, and the first surface 76 b on the other side of the second undercoat layer 76. A bifunctional layer 75 is formed. As described above, the first functional layer 70 includes the first high refractive index layer 72 and the first low refractive index layer 73, and the second functional layer 75 includes the second high refractive index layer 77 and the second low refractive index layer. 78. The high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 are formed by sputtering, respectively. In this manner, the base film 32 having the film body 33, the undercoat layers 71 and 76, the high refractive index layers 72 and 77, and the low refractive index layers 73 and 78 is formed.

(Transparent conductive layer deposition process)
Next, referring to FIG. 5C, the first transparent conductive layer 52 a is formed on the surface 32 a on one side of the base film 32, and the second transparent conductive is formed on the surface 32 b on the other side of the base film 32. A process of forming the layer 52b will be described. Here, the first transparent conductive layer 52a and the second transparent conductive layer 52b are layers that become the first transparent conductor 40 and the second transparent conductor 45 having translucency by performing patterning to be described later. As the 1st transparent conductive layer 52a and the 2nd transparent conductive layer 52b, the material which has translucency and electroconductivity is used, for example, ITO is used. The transparent conductive layers 52a and 52b made of ITO are formed on the base film 32 by sputtering, for example.

(Previous issues)
By the way, when forming ITO on the base film 32 by sputtering, conventionally, ITO is first formed on the base film 32 held at room temperature by sputtering. Thereafter, the base film 32 on which ITO is formed is heated to a temperature higher than the crystallization temperature of ITO (annealing treatment). Thus, by subjecting the base film 32 on which ITO is formed to annealing treatment, crystallization of the ITO is promoted, thereby reducing the specific resistance of the ITO.

  However, the heat resistance of the base film 32 having a film body made of PET is generally lower than that of a glass substrate or the like, and therefore it is difficult to anneal the base film 32 and ITO at a high temperature, for example, 200 ° C. or higher. It is. For this reason, when the film-like substrate film 32 is used as the ITO substrate, the temperature of the annealing treatment after sputtering is generally about 140 ° C. In this case, the crystallization of ITO cannot sufficiently proceed, and therefore the specific resistance of ITO cannot be lowered sufficiently. Therefore, in order to sufficiently reduce the electrical resistance of the transparent conductors 40 and 45 of the touch panel sensor 30, it is necessary to increase the thickness of the transparent conductors 40 and 45. However, as described above, when the thickness of the transparent conductors 40 and 45 is increased, the reflectance of light in the transparent conductors 40 and 45 is increased, thereby providing the transparent conductors 40 and 45 in the touch panel sensor 30. It is conceivable that the difference in light reflectance and transmittance between the region where the transparent conductors 40 and 45 are not provided increases.

(This embodiment)
In order to solve the above-described problems, in the present embodiment, when the transparent conductive layers 52a and 52b made of ITO are formed on the base film 32 by sputtering, the temperature of the base film 32 is 140 to 170 ° C. Is kept within the range. In this case, when atoms (molecules) of the elements constituting the ITO reach the base film 32 by sputtering, each atom (molecule) has a large kinetic energy by sputtering, and each atom (molecule) has a base material. Thermal energy is supplied from the film 32. Thus, since each atom (molecule) which reached | attained on the base film 32 has energy larger than before, crystallization of ITO on the base film 32 can be accelerated | stimulated, and, thereby, crystallization rate of Transparent conductive layers 52 a and 52 b made of high ITO can be formed on the base film 32. As a result, the specific resistance of the formed transparent conductive layers 52a and 52b (transparent conductors 40 and 45) can be reduced, for example, 4 × 10 ⁻⁶ Ωm (23 ° C., 55% RH) or less. Can do. Thereby, even when the thickness of the transparent conductive layers 52a and 52b (transparent conductors 40 and 45) is reduced, the electrical resistance of the transparent conductive layers 52a and 52b (transparent conductors 40 and 45) is sufficiently reduced. be able to.

  As described above, according to the present embodiment, when the transparent conductive layers 52a and 52b made of ITO are formed on the base film 32 by sputtering, the temperature of the base film 32 is maintained within a range of 140 to 170 ° C. Thus, the thickness of the transparent conductive layers 52a and 52b (transparent conductors 40 and 45) can be reduced.

  As described above, when the film thickness is small, for example, 40 nm or less, in general, the smaller the thickness of the transparent conductors 40 and 45, the smaller the reflectance of light derived from the transparent conductors 40 and 45, and the absorption term Since the influence is small, the transmittance is high. Thereby, the reflectance of light in the transparent conductors 40 and 45 can be made smaller than that of the prior art. This reduces the difference in light reflectance and transmittance between the area where the transparent conductors 40 and 45 are provided in the touch panel sensor 30 and the area where the transparent conductors 40 and 45 are not provided. be able to.

  Further, according to the present embodiment, the transparent conductors 40 and 45 and the film body 33 are composed of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78, and function as an index matching layer. Layers 70 and 75 are interposed. For this reason, the reflection of light between the region where the transparent conductors 40 and 45 are patterned in the touch panel sensor 30 and the region where the transparent conductors 40 and 45 are not patterned by causing the effect of thin film interference. The difference between the transmittance and the transmittance can be further reduced.

  Thus, by forming the transparent conductive layers 52a and 52b on the base film 32, as shown in FIG. 5C, the intermediate laminate 80 including the base film 32 and the transparent conductive layers 52a and 52b. Is obtained. The transparent conductive layers 52a and 52b (transparent conductors 40 and 45) are preferably made of ITO containing 2 to 4% by weight of tin. By using ITO having such a composition, crystallization of ITO can be further promoted, and thereby the thickness of the transparent conductive layers 52a and 52b (transparent conductors 40 and 45) can be further reduced. Become.

  Next, as shown in FIG. 5D, the first light-shielding conductive layer 54a is formed on the surface 80a on one side of the intermediate laminate 80, and the second surface 80b on the other side of the film 80 with the transparent conductive layer. A light-shielding conductive layer 54b is formed. Among these, the 1st light-shielding conductive layer 54a contains the 1st intermediate | middle layer 61, the 1st extraction conductor 43, and the 1st protective layer 62, and each is formed by sputtering. The second light-shielding conductive layer 54a includes a second intermediate layer 66, a second extraction conductor 48, and a second protective layer 67, and each is formed by sputtering. In this way, the laminate 50 used for manufacturing the touch panel sensor 30 is formed, which includes the base film 32, the transparent conductive layers 52a and 52b, and the light-shielding conductive layers 54a and 54b. .

  Here, the first light-shielding conductive layer 54a and the second light-shielding conductive layer 54b are layers having a light-shielding property with respect to light used for exposure of photosensitive layers 56a and 56b described later, that is, a layer having a property of not transmitting the exposure light. It is. However, in the present embodiment, not only the exposure light of the photosensitive layers 56a and 56b but also a layer having a light shielding property against light in other wavelength regions, more specifically, visible light that can be included in natural light. It is formed as a layer having a light shielding property against ultraviolet rays, infrared rays and the like. If such a layer is used as the light-shielding conductive layers 54a and 54b, it can be expected to more reliably shield the exposure light.

  In addition, the laminated body 50 may be prepared as the sheet-like laminated body 50, or the elongate web-like laminated body 50, for example, the laminated body 50 wound up by the roll may be prepared. However, in consideration of production efficiency, a laminate 50 prepared in a different place and wound around a roll is prepared, and the web-like laminate 50 is supplied by rewinding the roll laminate 50. It is preferable that the steps described below are performed on the web-like laminate 50 to which the following steps are supplied. Or the said base film 32 is drawn | fed out from the roll which wound up the base film 32, or the intermediate | middle laminated body 80 which consists of the base film 32 and the 1st and 2nd transparent conductive layers 52a and 52b is wound. The intermediate laminate 80 is drawn out from the taken roll, and the laminate 50 is produced from the base film 32 or the intermediate laminate 80. The produced laminate 50 will be described below. It is also preferable that each step is performed.

Manufacturing Process of Touch Panel Sensor Next, a process of manufacturing the touch panel sensor 30 will be described with reference to FIGS. 6A to 6L and FIG.

  First, as shown in FIG. 6A, a laminate 50 obtained by the above-described steps is prepared.

  Next, as shown in FIG. 7 and FIG. 6B, the first photosensitive layer 56 a is formed on the surface 50 a on one side of the multilayer body 50, and the second photosensitive layer is formed on the surface 50 b on the other side of the multilayer body 50. The layer 56b is formed (step S2). The first photosensitive layer 56a and the second photosensitive layer 56b have photosensitivity to light in a specific wavelength range, for example, ultraviolet rays. Specifically, the photosensitive layers 56a and 56b can be formed by coating a photosensitive material on the surface of the laminate 50 using a coater.

  Thereafter, as shown in FIGS. 7 and 6C, the first photosensitive layer 56a and the second photosensitive layer 56b are simultaneously exposed (step S3).

  Specifically, first, as shown in FIG. 6C (a), the first mask 58a is disposed on the first photosensitive layer 56a, and the second mask 58b is disposed on the second photosensitive layer 56b. The first mask 58a has a predetermined pattern corresponding to the pattern of the first transparent conductor 40 to be formed, and the second mask 58b has a predetermined pattern corresponding to the pattern of the second transparent conductor 45 to be formed. It has the pattern of. The pattern of the first mask 58a and the pattern of the second mask 58b are different from each other.

  The positioning of the first mask 58a and the second mask 58b can be performed with reference to the alignment mark 59a provided on each of the first mask 58a and the second mask 58b. According to such a method, it is possible to position the first mask 58a and the second mask 58b with respect to each other with extremely high accuracy, for example, on the order of microns, and very easily (and therefore in a short time). Become.

  Next, as shown in FIG. 6C (a), in this state, exposure light (for example, ultraviolet rays) corresponding to the photosensitive characteristics of the first photosensitive layer 58a and the second photosensitive layer 58b is passed through the masks 58a and 58b. The photosensitive layers 56a and 56b are irradiated. As a result, the first photosensitive layer 56a and the second photosensitive layer 56b are simultaneously exposed in different patterns.

  In the illustrated example, the first photosensitive layer 56a and the second photosensitive layer 56b are positive photosensitive layers. Therefore, the first photosensitive layer 56a is irradiated with exposure light in a pattern corresponding to the pattern of the portion removed by etching to form the first transparent conductor 40, and the second photosensitive layer 56b is irradiated with the second transparent conductive layer. In order to form the body 45, exposure light is irradiated in a pattern corresponding to the pattern of the portion removed by etching. As shown in FIG. 6C (a), the exposure light applied to the first photosensitive layer 56a passes through the first photosensitive layer 56a, is applied to the laminate (blanks) 50, and is applied to the second photosensitive layer 56b. The exposure light passes through the second photosensitive layer 56b and is applied to the stacked body 50.

  However, the laminated body 50 includes a first light-shielding conductive layer 54a and a second light-shielding conductive layer 54b that shield exposure light. Therefore, the light from the exposure light source that has passed through the first photosensitive layer 56a is blocked by the first light-shielding conductive layer 54a and does not reach the second photosensitive layer 56b. Similarly, the exposure light source that has passed through the second photosensitive layer 56b. Is blocked by the second light-shielding conductive layer 54b and does not reach the first photosensitive layer 56a. That is, since the exposure light irradiated in a predetermined pattern for exposing the first photosensitive layer 56a is shielded by the first light-shielding conductive layer 54a, the exposure light of the predetermined pattern is irradiated to the second photosensitive layer 56b. Never happen. Similarly, since the exposure light irradiated with a predetermined pattern for exposing the second photosensitive layer 56b is shielded by the second light-shielding conductive layer 54b, the exposure light of the predetermined pattern is irradiated to the first photosensitive layer 56a. It will never be done. As a result, in the exposure step S3, the first photosensitive layer 56a and the second photosensitive layer 56b can be simultaneously exposed with a desired pattern with high accuracy.

  Next, as shown in FIGS. 7 and 6D, the exposed first photosensitive layer 56a and the second photosensitive layer 56b are developed (step S4). Specifically, a developer corresponding to the first photosensitive layer 56a and the second photosensitive layer 56b is prepared, and the first photosensitive layer 56a and the second photosensitive layer 56b are developed using this developer. As a result, as shown in FIG. 6D, portions of the first photosensitive layer 56a and the second photosensitive layer 56b irradiated with light from the exposure light source without being shielded by the first mask 58a and the second mask 58b. Are removed, and the first photosensitive layer 56a and the second photosensitive layer 56b are patterned into a predetermined pattern.

  7 and 6E, the first light-shielding conductive layer 54a is etched using the patterned first photosensitive layer 56a as a mask, and the second light-shielding conductive layer is used using the patterned second photosensitive layer 56b as a mask. 54b is etched (step S5). By this etching, the first light-shielding conductive layer 54a and the second light-shielding conductive layer 54b are patterned in substantially the same pattern as the patterns of the first photosensitive layer 56a and the second photosensitive layer 56b, respectively. For example, when the light-shielding conductive layers 54a and 54b are made of aluminum or molybdenum, phosphoric acid acetic acid (water) formed by mixing phosphoric acid, nitric acid, acetic acid, and water in a ratio of 5: 5: 5: 1 is used as an etching solution. Can be used. When the light-shielding conductive layers 54a and 54b are made of silver or a silver alloy, phosphoric acid acetic acid (water) containing phosphoric acid, nitric acid, acetic acid, and water in a ratio of 4: 1: 4: 4 is used as an etching solution. Can be used as Furthermore, when the light-shielding conductive layers 54a and 54b are made of chromium, an etching solution in which cerium ammonium nitrate, perchloric acid, and water are mixed at a ratio of 17: 4: 70 can be used.

  Next, as shown in FIGS. 7 and 6F, the first transparent conductive layer 52a is etched using the patterned first photosensitive layer 56a and the first light-shielding conductive layer 54a as a mask, and the patterned second photosensitive layer is used. The second transparent conductive layer 52b is etched using the 56b and the second light-shielding conductive layer 54b as a mask (step S6). For example, by using ferric chloride as an etching solution, the first transparent conductive layer 52a made of ITO is patterned into a pattern substantially the same as the pattern of the first photosensitive layer 56a and the first light-shielding conductive layer 54a. The second transparent conductive layer 52b made of is patterned in substantially the same pattern as the patterns of the second photosensitive layer 56b and the second light-shielding conductive layer 54b. That is, both the first transparent conductive layer 52a and the second transparent conductive layer 52b are simultaneously etched.

  After that, as shown in FIGS. 7 and 6G, the first photosensitive layer 56a that is patterned and remains on the first light-shielding conductive layer 54a, and the patterning that remains on the second light-shielding conductive layer 54b. The second photosensitive layer 56b is removed (step S7). For example, by using an alkaline solution such as 2% potassium hydroxide, the remaining first photosensitive layer 56a is removed, the patterned first light-shielding conductive layer 54a is exposed, and the remaining second photosensitive layer 56a is exposed. The layer 56b is removed, and the patterned second light-shielding conductive layer 54b is exposed.

  Next, as shown in FIGS. 7 and 6H, a third photosensitive layer 56c is formed as a further photosensitive layer on the patterned first light-shielding conductive layer 54a, and on the patterned second light-shielding conductive layer 54b. A fourth photosensitive layer 56d is formed as a further photosensitive layer (step S8). In the illustrated example, the third photosensitive layer 56c is formed so as to cover the touch panel sensor 30 (stacked body 50) being manufactured from one side, and the touch panel sensor 30 (stacked body 50) being manufactured is covered from the other side. Thus, the fourth photosensitive layer 56d is formed. Similar to the first photosensitive layer 56a and the second photosensitive layer 56b, the third photosensitive layer 56c and the fourth photosensitive layer 56d have photosensitivity to light in a specific wavelength region, for example, ultraviolet rays. Similarly to the first photosensitive layer 56a and the second photosensitive layer 56b, the third photosensitive layer 56c and the fourth photosensitive layer 56d are formed by coating a photosensitive material on the surface of the laminated body 50 using a coater. Can be done.

  Thereafter, as shown in FIGS. 7 and 6I, the third photosensitive layer 56c and the fourth photosensitive layer 56d are simultaneously exposed (step S9).

  In this step, first, as shown in FIG. 6I (a), the third mask 58c is disposed on the third photosensitive layer 56c, and the fourth mask 58d is disposed on the fourth photosensitive layer 56d. The third mask 58c has a predetermined pattern corresponding to a portion of the patterned first light-shielding conductive layer 54a to be removed to form the first extraction conductor 43. The third mask 58c In the patterned second light-shielding conductive layer 54b, a predetermined pattern corresponding to a portion to be removed to form the second extraction conductor 48 is provided. In the illustrated example, the third mask 58c has a pattern formed corresponding to the active area Aa1, more specifically, a light-transmitting region formed slightly larger than the active area Aa1. In the illustrated example, the fourth mask 58d has the same pattern as the third mask 58c.

  The positioning of the third mask 58c is performed by, for example, forming an alignment mark for positioning when the first light-shielding conductive layer 54a is patterned, and then using the alignment mark formed from the first light-shielding conductive layer 54a. It can be implemented as a reference. According to this method, the third mask 58c can be positioned with high accuracy with respect to the patterns of the first light-shielding conductive layer 54a and the first transparent conductive layer 52a. In addition, the same positioning method can be employed for positioning the fourth mask 58d, whereby the fourth mask 58d can be accurately applied to the pattern of the second light-shielding conductive layer 54b and the second transparent conductive layer 52b. Can be positioned.

  Next, as shown in FIG. 6I (a), with the third mask 58c and the fourth mask 58d disposed, exposure light (for example, corresponding to the photosensitive characteristics of the third photosensitive layer 56c and the fourth photosensitive layer 56d) UV light is irradiated to the photosensitive layers 56c and 56d through the masks 58c and 58d. As a result, the third photosensitive layer 56c and the fourth photosensitive layer 56d are simultaneously exposed in the same pattern. In the illustrated example, the third photosensitive layer 56c and the fourth photosensitive layer 56d are positive photosensitive layers. The third mask 58c and the fourth mask 58d have a light transmitting region including a region facing the active area Aa1. Accordingly, the third photosensitive layer 56c and the fourth photosensitive layer 56d are irradiated with the exposure light on the area facing the active area Aa1 and the periphery thereof. As shown in FIG. 6I (a), the pattern of light from the exposure light source applied to the third photosensitive layer 56c is the same as the pattern of exposure light applied to the fourth photosensitive layer 56d. Therefore, the third photosensitive layer 56c and the fourth photosensitive layer 56d can be simultaneously exposed with a predetermined pattern with high accuracy.

  Next, as shown in FIGS. 7 and 6J, the exposed third photosensitive layer 56c and the fourth photosensitive layer 56d are developed (step S10). Specifically, a developer corresponding to the third photosensitive layer 56c and the fourth photosensitive layer 56d is prepared, and the third photosensitive layer 56c and the fourth photosensitive layer 56d are developed using this developer. As a result, as shown in FIG. 6J, portions of the third photosensitive layer 56c and the fourth photosensitive layer 56d that have been exposed to the exposure light without being shielded by the third mask 58c and the fourth mask 58d are removed. The That is, of the third photosensitive layer 56c and the fourth photosensitive layer 56d, the region facing the active area Aa1 and the surrounding region are removed, and the third photosensitive layer 56c and the fourth photosensitive layer 56d are moved to the inactive area Aa2. It remains only in the facing area.

  Thereafter, as shown in FIGS. 7 and 6K, the patterned first light-shielding conductive layer 54a is etched using the patterned third photosensitive layer 56c as a mask, and is patterned using the patterned fourth photosensitive layer 56d as a mask. The second light-shielding conductive layer 54b is etched (step S11). In this step, the etching solution has erosion with respect to the light-shielding conductive layers 54a and 54b and does not have erosion with respect to the transparent conductive layers 52a and 52b, or with respect to the transparent conductive layers 52a and 52b. An etchant having a weak erodibility is used. This is because the pattern of the transparent conductive layers 52a and 52b exposed by removing the light shielding conductive layers 54a and 54b is not impaired. That is, the etching solution used in this step S11 is selected so that a desired layer (light-shielding conductive layers 54a and 54b) can be selectively etched. As a specific example, the above-described phosphoric acid acetic acid (water) or cerium nitrate-based etching solution has etching properties for the light-shielding conductive layers 54a and 54b made of a predetermined metal, but the transparent conductive layer 52a made of ITO or the like. Since it has no etching property with respect to 52b, it can be suitably used in this step.

  Etching in this step S11 removes at least a portion of the patterned first light-shielding conductive layer 54a disposed at a position facing the active area Aa1. Similarly, at least a portion of the patterned second light-shielding conductive layer 54b disposed at a position facing the active area Aa1 is removed. As a result, as shown in FIG. 6K (b), only the base film 32 and the transparent conductive layers 52a and 52b remain in the active area Aa1, and the active area Aa1 has translucency over the entire area. To have.

  In this manner, the portion of the first light-shielding conductive layer 54a that is not covered by the third photosensitive layer 56c is removed, so that the first transparent conductive layer 52a is exposed. The exposed first transparent conductive layer 52a is located in and around the region facing the active area Aa1. The first transparent conductive layer 52a located in a region facing the active area Aa1 has a predetermined pattern, forms the first sensor portion 41 of the first transparent conductor 40, and is exposed to the inactive area Aa2. The conductive layer 52 a has a predetermined pattern and forms a part of the first connection portion 42 of the first transparent conductor 40.

  Similarly, the second transparent conductive layer 52b is exposed by removing the portion of the second light-shielding conductive layer 54b that is not covered by the fourth photosensitive layer 56d. The exposed second transparent conductive layer 52b is located in and around the region facing the active area Aa1. The second transparent conductive layer 52b located in the region facing the active area Aa1 has a predetermined pattern, forms the second sensor portion 46 of the second transparent conductor 45, and is exposed to the non-active area Aa2. The conductive layer 52 b has a predetermined pattern and forms a part of the second connection portion 47 of the second transparent conductor 45.

  Next, as shown in FIGS. 7 and 6L, the third photosensitive layer 56c that is patterned and remains on the first light-shielding conductive layer 54a, and the patterning that remains on the second light-shielding conductive layer 54b. The fourth photosensitive layer 56b is removed (step S12). For example, by using the alkali solution described above, the remaining third photosensitive layer 56c is removed, the patterned first light-shielding conductive layer 54a is exposed, and the remaining fourth photosensitive layer 56d is removed. Then, the patterned second light-shielding conductive layer 54b is exposed.

  The exposed first light-shielding conductive layer 54a has a predetermined pattern, and forms the first intermediate layer 61, the first extraction conductor 43, and the first protective layer 62. Between the formed 1st intermediate | middle layer 61 and the base film 32, the 1st connection part 42 of the 1st transparent conductor 40 which consists of a 1st transparent conductive layer 52a is formed. As described above and as shown in FIG. 3B, the first intermediate layer 61, the first extraction conductor 43, and the first protective layer 62 formed in this way are separated from the base film 32 and are first. It comes to be located on the connection part 42. For this reason, the first connection portion 42 is exposed laterally between the first intermediate layer 61 and the base film 32.

  Similarly, the exposed second light-shielding conductive layer 54b has a predetermined pattern, and forms the second intermediate layer 66, the second extraction conductor 48, and the second protective layer 67. Between the formed 2nd intermediate | middle layer 66 and the base film 32, the 2nd connection part 47 of the 2nd transparent conductor 45 which consists of a 2nd transparent conductive layer 52b is formed. The second intermediate layer 66, the second extraction conductor 48, and the second protective layer 67 formed in this way are separated from the base film 32 and are positioned on the second connection portion 47. For this reason, the second connection portion 47 is exposed laterally between the second intermediate layer 66 and the base film 32.

  The touch panel sensor 30 having the above-described configuration can be obtained as described above.

  As described above, the base material 32, the laminated body 50, or the base material such as the intermediate film 80 including the base film 32 and the first and second transparent conductive layers 52a and 52b is in a web shape. When prepared in a state of being wound around a roll, the web-shaped base material may be fed out from the roll, and the above-described steps may be performed on the fed-out base material. In this case, a large number of touch panel sensors 30 are formed in a state of being connected to each other through the base film 32. The web-shaped touch panel sensor 30 thus manufactured may be wound on a roll while being overlapped with a protective slip sheet for convenience of handling (conveyance, shipping, etc.). The touch panel sensor 30 wound on the roll can be fed out from the roll and cut into sheets as needed.

  In addition, when winding the web-shaped touch panel sensor 30 on a roll, the web-shaped touch panel sensor 30 may be wound by placing a slip sheet on both sides, or only one side of the web-shaped touch panel sensor 30 may be wound. An interleaving paper may be arranged and wound up.

  According to the manufacturing method described above, the first photosensitive layer 56a and the second photosensitive layer 56b are exposed simultaneously. In the double-sided simultaneous exposure process of the photosensitive layer, as shown in FIG. 6C (a), the first mask 58a and the second mask 58a and the second mask 58b are provided by providing the alignment marks 59a respectively. It is possible to position the masks 58b with respect to each other with extremely high accuracy, for example, on the order of microns, and very easily (and therefore in a short time). As a result, in the touch panel sensor 30, both the first transparent conductor 40 and the second transparent conductor 45 are positioned on the base film 32 with high accuracy and efficiency.

  On the other hand, when the first photosensitive layer 56a and the second photosensitive layer 56b are sequentially exposed one by one, the first transparent conductor 40 and the second transparent conductor 45 can be manufactured accurately and easily. Can not. In order to manufacture both the first transparent conductor 40 and the second transparent conductor 45 with high accuracy, one of the first transparent conductor 40 and the second transparent conductor 45 is formed on the base film 32 together with the alignment mark. Thereafter, the mask used for forming the other of the first transparent conductor 40 and the second transparent conductor 45 is positioned with respect to the alignment mark formed on the base film 32. That is, at least the exposure process and the development process need to be performed separately for each of the first photosensitive layer 56a and the second photosensitive layer 56b. For this reason, the first transparent conductor 40 and the second transparent conductor 45 cannot be efficiently and easily formed in a short time.

  Further, without using the alignment mark, for example, the first transparent conductor 40 and the second transparent conductor 45 are exposed while positioning the first mask 58a and the second mask 58b with reference to the end of the base film 32. Is also possible. According to this method, the exposure process and the development process for the first photosensitive layer 56a and the second photosensitive layer 56b can be performed simultaneously. However, the positioning accuracy of the first transparent conductor 40 and the second transparent conductor 45 depends on the outer shape accuracy of the base film 32. Generally, according to this method, the positioning accuracy of the first transparent conductor 40 and the second transparent conductor 45 can be expected only in units of several tens of microns at the maximum.

  From these things, according to the manufacturing method of this Embodiment demonstrated above, the 1st transparent conductor 40 and the 2nd transparent conductor 45 can be positioned easily and accurately with respect to each other. Specifically, according to the present embodiment, when the touch panel sensor 30 is viewed from the top, that is, when the touch panel sensor 30 is observed from the normal direction, the bulging portion having a substantially square shape of the first sensor portion 41. The gap G (also referred to as a pattern gap, see FIG. 3A) parallel to each other between 41b and the bulging portion 46b having a substantially square shape of the second sensor portion 46 is stably set to 100 μm or less. I was able to. On the other hand, in the conventional method of bonding two films, the pattern gap G is 200 μm or more. As a result, according to the present embodiment, when the touch panel sensor 30 is observed from the normal direction to the entire area of the active area Aa1 where the contact (approach) position can be detected, the first sensor unit 41 and the second sensor The percentage of the region where at least one of the portions 46 is arranged can be 95% or more in percentage. Moreover, according to this Embodiment, the adhesion layer for bonding two films together becomes unnecessary, and thereby manufacturing cost can be lowered.

  Further, the extraction wirings 36b and 37b include extraction conductors 43 and 48 having high conductivity as well as connection portions 42 and 47 of the transparent conductors 40 and 45 having low conductivity. Therefore, the line widths of the extraction wirings 36b and 37b can be reduced, and the arrangement space of the extraction wirings 36b and 37b, that is, the area of the inactive area Aa2 can be reduced.

  In particular, according to the above-described method, the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protection layers 62 and 67 are formed as shown in FIG. It is possible to prevent it from extending to the side of the connecting portions 42 and 47 of the transparent conductors 40 and 45 only by being disposed on the connecting portions 42 and 47 of 45. On the other hand, for example, when the conductive conductors 43 and 48 are formed from the high conductivity material on the connection portions 42 and 47 of the transparent conductors 40 and 45 by screen printing that has been frequently used in the past, as shown in FIG. In addition, the transparent conductors 40 and 45 extend from the side of the connecting portions 42 and 47 to the base film 32 and spread. According to the extraction wirings 36b and 37b of the present embodiment as compared with such a conventional extraction wiring, when the extraction conductor is formed using the same amount of high conductivity material, the conductivity of the extraction wirings 36b and 37b. The line width can be greatly reduced while keeping the same.

  In addition, since the intermediate layers 61 and 66, the extraction conductors 43 and 48, the protective layers 62 and 67, and the connection portions 42 and 47 of the transparent conductors 40 and 45 according to the present embodiment are formed by photolithography technology, Compared with a conventional method by screen printing or the like, it can be formed in a desired shape at a desired position with extremely high accuracy. Furthermore, according to the present embodiment, unlike the conventional extraction wiring shown in FIG. 12, the high-conductivity extraction conductors 43 and 48 cover the transparent conductors 40 and 45 to the sides of the connection portions 42 and 47, respectively. Therefore, the possibility of electromigration can be reduced. For these reasons, the arrangement pitch of the extraction wirings 36b and 37b can be significantly shortened, whereby the arrangement space of the extraction wirings 36b and 37b, that is, the area of the inactive area Aa2 can be reduced.

  By the way, according to the manufacturing method of the present embodiment described above, the connecting portions 42 and 47 of the transparent conductors 40 and 45 are formed by the intermediate layers 61 and 66, the extraction conductors 43 and 48 or the protective layers 62 and 67. As shown in FIG. 3B, the widths of the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67 are covered by the intermediate layers 61 and 66 as well as preventing light from being shielded from the side. The width of the connecting portions 42 and 47 of the transparent conductors 40 and 45 may be narrower. That is, when observed from the normal direction of the film surface of the base film 32, the intermediate layers 61, 66, the extraction conductors 43, 48 and the protective layers 62, 67 are arranged only on the transparent conductors 40, 45. In other words, the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67 are disposed only in the region where the connection portions 42 and 47 of the transparent conductors 40 and 45 are disposed. Can be. According to such a configuration, it is possible to further stabilize the conduction between the sensor electrodes 36a and 37a and the detection control unit 25 described above. Further, since the possibility of electromigration can be further reduced, the arrangement pitch of the extraction wirings 36b and 37b can be further shortened, and the area of the inactive area Aa2 can be reduced.

  Hereinafter, when the extraction wirings 36b and 37b are formed by the manufacturing method described above, the widths of the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67 of the extraction wirings 36b and 37b are the same. 66, an estimation mechanism that becomes narrower than the width of the connection portions 42 and 47 of the transparent conductors 40 and 45 covered by the extraction conductors 43 and 48 and the protective layers 62 and 67 is mainly illustrated. As will be described with reference to FIG. 8, the present invention is not limited to this estimation mechanism.

  In the conventional method of making a touch panel sensor by bonding two films together, when forming a transparent conductor connection on the film using photolithography technology, on the transparent conductive layer that becomes a transparent conductor The photosensitive layer is directly disposed on the substrate. On the other hand, according to the present embodiment, the light-shielding conductive layers 54a and 54b are disposed on the transparent conductive layers 52a and 52b that form the transparent conductors 40 and 45, respectively. Generally, a photosensitive layer (resist layer) has high erosion resistance with respect to an etching solution (for example, ferric chloride) for etching a transparent conductive layer. However, the light-shielding conductive layers 54a and 54b made of metal or the like can be etched with an etching solution for the transparent conductive layers 52a and 52b such as ITO.

  Therefore, as shown in FIG. 8, when the transparent conductive layers 52a and 52b are etched in the vertical direction (normal direction of the base film) in the step S6 of etching the transparent conductive layers 52a and 52b, the light shielding conductive layer. 54a and 54b can be etched in the lateral direction (direction along the sheet surface of the base film 32) from the side not covered by the photosensitive layers 56a and 56b. On the other hand, since the photosensitive layer has high erosion resistance with respect to the etching solution used in this step S6, it is not greatly etched in the lateral direction. For the reasons described above, according to the touch panel sensor 30 manufactured by the manufacturing method of the present embodiment, the widths of the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67 are set to the intermediate layer. 61, 66, the extraction conductors 43, 48, and the widths of the connecting portions 42, 47 of the transparent conductors 40, 45 covered by the protective layers 62, 67 can be made smaller.

  Furthermore, when the first photosensitive layer 52a and the second photosensitive layer 52b are simultaneously exposed in different patterns, the light shielding layer (covered conductive layer) 54a used to avoid the influence of the exposure light patterns on each other. , 54b, intermediate layers 61 and 66, extraction conductors 43 and 48, and protective layers 62 and 67 are produced. According to such a method, it is possible to reduce the material cost required for manufacturing the touch panel sensor 30. Furthermore, the production efficiency of the touch panel sensor 30 can be improved extremely effectively, and the production cost of the touch panel sensor 30 can be reduced accordingly. That is, the above-described excellent touch panel 30 (touch panel device 20) can be manufactured with high production efficiency and low manufacturing cost.

Moreover, according to this Embodiment, as mentioned above, when forming the transparent conductive layers 52a and 52b on the base film 32 by sputtering, the temperature of the base film 32 is kept within the range of 140-170 degreeC. Thus, the crystallization of the transparent conductive layers 52a and 52b on the base film 32 can be promoted, whereby the transparent conductive layers 52a and 52b having a high crystallization rate can be formed on the base film 32. it can. As a result, the specific resistance of the formed transparent conductive layers 52a and 52b (transparent conductors 40 and 45) can be reduced. For example, ITO can be used as a material for the transparent conductive layers 52a and 52b (transparent conductors 40 and 45). Is used, the specific resistance can be 4 × 10 ⁻⁶ Ωm (23 ° C., 55% RH) or less.

  Thus, by reducing the specific resistance of the transparent conductive layers 52a and 52b (transparent conductors 40 and 45), the thickness of the transparent conductors 40 and 45 in the touch panel sensor 30 can be reduced. The reflectance of light in the bodies 40 and 45 can be made smaller than before. For this reason, the difference in the reflectance of light between the region where the transparent conductors 40 and 45 are patterned in the touch panel sensor 30 and the region where the transparent conductors 40 and 45 are not patterned can be reduced. Thereby, the designability of the touch panel sensor 30 can be improved.

  The touch panel sensor 30 obtained as described above is bonded to the display device 15 via the adhesive layer 19, and the protective cover 12 is bonded to the touch panel sensor 30 via the adhesive layer 15. The input / output device 10 shown in FIG. Next, the operation when using the input / output device 10 will be described.

Operation of Input / Output Device First, in such an input / output device 10, an observer observes an image through the protective cover 12 and the touch panel sensor 30 by displaying an image on the display panel 16 of the display device 15. be able to.

  In the input / output device 10, the touch panel sensor 30 and the protective cover 12 constitute a part of the touch panel device 20, and the external conductor 5, typically a human finger 5, contacts (approaches) on the protective cover 12. While being able to detect, the position where the outer conductor 5 contacted (approached) on the protective cover 12 can be detected.

  Specifically, first, when an external conductor (for example, a human finger) 5 comes into contact with the protective cover 12, the transparent conductor located near the external conductor 5 and a position where the external conductor 5 contacts the protective cover 12. The sensor portions 41 and 46 of the bodies 40 and 45 function as electrodes, and an electric field is formed. At this time, the protective cover 12, the base film 32, and the like positioned between the sensor portions 41 and 46 of the transparent conductors 40 and 45 constituting the sensor electrodes 36a and 37a and the outer conductor 5 function as a dielectric. . That is, when the outer conductor 5 comes into contact with the protective cover 12, a capacitor having the sensor portions 41 and 46 and the outer conductor 5 as electrodes is formed.

  The detection circuit of the detection control unit 25 of the touch panel device 20 is connected to the sensor units 41 and 46, and can detect the capacitance between the sensor units 41 and 46 and the external conductor 5. Yes. Then, the detection control unit 25 detects a change in the capacitance between each of the sensor units 41 and 46 and the outer conductor 5, thereby determining which first sensor unit 41 the outer conductor 5 faces. In addition, it can be specified which second sensor portion 46 the outer conductor 5 faces.

  That is, the detection circuit of the detection control unit 25 faces the outer conductor 5 of the multiple first sensor units 41 included in the first transparent conductors 40 arranged in the one direction in the active area Aa1. By specifying the first sensor portion (linear conductor), the position of the outer conductor 5 on the coordinate axis extending in the one direction can be specified. Similarly, the detection circuit of the detection control unit 25 faces the outer conductor 5 of the multiple second sensor units 46 included in the second transparent conductor 45 arranged side by side in the other direction in the active area Aa1. By specifying the second sensor portion (linear conductor), the position of the outer conductor 5 on the coordinate axis extending in the other direction can be specified. In this way, by detecting the contact position of the external conductor 5 to the touch panel device 20 (protective cover 12) in two directions, the position coordinates of the contact position of the external conductor 5 to the surface of the touch panel device 20 can be obtained. It is possible to specify with high accuracy on the surface of the device 20. Note that various methods (principle) for detecting a contact position in a projected capacitively coupled touch panel are disclosed in various documents, and further description is omitted in this specification.

  In the touch panel sensor 30 manufactured according to the above-described manufacturing method, the sensor electrodes 36a and 37a and the extraction wirings 36b and 37b are formed on both sides of the base film 32 composed of a plurality of layers formed as a unit. That is, a joined body of a plurality of films joined via an adhesive or the like is not used as a base film. As a result, the transmissivity of the touch panel sensor 30 as a whole can be improved. In addition, since the number of interfaces that can reflect ambient light (external light) such as illumination or image light can be reduced, the reflection of the ambient light is suppressed and the contrast of the image displayed on the display device 15 is improved. be able to. Accordingly, when the touch panel sensor 30 is disposed on the display surface 16 of the display device 15, it is possible to prevent the display image of the display device 15 from being greatly deteriorated. Furthermore, the total thickness of the touch panel sensor 30 and the input / output device 10 can be reduced.

  Further, as shown in FIG. 2, the first sensor portion 41 of the first transparent conductor 40 constituting the first sensor electrode 36a and the second sensor portion of the second transparent conductor 45 constituting the second sensor electrode 37a. 46 is arrange | positioned in a different position along the normal line direction of the touchscreen sensor 30 (protective cover 12). Specifically, the second sensor portion 46 of the second transparent conductor 45 is disposed at a position spaced apart from the protective cover 12 by the thickness of the base film 32 than the first sensor portion 41 of the first transparent conductor 40. Has been. However, as described above, the base film 32 in the present embodiment is configured as a film composed of a plurality of layers formed integrally. Further, the base film 32 is not required to have a special function such as a deep ultraviolet light shielding function, unlike the base film disclosed in the patent document (Japanese Patent Laid-Open No. 4-264613). That is, it can be composed of a thin film. Therefore, when the outer conductor 5 comes into contact with the protective cover 12, a capacitor can be stably formed between the outer conductor 5 and the second sensor portion 46 of the second transparent conductor 45. Thereby, the contact position (touch position) of the outer conductor 5 to the protective cover 12 is not only determined by the first sensor unit 41 of the first transparent conductor 40 but also by the second sensor unit 46 of the second transparent conductor 45. However, it becomes possible to detect with high sensitivity and accuracy.

  Further, according to the present embodiment, the touch panel sensor 30 includes the base film 32, the first transparent conductor 40 patterned on the surface 32 a on one side of the base film 32, and the other of the base film 32. And a second transparent conductor 45 patterned on the surface 32b on this side. Among these, the base film 32 includes a transparent film body 33, a first undercoat layer 71 provided on the surface 33 a on one side of the film body 33, and a surface on one side of the first undercoat layer 71. The first high refractive index layer 72 provided on 71a, the first low refractive index layer 73 provided on the surface 72a on one side of the first high refractive index layer 72, and the other side of the film body 33 A second undercoat layer 76 provided on the second surface 33b, a second high refractive index layer 77 provided on the second surface 76b of the second undercoat layer 76, and a second high refractive index layer 77. And a second low refractive index layer 78 provided on the surface b77 on the other side.

  The optical refractive index of the high refractive index layers 72 and 77 is larger than the optical refractive index of the transparent conductors 40 and 45, and the optical refractive index of the low refractive index layers 73 and 78 is the transparent conductor 40. , 45 is smaller than the optical refractive index. Therefore, the functional layers 70 and 75 including the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 can function as an index matching layer, and the functional layers 70 and 75 are transparent to the film body 33. By providing between the conductors 40 and 45, the effect of thin film interference can be produced. Thus, the reflectance of light in the area where the transparent conductors 40 and 45 are provided in the active area Aa1 of the base film 32 and the reflectance of light in the area where the transparent conductors 40 and 45 are not provided. And the difference can be reduced. Similarly, by providing the functional layers 70 and 75 composed of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 between the film body 33 and the transparent conductors 40 and 45, the transparent conductor 40, The difference between the light transmittance in the region where 45 is provided and the light transmittance in the region where the transparent conductors 40 and 45 are not provided can be reduced.

  Further, by providing functional layers 70 and 75 composed of the high refractive index layers 72 and 77 and the low refractive index layers 73 and 78 between the film main body 33 and the transparent conductors 40 and 45, the base film 32 is transparent. The spectrum of the light transmitted through the region where the conductors 40 and 45 are provided can be flat in each wavelength range. For example, when the transmitted light is expressed in the L * a * b * color system The absolute value of b * can be 1.5 or less.

  Further, according to the present embodiment, as shown in FIG. 3A, the first sensor portion 41 of the first transparent conductor 40 has the line portion 41 a and the bulging portion 41 b, and the second transparent conductor 45 The 2nd sensor part 46 has the line part 46a and the bulging part 46b. In each sensor part 41 and 46, the width | variety in the bulging parts 41b and 46b is very thick compared with the width | variety in the line parts 41a and 46a. As described above, the bulging portion 41b of the first sensor portion 41 included in the first transparent conductor 40 and the bulging portion 46b of the second sensor portion 46 included in the second transparent conductor 45 are: It arrange | positions so that it may not overlap, when it observes from the normal line direction of the film surface of the base film 32. FIG. For this reason, the external sensor 5 and the second sensor unit 46 of the second transparent conductor 45 have a wide area that allows the first sensor unit 41 of the first transparent conductor 40 to affect the detection accuracy of the contact position. There is no intervening between them. As a result, it is possible to prevent the capacitor from being effectively formed between the outer conductor 5 and the second sensor portion 46 of the second transparent conductor 45.

  Furthermore, as described above, the display control unit 17 of the display device 15 and the detection control unit 25 of the touch panel device 20 are connected. The detection control unit 25 can transmit information input when the outer conductor 5 contacts a predetermined position on the protective cover 12 to the display control unit 17. Based on the input information read by the detection control unit 25, the display control unit 17 can also display an image corresponding to the input information on the display panel 16 of the display device 15. In other words, the display function as the output unit and the touch position detection function as the input unit allow direct interaction of information between the user (operator) of the input / output device 10 and the input / output device 10. Exchange (for example, an instruction to the display device 15 by the user and execution of the instruction by the display device 15) can be realized.

  And as mentioned above, when the 1st transparent conductor 40 and the 2nd transparent conductor 45 are patterned on the base film 32 through the double-sided simultaneous exposure process (process S3) of the photosensitive layers 56a and 56b. The first sensor parts 41 of the first transparent conductor 40 constituting the first sensor electrode 36a and the second sensor parts 46 of the second transparent conductor 45 constituting the second sensor electrode 37a are accurate with respect to each other. It will be well positioned. As a result, both the first sensor portions 41 of the first transparent conductor 40 and the second sensor portions 46 of the second transparent conductor 45 can be accurately positioned with respect to the display device 15. In this case, the contact position of the outer conductor 5 with the protective cover 12 can be detected with high accuracy using the display device 15 as a reference. As a result, the input corresponding to the video information displayed on the display device 15 can be detected with high resolution and high accuracy, whereby the user (operator) of the input / output device 10 and the input / output device 10 can be detected. Exchange of information in the form of dialogue between the two will be carried out very smoothly.

  According to the present embodiment as described above, the light-shielding conductive layers 54a and 54b having light-shielding properties are arranged between the first photosensitive layer 56a and the second photosensitive layer 56b having photo-sensitivity. Therefore, the first photosensitive layer 56a and the second photosensitive layer 56b can be exposed with different patterns with high accuracy, and thereby the first photosensitive layer 56a and the second photosensitive layer 56b can be exposed with different desired patterns. Patterning can be performed with extremely high accuracy. The exposure of the first photosensitive layer 56a and the exposure of the second photosensitive layer 56b are performed in a state where the first mask 58a is disposed on the first photosensitive layer 56a and the second mask 58b is disposed on the second photosensitive layer 56b. Done. In this case, the first mask 58a and the second mask 58b can be easily and accurately positioned with respect to each other, whereby the pattern of the first photosensitive layer 56a and the pattern of the second photosensitive layer 56b are extremely accurate with respect to each other. It can be positioned well. As a result, the first transparent conductor 40 and the second transparent conductor 45 of the obtained touch panel sensor 30 can be formed with a desired pattern with high accuracy, and the first transparent conductor 40 and the second transparent conductor are formed. 45 can be positioned with high accuracy relative to each other. Therefore, by using the touch panel sensor 30, it is possible to accurately detect the position on the plane where the outer conductor (typically, the finger) 5 approaches or comes into contact.

  Further, the first mask 58a and the second mask 58b can be easily positioned with respect to each other, and the exposure of the first photosensitive layer 56a and the exposure of the second photosensitive layer 56b can be performed simultaneously. Therefore, the touch panel sensor 30 can be manufactured extremely efficiently, and thereby the manufacturing cost of the touch panel sensor 30 can be significantly reduced.

  Further, since the base film 32 is not required to have a special function (for example, a light blocking function for light in a specific wavelength range), it is a film formed of a plurality of layers that are usually formed integrally and used in a display device or the like. A material can be used as the base film 32. Therefore, it is not necessary to use a thick film or a laminate of a plurality of films bonded via an adhesive or the like as the base film. As a result, the separation distance between the first transparent conductor 40 and the second transparent conductor 45 is shortened, so that not only the first transparent conductor 40 but also the contact position or approach position detection sensitivity by the second transparent conductor 45 is detected. Can be improved. Moreover, the transmissivity of the touch panel sensor 30 can be improved, and when the touch panel sensor 30 is arranged on the display surface 16a of the display device 15, the display image of the display device 15 is greatly deteriorated. Can be prevented.

  Further, in the above-described embodiment, the light shielding conductive layers 54a and 54b arranged on the transparent conductive layers 52a and 52b and patterned together with the transparent conductive layers 52a and 52b are used as a part of the extraction wirings 36b and 37b. Specifically, the intermediate layers 61 and 66 including the light-shielding conductive layers 54a and 54b, which are patterned in the same pattern as the transparent conductive layers 52a and 52b and then partially removed, the extraction conductors 43 and 48, and the protective layer 62 are formed. 67, together with the transparent conductors 40 and 45 made of the patterned transparent conductive layers 52a and 52b, form the extraction wirings 36b and 37b.

  The extraction wirings 36b and 37b manufactured by such a method can ensure high conductivity (electrical conductivity) by the extraction conductors 43 and 48. Further, unlike the conventional extraction wiring (see FIG. 12) produced by screen printing or the like, the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67 are formed on the transparent conductive layers 52a and 52b. It is arranged and does not extend to the side of the transparent conductive layers 52a and 52b. Thereby, the line width of the extraction wirings 36b and 37b can be significantly reduced. Furthermore, according to the above-described embodiment, the extraction conductors 43 and 48 are formed using a photolithography technique unlike a conventional manufacturing method such as screen printing, so that a desired pattern can be stably and highly accurately formed. It is possible to produce the lead-out wirings 36b and 37b. Thereby, the possibility of electromigration can be greatly reduced. From the above, according to the present embodiment, it is possible to form the extraction wirings 36b and 37b having a narrow line width side by side at a short pitch, which is necessary for arranging the extraction wirings 36b and 37b. The area of the region, that is, the area of the inactive area Aa2 can be significantly reduced.

  Further, in the extraction wirings 36b and 37b, a silver alloy such as an APC alloy is used as the material of the extraction conductors 43 and 48. A silver alloy such as an APC alloy has a specific resistance smaller than that of chromium generally used as a wiring material. For this reason, the conductivity of the extraction wiring 37b can be increased by using a silver alloy as the material of the extraction conductors 43 and 48.

  In the extraction wirings 36b and 37b, intermediate layers 61 and 66 made of MoNb alloy or the like are interposed between the transparent conductors 40 and 45 and the extraction conductors 43 and 48 made of silver alloy. Here, the adhesion force of the intermediate layers 61 and 66 to the transparent conductors 40 and 45 and the adhesion force of the intermediate layers 61 and 66 to the extraction conductors 43 and 48 are determined by the transparent conductors 40 and 45 of the extraction conductors 43 and 48. It is larger than the adhesive strength against. For this reason, even if some mechanical force is applied to the extraction conductors 43 and 48, the extraction conductors 43 and 48 are not easily separated from the intermediate layers 61 and 66. Accordingly, the mechanical stability of the touch panel 30 can be improved as compared with the case where the intermediate layers 61 and 66 are not interposed between the transparent conductors 40 and 45 and the extraction conductors 43 and 48.

  Further, in the extraction wirings 36b and 37b, protective layers 62 and 67 made of a Mo alloy having oxidation resistance and water resistance, such as MoNb, are provided on the extraction conductors 43 and 48 made of silver alloy. As a result, the oxidation resistance and water resistance of the extraction conductors 43 and 48 can be improved as compared with the case where the protective layers 62 and 67 are not provided on the extraction conductors 43 and 48. The reliability of the touch panel 30 can be improved.

  Further, the extraction conductors 43 and 48 are not in contact with the base film 32 and are only bonded to the intermediate layers 61 and 66 that can exhibit high adhesion. For this reason, even if the touch panel sensor 30 is deformed during use, it is possible to make it difficult to form a starting point at which the extraction conductors 43 and 48 peel from the touch panel sensor 30. Further, the connecting portions 42 and 47 of the transparent conductors 40 and 45 are not covered to the side by the intermediate layers 61 and 66, the extraction conductors 43 and 48 or the protective layers 62 and 67, so It is exposed to the side between the layers 61 and 66. In other words, the deformation of the connecting portions 42 and 47 by the intermediate layers 61 and 66, the extraction conductors 43 and 48 and the protective layers 62 and 67 is weak, and the connecting portions 42 and 47 are formed on the base film when the touch panel sensor 30 is deformed. It can be deformed following the deformation of 32. Thus, the extraction conductors 43 and 48 are peeled off from the transparent conductors 40 and 45 or the base film 32, and the connection portions 42 and 47 are peeled off from the base film 32 together with the extraction conductors 43 and 48. , Can be effectively suppressed. As a result, the reliability of the detection function of the touch panel sensor 30 can be greatly improved.

  Furthermore, the light shielding conductive layers 54a and 54b used for forming the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67 are layers used as the light shielding layer in the double-sided simultaneous exposure step S3. According to such a manufacturing method, the touch panel sensor 30 having excellent performance as described above can be manufactured extremely efficiently and inexpensively.

Modifications Various modifications can be made to the above-described embodiment. Hereinafter, an example of modification will be described.

  For example, in the above-described embodiment, in the step of removing a part of the patterned light-shielding conductive layers 54a and 54b, the active area Aa1 of the light-shielding conductive layers 54a and 54b and the vicinity of the active area Aa1 surrounding the active area Aa1 Although the example in which the portion located in the region is removed has been shown, the present invention is not limited to this. From the viewpoint of removing the light-shielding conductive layers 54a and 54b having a light-shielding property in order to ensure the transparency of the active area Aa1, only the part located in the active area Aa1 may be removed. it can. According to such an example, it is possible to increase the conductivity of the extraction wirings 36b and 37b by enlarging the area where the extraction conductors 43 and 48 are arranged while ensuring transparency in the active area Aa1 of the touch panel sensor 30. it can. However, the above-described embodiment is superior from the viewpoint of allowing further variations in exposure accuracy and development accuracy of the photosensitive layers 56c and 56d and improving the reliability of the touch panel sensor 30. Of course, when changing the portions where the light-shielding conductive layers 54a and 54b are removed, the patterns of the transmission regions of the third mask 58c and the fourth mask 58d described above must be changed.

  Further, in the above-described embodiment, in the step of developing and patterning the further photosensitive layers 56c and 56d, the example in which the photosensitive layers 56c and 56d are patterned in a frame shape surrounding the active area Aa1 from the four sides is shown. Not limited to this. For example, further photosensitive layers 56c and 56d are exposed (see FIG. 9A) and developed (see FIG. 9B) in a pattern corresponding to the pattern that should remain on the transparent conductive layers 52a and 52b (transparent conductors 40 and 45). Also good. As shown in FIG. 9A, also in such a modified example, the light-shielding conductive materials 54a and 54b having a light-shielding property shield light from an exposure light source irradiated in a predetermined pattern from different sides. Accordingly, the third photosensitive layer 56c and the fourth photosensitive layer 56d can be simultaneously exposed on both sides with high accuracy with different patterns. However, the above-described embodiment is superior from the viewpoint of allowing further variations in exposure accuracy and development accuracy of the photosensitive layers 56c and 56d and improving the reliability of the touch panel sensor 30. In the modification shown in FIGS. 9A and 9B, the configuration of other parts can be configured in the same manner as in the above-described embodiment. 9A and 9B, parts that can be configured in the same manner as in the above-described embodiment are given the same reference numerals, and redundant descriptions are omitted.

  Moreover, in embodiment mentioned above, although an example of the manufacturing method of the touch panel sensor 30 was demonstrated, it is not restricted to this example. For example, a step of annealing the transparent conductive layers 52a and 52b to promote crystallization (microcrystallization) of the transparent conductive layers 52a and 52b may be provided after the sputtering of the transparent conductive layers 52a and 52b.

  As described above, the transparent conductive layers 52a and 52b formed of ITO or the like are crystallized by appropriately adjusting the temperature at the time of film formation by sputtering or the like. That is, when the transparent conductive layers 52a and 52b are formed on the base film 32 by sputtering or the like, the transparent conductive layer on the base film 32 is maintained by keeping the temperature of the base film 32 within a range of 140 to 170 ° C. Crystallization of the layers 52a and 52b is promoted. In order to further promote crystallization, the transparent conductive layers 52a and 52b are formed on the base film 32 by sputtering or the like, and then annealed at a temperature of about 140 ° C. (Also called crystallization).

  The step of annealing the transparent conductive layers 52a and 52b is after the step S6 of patterning the transparent conductive layers 52a and 52b described above, and more than the step S11 of removing a part of the patterned light-shielding conductive layers 54a and 54b. Prior to this, for example, it is preferably performed between step S10 for developing further photosensitive layers 58c and 58d and step S11 for removing a part of the light-shielding conductive layers 54a and 54b. For example, when the chemical resistance of the light-shielding conductive layers 54a and 54b is weak and the patterned light-shielding conductive layers 54a and 54b may be etched in the step S6 of patterning the transparent conductive layers 52a and 52b, It is effective to add an annealing process.

  Specifically, in step S6 of patterning the transparent conductive layers 52a and 52b, the transparent conductive layers 52a and 52b are etched with an etchant having a weak erosion property, for example, oxalic acid. At this time, if the crystallization of the transparent conductive layers 52a and 52b at the time of etching is incomplete, the chemical resistance of the transparent conductive layers 52a and 52b is low, and therefore the transparent conductive layers 52a and 52b are etched. By using an etching solution having a weak erodibility, the light-shielding conductive layers 54a and 54b made of a material having a relatively weak chemical resistance (for example, a silver alloy) are formed between the transparent conductive layers 52a and 52b and the photosensitive layers 56a and 56b. It is possible to prevent erosion in the lateral direction (that is, the direction along the sheet surface of the base film 32). As a result, the transparent conductive layers 52a and 52b can be patterned with extremely high accuracy. Then, before the step S11 of removing a part of the light-shielding conductive layers 54a and 54b, the chemical resistance of the transparent conductive layers 52a and 52b is increased by annealing, thereby removing a part of the light-shielding conductive layers 54a and 54b. At this time, it is possible to effectively prevent the pattern of the transparent conductive layers 52a and 52b patterned into a desired shape from being damaged.

  Further, in the above-described embodiment, in the laminated body (blanks) 50 as a base material used for manufacturing the touch panel sensor 30, the first light-shielding conductive layer 54a is formed on the first transparent conductive layer 52a, and the first Although the example in which the two light-shielding conductive layers 54a are formed on the second transparent conductive layer 52b is shown, the present invention is not limited to this. The light shielding conductive layer may be formed only on one of the first transparent conductive layer 52a and the second transparent conductive layer 52b. In the example shown in FIGS. 10A and 10B, the above-described first light-shielding conductive layer 54a is omitted. That is, the laminated body (blanks) 50 as a base material is formed on the base film 32, the first and second transparent conductors 52a and 52b disposed on the base film 32, and the second transparent conductor 52b. And a second light-shielding conductive layer 54b disposed. FIGS. 10 (a) and 10 (b) correspond to FIGS. 6C (a) and 6C (b), respectively, and a first photosensitive layer 56a disposed on the first transparent conductor 52a; The process S3 which exposes both the 2nd photosensitive layer 56b arrange | positioned on the 2nd light-shielding conductive layer 54b simultaneously is shown. As shown in FIG. 10A, the exposure light for exposing the first photosensitive layer 56a in a predetermined pattern is shielded by the second light-shielding conductive layer 54b, and is not irradiated to the second photosensitive layer 56b. The exposure light for exposing the second photosensitive layer 56b with a predetermined pattern is shielded by the second light-shielding conductive layer 54b and is not irradiated to the first photosensitive layer 56a. As a result, similar to the above-described embodiment, the photosensitive layers 56a and 56b can be simultaneously exposed on both sides with different patterns with high accuracy. Further, the transparent conductors 40 and 45, the second intermediate layer 66, the second extraction conductor 48, and the second protective layer 67 similar to those in the above-described embodiment can be obtained. In addition, since the light-shielding conductive layer 54b is not formed on the first transparent conductive layer 52a, in the illustrated example, the first intermediate layer 61, the first extraction conductor 43, and the first conductive layer are formed on the first transparent conductor 40. The protective layer 66 is not formed.

  Furthermore, in embodiment mentioned above, although the laminated body (blanks) 50 showed the example by which the transparent conductive layers 52a and 52b and the covering conductive layers 54a and 54b were each provided in the both sides of the base film 32, this was shown. Not limited to. The transparent conductive layer and the coated conductive layer may be provided only on one surface of the base film 32. In this case, the sensor electrodes 36a and 37a and the extraction wirings 36b and 37b of the above-described embodiment can be obtained on one surface of the base film 32. In this modification, the exposure light can be irradiated from only one side of the stacked body 50 in the above-described step S3 of exposing the photosensitive layer. In this modification, the coated conductive layer can be made of a material that does not have a light shielding property.

  Further, in the above-described embodiment, the first sensor portion 41 of the first transparent conductor 40 has the line portion 41a and the bulging portion 41b, and the second sensor portion 46 of the second transparent conductor 45 is the line portion. The example which has 46a and the bulging part 46b was shown. Further, in the above-described embodiment, the example in which the bulging portions 41b and 46b are formed in a substantially square shape in plan view is shown. However, the present invention is not limited thereto, and as an example, the bulging portions 41b and 46b may have a quadrangular shape such as a rhombus other than a square, a polygonal shape, a circular shape, or the like in plan view. Moreover, the sensor parts 41 and 46 may not have the bulging parts 41b and 46b but may have a linear outline.

  Further, in the above-described embodiment, the example in which the first sensor unit 41 of the first transparent conductor 40 and the second sensor unit 46 of the second transparent conductor 45 are configured in the same manner has been described. Not limited to. For example, as shown in FIG. 11, the line width w2 of the second sensor portion 46 of the second transparent conductor 45 of the first transparent conductor 40 disposed closer to the protective cover 12 (observer side surface). You may make it thicker than the line width w1 of the 1st sensor part 41. FIG. According to such an example, when the outer conductor 5 comes into contact with the protective cover 12, the second sensor portion of the second transparent conductor 45 disposed at a position relatively far from the protective cover 12 (observer side surface). The capacitor can be formed stably between the outer conductor 46 and the outer conductor 5. Further, the outer conductor 5 in contact with the protective cover 12 is compared with the capacitance of the capacitor formed between the outer conductor 5 in contact with the protective cover 12 and the first sensor portion 41 of the first transparent conductor 40. And the second sensor portion 46 of the second transparent conductor 45 can be prevented from lowering the capacitance of the capacitor. Thereby, the contact position (touch position) of the outer conductor 5 to the protective cover 12 is not only determined by the first sensor part 41 of the first transparent conductor 40 but also by the second sensor part 46 of the second transparent conductor 45. Thus, it becomes possible to detect with extremely high sensitivity and accuracy. In addition, in the modification shown in FIG. 11, about the structure of another part, it can comprise similarly to embodiment mentioned above. In FIG. 11, parts that can be configured in the same way as the above-described embodiment are given the same reference numerals, and redundant descriptions are omitted.

  Moreover, in the extraction wirings 36b and 37b in the above-described embodiment, an example in which the intermediate layers 61 and 66 are interposed between the transparent conductors 40 and 45 and the extraction conductors 43 and 48 has been shown. However, the present invention is not limited to this, and when the adhesion between the transparent conductors 40 and 45 and the extraction conductors 43 and 48 is sufficiently large, or the transparent conductors 40 and 45 and the extraction conductors 43 and 48. In such a case, the extraction conductors 43 and 48 may be directly adhered to the transparent conductors 40 and 45 without providing the intermediate layers 61 and 66.

  Furthermore, the example in which the protective layers 62 and 67 are provided on the extraction conductors 43 and 48 in the extraction wirings 36b and 37b in the above-described embodiment is shown. However, the present invention is not limited to this, and when the extraction conductors 43 and 48 have sufficiently large oxidation resistance, water resistance, or the like, or the extraction conductors 43, 48 need much oxidation resistance, water resistance, etc. If not, the protective layers 62 and 67 may not be provided on the extraction conductors 43 and 48.

  Further, in the etching process (steps S5 and S11) of the light shielding conductive layers 54a and 54b in the above-described embodiment, the light shielding conductive layer 54a including the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67. , 54b shows an example of being etched by one kind of etching solution. However, the present invention is not limited to this, and the intermediate layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67 may be intermediated step by step using two or three types of etching solutions depending on the material forming the protective layers 62 and 67. The layers 61 and 66, the extraction conductors 43 and 48, and the protective layers 62 and 67 may be etched.

  In addition, although the some modification with respect to embodiment mentioned above was demonstrated above, naturally, it is also possible to apply combining several modifications suitably.

  EXAMPLES Hereinafter, although this invention is demonstrated in detail using an Example, this invention is not limited to this Example.

Example 1
About the base film 32 of the touch panel sensor 30 according to the present invention, a film body 33, undercoat layers 71 and 76 made of thermosetting acrylic resin, high refractive index layers 72 and 77 made of niobium pentoxide (Nb ₂ O ₅ ), And the optical refractive index and thickness of the low refractive index layers 73 and 78 made of silicon dioxide (SiO ₂ ) were measured. Further, the optical refractive index (real part n and absorption term k) and thickness of the transparent conductors 40 and 45 made of ITO of the touch panel sensor 30 according to the present invention were measured. The results are shown in Table 2. The light refractive index was measured while changing the light wavelength in 5 nm increments within the light wavelength range of 380 nm to 780 nm. In addition, the optical refractive index (real part n and absorption term k) in the atmosphere was measured for use in the simulation described later. The results are shown in Table 2.

  As shown in Table 2, in the layer having a high light refractive index, that is, the high refractive index layers 72 and 77 and the transparent conductors 40 and 45, the light refractive index greatly changed depending on the light wavelength. FIG. 13 shows the result of plotting the optical refractive index (real part n) of the high refractive index layers 72 and 77 and the transparent conductors 40 and 45 against the optical wavelength. As shown in FIG. 13, when the light wavelength is changed from 400 nm to 550 nm, the optical refractive index is reduced by 0.15 in the transparent conductors 40 and 45, and the optical refractive index is 0. 5 in the high refractive index layers 72 and 77. It was only 18 smaller. Further, when the light wavelength is changed from 550 nm to 780 nm, the optical refractive index is decreased by 0.12 in the transparent conductors 40 and 45, and the optical refractive index is decreased by 0.07 in the high refractive index layers 72 and 77. . That is, the refractive index change of the high refractive index layers 72 and 77 is larger than the refractive index change of the transparent conductors 40 and 45 at 400 to 550 nm, and the transparent conductor is higher than the refractive index change of the high refractive index layers 72 and 77 at 550 to 780 nm. The refractive index change of 40 and 45 was large.

  Based on the measured thickness and light refractive index of each layer of the base film 32 and the thickness and light refractive index of the transparent conductors 40 and 45, in a region where the transparent conductors 40 and 45 are provided by simulation. The difference between the light reflectance and transmittance values and the light reflectance and transmittance values in the region where the transparent conductors 40 and 45 are not provided was determined. Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. Details will be described below.

(Simulation conditions)
With respect to the region where the transparent conductors 40 and 45 are provided, the simulation was performed assuming the following layer structure.
Film body (output side medium) / undercoat layer / high refractive index layer / low refractive index layer / transparent conductor / atmosphere (incident side medium)
In this case, as described later, the refractive index of the film body, the refractive index and thickness of the undercoat layer, the refractive index and thickness of the high refractive index layer, the refractive index and thickness of the low refractive index layer, the refractive index of the transparent conductor and The simulation was performed while appropriately changing the thickness. In all simulations, the incident angle of light was set to 0 degree (normal incidence).

With respect to the region where the transparent conductors 40 and 45 are not provided, simulation was performed assuming the following layer structure.
Film body (output side medium) / undercoat layer / high refractive index layer / low refractive index layer / atmosphere (incident side medium)
The other conditions are substantially the same as the simulation conditions related to the region where the transparent conductors 40 and 45 are provided, and thus detailed description thereof is omitted.

(Evaluation item 1 reflectance)
The reflection spectrum of light in the region where the transparent conductors 40 and 45 are provided and in the region where the transparent conductors 40 and 45 are not provided was obtained by simulation. The results are shown in FIG. 14A. As shown in FIG. 14A, periodic disturbance (hunting) of the reflection spectrum of light was observed in the light wavelength range of 380 nm to 780 nm. Such hunting is considered to be caused by thin film interference between each layer of the base film 32 and between the base film 32 and the transparent conductors 40 and 45.

  FIG. 14B shows the difference (reflectance difference) between the light reflection spectrum in the region where the transparent conductors 40 and 45 are not provided and the light reflection spectrum in the region where the transparent conductors 40 and 45 are provided. Here, reflectance difference = (reflectance in a region where the transparent conductors 40 and 45 are not provided) − (reflectance in a region where the transparent conductors 40 and 45 are provided). As shown in FIG. 14B, hunting was also observed in the light wavelength range of 380 nm to 780 nm for the difference in reflectance. As shown in FIG. 14B, this hunting is generated with a line having a reflectance difference of 0% (dotted line indicated by reference numeral 81 in FIG. 14B) as a substantially center line. It was also confirmed that the shorter the wavelength, the larger the hunting amplitude.

  From the reflection spectrum obtained by simulation, using the color matching function in the XYZ color system, the region where the transparent conductors 40 and 45 are provided and the region where the transparent conductors 40 and 45 are not provided are respectively shown in the XYZ table. The Y value in the color system was determined. A specific calculation method is defined in JIS Z8701, and detailed description thereof is omitted here. At this time, the spectral distribution of standard light C was used as the spectral distribution of standard light used for color display. Next, the difference (hereinafter referred to as ΔY (reflection)) between the Y value in the region where the transparent conductors 40 and 45 are provided and the Y value in the region where the transparent conductors 40 and 45 are not provided was obtained. As a result, ΔY (reflection) was 0.0576%.

(Evaluation item 2 transmittance)
The transmission spectrum of light in the region where the transparent conductors 40 and 45 are provided and the region where the transparent conductors 40 and 45 are not provided was obtained by simulation. The results are shown in FIG. 15A. As shown in FIG. 15A, in the light wavelength range of 380 nm to 780 nm, hunting of the light transmission spectrum was observed as in the case of the light reflection spectrum.

  FIG. 15B shows the difference (transmittance difference) between the light transmission spectrum in the region where the transparent conductors 40 and 45 are not provided and the light transmission spectrum in the region where the transparent conductors 40 and 45 are provided. Here, transmittance difference = (transmittance in a region where the transparent conductors 40 and 45 are not provided) − (transmittance in a region where the transparent conductors 40 and 45 are provided). As shown in FIG. 15B, hunting was also observed within the light wavelength range of 380 nm to 780 nm for the transmittance difference. As shown in FIG. 15B, this hunting occurred with the 0% line 81 being substantially the center line. It was also confirmed that the shorter the wavelength, the larger the hunting amplitude.

  A region where the transparent conductors 40 and 45 are provided and a region where the transparent conductors 40 and 45 are not provided using the color matching function in the XYZ color system (see JIS Z8701) from the transmission spectrum obtained by simulation. For each, the Y value in the XYZ color system was determined (see JIS Z8701). At this time, the spectral distribution of standard light C was used as the spectral distribution of standard light used for color display. Next, the difference (hereinafter referred to as ΔY (transmission)) between the Y value in the region where the transparent conductors 40 and 45 are provided and the Y value in the region where the transparent conductors 40 and 45 are not provided was obtained. As a result, ΔY (transmission) was 0.0247%.

(Evaluation item 3 b *)
Using the X value, Y value, and Z value (see JIS Z8701) of the XYZ color system in the region where the transparent conductors 40, 45 are provided, the region where the transparent conductors 40, 45 are provided The color coordinate b * in the * a * b * color system was determined. A specific calculation method is defined in JIS Z8729, and a detailed description thereof is omitted here. As a result, b * was −0.142.

  According to the present embodiment, the touch panel sensor 30 is provided in a predetermined pattern on the base film 32 composed of each layer having the refractive index and thickness shown in Table 2 above, and the surfaces 32a and 32b of the base film 32. Transparent conductors 40 and 45 formed. For this reason, the hunting of the difference in reflectance and the difference in transmittance within the light wavelength range of 380 nm to 780 nm could be generated with the 0% line 81 being substantially the center line. As a result, as described above, the absolute values of ΔY (reflection), ΔY (transmission), and b * can be made sufficiently small. This could prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

Comparative Example 1
The reflection of light in the region where the transparent conductors 40 and 45 are provided by simulation in the same manner as in Example 1 except that the light refractive index of the high refractive index layers 72 and 77 is constant regardless of the wavelength. The difference between the value of the transmittance and the transmittance and the value of the reflectance and transmittance of the light in the region where the transparent conductors 40 and 45 are not provided was obtained. The value of the optical refractive index of the high refractive index layers 72 and 77 is 2.0, 2.4, or 2.183 (equivalent to the value of the optical refractive index of the high refractive index layer in Example 1 at a wavelength of 550 nm). ) Was used.

(Evaluation item 1 reflectance)
The reflection spectrum of light in the region where the transparent conductors 40 and 45 are provided and in the region where the transparent conductors 40 and 45 are not provided was obtained by simulation. Next, the difference (reflectance difference) between the light reflection spectrum in the region where the transparent conductors 40 and 45 are not provided and the light reflection spectrum in the region where the transparent conductors 40 and 45 are provided was obtained. . The results are shown in FIG. 16A. For comparison, the difference in reflectance when the refractive index of the high refractive index layers 72 and 77 is 2.183 regardless of the wavelength and the difference in reflectance in the case of Example 1 described above are shown together. Shown in 16B.

  As shown in FIG. 16A, when the optical refractive index of the high refractive index layers 72 and 77 is set to 2.4 regardless of the wavelength, the hunting of the reflectance difference is performed with the 0% line 81 being substantially the center line in the short wavelength region. However, in the long wavelength region, the hunting center line of the difference in reflectance was higher than the 0% line 81. Further, as shown in FIGS. 16A and 16B, when the refractive index of the high refractive index layers 72 and 77 is 2.183 regardless of the wavelength, the 0% line 81 is reflected as a substantially center line in the long wavelength region. Although the ratio difference hunting occurred, the center line of the reflectance difference hunting was below the 0% line 81 in the short wavelength region. Further, when the optical refractive index of the high refractive index layers 72 and 77 is set to 2.0 regardless of the wavelength, the center line of the hunting of the reflectance difference is lower than the 0% line 81 over the entire optical wavelength range of 380 nm to 780 nm. It was.

  On the other hand, according to the high refractive index layers 72 and 77 of the present invention indicated by the solid line in FIG. 16B, the hunting of the reflectance difference is performed with the 0% line 81 as a substantially center line over almost the entire light wavelength range of 380 nm to 780 nm. It was happening. That is, as shown in Table 2, the refractive index of the high refractive index layers 72 and 77 for light with a wavelength of 550 nm is about 2.18, and the refractive index of the high refractive index layers 72 and 77 for light with a wavelength of 400 nm is about. By setting it to 2.36, it was possible to cause hunting of the difference in reflectance with the 0% line 81 being substantially the center line. As described above, various reasons can be considered that the high refractive index layers 72 and 77 of the present invention can cause the hunting of the difference in reflectance to occur with the 0% line 81 as a substantially center line. That is, as shown in FIG. 16A, the refractive indexes of the high refractive index layers 72 and 77 are as high as 2.4 in the short wavelength region and as high as 2.4 in the long wavelength region. The refractive indexes of the refractive index layers 72 and 77 are preferably close to 2.183 from the viewpoint of the difference in reflectance. In the wavelength region of 400 to 550 nm, the wavelength dependency of the refractive index of the high refractive index layers 72 and 77 is larger than that of the transparent conductors 40 and 45, and in the wavelength range of 550 to 780 nm, the refractive index of the high refractive index layers 72 and 77 is higher. It is considered that the wavelength dependency is preferably smaller than that of the transparent conductors 40 and 45. Then, by using the high refractive index layers 72 and 77 having such a wavelength dependency of the refractive index, the wavelength dependency of the reflectance difference caused by the wavelength dependency of the refractive index of the transparent conductors 40 and 45 is appropriately set. It is thought that it was possible to correct it.

(Evaluation item 2 transmittance)
The transmission spectrum of light in the region where the transparent conductors 40 and 45 are provided and the region where the transparent conductors 40 and 45 are not provided was obtained by simulation. Next, the difference (transmittance difference) between the light transmission spectrum in the region where the transparent conductors 40 and 45 are not provided and the light transmission spectrum in the region where the transparent conductors 40 and 45 are provided was obtained. . The results are shown in FIG. 17A. For comparison, the transmittance difference when the optical refractive index of the high-refractive index layers 72 and 77 is 2.183 regardless of the wavelength and the transmittance difference in the case of Example 1 described above are shown together. Shown in 17B.

  As shown in FIGS. 17A and 17B, when the optical refractive index of the high refractive index layers 72 and 77 is 2.183 regardless of the wavelength, the transmittance is obtained with the 0% line 81 being substantially the center line in the long wavelength region. Although the difference hunting occurred, the center line of the transmittance difference hunting was above the 0% line 81 in the short wavelength region. Further, when the light refractive index of the high refractive index layers 72 and 77 is set to 2.0 regardless of the wavelength, the center line of the transmittance difference hunting is higher than the 0% line 81 over the entire light wavelength range of 380 nm to 780 nm. It was. Further, when the optical refractive index of the high refractive index layers 72 and 77 is set to 2.4 regardless of the wavelength, the hunting center line of the transmittance difference over the almost entire optical wavelength range of 380 nm to 780 nm is more than the 0% line 81. It was below.

  On the other hand, according to the high refractive index layers 72 and 77 of the present invention shown by the solid line in FIG. It was happening. That is, as shown in Table 2, the refractive index of the high refractive index layers 72 and 77 for light with a wavelength of 550 nm is about 2.18, and the refractive index of the high refractive index layers 72 and 77 for light with a wavelength of 400 nm is about. By setting it to 2.36, it was possible to cause hunting of the transmittance difference with the 0% line 81 as the center line. As described above, various reasons can be considered that the high refractive index layers 72 and 77 of the present invention enable the hunting of the transmittance difference to be generated with the 0% line 81 being substantially the center line. That is, as shown in FIG. 17A, the refractive index of the high refractive index layers 72 and 77 is as high as 2.4 in the short wavelength region and as high as 2.4 in the long wavelength region. The refractive indexes of the refractive index layers 72 and 77 are preferably close to 2.183 from the viewpoint of transmittance difference. In the wavelength region of 400 to 550 nm, the wavelength dependency of the refractive index of the high refractive index layers 72 and 77 is larger than that of the transparent conductors 40 and 45, and in the wavelength range of 550 to 780 nm, the refractive index of the high refractive index layers 72 and 77 is higher. It is considered that the wavelength dependency is preferably smaller than that of the transparent conductors 40 and 45. Then, by using such high refractive index layers 72 and 77 having the wavelength dependency of the refractive index, the wavelength dependency of the transmittance difference due to the wavelength dependency of the refractive index of the transparent conductors 40 and 45 is appropriately set. It is thought that it was possible to correct it.

Example 2
The optical refractive indexes (real part) of the high refractive index layers 72 and 77 are uniformly +0.3, +0.21, +0.2, +0... From the optical refractive index shown in Table 2 over the entire light wavelength range of 380 nm to 780 nm. The transparent conductors 40 and 45 were simulated by simulation in the same manner as in Example 1 except that -0.1, -0.14, -0.2, -0.25, or -0.3. The difference (ΔY (reflection) and ΔY () between the reflectance and transmittance of light in the provided region and the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are not provided. Transmission)). Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. The results are shown in FIG.

  As shown in FIG. 18, when the amount of displacement from the optical refractive index of the high refractive index layers 72 and 77 shown in Table 2 is uniformly within the range of −0.26 to +0.22 regardless of the wavelength, ΔY (reflection) and ΔY (transmission) were 1% or less, and the absolute value of b * was 1.5 or less. Further, when the amount of displacement from the optical refractive index of the high refractive index layers 72 and 77 shown in Table 2 is uniformly within the range of −0.12 to +0.11 regardless of the wavelength, ΔY (reflection) and ΔY (transmission) was 0.5% or less, and the absolute value of b * was 1.5 or less. Therefore, in the touch panel sensor 30 according to the present invention, preferably, the light refractive index of the high refractive index layers 72 and 77 with respect to light having a wavelength of 550 nm is in the range of 2.18 + 0.22 / −0.26, and the wavelength is 400 nm. The light refractive index of the high refractive index layers 72 and 77 for the light of 2.36 + 0.22 / −0.26 is in the range. More preferably, the optical refractive index of the high refractive index layers 72 and 77 for light having a wavelength of 550 nm is in the range of 2.18 + 0.11 / −0.12, and the high refractive index layers 72 and 77 for light having a wavelength of 400 nm. 77 has a refractive index of 2.36 + 0.11 / −0.12. This can prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

Example 3
Except that the thickness of the high refractive index layers 72 and 77 is 0, 2, 4, 4.8, 4.9, 5, 6, 7, 7.2, 8 or 10 nm, it is the same as in Example 1. By simulation, the values of the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are provided and the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are not provided are obtained. The difference from the value (ΔY (reflection) and ΔY (transmission)) was determined. Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. The results are shown in FIG.

  As shown in FIG. 19, when the thicknesses of the high refractive index layers 72 and 77 are in the range of 3.6 to 8.3 nm, ΔY (reflection) and ΔY (transmission) become 1% or less, The absolute value of b * was 1.5 or less. Further, when the thickness of the high refractive index layers 72 and 77 is in the range of 4.9 to 7.1 nm, ΔY (reflection) and ΔY (transmission) are 0.5% or less, and b * The absolute value was 1.5 or less. Therefore, in the touch panel sensor 30 according to the present invention, preferably, the thickness of the high refractive index layers 72 and 77 is in the range of 3.6 to 8.3 nm, and more preferably, the high refractive index layers 72 and 77. The thickness is in the range of 4.9 to 7.1 nm. This can prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

Example 4
The light refractive index (real part) of the transparent conductors 40 and 45 is uniformly +0.3, +0.2, +0.13, +0.1 from the light refractive index shown in Table 2 over the entire light wavelength range of 380 nm to 780 nm. , +0.08, -0.1, -0.2, -0.25, or -0.3, transparent conductors 40 and 45 are provided by simulation in the same manner as in Example 1. The difference between the reflectance and transmittance of light in the region where the light is transmitted and the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are not provided (ΔY (reflection) and ΔY (transmission)) ) Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. The results are shown in FIG.

  As shown in FIG. 20, when the amount of displacement from the optical refractive index of the transparent conductors 40 and 45 shown in Table 2 is uniformly within the range of −0.25 to +0.13 regardless of the wavelength, ΔY (Reflection) and ΔY (transmission) were 1% or less, and the absolute value of b * was 1.5 or less. Further, when the amount of displacement from the optical refractive index of the transparent conductors 40 and 45 shown in Table 2 is uniformly within the range of −0.08 to +0.07 regardless of the wavelength, ΔY (reflection) and ΔY (Transmission) was 0.5% or less, and the absolute value of b * was 1.5 or less. Accordingly, in the touch panel sensor 30 according to the present invention, the optical refractive index of the transparent conductors 40 and 45 with respect to light having a wavelength of 550 nm is preferably in the range of 1.97 + 0.13 / −0.25, and the wavelength of 400 nm. The light refractive index of the transparent conductors 40 and 45 with respect to light is in the range of 2.12 + 0.13 / −0.25. More preferably, the optical refractive index of the transparent conductors 40 and 45 with respect to light with a wavelength of 550 nm is in the range of 1.97 + 0.07 / −0.08, and the transparent conductors 40 and 45 with respect to light with a wavelength of 400 nm The optical refractive index is in the range of 2.12 + 0.07 / −0.08. This can prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

Example 5
Implementation was performed except that the thickness of the transparent conductors 40 and 45 was set to 0, 5, 8, 10, 12.5, 15, 16, 17, 18, 19, 20, 20.5, 22.5, or 25 nm. Similar to Example 1, the values of the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are provided and the reflection of light in the region where the transparent conductors 40 and 45 are not provided are obtained by simulation. The difference (ΔY (reflection) and ΔY (transmission)) between the rate and the value of transmittance was determined. Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. The results are shown in FIG.

  As shown in FIG. 21, when the thickness of the transparent conductors 40 and 45 is in the range of 12 to 23 nm, ΔY (reflection) and ΔY (transmission) are 1% or less, and the absolute value of b * Was 1.5 or less. When the thickness of the transparent conductors 40 and 45 is in the range of 12 to 20 nm, ΔY (reflection) and ΔY (transmission) are 0.5% or less, and the absolute value of b * is 1. It was 5 or less. Accordingly, in the touch panel sensor 30 according to the present invention, the thickness of the transparent conductors 40 and 45 is preferably in the range of 12 to 23 nm, and more preferably the thickness of the transparent conductors 40 and 45 is 12 to 20 nm. It is within the range. This can prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

Example 6
The light refractive index of the low refractive index layers 73 and 78 is uniformly 1.2, 1.3, 1.31, 1.38, 1.4, 1.46, 1.5 over the entire light wavelength range of 380 nm to 780 nm. , 1.53, 1.6, 1.66, 1.7, 1.8, or 2.0, transparent conductors 40 and 45 are provided by simulation in the same manner as in Example 1. The difference between the reflectance and transmittance of light in the region where the light is transmitted and the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are not provided (ΔY (reflection) and ΔY (transmission)) ) Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. The results are shown in FIG.
As is apparent from Table 2, the wavelength dependence of the light refractive index in the low refractive index layers 73 and 78 made of silicon dioxide (SiO ₂ ) or the like is different in the transparent conductors 40 and 45 or the high refractive index layers 72 and 77. Smaller than the wavelength dependence of the photorefractive index. Therefore, in this embodiment, as described above, the light refractive indexes of the low refractive index layers 73 and 78 are set to uniform values over the entire light wavelength range of 380 nm to 780 nm.

  As shown in FIG. 22, when the light refractive indexes of the low refractive index layers 73 and 78 are in the range of 1.30 to 1.67, ΔY (reflection) and ΔY (transmission) are 1% or less. At the same time, the absolute value of b * was 1.5 or less. Further, when the optical refractive index of the low refractive index layers 73 and 78 is in the range of 1.37 to 1.67, ΔY (reflection) and ΔY (transmission) are 0.5% or less, and b The absolute value of * was 1.5 or less. Therefore, in the touch panel sensor 30 according to the present invention, the low refractive index layers 73 and 78 preferably have a light refractive index in the range of 1.30 to 1.67, and more preferably, the low refractive index layer 73, The light refractive index of 78 is in the range of 1.37 to 1.67. This can prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

Example 7
Except that the thickness of the low refractive index layers 73 and 78 was 0, 20, 27, 40, 42, 48, 50, 60, 64, 68, 70, 85, or 100 nm, By simulation, the light reflectance and transmittance values in the region where the transparent conductors 40 and 45 are provided, and the light reflectance and transmittance values in the region where the transparent conductors 40 and 45 are not provided, and Difference (ΔY (reflection) and ΔY (transmission)) was obtained. Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. The results are shown in FIG.

  As shown in FIG. 23, when the thicknesses of the low refractive index layers 73 and 78 are in the range of 41 to 87 nm, ΔY (reflection) and ΔY (transmission) become 1% or less, and the absolute value of b * The value was 1.5 or less. When the thicknesses of the low refractive index layers 73 and 78 are in the range of 49 to 86 nm, ΔY (reflection) and ΔY (transmission) are 0.5% or less, and the absolute value of b * is 1. .5 or less. Accordingly, in the touch panel sensor 30 according to the present invention, the thickness of the low refractive index layers 73 and 78 is preferably in the range of 41 to 87 nm, and more preferably the thickness of the low refractive index layers 73 and 78 is 49 to 49. It is in the range of 86 nm. This can prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

Example 8
The light refractive index of the undercoat layers 71 and 76 is uniformly 1.3, 1.36, 1.4, 1.41, 1.43, 1.47, 1.5, over the entire light wavelength range of 380 nm to 780 nm. The transparent conductors 40 and 45 were simulated by simulation in the same manner as in Example 1 except that the values were 1.55, 1.58, 1.6, 1.66, 1.7, 1.8, or 2.0. The difference between the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are not provided and the difference between the reflectance and transmittance of light in the region where the transparent conductors 40 and 45 are not provided (ΔY (reflection) and ΔY (Transmission)). Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. The results are shown in FIG.
As is clear from Table 2, the wavelength dependence of the optical refractive index in the undercoat layers 71 and 76 made of acrylic resin or the like is the wavelength of the optical refractive index in the transparent conductors 40 and 45 or the high refractive index layers 72 and 77. Small compared to dependency. Therefore, in this embodiment, as described above, the light refractive index of the undercoat layers 71 and 76 is set to a uniform value over the entire light wavelength range of 380 nm to 780 nm.

  As shown in FIG. 24, when the light refractive index of the undercoat layers 71 and 76 is in the range of 1.35 to 1.67, ΔY (reflection) and ΔY (transmission) become 1% or less. The absolute value of b * was 1.5 or less. Moreover, when the optical refractive index of the undercoat layers 71 and 76 is in the range of 1.44 to 1.58, ΔY (reflection) and ΔY (transmission) are 0.5% or less, and b * The absolute value of was 1.5 or less. Therefore, in the touch panel sensor 30 according to the present invention, the light refractive index of the undercoat layers 71 and 76 is preferably in the range of 1.35 to 1.67, and more preferably, the undercoat layers 71 and 76 The optical refractive index is in the range of 1.44 to 1.58. This can prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

Example 9
Simulation was performed in the same manner as in Example 1 except that the thickness of the undercoat layers 71 and 76 was 0, 100, 200, 500, 600, 900, 950, 1000, 2000, 3000, 4000, 5000, or 10,000 nm. Thus, the light reflectance and transmittance values in the region where the transparent conductors 40 and 45 are provided and the light reflectance and transmittance values in the region where the transparent conductors 40 and 45 are not provided. The difference (ΔY (reflection) and ΔY (transmission)) was determined. Moreover, b * in the area | region in which the transparent conductors 40 and 45 are provided was calculated | required by simulation. The results are shown in FIG.

  As shown in FIG. 25, when the thickness of the undercoat layers 71 and 76 is in the range of 600 to 10000 nm, ΔY (reflection) and ΔY (transmission) are 0.5% or less, and b * The absolute value was 1.5 or less. Therefore, in the touch panel sensor 30 according to the present invention, the thickness of the undercoat layers 71 and 76 is preferably in the range of 600 to 10000 nm. This can prevent the pattern of the transparent conductors 40 and 45 from being visually recognized by the user of the touch panel sensor 30.

DESCRIPTION OF SYMBOLS 10 Input / output device 15 Display device 20 Touch panel device 30 Touch panel sensor 32 Base film 32a surface (surface on one side)
32b surface (surface on the other side)
33 Film body 36a First sensor electrode 36b First extraction wiring 36c Connection terminal portion 37a with detection control section Second sensor electrode 37b Second extraction wiring 37c Connection terminal section 40 with detection control section First transparent conductor 41 First Sensor part 41a Line part 41b Swelling part 42 First connection part 43 First extraction conductor 45 Second transparent conductor 46 Second sensor part 46a Line part 46b Swelling part 47 Second connection part 48 Second extraction conductor 50 Laminate (Blanks)
52a First transparent conductive layer 52b Second transparent conductive layer 54a First light-shielding conductive layer (first covering conductive layer)
54b Second light-shielding conductive layer (second covering conductive layer)
56a First photosensitive layer 56b Second photosensitive layer 56c Third photosensitive layer (further photosensitive layer)
56d Fourth photosensitive layer (further photosensitive layer)
58a First mask (first photomask)
58b Second mask (second photomask)
58c Third mask (third photomask)
58d Fourth mask (fourth photomask)
61 1st intermediate | middle layer 62 1st protective layer 66 2nd intermediate | middle layer 67 2nd protective layer 70 1st functional layer 71 1st undercoat layer 71a surface (surface of one side)
72 surface of first high refractive index layer 72a (surface on one side)
73 1st low refractive index layer 75 2nd functional layer 76 2nd undercoat layer 76b surface (surface of the other side)
77 second high refractive index layer 77b surface (surface on the other side)
78 Second Low Refractive Index Layer 80 Intermediate Laminate 8 10% Line

Claims (10)

A base film;
A first transparent conductor patterned on the surface on one side of the base film,
The base film is
A transparent film body,
A first undercoat layer provided on the surface of the film body on the first transparent conductor side;
A first high refractive index layer provided on a surface of the first undercoat layer on the first transparent conductor side;
A first low refractive index layer provided on the first transparent conductor side surface of the first high refractive index layer,
The optical refractive index of the first transparent conductor is smaller than the optical refractive index of the first high refractive index layer of the base film, and the optical refractive index of the first low refractive index layer and the first undercoat layer of the base film. Bigger than
The first high refractive index layer has a thickness in the range of 3.6 to 8.3 nm, and its optical refractive index is 2.18 + 0.22 / −0.26 for light having a wavelength of 550 nm. The touch panel sensor is characterized in that it is within a range of 2.36 + 0.22 / −0.26 with respect to light having a wavelength of 400 nm. The first transparent conductor has a thickness in a range of 12 to 23 nm, and a light refractive index of 1.97 + 0.13 / −0.25 with respect to light having a wavelength of 550 nm. It is in the range of 2.12 + 0.13 / -0.25 with respect to the light of wavelength 400nm. The touch panel sensor of Claim 1 characterized by the above-mentioned. The first low refractive index layer has a thickness in the range of 41 to 87 nm and an optical refractive index in the range of 1.30 to 1.67. The touch panel sensor according to 1 or 2. The first undercoat layer has a thickness in the range of 600 to 10000 nm and an optical refractive index in the range of 1.35 to 1.67. 4. The touch panel sensor according to any one of 3. A laminate used for producing the touch panel sensor according to claim 1,
A base film;
A first transparent conductive layer provided on the surface on one side of the base film,
The base film is
A transparent film body,
A first undercoat layer provided on the surface of the film body on the first transparent conductor side;
A first high refractive index layer provided on a surface of the first undercoat layer on the first transparent conductive layer side;
A first low refractive index layer provided on the first transparent conductive layer side surface of the first high refractive index layer,
The optical refractive index of the first transparent conductive layer is smaller than the optical refractive index of the first high refractive index layer of the base film, and the optical refractive index of the first low refractive index layer and the first undercoat layer of the base film. Bigger than
The first high refractive index layer has a thickness in the range of 3.6 to 8.3 nm, and its optical refractive index is 2.18 + 0.22 / −0.26 for light having a wavelength of 550 nm. The laminate is characterized in that it is in the range of 2.36 + 0.22 / −0.26 for light having a wavelength of 400 nm. A base film;
A first transparent conductor patterned on the surface of one side of the base film;
A second transparent conductor patterned on the surface of the other side of the base film,
The base film is
A transparent film body,
A first undercoat layer provided on the surface of the film body on the first transparent conductor side;
A first high refractive index layer provided on a surface of the first undercoat layer on the first transparent conductor side;
A first low refractive index layer provided on a surface of the first high refractive index layer on the first transparent conductor side;
A second undercoat layer provided on the surface of the film body on the second transparent conductor side;
A second high refractive index layer provided on the second transparent conductor side surface of the second undercoat layer;
A second low refractive index layer provided on the second transparent conductor side surface of the second high refractive index layer,
The optical refractive index of the first transparent conductor is smaller than the optical refractive index of the first high refractive index layer of the base film, and the optical refractive index of the first low refractive index layer and the first undercoat layer of the base film. Bigger than
The optical refractive index of the second transparent conductor is smaller than the optical refractive index of the second high refractive index layer of the base film, and the optical refractive index of the second low refractive index layer and the second undercoat layer of the base film. Bigger than
The first high refractive index layer and the second high refractive index layer have a thickness in the range of 3.6 to 8.3 nm, and the optical refractive index is 2.18 + 0 with respect to light having a wavelength of 550 nm. A touch panel sensor characterized by being within a range of .22 / −0.26 and being within a range of 2.36 + 0.22 / −0.26 with respect to light having a wavelength of 400 nm. The first transparent conductor and the second transparent conductor have a thickness in the range of 12 to 23 nm, and have an optical refractive index of 1.97 + 0.13 / − with respect to light having a wavelength of 550 nm. The touch panel sensor according to claim 6, wherein the touch panel sensor is within a range of 0.25 and is within a range of 2.12 + 0.13 / −0.25 with respect to light having a wavelength of 400 nm. The first low refractive index layer and the second low refractive index layer have a thickness in the range of 41 to 87 nm, and the optical refractive index in the range of 1.30 to 1.67. The touch panel sensor according to claim 6 or 7, wherein: The first undercoat layer and the second undercoat layer have a thickness in the range of 600 to 10,000 nm and a light refractive index in the range of 1.35 to 1.67. The touch panel sensor according to claim 6. A laminate used for producing the touch panel sensor according to claim 6,
A base film;
A first transparent conductive layer provided on the surface of one side of the base film;
A second transparent conductive layer provided on the surface of the other side of the base film,
The base film is
A transparent film body,
A first undercoat layer provided on the surface of the film body on the first transparent conductor side;
A first high refractive index layer provided on a surface of the first undercoat layer on the first transparent conductive layer side;
A first low refractive index layer provided on a surface of the first high refractive index layer on the first transparent conductive layer side;
A second undercoat layer provided on the surface of the film body on the second transparent conductor side;
A second high refractive index layer provided on the second transparent conductive layer side surface of the second undercoat layer;
A second low refractive index layer provided on the second transparent conductive layer side surface of the second high refractive index layer,
The optical refractive index of the first transparent conductive layer is smaller than the optical refractive index of the first high refractive index layer of the base film, and the optical refractive index of the first low refractive index layer and the first undercoat layer of the base film. Bigger than
The optical refractive index of the second transparent conductive layer is smaller than the optical refractive index of the second high refractive index layer of the base film, and the optical refractive indexes of the second low refractive index layer and the second undercoat layer of the base film. Bigger than
The first high refractive index layer and the second high refractive index layer have a thickness in the range of 3.6 to 8.3 nm, and the optical refractive index is 2.18 + 0 with respect to light having a wavelength of 550 nm. A laminate that is within the range of .22 / −0.26 and is within the range of 2.36 + 0.22 / −0.26 with respect to light having a wavelength of 400 nm.

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