JP4791745B2 - 光学媒質の光入出射部処理方法 - Google Patents
光学媒質の光入出射部処理方法 Download PDFInfo
- Publication number
- JP4791745B2 JP4791745B2 JP2005093145A JP2005093145A JP4791745B2 JP 4791745 B2 JP4791745 B2 JP 4791745B2 JP 2005093145 A JP2005093145 A JP 2005093145A JP 2005093145 A JP2005093145 A JP 2005093145A JP 4791745 B2 JP4791745 B2 JP 4791745B2
- Authority
- JP
- Japan
- Prior art keywords
- optical medium
- laser
- incident
- fine structure
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
- C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Laser Beam Processing (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Lasers (AREA)
Description
Pθ=P0/(1±sinθ)
となる。このとき、入射レーザの走査方向が図中のイ方向(真上から照射角度θだけ傾けた側の方向)であれば
Pθ=P0/(1+sinθ)
となり、入射レーザの走査方向が図中のロ方向(上記イ方向と逆方向)であれば
Pθ=P0/(1−sinθ)
となることが確認される。
1b 光学媒質
1c 光学媒質
P 周期間隔
n1 屈折率
n2 屈折率
n3 屈折率
θ 照射角度
Claims (7)
- 屈折率が異なる2つの光学媒質の界面に凹凸状の周期微細構造を設けるにあたり、光学媒質の表面に金属薄膜を形成しておき、この金属薄膜に対して1光束の入射レーザを照射させ、照射箇所にて金属薄膜を除去するとともに、入射レーザを照射した際の散乱波とこの入射レーザとの相互作用によって、光学媒質の表面に周期微細構造を形成することを特徴とする光学媒質の光入出射部処理方法。
- 入射レーザとして、パルス幅が1ps未満の超高強度パルスレーザを用いることを特徴とする請求項1に記載の光学媒質の光入出射部処理方法。
- 入射レーザを金属薄膜に対して斜め方向から照射することを特徴とする請求項1又は2に記載の光学媒質の光入出射部処理方法。
- 入射レーザとして、円偏光レーザを用いることを特徴とする請求項1〜3のいずれか一項に記載の光学媒質の光入出射部処理方法。
- 入射レーザ照射後に、光学媒質のレーザ加工面のエッチング処理を行うことを特徴とする請求項1〜4のいずれか一項に記載の光学媒質の光入出射部処理方法。
- 金属薄膜として銅又は鉄、或いはその合金を含む材料を用いることを特徴とする請求項1〜5のいずれか一項に記載の光学媒質の光入出射部処理方法。
- 一方の光学媒質の表面に形成した周期微細構造を、他方の光学媒質と密接させることを特徴とする請求項1〜6のいずれか一項に記載の光学媒質の光入出射部処理方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005093145A JP4791745B2 (ja) | 2005-03-28 | 2005-03-28 | 光学媒質の光入出射部処理方法 |
TW095110382A TWI289209B (en) | 2005-03-28 | 2006-03-24 | Laser surface treatment |
EP06006249A EP1707994B1 (en) | 2005-03-28 | 2006-03-27 | Laser surface treatment |
AT06006249T ATE519136T1 (de) | 2005-03-28 | 2006-03-27 | Laser-oberflächenbehandlung |
US11/388,973 US8026459B2 (en) | 2005-03-28 | 2006-03-27 | Laser surface treatment |
CNB2006100714331A CN100381838C (zh) | 2005-03-28 | 2006-03-28 | 激光表面处理 |
KR1020060028048A KR100774436B1 (ko) | 2005-03-28 | 2006-03-28 | 레이저 표면 처리 방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005093145A JP4791745B2 (ja) | 2005-03-28 | 2005-03-28 | 光学媒質の光入出射部処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006276282A JP2006276282A (ja) | 2006-10-12 |
JP4791745B2 true JP4791745B2 (ja) | 2011-10-12 |
Family
ID=36616874
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005093145A Expired - Fee Related JP4791745B2 (ja) | 2005-03-28 | 2005-03-28 | 光学媒質の光入出射部処理方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8026459B2 (ja) |
EP (1) | EP1707994B1 (ja) |
JP (1) | JP4791745B2 (ja) |
KR (1) | KR100774436B1 (ja) |
CN (1) | CN100381838C (ja) |
AT (1) | ATE519136T1 (ja) |
TW (1) | TWI289209B (ja) |
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US7893385B2 (en) * | 2007-03-01 | 2011-02-22 | James Neil Rodgers | Method for enhancing gain and range of an RFID antenna |
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JP2008289818A (ja) * | 2007-05-28 | 2008-12-04 | Panasonic Electric Works Co Ltd | 光脱毛機器 |
US8279579B1 (en) * | 2007-12-10 | 2012-10-02 | Victor Rivas Alvarez | Energy transforming, storing and shielding devices |
US20100078418A1 (en) * | 2008-09-26 | 2010-04-01 | Electro Scientific Industries, Inc. | Method of laser micro-machining stainless steel with high cosmetic quality |
CN102741010A (zh) * | 2010-02-05 | 2012-10-17 | 株式会社藤仓 | 表面微细构造的形成方法以及具有表面微细构造的基体 |
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CN102416527B (zh) * | 2011-07-29 | 2014-12-03 | 武汉理工大学 | 纳秒激光刻蚀亚波长周期性条纹的方法 |
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US9023257B2 (en) | 2012-11-14 | 2015-05-05 | Perfect Ip, Llc | Hydrophilicity alteration system and method |
US9925621B2 (en) | 2012-11-14 | 2018-03-27 | Perfect Ip, Llp | Intraocular lens (IOL) fabrication system and method |
CN104942443B (zh) * | 2014-03-28 | 2017-01-25 | 汉达精密电子(昆山)有限公司 | 表面处理方法及其产品 |
US10629434B2 (en) * | 2015-04-08 | 2020-04-21 | The Trustees Of Columbia University In The City Of New York | Laser irradiation induced surface planarization of polycrystalline silicon films |
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US11231525B2 (en) * | 2016-11-14 | 2022-01-25 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Seed layer for fabrication of antireflective surface structures on optical elements |
CN116689948A (zh) * | 2017-10-25 | 2023-09-05 | 株式会社尼康 | 加工装置及加工方法 |
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DE102018221189A1 (de) * | 2018-12-07 | 2020-06-10 | Carl Zeiss Smt Gmbh | Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und optisches Element |
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-
2005
- 2005-03-28 JP JP2005093145A patent/JP4791745B2/ja not_active Expired - Fee Related
-
2006
- 2006-03-24 TW TW095110382A patent/TWI289209B/zh not_active IP Right Cessation
- 2006-03-27 US US11/388,973 patent/US8026459B2/en active Active
- 2006-03-27 EP EP06006249A patent/EP1707994B1/en active Active
- 2006-03-27 AT AT06006249T patent/ATE519136T1/de not_active IP Right Cessation
- 2006-03-28 KR KR1020060028048A patent/KR100774436B1/ko not_active IP Right Cessation
- 2006-03-28 CN CNB2006100714331A patent/CN100381838C/zh active Active
Also Published As
Publication number | Publication date |
---|---|
TW200634329A (en) | 2006-10-01 |
KR20060104938A (ko) | 2006-10-09 |
TWI289209B (en) | 2007-11-01 |
EP1707994A1 (en) | 2006-10-04 |
CN100381838C (zh) | 2008-04-16 |
US8026459B2 (en) | 2011-09-27 |
US20060213880A1 (en) | 2006-09-28 |
EP1707994B1 (en) | 2011-08-03 |
ATE519136T1 (de) | 2011-08-15 |
KR100774436B1 (ko) | 2007-11-08 |
JP2006276282A (ja) | 2006-10-12 |
CN1841097A (zh) | 2006-10-04 |
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