JP2006276238A - Photopolymerizable composition and lithographic printing original plate - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a photopolymerizable composition and a lithographic printing original plate that is superior in printing durability and image-forming properties and suitable for drawing with a laser light. <P>SOLUTION: The photopolymerizable composition contains (A) an alkali-soluble binder polymer, having a unit containing an ethylenically unsaturated bond, as well as a unit containing a sugar structure, (B) a polymerizable compound and (C) a polymerization initiator. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a negative photopolymerizable composition and a lithographic printing plate precursor, and more particularly to a negative photopolymerizable composition and a lithographic printing plate precursor that can be written with high sensitivity by laser light.

  Conventionally, PS plates having a structure in which an oleophilic photosensitive resin layer is provided on a hydrophilic support are widely used as lithographic printing plate precursors. As a plate making method, mask exposure (typically through a lithographic film) After the surface exposure), the desired printing plate was obtained by dissolving and removing the non-image area. In recent years, digitization techniques that electronically process, store, and output image information using a computer have become widespread. Various new image output methods corresponding to such digitization techniques have come into practical use. As a result, computer-to-plate (CTP) technology that scans highly directional light such as laser light according to digitized image information and directly produces printing plates without going through a lithographic film is eagerly desired. Therefore, obtaining a lithographic printing plate precursor adapted to this is an important technical issue.

  As such a lithographic printing plate precursor capable of scanning exposure, an oleophilic photosensitive resin layer containing a photosensitive compound capable of generating active species such as radicals and bronzed acids by laser exposure on a hydrophilic support (hereinafter referred to as “lithographic printing plate precursor”) , Which is also referred to as a photosensitive layer) has been proposed and is already on the market. This lithographic printing plate precursor is laser-scanned based on digital information to generate active species, which causes physical or chemical changes in the photosensitive layer to insolubilize it, followed by development processing, thereby developing a negative lithographic printing plate Can be obtained. In particular, a photopolymerization type photosensitive layer containing a photopolymerization initiator excellent in photosensitive speed on a hydrophilic support, an ethylenically unsaturated compound capable of addition polymerization, and a binder polymer soluble in an alkali developer, and necessary A lithographic printing plate precursor provided with an oxygen-blocking protective layer in accordance with the printing plate having desirable printing performance due to advantages such as excellent productivity, simple development processing, and good resolution and inking properties. It can be.

Conventionally, as the binder polymer constituting the photosensitive layer, methacrylic acid copolymer, acrylic acid copolymer, itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer Organic polymer polymers that can be developed with alkali have been used (see, for example, Patent Documents 1 to 8). However, in a conventional lithographic printing plate precursor provided with a photosensitive layer containing such a binder polymer, the developer is insufficiently cured due to insufficient curing in the image portion that should have been cured. As a result, the photosensitive layer was damaged and the printing durability was lowered. In order to suppress the penetration of the developing solution into the image area, the developability of the non-image area is usually sacrificed. It was a very difficult problem to achieve both high developability and compatibility.
Japanese Patent Publication No.59-44615 Japanese Patent Publication No.54-34327 Japanese Examined Patent Publication No. 58-12777 Japanese Patent Publication No.54-25957 JP 54-92723 A JP 59-53836 A JP 59-71048 A Japanese Patent Laid-Open No. 2002-40652

  Accordingly, the object of the present invention is to solve the above-mentioned problem of coexistence of the suppression of the developer penetration of the image area and the high developability of the non-image area, and to provide a lithographic printing plate precursor excellent in printing durability and image formability and its A photopolymerizable composition suitable for a photosensitive layer, particularly a lithographic printing plate precursor suitable for drawing with a laser beam and a photopolymerizable composition suitable for the photosensitive layer.

As a result of intensive studies to achieve the above object, the present inventors have achieved the above object with a photopolymerizable composition containing a specific binder polymer and a photosensitive layer using the photopolymerizable composition. As a result, the present invention has been accomplished.
That is, the present invention is as follows.

(1) (A) an alkali-soluble binder polymer having an ethylenically unsaturated bond-containing unit together with a sugar structure-containing unit,
A photopolymerizable composition comprising (B) a polymerizable compound and (C) a polymerization initiator.
(2) A lithographic printing plate precursor comprising a photosensitive layer containing the photopolymerizable composition described in (1) above on a support.

Although the operation of the present invention is not clear, it is presumed as follows.
Since sugar has many hydroxyl groups (OH) in its structure, when a photosensitive layer (coating film) is formed using a binder having this in the side chain, a network of multipoint hydrogen bonds is formed in the film. As a result, in addition to the formation of a crosslinked hardened film by exposure (in this case, a covalent bond is formed between C = C of the binder side chain and C = C of the polymerizable compound), the above-mentioned multipoint hydrogen bond It is presumed that the addition of the non-covalent bond interaction caused by the improvement of the cross-linked dura strength and, consequently, the improvement of sensitivity (press life).
On the other hand, in the non-image area (= unexposed area), the multipoint hydrogen bond formed between the sugars is a non-covalent bond, and a protic medium such as water (for example, developer) is interposed. Then, since water molecules inhibit the formation of hydrogen bonds between functional groups, it is generally impossible to form hydrogen bonds. As a result, even though some crosslinking reaction or polymerization reaction occurred even though the exposure was not carried out, the penetration of the developer into the film was promoted by OH in the sugar structure, so that the unexposed portion of the photosensitive layer was aged. In some cases, it is presumed that they can be easily developed. As a result, it is considered that a good printing plate excellent in raw storability (= no stain due to development failure even with time) can be obtained.

The alkali-soluble binder polymer of the present invention has an ethylenically unsaturated bond-containing unit together with a sugar structure-containing unit. By providing the photosensitive layer containing the binder polymer, it is possible to produce a lithographic printing plate precursor having very high sensitivity and printing durability and excellent raw storage stability.
Furthermore, the lithographic printing plate precursor according to the present invention is suitable for scanning exposure with laser light, can be written at high speed, and has high productivity.

The present invention will be described below.
<Polymerizable composition>
The photopolymerizable composition of the present invention includes an alkali-soluble binder polymer having an ethylenically unsaturated bond-containing unit together with a sugar structure-containing unit, a sensitizing dye having an absorption maximum at a wavelength of 300 to 600 nm, a polymerization initiator, and a polymerizable compound It is characterized by containing.
Such a photopolymerizable composition has a mechanism in which a polymerization initiator is decomposed by light or heat to generate a radical, and the polymerizable compound causes a polymerization reaction by the generated radical. Furthermore, since the photopolymerizable composition of the present invention preferably contains a sensitizing dye, when exposed to a laser beam having a wavelength of 300 to 600 nm, only the exposed portion is photosensitized to cause a polymerization reaction. Progresses and hardens. This photopolymerizable composition can be applied to various uses utilizing these mechanisms, for example, a photosensitive layer of a lithographic printing plate precursor that can be directly drawn by a laser beam, an image recording material, or It is also suitable as a high-sensitivity optical modeling material, and can be applied to hologram materials by utilizing the change in refractive index accompanying polymerization, and to the production of electronic materials such as photoresists. Among these, it is particularly suitable as a photosensitive layer of a lithographic printing plate precursor that can be directly drawn with a laser beam or the like.
The photopolymerizable composition of the present invention will be described in detail with reference to the lithographic printing plate precursor which is the most suitable application.

<Lithographic printing plate precursor>
The lithographic printing plate precursor according to the invention is characterized in that a photosensitive layer containing the photopolymerizable composition according to the invention is provided on a support.

(Photosensitive layer)
First, the photosensitive layer in the lithographic printing plate precursor according to the invention will be described in detail.
The photosensitive layer in the invention contains an alkali-soluble binder polymer having an ethylenically unsaturated bond-containing unit together with a sugar structure-containing unit, a sensitizing dye having an absorption maximum at a wavelength of 300 to 600 nm, a polymerization initiator, and a polymerizable compound. It is characterized by that.
Hereinafter, each component constituting the photosensitive layer in the invention will be described.

[(A) Binder polymer]
The binder polymer contained in the photosensitive layer in the lithographic printing plate precursor according to the invention has an ethylenically unsaturated bond-containing unit together with a sugar structure-containing unit. Hereinafter, a binder polymer having an ethylenically unsaturated bond-containing unit together with a sugar structure-containing unit will be referred to as a specific binder polymer, and will be described in detail.

The alkali-soluble binder polymer preferably has a sugar structure in the side chain.
As the sugar structure of the side chain, any sugar from monosaccharide to polysaccharide may be introduced. From the viewpoint of ease of synthesis, monosaccharide to pentasaccharide are preferable. Furthermore, from the viewpoint of developability of the non-image area (which depends on the hydrogen bond between OH groups in the sugar structure), the number of OH groups is more preferably about a monosaccharide. Further, in order to achieve both sensitivity and raw storage stability, if the number of OH groups is about the same as that of monosaccharides, the amount of hydrogen bonding is optimized, and therefore monosaccharides are more preferable.

The content of the unit having a saccharide structure in the alkali-soluble polymer is preferably 0.01 to 10.0 mmol, more preferably 0.1 to 6.0 mmol, and most preferably 0.5 to 4 per 1 g of the alkali-soluble polymer. 0.0 mmol. Moreover, only one type of such units may be contained in the alkali-soluble polymer, or two or more types may be contained.
Specific examples of preferable saccharides are described below.

  Glucose, fructose, mannose, galactose, gulose, allose, idose, xylose, ribose, arabinose, lyxose, erythrose, threose and other monosaccharides, maltose, cellobiose, lactose, sucrose, sucrose, etc. , An ether group, an ester group, an amide group, an amino group, a thioether group, an aryl group, a urethane group, a urea group, and the like, can be introduced into the side chain by bonding.

  The above saccharides are alkyl groups, alkenyl groups, alkynyl groups, alkoxy groups, aryl groups, heterocyclic groups, hydroxyl groups, carboxyl groups, amino groups, ethyleneoxy groups, sulfonic acid groups, phosphoric acid groups, urethane groups, ureas. It is possible to substitute with a group, a thiol group, an acetal group, or a combination thereof.

Examples of the hydrophilic group in the compound having two or more 5-membered ring and / or 6-membered ring structure and the ring structure containing a hydrophilic group include a hydroxyl group, a carboxyl group, an amino group, an ethyleneoxy group, and a sulfonic acid. Group, phosphoric acid group, urethane group, urea group, thiol group and the like. These can be directly bonded to a 5-membered ring or a 6-membered ring, but can also be bonded via a linking group such as a methylene group, a methyleneoxy group, an aryl group, if necessary. Further, the hydroxyl group, carboxyl group, sulfonic acid group, phosphoric acid group, thiol group and the like mentioned above can be used either in the proton form or neutralized with a base.
The amino group may be an ammonium group neutralized with an acid.

  Specific examples of the saccharide-containing unit are given below, but the present invention is not limited to these.

  In the saccharide-containing unit, the following abbreviations were also used as the saccharide structure.

  For example,

Is synonymous with the following structure.

  Furthermore, the alkali-soluble polymer of the present invention preferably has an ethylenically unsaturated double bond (hereinafter referred to as “radical polymerizable group” as appropriate) in its side chain. As a method for introducing a radical polymerizable group into the side chain of the alkali-soluble polymer of the present invention, in addition to the unit having the sugar structure, radical polymerization having a structure represented by the following general formulas (A) to (E): The method of combining the unit which has a sex group is mentioned. The content of radically polymerizable groups in the alkali-soluble polymer (content of unsaturated double bond capable of radical polymerization by iodometric titration) is preferably 0.1 to 10.0 mmol, more preferably 1 g per 1 g of alkali-soluble polymer. 1.0 to 8.0 mmol, most preferably 1.5 to 7.0 mmol. Moreover, only one type of such units may be contained in the alkali-soluble polymer, or two or more types may be contained.

First, general formulas (A) to (C) will be described. In general formulas (A) to (C), R ^{4 to} R ¹⁴ each independently represents a hydrogen atom or a monovalent substituent. X and Y each independently represent an oxygen atom, a sulfur atom, or N—R ¹⁵ , and Z represents an oxygen atom, a sulfur atom, —N—R ^15, or a phenylene group. Here, R ¹⁵ represents a hydrogen atom or a monovalent organic group.

In the general formula (A), R ^{4 to} R ⁶ each independently represent a hydrogen atom or a monovalent substituent, and R ⁴ is a hydrogen atom or an alkyl which may have a substituent. An organic group such as a group can be mentioned, and specifically, a hydrogen atom, a methyl group, a methylalkoxy group, and a methyl ester group are preferable. R ⁵ and R ⁶ are each independently a hydrogen atom, halogen atom, amino group, dialkylamino group, carboxyl group, alkoxycarbonyl group, sulfo group, nitro group, cyano group, alkyl group, aryl group, alkoxy group , An aryloxy group, an alkylamino group, an arylamino group, an alkylsulfonyl group, an arylsulfonyl group, and the like. Among them, a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl group, and an aryl group are preferable.
Each of the above groups may have a substituent, and examples of the substituent that can be introduced include a methoxycarbonyl group, an ethoxycarbonyl group, an isopropyloxycarbonyl group, a methyl group, an ethyl group, and a phenyl group.
X represents an oxygen atom, a sulfur atom, or —N—R ¹⁵ , where R ¹⁵ includes an alkyl group which may have a substituent.

In the general formula (B), R ^{7 to} R ¹¹ each independently represents a hydrogen atom or a monovalent substituent, and R ^{7 to} R ¹¹ are, for example, a hydrogen atom, a halogen atom, an amino group, Dialkylamino group, carboxyl group, alkoxycarbonyl group, sulfo group, nitro group, cyano group, alkyl group, aryl group, alkoxy group, aryloxy group, alkylamino group, arylamino group, alkylsulfonyl group, arylsulfonyl group, etc. Among them, a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl group, and an aryl group are preferable.
Each of the above groups may have a substituent, and examples of the substituent that can be introduced include those exemplified as the substituent that can be introduced in the general formula (A).
Y represents an oxygen atom, a sulfur atom, or —N—R ¹⁵ . Examples of R ¹⁵ include the same as those in general formula (A).

In the general formula (C), R ^{12 to} R ¹⁴ each independently represents a hydrogen atom or a monovalent substituent. Specific examples include a hydrogen atom, a halogen atom, an amino group, and a dialkylamino group. Carboxyl group, alkoxycarbonyl group, sulfo group, nitro group, cyano group, alkyl group, aryl group, alkoxy group, aryloxy group, alkylamino group, arylamino group, alkylsulfonyl group, arylsulfonyl group, etc. Of these, a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, an alkyl group, and an aryl group are preferable.
Each of the above groups may have a substituent, and examples of the substituent that can be introduced include those exemplified as the substituent that can be introduced in the general formula (A).
Z represents an oxygen atom, a sulfur atom, —N—R ¹⁵ or a phenylene group. Examples of R ¹⁵ include the same as R ^{4 to} R ⁶ in the general formula (A).
Specific examples of preferred units having radically polymerizable groups having the structures represented by the general formulas (A) to (C) are shown below, but the present invention is not limited thereto.

  The polymer having a radically polymerizable group having a structure represented by the general formula (A) according to the present invention can be produced by at least one of the synthesis methods (i) and (ii) shown below.

(Synthesis method (i))
After synthesizing a polymer compound by polymerizing one or more radically polymerizable compounds represented by the following general formula (a), using a base, a proton is extracted, and Z ¹ is eliminated to obtain a desired compound. A method for obtaining a polymer compound.

In the general formula (a), R ⁴ ~R ⁶ have the same meanings as R ⁴ to R ⁶ in the general formula (A). Z ¹ represents an anionic leaving group. Q represents an oxygen atom, —NH—, or NR ¹⁷ — (wherein R ¹⁷ represents an alkyl group which may have a substituent). R ¹⁶ includes a hydrogen atom or an alkyl group which may have a substituent. Among them, a hydrogen atom, a methyl group, a methylalkoxy group or a methyl ester group is preferable. A represents a divalent organic linking group.

  Examples of the radical polymerizable compound represented by the general formula (a) include, but are not limited to, the following compounds.

These radically polymerizable compounds represented by the general formula (a) can be easily obtained as commercial products.
A polymer compound was synthesized by polymerizing by one ordinary radical polymerization method using one or more of these radically polymerizable compounds represented by the general formula (a) and other radically polymerizable compounds as required. Thereafter, a desired amount of a base is dropped into a polymer solution under a cooling or heating condition to perform a reaction, and if necessary, neutralization treatment with an acid is performed to represent the general formula (A). Groups can be introduced. A generally known suspension polymerization method or solution polymerization method can be applied to the production of the polymer compound.
Here, as a base to be used, either an inorganic compound (inorganic base) or an organic compound (organic base) may be used. Preferred inorganic bases include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogen carbonate, potassium carbonate, potassium hydrogen carbonate and the like, and organic bases include sodium methoxide, sodium ethoxide, potassium tert-butoxide. And metal amine alkoxides, triethylamine, pyridine, and organic amine compounds such as diisopropylethylamine.

(Synthesis method (ii))
One or more radically polymerizable compounds having functional groups are polymerized to form a trunk polymer compound (
After synthesizing the polymer compound constituting the main chain, a desired polymer compound is obtained by reacting the side chain functional group of the trunk polymer compound with a compound having a structure represented by the following general formula (b). Method.

R ⁴ to R in the general formula (b) ⁶ has the same meaning as R ⁴ to R ⁶ in the general formula (A).

Examples of the functional group of the radical polymerizable compound having a functional group used for the synthesis of the trunk polymer compound in the synthesis method (ii) include a hydroxyl group, a carboxyl group, a carboxylic acid halide group, a carboxylic acid anhydride group, an amino group, Examples include halogenated alkyl groups, isocyanate groups, and epoxy groups. Specific examples of the radical polymerizable compound having such a functional group include 2-hydroxylethyl acrylate, 2-hydroxylethyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, acrylic acid, methacrylic acid, acrylic acid chloride, methacrylic acid. Examples include acid chloride, methacrylic anhydride, N, N-dimethyl-2-aminoethyl methacrylate, 2-chloroethyl methacrylate, 2-isocyanate ethyl methacrylate, glycidyl acrylate, and grindyl methacrylate.
After synthesizing one or more radically polymerizable compounds having such a functional group and copolymerizing with other radically polymerizable compounds as necessary to synthesize a trunk polymer compound, the above general formula (b) A desired polymer compound can be obtained by reacting a compound having the group represented.
Here, as an example of the compound having a group represented by the general formula (b), the compounds mentioned as specific examples of the radical polymerizable compound having such a functional group are mentioned.

  The polymer having a radically polymerizable group having the structure represented by the general formula (B) according to the present invention can be produced by at least one of the following synthesis methods (iii) and (iv).

(Synthesis method (iii))
One or more radically polymerizable compounds having an unsaturated group represented by the general formula (B) and an ethylenically unsaturated group further rich in addition polymerization than the unsaturated group, and further if necessary A method of polymerizing another radical polymerizable compound to obtain a polymer compound. This method uses a compound having a plurality of ethylenically unsaturated groups having different addition polymerization properties in one molecule, for example, a compound such as allyl methacrylate.

  Examples of the radical polymerizable compound having an ethylenically unsaturated group rich in addition polymerization than the unsaturated group represented by the general formula (B) include allyl acrylate, allyl methacrylate, 2-allyloxyethyl acrylate, 2 Examples include -allyloxyethyl methacrylate, propargyl acrylate, propargyl methacrylate, N-allyl acrylate, N-allyl methacrylate, N, N-diallyl acrylate, N, N-diallyl methacrylamide, allyl acrylamide, and allyl methacrylamide.

(Synthesis method (iv))
After synthesizing one or more radically polymerizable compounds having a functional group to synthesize a polymer compound, a side chain functional group and a compound having a structure represented by the following general formula (c) are reacted to form a general formula (B The method of introduce | transducing group represented by this.

R < ⁷ > -R < ¹¹ > in general formula (c) is synonymous with R < ⁷ > -R < ¹¹ > in the said general formula (B).

Specific examples of the radically polymerizable compound having a functional group in the synthesis method (iv) include the specific examples of the radically polymerizable compound having a functional group shown in the aforementioned synthesis method (ii).
Examples of the compound having the structure represented by the general formula (c) include allyl alcohol, allylamine, diallylamine, 2-allyloxyethyl alcohol, 2-chloro-1-butene, and allyl isocyanate.

  The polymer having a radically polymerizable group having a structure represented by the general formula (C) according to the present invention can be produced by at least one of the synthesis methods (v) and (vi) shown below.

(Synthesis method (v))
One or more radically polymerizable compounds having an unsaturated group represented by the general formula (C) and an ethylenically unsaturated group further rich in addition polymerization than the unsaturated group, and further if necessary A method of obtaining a polymer compound by copolymerizing with another radical polymerizable compound.

  Examples of the radical polymerizable compound having an ethylenically unsaturated group richer in addition polymerization than the unsaturated group represented by the general formula (C) include vinyl acrylate, vinyl methacrylate, 2-phenylvinyl acrylate, 2- Examples include phenyl vinyl methacrylate, 1-propenyl acrylate, 1-propenyl methacrylate, vinyl acrylamide, vinyl methacrylamide and the like.

(Synthesis method (vi))
A method in which one or more radically polymerizable compounds having a functional group are polymerized to synthesize a polymer compound, and then a side chain functional group and a compound having a structure represented by the general formula (d) are reacted and introduced.

R < ¹² > -R < ¹⁴ > in general formula (d) is synonymous with R < ¹² > -R < ¹⁴ > in the said general formula (C).

Specific examples of the radical polymerizable compound having a functional group in the synthesis method (vi) include specific examples of the radical polymerizable compound having a functional group shown in the synthesis method (ii).
Examples of the compound having the structure represented by the general formula (d) include 2-hydroxyethyl monovinyl ether, 4-hydroxybutyl monovinyl ether, diethylene glycol monovinyl ether, 4-chloromethylstyrene and the like.

  As mentioned above, although the synthesis method (i)-(vi) of the polymer which has the radically polymerizable group of the structure represented by the said general formula (A)-(C) based on this invention was demonstrated, this synthesis method was used. In order to synthesize the specific binder polymer of the present invention, when the radically polymerizable compound is polymerized in each of the synthesis methods (i) to (vi), the radically polymerizable compound and the sugar structure-containing unit are mixed with each other. This is achieved by copolymerization in proportion.

Next, general formulas (D) and (E) will be described.
In the general formula (D), R ¹⁶ represents a hydrogen atom or a methyl group. R ¹⁷ represents any substitutable atom or atomic group. k represents an integer of 0 to 4. In addition, the radically polymerizable group represented by the general formula (D) is bonded to the polymer main chain through a single bond or a linking group composed of an arbitrary atom or atomic group. There is no limit.

In general formula (E), R ¹⁸ represents hydrogen or a methyl group. R ¹⁹ represents any substitutable atom or atomic group. m represents an integer of 0 to 4. A ⁻ represents an anion. Such a pyridinium ring may take the form of a benzopyridinium fused with a benzene ring as a substituent, and in this case, includes a quinolium group and an isoquinolium group. In addition, the radically polymerizable group represented by the general formula (E) is bonded to the polymer main chain through a single bond or a linking group composed of an arbitrary atom or atomic group, and the bonding method is also particularly preferable. There is no limit.

  Preferred examples of the unit (repeating unit) containing the radically polymerizable group represented by the general formulas (D) and (E) are shown below, but the present invention is not limited thereto.

As described above, among the radical polymerizable groups represented by the general formulas (A) to (E), a radical polymerizable group having a structure represented by the general formulas (A) and (B) is preferable. Among them, particularly preferred is a radically polymerizable group having a structure represented by the general formula (A), and R ⁴ is a hydrogen atom or a methyl group, and X is an oxygen atom or a nitrogen atom. preferable.

  The binder polymer of the present invention may further have a unit containing an amide group as a copolymerization component with the sugar structure-containing unit. Such an amide group is preferably an amide group having a structure represented by the following general formula (F).

In general formula (F), R ²⁰ and R ²¹ are each independently a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heterocyclic group, or It represents a substituted sulfonyl group, and R ²⁰ and R ²¹ may be bonded to each other to form an alicyclic structure.

Preferable examples of R ²⁰ and R ²¹ will be described in detail. Examples of the alkyl group represented by R ²⁰ and R ²¹ include linear, branched, and cyclic alkyl groups having 1 to 20 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, and an ethyl group. Group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, hexadecyl group, octadecyl group, eicosyl group, isopropyl group, isobutyl group, Examples thereof include s-butyl group, t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group and 2-norbornyl group. . Of these, linear alkyl groups having 1 to 12 carbon atoms, branched alkyl groups having 3 to 12 carbon atoms, and cyclic alkyl groups having 5 to 10 carbon atoms are more preferable.

Examples of the substituent of the substituted alkyl group represented by R ²⁰ and R ²¹ include a group consisting of a monovalent nonmetallic atomic group excluding a hydrogen atom, and preferred examples include halogen atoms (—F, —Br, -Cl, -I), hydroxyl group, alkoxy group, aryloxy group, mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, amino group, N-alkylamino group, N, N-dialkylamino group, N-arylamino group, N, N-diarylamino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkyl Carbamoyloxy group, N, N-diarylcarbamoyloxy group, N-alkyl-N-arylcarbamo Ruoxy group, alkylsulfoxy group, arylsulfoxy group, acylthio group, acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N′-alkylureido group, N ′, N′-dialkyl Ureido group, N′-arylureido group, N ′, N′-diarylureido group, N′-alkyl-N′-arylureido group, N-alkylureido group, N-arylureido group, N′-alkyl-N -Alkylureido group, N'-alkyl-N-arylureido group, N ', N'-dialkyl-N-alkylureido group, N', N'-dialkyl-N-arylureido group, N'-aryl-N -Alkylureido group, N'-aryl-N-arylureido group, N ', N'-diaryl-N-alkylureido group, N', N'-diaryl- N-arylureido group, N′-alkyl-N′-aryl-N-alkylureido group, N′-alkyl-N′-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxycarbonylamino group, N -Alkyl-N-alkoxycarbonylamino group, N-alkyl-N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N-aryloxycarbonylamino group, formyl group, acyl group (R ⁰¹ CO—), carboxyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N-diarylcarbamoyl group, N-alkyl-N-arylcarbamo Group, alkylsulfinyl group, arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, (referred to as a sulfonato group) sulfo group (-SO ₃ H) and its conjugated base group, alkoxy sulfonyl group, aryloxy sulfonyl group, sulfinamoyl group N-alkylsulfinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl group, N-alkyl-N-arylsulfinamoyl group, Sulfamoyl group, N-alkylsulfamoyl group, N, N-dialkylsulfamoyl group, N-arylsulfamoyl group, N, N-diarylsulfamoyl group, N-alkyl-N-arylsulfamoyl group Phosphono group (—PO ₃ H ₂ ) and its conjugate base group (phospho A dialkylphosphono group (—PO ₃ (alkyl) ₂ ; alkyl = alkyl group, hereinafter the same), a diarylphosphono group (—PO ₃ (aryl) ₂ ; aryl = aryl group, the same hereinafter), An alkylarylphosphono group (—PO ₃ (alkyl) (aryl)), a monoalkylphosphono group (—PO ₃ (alkyl)) and its conjugate base group (referred to as an alkylphosphonato group), a monoarylphosphono group ( -PO ₃ referred to as H (aryl)) and its conjugated base group (aryl phosphite Hona preparative group), referred to as phosphonooxy group (-OPO ₃ H ₂₎ and its conjugated base group (phosphonatooxy group), dialkylphosphono group (- _{OPO 3 H (alkyl) 2)} , diaryl phosphono group _{(-OPO 3 (aryl) 2)} , alkylaryl phosphonooxymethyl (-OPO ₃ (alkyl) (aryl)), (referred to as alkylphosphonato group) monoalkyl phosphono group (-OPO ₃ H (alkyl)) and its conjugated base group, monoarylphosphono group (- OPO ₃ H (aryl)) and its conjugate base group (referred to as arylphosphonatoxy group), cyano group, nitro group, aryl group, alkenyl group, alkynyl group, heterocyclic group, silyl group and the like.

  Specific examples of the alkyl group in these substituents include the above-described alkyl groups, and specific examples of the aryl group include a phenyl group, a biphenyl group, a naphthyl group, a tolyl group, a xylyl group, a mesityl group, and a cumenyl group. , Chlorophenyl group, bromophenyl group, chloromethylphenyl group, hydroxyphenyl group, methoxyphenyl group, ethoxyphenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group, methylthiophenyl group, phenylthiophenyl group, methylamino Phenyl group, dimethylaminophenyl group, acetylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl group, ethoxyphenylcarbonyl group, phenoxycarbonylphenyl group, N-phenylcarbamoylphenyl group, cyanophene Group, sulfophenyl group, sulfonatophenyl group, phosphonophenyl group, and a phosphate Hona preparative phenyl group.

Examples of the alkenyl group in these substituents include vinyl group, 1-propenyl group, 1-butenyl group, cinnamyl group, 2-chloro-1-ethenyl group, and the like. Examples of alkynyl groups Includes an ethynyl group, a 1-propynyl group, a 1-butynyl group, a trimethylsilylethynyl group, and the like.
Furthermore, in these substituents, R ⁰¹ in the acyl group (R ⁰¹ CO-), a hydrogen atom, and the above-described alkyl group, and an aryl group.

  Among these substituents, more preferred are halogen atoms (—F, —Br, —Cl, —I), alkoxy groups, aryloxy groups, alkylthio groups, arylthio groups, N-alkylamino groups, N, N -Dialkylamino group, acyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, acylamino group, formyl group, acyl group, carboxyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group Group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N-alkyl-N-arylcarbamoyl group, sulfo group, sulfonate group, sulfamoyl group, N-alkylsulfamoyl group, N, N-dialkylsulfa group Moyl group, N-arylsulfur Amoyl group, N-alkyl-N-arylsulfamoyl group, phosphono group, phosphonato group, dialkylphosphono group, diarylphosphono group, monoalkylphosphono group, alkylphosphonato group, monoarylphosphono group, arylphospho Examples thereof include a nato group, a phosphonooxy group, a phosphonatooxy group, an aryl group, and an alkenyl group. In addition, examples of the heterocyclic group include a pyridyl group and a piperidinyl group. Examples of the silyl group include a trimethylsilyl group.

On the other hand, the alkylene group constituting the substituted alkyl group includes a divalent organic residue obtained by removing any one of the hydrogen atoms on the alkyl group having 1 to 20 carbon atoms. Preferred examples include linear alkylene groups having 1 to 12 carbon atoms, branched alkylene groups having 3 to 12 carbon atoms, and cyclic alkylene groups having 5 to 10 carbon atoms. Preferable specific examples of the substituted alkyl group obtained by combining such an alkylene group and a substituent include chloromethyl group, bromomethyl group, 2-chloroethyl group, trifluoromethyl group, methoxymethyl group, isopropoxymethyl. Group, butoxymethyl group, s-butoxybutyl group, methoxyethoxyethyl group, allyloxymethyl group, phenoxymethyl group, methylthiomethyl group, tolylthiomethyl group, pyridylmethyl group, tetramethylpiperidinylmethyl group, N-acetyl Tetramethylpiperidinylmethyl group, trimethylsilylmethyl group, methoxyethyl group, ethylaminoethyl group, diethylaminopropyl group, morpholinopropyl group, acetyloxymethyl group, benzoyloxymethyl group, N-cyclohexylcarbamoyloxye Group, N-phenylcarbamoyloxyethyl group, acetylaminoethyl group, N-methylbenzoylaminopropyl group, 2-oxoethyl group, 2-oxopropyl group, carboxypropyl group, methoxycarbonylethyl group, allyloxycarbonylbutyl group, Chlorophenoxycarbonylmethyl group, carbamoylmethyl group, N-methylcarbamoylethyl group, N, N-dipropylcarbamoylmethyl group, N- (methoxyphenyl) carbamoylethyl group, N-methyl-N- (sulfophenyl) carbamoylmethyl group , Sulfobutyl group, sulfonatobutyl group, sulfamoylbutyl group, N-ethylsulfamoylmethyl group, N, N-dipropylsulfamoylpropyl group, N-tolylsulfamoylpropyl group, N-methyl-N- (phosphono Enyl) sulfamoyloctyl group, phosphonobutyl group, phosphonatohexyl group, diethylphosphonobutyl group, diphenylphosphonopropyl group, methylphosphonobutyl group, methylphosphonatobutyl group, tolylphosphonohexyl group, tolylphosphonatohexyl Group, phosphonooxypropyl group, phosphonatoxybutyl group, benzyl group, phenethyl group, α-methylbenzyl group, 1-methyl-1-phenylethyl group, p-methylbenzyl group, cinnamyl group, allyl group, 1- A propenylmethyl group, 2-butenyl group, 2-methylallyl group, 2-methylpropenylmethyl group, 2-propynyl group, 2-butynyl group, 3-butynyl group and the like can be mentioned.

Next, examples of the aryl group as R ²⁰ and R ²¹ include those in which 1 to 3 benzene rings form a condensed ring, and those in which a benzene ring and a 5-membered unsaturated ring form a condensed ring. Specific examples include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenaphthenyl group, and a fluorenyl group. Among these, a phenyl group and a naphthyl group are more preferable.

Examples of the substituted aryl group represented by R ²⁰ and R ²¹ include those having a group consisting of a monovalent non-metallic atomic group excluding a hydrogen atom as a substituent on the ring-forming carbon atom of the aforementioned aryl group. It is done. Examples of preferred substituents include the aforementioned alkyl groups, substituted alkyl groups, and those previously shown as substituents in the substituted alkyl group. Preferred examples of such a substituted aryl group include biphenyl group, tolyl group, xylyl group, mesityl group, cumenyl group, chlorophenyl group, bromophenyl group, fluorophenyl group, chloromethylphenyl group, trifluoromethylphenyl group. Hydroxyphenyl group, methoxyphenyl group, methoxyethoxyphenyl group, allyloxyphenyl group, phenoxyphenyl group, methylthiophenyl group, tolylthiophenyl group, ethylaminophenyl group, diethylaminophenyl group, morpholinophenyl group, acetyloxyphenyl group, Benzoyloxyphenyl group, N-cyclohexylcarbamoyloxyphenyl group, N-phenylcarbamoyloxyphenyl group, acetylaminophenyl group, N-methylbenzoylaminophenyl group, cal Xiphenyl group, methoxycarbonylphenyl group, allyloxycarbonylphenyl group, chlorophenoxycarbonylphenyl group, carbamoylphenyl group, N-methylcarbamoylphenyl group, N, N-dipropylcarbamoylphenyl group, N- (methoxyphenyl) carbamoylphenyl group N-methyl-N- (sulfophenyl) carbamoylphenyl group, sulfophenyl group, sulfonatophenyl group, sulfamoylphenyl group, N-ethylsulfamoylphenyl group, N, N-dipropylsulfamoylphenyl group, N-tolylsulfamoylphenyl group, N-methyl-N- (phosphonophenyl) sulfamoylphenyl group, phosphonophenyl group, phosphonatophenyl group, diethylphosphonophenyl group, diphenylphosphonophenyl Methylphosphonophenyl group, methylphosphonatophenyl group, tolylphosphonophenyl group, tolylphosphonophenyl group, allylphenyl group, 1-propenylmethylphenyl group, 2-butenylphenyl group, 2-methylallylphenyl group, A 2-methylpropenylphenyl group, a 2-propynylphenyl group, a 2-butynylphenyl group, a 3-butynylphenyl group, and the like can be given.

An alkenyl group, a substituted alkenyl group, an alkynyl group, and a substituted alkynyl group (—C (R ⁰² ) ═C (R ⁰³ ) (R ⁰⁴ ) represented by R ²⁰ and R ²¹ , and —C≡C (R ^{05 Examples of} )) include those in which R ⁰² , R ⁰³ , R ⁰⁴ and R ⁰⁵ are monovalent non-metallic atomic groups. Preferable examples of R ⁰² , R ⁰³ , R ⁰⁴ and R ⁰⁵ include a hydrogen atom, a halogen atom, an alkyl group, a substituted alkyl group, an aryl group and a substituted aryl group. Specific examples thereof include those shown as the above examples. More preferable groups of R ⁰² , R ⁰³ , R ⁰⁴ , and R ⁰⁵ include a hydrogen atom, a halogen atom, and a linear, branched, or cyclic alkyl group having 1 to 10 carbon atoms. Preferable specific examples of the alkenyl group, substituted alkenyl group, alkynyl group and substituted alkynyl group represented by R ²⁰ and R ²¹ are vinyl group, 1-propenyl group, 1-butenyl group, 1-pentenyl group, 1-hexenyl group, 1-octenyl group, 1-methyl-1-propenyl group, 2-methyl-1-propenyl group, 2-methyl-1-butenyl group, 2-phenyl-1-ethenyl group, 2-chloro- Examples include 1-ethenyl group, ethynyl group, 1-propynyl group, 1-butynyl group, and phenylethynyl group.

Examples of the heterocyclic group represented by R ²⁰ and R ²¹ include the pyridyl group exemplified as the substituent of the substituted alkyl group.

^{Examples of the} substituted sulfonyl group (R ⁰¹¹ —SO ₂ —) represented by R ²⁰ and R ²¹ include those in which R ⁰¹¹ is a group consisting of a monovalent nonmetallic atomic group. More preferable examples include an alkylsulfonyl group and an arylsulfonyl group. Examples of the alkyl group and aryl group in these include those described above as the alkyl group, substituted alkyl group, aryl group, and substituted aryl group. Specific examples of such a substituted sulfonyl group include a butylsulfonyl group, a phenylsulfonyl group, a chlorophenylsulfonyl group, and the like.

Examples of the ring formed by bonding R ²⁰ and R ²¹ to each other in the general formula (F) include morpholine, piperazine, pyrrolidine, pyrrole, indoline and the like. These may be further substituted with a substituent as described above. Among them, the case where an alicyclic ring is formed is preferable.

In the general formula (F), R ²⁰ and R ²¹ are preferably an alkyl group, an alkenyl group, an aryl group, or a substituted sulfonyl group. It is also preferred when R ²⁰ and R ²¹ form an alicyclic ring.

  Specific preferred examples of the monomer or repeating unit having an amide group having a structure represented by the general formula (F) are shown below, but are not limited thereto.

The alkali-soluble binder polymer of the present invention preferably further contains a unit having a carboxylic acid group represented by the following general formula (I).
The content of the carboxylic acid group represented by the following general formula (I) in the alkali-soluble polymer is preferably 0.1 to 10.0 mmol, more preferably 0.3 to 5.0 mmol, per 1 g of the alkali-soluble polymer. Most preferably, it is 0.5-4.0 mmol. Moreover, only one type of unit represented by general formula (I) may be contained in the alkali-soluble polymer, or two or more types may be contained.

In general formula (I), R < ¹ > represents a hydrogen atom or a methyl group, and especially a methyl group is preferable.
R ² represents a (n + 1) -valent linking group, and such a linking group is composed of one or more atoms selected from the group consisting of a hydrogen atom, an oxygen atom, a nitrogen atom, a sulfur atom and a halogen atom. , An (n + 1) -valent organic linking group containing an ester group represented by —O (C═O) —.

As the linking group represented by R ² , those having 5 to 20 atoms are further preferable, and those having a chain structure and having an ester bond in the structure are preferable.

Examples of the substituent that can be introduced into the linking group represented by R ² include monovalent nonmetallic atomic groups other than hydrogen, such as halogen atoms (—F, —Br, —Cl, —I), hydroxyl groups. Group, alkoxy group, aryloxy group, mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, amino group, N-alkylamino group, N, N-dialkylamino group, N-arylamino group, N, N-diarylamino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkylcarbamoyloxy group, N, N- Diarylcarbamoyloxy group, N-alkyl-N-arylcarbamoyloxy group, alkylsulfoxy , Arylsulfoxy group, acylthio group, acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N′-alkylureido group, N ′, N′-dialkylureido group, N′-aryl Ureido group, N ′, N′-diarylureido group, N′-alkyl-N′-arylureido group, N-alkylureido group, N-arylureido group, N′-alkyl-N-alkylureido group, N ′ -Alkyl-N-arylureido group, N ', N'-dialkyl-N-alkylureido group, N', N'-dialkyl-N-arylureido group, N'-aryl-N-alkylureido group, N ' -Aryl-N-arylureido group, N ', N'-diaryl-N-alkylureido group, N', N'-diaryl-N-arylureido group, N'-al Kill-N′-aryl-N-alkylureido group, N′-alkyl-N′-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxycarbonylamino group, N-alkyl-N-alkoxycarbonylamino group N-alkyl-N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N-aryloxycarbonylamino group, formyl group, acyl group,

Carboxyl group and its conjugate base group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N-diarylcarbamoyl group, N- Alkyl-N-arylcarbamoyl group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, sulfo group (—SO ₃ H) and its conjugate base group, alkoxysulfonyl group, aryloxysulfonyl group, sulfinamoyl group, N-alkylsulfinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl group, N-alkyl-N-arylsulfinamoyl group, sulfamo Group, N-alkylsulfamoyl group, N, N-dialkylsulfamoyl group, N-arylsulfamoyl group, N, N-diarylsulfamoyl group, N-alkyl-N-arylsulfamoyl group N-acylsulfamoyl group and its conjugate base group, N-alkylsulfonylsulfamoyl group (—SO ₂ NHSO ₂ (alkyl)) and its conjugate base group, N-arylsulfonylsulfamoyl group (—SO ₂₎ NHSO ₂ (aryl)) and its conjugate base group, N-alkylsulfonylcarbamoyl group (—CONHSO ₂ (alkyl)) and its conjugate base group, N-arylsulfonylcarbamoyl group (—CONHSO ₂ (aryl)) and its conjugate base group, an alkoxysilyl group (-Si (Oalkyl) _3), aryloxy silyl group (- i (Oaryl) _3), hydroxy silyl group (-Si (OH) ₃₎ and its conjugated base group, a phosphono group (-PO ₃ H ₂₎ and its conjugated base group, a dialkyl phosphono group (-PO ₃ (alkyl) ₂ ), a diarylphosphono group (—PO ₃ (aryl) ₂ ), an alkylarylphosphono group (—PO ₃ (alkyl) (aryl)), a monoalkylphosphono group (—PO ₃ H (alkyl)) and its A conjugated base group, a monoarylphosphono group (—PO ₃ H (aryl)) and its conjugated base group, a phosphonooxy group (—OPO ₃ H ₂ ) and its conjugated base group,

Dialkylphosphonooxy group (—OPO ₃ (alkyl) ₂ ), diarylphosphonooxy group (—OPO ₃ (aryl) ₂ ), alkylarylphosphonooxy group (—OPO ₃ (alkyl) (aryl)), monoalkyl A phosphonooxy group (—OPO ₃ H (alkyl)) and its conjugate base group, a monoarylphosphonooxy group (—OPO ₃ H (aryl)) and its conjugate base group, a cyano group, a nitro group, and a dialkylboryl group ( -B (alkyl) ₂ ), diarylboryl group (-B (aryl) ₂ ), alkylarylboryl group (-B (alkyl) (aryl)), dihydroxyboryl group (-B (OH) ₂ ) and its conjugate base Group, alkylhydroxyboryl group (-B (alkyl) (OH)) and its conjugate base group, arylhydroxyboryl (-B (aryl) (OH)) and its conjugated base group, an aryl group, an alkenyl group, an alkynyl group.

  In particular, when the alkali-soluble polymer of the present invention is used as a recording layer component of a lithographic printing plate precursor, depending on the design of the recording layer, a substituent having a hydrogen atom capable of hydrogen bonding, particularly a carboxylic acid Substituents having an acid dissociation constant (pKa) smaller than that are not preferred because they tend to lower the printing durability. On the other hand, hydrophobic substituents such as halogen atoms, hydrocarbon groups (alkyl groups, aryl groups, alkenyl groups, alkynyl groups), alkoxy groups, aryloxy groups and the like are more preferable because they tend to improve printing durability. When the cyclic structure is a monocyclic aliphatic hydrocarbon having 6 or less members such as cyclopentane or cyclohexane, it preferably has such a hydrophobic substituent. If possible, these substituents may be bonded to each other or with a substituted hydrocarbon group to form a ring, and the substituent may be further substituted.

R ³ in the case where A in the general formula (I) is NR ³ — represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. Examples of the monovalent hydrocarbon group having 1 to 10 carbon atoms represented by R ³ include an alkyl group, an aryl group, an alkenyl group, and an alkynyl group.
Specific examples of the alkyl group include methyl group, ethyl group, propyl group, butyl group, pentyl group, hexyl group, heptyl group, octyl group, nonyl group, decyl group, isopropyl group, isobutyl group, sec-butyl group, 1 carbon number such as tert-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclopentyl group, cyclohexyl group, 1-adamantyl group, 2-norbornyl group Up to 10 linear, branched or cyclic alkyl groups.
Specific examples of the aryl group include carbon having one heteroatom selected from the group consisting of an aryl group having 1 to 10 carbon atoms such as a phenyl group, a naphthyl group, and an indenyl group, a nitrogen atom, an oxygen atom, and a sulfur atom. Examples include heteroaryl groups of 1 to 10, such as furyl, thienyl, pyrrolyl, pyridyl, and quinolyl groups.
Specific examples of the alkenyl group include a vinyl group, 1-propenyl group, 1-butenyl group, 1-
Examples thereof include linear, branched, or cyclic alkenyl groups having 1 to 10 carbon atoms such as a methyl-1-propenyl group, 1-cyclopentenyl group, and 1-cyclohexenyl group.
Specific examples of the alkynyl group include alkynyl groups having 1 to 10 carbon atoms such as ethynyl group, 1-propynyl group, 1-butynyl group, and 1-octynyl group. The substituent that R ³ may have is the same as those exemplified as the substituent that R ² can introduce. However, the carbon number of R < ³ > is 1-10 including the carbon number of a substituent.

A in the general formula (I) is preferably an oxygen atom or —NH— because synthesis is easy.
N in the general formula (I) represents an integer of 1 to 5, and is preferably 1 in terms of printing durability.

  Although the preferable specific example of the unit represented by general formula (I) is shown below, this invention is not limited to these.

The specific binder polymer used for the photosensitive layer in the lithographic printing plate precursor according to the invention preferably contains a unit having a sugar structure of the monosaccharide to trisaccharide, and preferably contains a unit having the monosaccharide structure. More preferred. And a copolymer containing a unit having a sugar structure of any of monosaccharide to trisaccharide and a unit having a radical polymerizable group represented by any one of the general formulas (A) to (D). It is also a more preferable aspect.
The specific binder polymer may be a copolymer containing a unit having the monosaccharide structure and a unit having a radical polymerizable group represented by any one of the general formulas (A) to (D). Further preferred.
Furthermore, the specific binder polymer has three units: a unit having the monosaccharide structure, a radical polymerizable group represented by any one of the general formulas (A) to (D), and a unit having a carboxylic acid group. Most preferably, it is a copolymer comprising units. In addition to these units, a copolymer containing a unit having a functional group such as an amide group or an ester group may be used.

  The molecular weight of the specific binder polymer in the present invention is appropriately determined from the viewpoint of image formability and printing durability. Usually, when the molecular weight increases, the printing durability is excellent, but the image formability tends to deteriorate. On the other hand, when it is low, the image formability is improved, but the printing durability tends to be lowered. The molecular weight is preferably in the range of 2,000 to 1,000,000, more preferably 5,000 to 500,000, and still more preferably 10,000 to 300,000.

The content of the unit having a saccharide structure in the alkali-soluble polymer is preferably 0.01 to 10.0 mmol, more preferably 0.1 to 6.5, per 1 g of the alkali-soluble polymer.
0 mmol, most preferably 0.5-4.0 mmol.

  The content of the radical polymerizable group in the specific binder polymer (content of unsaturated double bond capable of radical polymerization by iodometric titration) is preferably 0.00 per gram of the binder polymer from the viewpoint of sensitivity and storage stability. It is 1-10.0 mmol, More preferably, it is 1.0-8.0 mmol, Most preferably, it is 2.0-7.0 mmol.

  Further, the content of alkali-soluble groups in the specific binder polymer (acid value by neutralization titration) is preferably 0.1 to 3.0 mmol, more preferably 1 g of binder polymer from the viewpoint of developability and printing durability. Is 0.2 to 2.0 mmol, most preferably 0.3 to 1.5 mmol.

  The glass transition point (Tg) of such a specific binder polymer is preferably in the range of 70 to 300 ° C, more preferably 80 to 250 ° C, and most preferably 90 to 200 ° C, from the viewpoint of storage stability and sensitivity. It is.

  Moreover, the binder polymer used for the photosensitive layer in the lithographic printing plate precursor according to the invention may be a specific binder polymer alone, or may be used as a mixture by combining one or more other binder polymers. The binder polymer used in combination is used in the range of 1 to 60% by mass, preferably 1 to 40% by mass, and more preferably 1 to 20% by mass with respect to the total mass of the binder polymer component. As the binder polymer that can be used in combination, a conventionally known binder polymer can be used without limitation, and specifically, an acrylic main chain binder, a urethane binder, or the like often used in the industry is preferably used.

  Although the total amount of the specific binder polymer contained in the photosensitive layer and the binder polymer that may be used in combination can be determined as appropriate, it is usually 10 to 90% by mass with respect to the total mass of nonvolatile components in the photosensitive layer. , Preferably it is 20-80 mass%, More preferably, it is the range of 30-70 mass%.

  Here, although the preferable specific example of the binder polymer used for the photosensitive layer in the planographic printing plate precursor of this invention is shown below, it is not limited to these. In addition, the binder polymer which shows a specific example here is a specific binder polymer in this invention.

[(B) Polymerizable compound]
The polymerizable compound used in the negative photosensitive layer in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and has at least one ethylenically unsaturated bond, preferably 2 or more. It is chosen from the compound which has. Such a compound group is widely known in the industrial field, and can be used without any particular limitation in the present invention. These have chemical forms such as monomers, prepolymers, that is, dimers, trimers and oligomers, or mixtures thereof and copolymers thereof. Examples of monomers and copolymers thereof include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), and esters and amides thereof. In this case, an ester of an unsaturated carboxylic acid and an aliphatic polyhydric alcohol compound, or an amide of an unsaturated carboxylic acid and an aliphatic polyvalent amine compound is used. In addition, an addition reaction product of an unsaturated carboxylic acid ester or amide having a nucleophilic substituent such as a hydroxyl group, amino group or mercapto group with a monofunctional or polyfunctional isocyanate or epoxy, and monofunctional or polyfunctional A dehydration condensation reaction product with a functional carboxylic acid is also preferably used. Further, an addition reaction product of an unsaturated carboxylic acid ester or amide having an electrophilic substituent such as an epoxy group or an epoxy group with a monofunctional or polyfunctional alcohol, amine or thiol, a halogen group or In addition, a substitution reaction product of an unsaturated carboxylic acid ester or amide having a leaving substituent such as a tosyloxy group and a monofunctional or polyfunctional alcohol, amine or thiol is also suitable. As another example, it is also possible to use a group of compounds substituted with unsaturated phosphonic acid, styrene, vinyl ether or the like instead of the unsaturated carboxylic acid.

  Specific examples of the monomer of an ester of an aliphatic polyhydric alcohol compound and an unsaturated carboxylic acid include acrylic acid esters such as ethylene glycol diacrylate, triethylene glycol diacrylate, 1,3-butanediol diacrylate, and tetramethylene glycol. Diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tri (acryloyloxypropyl) ether, trimethylolethane triacrylate, hexanediol diacrylate, 1,4-cyclohexanediol diacrylate , Tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol hexaacrylate, tri (acryloyloxyethyl) isocyanurate, polyester acrylate oligomer.

  Methacrylic acid esters include tetramethylene glycol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate, ethylene glycol dimethacrylate, 1,3-butanediol dimethacrylate, Hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p- (3-methacryloxy- 2-hydroxypro ) Phenyl] dimethyl methane, bis - [p- (methacryloxyethoxy) phenyl] dimethyl methane.

Itaconic acid esters include ethylene glycol diitaconate, propylene glycol diitaconate, 1,3-butanediol diitaconate, 1,4-butanediol diitaconate, tetramethylene glycol diitaconate, pentaerythritol diitaconate And sorbitol tetritaconate. Examples of crotonic acid esters include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradicrotonate. Examples of isocrotonic acid esters include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of maleic acid esters include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, and sorbitol tetramaleate.

  Examples of other esters include aliphatic alcohol esters described in JP-B-46-27926, JP-B-51-47334, JP-A-57-196231, JP-A-59-5240, JP Those having an aromatic skeleton described in JP-A-59-5241 and JP-A-2-226149, those containing an amino group described in JP-A-1-165613, and the like are also preferably used. Furthermore, the ester monomers described above can also be used as a mixture.

  Specific examples of amide monomers of aliphatic polyvalent amine compounds and unsaturated carboxylic acids include methylene bis-acrylamide, methylene bis-methacrylamide, 1,6-hexamethylene bis-acrylamide, 1,6-hexamethylene bis. -Methacrylamide, diethylenetriamine trisacrylamide, xylylene bisacrylamide, xylylene bismethacrylamide and the like. Examples of other preferable amide monomers include those having a cyclohexylene structure described in JP-B No. 54-21726.

  In addition, urethane-based addition polymerizable compounds produced by using an addition reaction of isocyanate and hydroxyl group are also suitable, and specific examples thereof include, for example, one molecule described in JP-B-48-41708. A vinyl urethane compound containing two or more polymerizable vinyl groups in one molecule obtained by adding a vinyl monomer containing a hydroxyl group represented by the following formula (a) to a polyisocyanate compound having two or more isocyanate groups. Etc.

^{_{CH 2 = C (R 4)}} COOCH 2 CH (R 5) OH (a)
(However, R ⁴ and R ⁵ represent H or CH _3. )

  Also, urethane acrylates such as those described in JP-A-51-37193, JP-B-2-32293, and JP-B-2-16765, JP-B-58-49860, JP-B-56-17654, Urethane compounds having an ethylene oxide skeleton described in JP-B-62-39417 and JP-B-62-39418 are also suitable. Further, by using addition polymerizable compounds having an amino structure or a sulfide structure in the molecule described in JP-A-63-277653, JP-A-63-260909, and JP-A-1-105238, It is possible to obtain a photopolymerizable composition having a very high photosensitive speed.

  Other examples include polyester acrylates, epoxy resins and (meth) acrylic acid as described in JP-A-48-64183, JP-B-49-43191, JP-B-52-30490. Mention may be made of polyfunctional acrylates and methacrylates such as reacted epoxy acrylates. Further, specific unsaturated compounds described in JP-B-46-43946, JP-B-1-40337 and JP-B-1-40336, vinylphosphonic acid compounds described in JP-A-2-25493, and the like can also be mentioned. . In some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 is preferably used. Furthermore, Journal of Japan Adhesion Association vol. 20, no. 7, pages 300 to 308 (1984), which are introduced as photocurable monomers and oligomers, can also be used.

About these addition polymerizable compounds, the details of usage, such as the structure, single use or combination, addition amount, etc. can be arbitrarily set according to the performance design of the final lithographic printing plate precursor. For example, it is selected from the following viewpoints. From the viewpoint of photosensitive speed, a structure having a high unsaturated group content per molecule is preferable. Further, in order to increase the strength of the image area, that is, the cured film, those having three or more functionalities are preferable, and further, different functional numbers and different polymerizable groups (for example, acrylic acid ester, methacrylic acid ester, styrenic compound, vinyl ether). It is also effective to adjust both photosensitivity and strength by using a compound of the type). A compound having a large molecular weight or a compound having high hydrophobicity is excellent in photosensitive speed and film strength, but is not preferable in terms of development speed and precipitation in a developer. In addition, the selection and use method of the addition polymerization compound is also an important factor for the compatibility and dispersibility with other components in the photosensitive layer (for example, binder polymer, initiator, colorant, etc.). In some cases, the compatibility can be improved by using a low-purity compound or by using two or more kinds in combination. In addition, a specific structure may be selected for the purpose of improving the adhesion of the support or the overcoat layer described later. As for the compounding ratio of the addition polymerizable compound in the photosensitive layer, a larger amount is advantageous in terms of sensitivity, but if it is too much, an undesirable phase separation occurs or a problem in the production process due to the adhesiveness of the photosensitive layer. For example, problems such as transfer of photosensitive layer components and manufacturing defects due to adhesion, and precipitation from the developer may occur. From these viewpoints, the addition polymerizable compound is preferably used in the range of 5 to 80% by mass, and more preferably 25 to 75% by mass with respect to the nonvolatile component in the photosensitive layer. These may be used alone or in combination of two or more. In addition, the use method of the addition polymerizable compound can be arbitrarily selected from the viewpoint of polymerization inhibition with respect to oxygen, resolution, fogging property, refractive index change, surface adhesiveness, etc. Depending on the case, a layer configuration and coating method such as undercoating and overcoating can be performed.

[(C) Polymerization initiator]
The (C) polymerization initiator in the present invention is used to initiate and advance the curing reaction of the polymerizable compound (B), and is a compound that decomposes by light or heat to generate radicals (hereinafter, appropriately, Called a radical generator). By using such a radical generator in combination with a sensitizing dye described later, the sensitizing dye absorbs the laser beam and generates heat when irradiated with the exposure laser, and the light and heat generate radicals. These combinations are possible, and high-sensitivity image formation is possible.

  The radical generator as the component (C) is preferably (a) aromatic ketones, (b) onium salt compounds, (c) organic peroxides, (d) thio compounds, (e) hexaary. A rubiimidazole compound, (f) a ketoxime ester compound, (g) a borate compound, (h) an azinium compound, (i) a metallocene compound, (j) an active ester compound, (k) a compound having a carbon halogen bond, and the like. . Specific examples of the above (a) to (k) are given below, but the present invention is not limited to these.

(A) Aromatic ketones The (a) aromatic ketones include “RADIATION CURING IN POLYMER SCIENCE AND TECHNOLOGY” J. Org. P. Fouassier, J. et al. F. Examples include compounds having a benzophenone skeleton or a thioxanthone skeleton described in Rabek (1993), p77-117. For example, the following compounds are mentioned.

  Among them, particularly preferred examples of (a) aromatic ketones include α-thiobenzophenone compounds described in JP-B-47-6416, benzoin ether compounds described in JP-B-47-3981, such as the following compounds: Is mentioned.

  Examples of the α-substituted benzoin compounds described in JP-B-47-22326 include the following compounds.

  Benzoin derivatives described in JP-B-47-23664, aroylphosphonic acid esters described in JP-A-57-30704, dialkoxybenzophenones described in JP-B-60-26483, for example, the following compounds: It is done.

  Examples of the benzoin ethers described in JP-B-60-26403 and JP-A-62-81345 include the following compounds.

  Examples of α-aminobenzophenones described in JP-B-1-34242, US Pat. No. 4,318,791 and European Patent 0284561A1, for example, the following compounds.

  P-di (dimethylaminobenzoyl) benzene described in JP-A-2-211452, for example, the following compounds may be mentioned.

  Examples of the thio-substituted aromatic ketone described in JP-A-61-194062 include the following compounds.

  The acyl phosphine sulfide described in JP-B-2-9597 includes, for example, the following compounds.

  Examples of the acylphosphine described in JP-B-2-9596 include the following compounds.

  Further, thioxanthones described in JP-B-63-61950, coumarins described in JP-B-59-42864, and the like can also be mentioned.

(B) Onium salt compound Examples of the (b) onium salt compound include iodonium salts, diazonium salts, and sulfonium salts. In the present invention, these onium salt compounds function not as acid generators but as radical generators. Examples of the onium salt compound suitably used in the present invention include compounds represented by the following general formulas (1) to (3).

In General Formula (1), Ar ¹¹ and Ar ¹² each independently represent an aryl group having 20 or less carbon atoms, which may have a substituent. Preferred substituents when this aryl group has a substituent include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or a carbon atom having 12 or less carbon atoms. An aryloxy group is mentioned. Z ¹¹⁻ represents a counter ion selected from the group consisting of a halogen ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, a carboxylate ion, and a sulfonate ion, preferably a perchlorate ion, Hexafluorophosphate ions, carboxylate ions, and aryl sulfonate ions.

In the general formula (2), Ar ²¹ represents an aryl group having 20 or less carbon atoms which may have a substituent. Preferred examples of the substituent include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, an aryloxy group having 12 or less carbon atoms, and 12 or less carbon atoms. Examples thereof include an alkylamino group, a dialkylamino group having 12 or less carbon atoms, an arylamino group having 12 or less carbon atoms, or a diarylamino group having 12 or less carbon atoms. Z ^21- represents a counter ion having the same ^meaning as Z ^11- .

In the general formula (3), R ³¹ , R ³² and R ³³ may be the same or different and each represents a hydrocarbon group having 20 or less carbon atoms which may have a substituent. Preferable substituents include a halogen atom, a nitro group, an alkyl group having 12 or less carbon atoms, an alkoxy group having 12 or less carbon atoms, or an aryloxy group having 12 or less carbon atoms. Z ^31- represents a counter ion having the same ^meaning as Z ^11- .

  In the present invention, (C) Specific examples of onium salt compounds that can be suitably used as a compound (radical generator) that generates radicals by light or heat include those described in JP-A-2001-133696, etc. Can be mentioned. In the present invention, the onium salt compounds represented by the general formula (1) ([OI-1] to [OI-10]) and the onium salt compounds represented by the general formula (2) (which can be suitably used in the present invention) Specific examples of [ON-1] to [ON-5]) and the onium salt compounds represented by the general formula (3) ([OS-1] to [OS-7]) will be given, but the present invention is not limited thereto. It is not a thing.

  The onium salt compound used in the present invention preferably has a maximum absorption wavelength of 400 nm or less, and more preferably 360 nm or less. By setting the absorption wavelength in the ultraviolet region in this way, the negative image recording material of the present invention can be handled under white light.

(C) Organic peroxide The (c) organic peroxide includes almost all organic compounds having one or more oxygen-oxygen bonds in the molecule. Examples thereof include methyl ethyl ketone peroxide and cyclohexanone. Peroxide, 3,3,5-trimethylcyclohexanone peroxide, methylcyclohexanone peroxide, acetylacetone peroxide, 1,1-bis (tertiarybutylperoxy) -3,3,5-trimethylcyclohexane, 1,1-bis (Tertiary butyl peroxy) cyclohexane, 2,2-bis (tertiary butyl peroxy) butane, tertiary butyl hydroperoxide, cumene hydroperoxide, diisopropylbenzene hydroperoxide, paraffin hydroper -Oxide, 2,5-dimethylhexane-2,5-dihydroperoxide, 1,1,3,3-tetramethylbutyl hydroperoxide, ditertiary butyl peroxide, tertiary butyl cumyl peroxide, dicumyl peroxide Bis (tertiarybutylperoxyisopropyl) benzene, 2,5-dimethyl-2,5-di (tertiarybutylperoxy) hexane, 2,5-xanoyl peroxide, succinic peroxide, benzoyl peroxide, 2,4-dichlorobenzoyl peroxide, meta-toluoyl peroxide, diisopropyl peroxydicarbonate, di-2-ethylhexyl peroxydicarbonate, di-2-ethoxyethyl peroxydicarbonate, dimethoxyisopropyl peroxide Dicarbonate, di (3-methyl-3-methoxybutyl) peroxydicarbonate, tertiary butyl peroxyacetate, tertiary butyl peroxypivalate, tertiary butyl peroxyneodecanoate, tertiary butyl peroxyocta Noate, tertiary butyl peroxy-3,5,5-trimethylhexanoate, tertiary butyl peroxylaurate, tertiary carbonate, 3,3'4,4'-tetra- (t-butylperoxycarbonyl) ) Benzophenone, 3,3′4,4′-tetra- (t-amylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3′4 , 4′-Tetra- (t-octylperoxycarbonyl) be Nzophenone, 3,3′4,4′-tetra- (cumylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, carbonyldi (t-butylperoxy) Oxydihydrogen diphthalate), carbonyldi (t-hexylperoxydihydrogen diphthalate), and the like.

  Among them, 3,3′4,4′-tetra- (t-butylperoxycarbonyl) benzophenone, 3,3′4,4′-tetra- (t-amylperoxycarbonyl) benzophenone, 3,3′4 4'-tetra- (t-hexylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- (t-octylperoxycarbonyl) benzophenone, 3,3'4,4'-tetra- (cumylper) Peroxyesters such as (oxycarbonyl) benzophenone, 3,3′4,4′-tetra- (p-isopropylcumylperoxycarbonyl) benzophenone, di-t-butyldiperoxyisophthalate are preferred.

(D) Thio compound As said (d) thio compound, the compound which has a structure shown by following General formula (4) is mentioned.

In the general formula (4), R ²⁶ represents an alkyl group, an aryl group or a substituted aryl group, and R ²⁷ represents a hydrogen atom or an alkyl group. R ²⁶ and R ²⁷ represent a group of nonmetallic atoms necessary to form a 5-membered to 7-membered ring which may be bonded to each other and contain a hetero atom selected from oxygen, sulfur and nitrogen atoms.
As an alkyl group in the said General formula (4), a C1-C4 thing is preferable. As the aryl group, those having 6 to 10 carbon atoms such as phenyl and naphthyl are preferable, and as the substituted aryl group, a halogen atom such as a chlorine atom and an alkyl such as a methyl group as described above. And those substituted with an alkoxy group such as a group, a methoxy group, and an ethoxy group. R ²⁷ is preferably an alkyl group having 1 to 4 carbon atoms. Specific examples of the thio compound represented by the general formula (4) include compounds as shown in Table 1 below.

(E) Hexaarylbiimidazole compound Examples of the (e) hexaarylbiimidazole compound include lophine dimers described in JP-B Nos. 45-37377 and 44-86516, such as 2,2′-bis (o-chlorophenyl). ) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-bromophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′- Bis (o, p-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-chlorophenyl) -4,4 ′, 5,5′-tetra (m- Methoxyphenyl) biimidazole, 2,2′-bis (o, o′-dichlorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole, 2,2′-bis (o-nitrophenyl) -4 , ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-methylphenyl) -4,4', 5,5'-tetraphenylbiimidazole, 2,2'-bis (o-tri Fluorophenyl) -4,4 ′, 5,5′-tetraphenylbiimidazole and the like.

(F) Ketooxime ester compound Examples of the (f) ketoxime ester compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, and 3-propionyloxyiminobutan-2-one. 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-p-toluenesulfonyloxyiminobutane 2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, and the like.

(G) Borate Compound As an example of the (g) borate compound, a compound represented by the following general formula (5) can be given.

In the general formula (5), R ²⁸ , R ²⁹ , R ³⁰ and R ³¹ may be the same or different from each other, and each is a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted group. An alkenyl group, a substituted or unsubstituted alkynyl group, or a substituted or unsubstituted heterocyclic group, wherein R ²⁸ , R ²⁹ , R ³⁰ and R ³¹ are bonded to form a cyclic structure. May be. However, at least one of R ²⁸ , R ²⁹ , R ³⁰ and R ³¹ is a substituted or unsubstituted alkyl group. (Z ⁵ ) ⁺ represents an alkali metal cation or a quaternary ammonium cation.
Examples of the alkyl group for R ^{28 to} R ³¹ include straight-chain, branched, and cyclic groups, and those having 1 to 18 carbon atoms are preferable. Specifically, methyl, ethyl, propyl, isopropyl, butyl, pentyl, hexyl, octyl, stearyl, cyclobutyl, cyclopentyl, cyclohexyl and the like are included. The substituted alkyl group includes an alkyl group as described above, a halogen atom (for example, —Cl, —Br, etc.), a cyano group, a nitro group, an aryl group (preferably a phenyl group), a hydroxy group, —COOR ³² (here R ³² represents a hydrogen atom, an alkyl group having 1 to 14 carbon atoms, or an aryl group), —OCOR ³³ or —OR ³⁴ (where R ³³ and R ³⁴ are alkyl groups having 1 to 14 carbon atoms, or aryl. And a group having a substituent represented by the following formula.

Here, R ³⁵ and R ³⁶ independently represent a hydrogen atom, an alkyl group having 1 to 14 carbon atoms, or an aryl group.
The aryl group of R ^{28 to} R ³¹ includes 1 to 3 ring aryl groups such as a phenyl group and a naphthyl group, and the substituted aryl group is a substitution of the above substituted alkyl group with the above aryl group. Those having a group or an alkyl group having 1 to 14 carbon atoms are included. Examples of the alkenyl group for R ^{28 to} R ³¹ include linear, branched and cyclic groups having 2 to 18 carbon atoms. Examples of the substituent of the substituted alkenyl group include those listed as the substituents of the substituted alkyl group. Examples of the alkynyl group of R ^{28 to} R ³¹ include straight chain or branched groups having 2 to 28 carbon atoms, and examples of the substituent of the substituted alkynyl group include those listed as the substituents of the substituted alkyl group. included. In addition, examples of the heterocyclic group of R ^{28 to} R ³¹ include a 5-membered ring or more, preferably a 5- to 7-membered heterocyclic group containing at least one of N, S, and O. May contain a condensed ring. Furthermore, you may have what was mentioned as a substituent of the above-mentioned substituted aryl group as a substituent. Specific examples of the compound represented by the general formula (5) are specifically described in US Pat. Nos. 3,567,453, 4,343,891, European Patents 109,772, and 109,773. The compounds described and those shown below are mentioned.

(H) Azinium compound As the (h) azinium salt compound, JP-A 63-138345, JP-A 63-142345, JP-A 63-142346, JP-A 63-143537 are disclosed. And compounds having an N—O bond described in JP-B No. 46-42363.

(I) Metallocene compound Examples of the (i) metallocene compound include JP-A-59-152396, JP-A-61-151197, JP-A-63-41484, JP-A-2-249, Examples thereof include titanocene compounds described in Kaihei 2-4705 and iron-arene complexes described in JP-A-1-304453 and JP-A-1-152109.

Specific examples of the titanocene compound include di-cyclopentadienyl-Ti-di-chloride, di-cyclopentadienyl-Ti-bis-phenyl, and di-cyclopentadienyl-Ti-bis-2,3. 4,5,6-pentafluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophen-1-yl, di-cyclopentadienyl-Ti- Bis-2,4,6-trifluorophen-1-yl, di-cyclopentadienyl-Ti-2,6-difluorophen-1-yl, di-cyclopentadienyl-Ti-bis-2,4 -Difluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,3,4,5,6-pentafluorophen-1-yl, di-methylcyclopentadienyl-Ti- -2,3,5,6-tetrafluorophen-1-yl, di-methylcyclopentadienyl-Ti-bis-2,4-difluorophen-1-yl, bis (cyclopentadienyl) -bis (2,6-difluoro-3- (pyridin-1-yl) phenyl) titanium bis (cyclopentadienyl) bis [2,6-difluoro-3- (
Methylsulfonamido) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-butylbialoyl-amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro -3- (N-butyl- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N-benzyl-2,2-dimethylpentanoylamino) ) Phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (2-ethylhexyl) -4-tolyl-sulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) Bis [2,6-difluoro-3- (N- (3-oxaheptyl) benzoylamino) phenyl] titanium, bis (si Lopentadienyl) bis [2,6-difluoro-3- (N- (3,6-dioxadecyl) benzoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (trifluoromethyl) Sulfonyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (trifluoroacetylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro- 3- (2-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (4-chlorobenzoyl) amino) phenyl] titanium, bis (cyclopentadienyl) Bis [2,6-difluoro-3- (N- (3,6-dioxadecyl) -2,2-dimethylpe Tanoylamino) phenyl] titanium, bis (cyclopentadienyl) bis [2,6-difluoro-3- (N- (3,7-dimethyl-7-methoxyoctyl) benzoylamino) phenyl] titanium, bis (cyclopentadi Enyl) bis [2,6-difluoro-3- (N-cyclohexylbenzoylamino) phenyl] titanium and the like.

(J) Active ester compound Examples of the (j) active ester compound include an imide sulfonate compound described in JP-B-62-2223, an activity described in JP-B-63-14340, and JP-A-59-174831. Mention may be made of sulfonates.

(K) Compound having carbon halogen bond Examples of the compound (k) having a carbon halogen bond include those represented by the following general formulas (6) to (12).

In the general formula (6), X ² represents a halogen atom, and Y ¹ represents —C (X ² ) ₃ , —NH ₂ , —NHR ³⁸ , —NR ³⁸ , —OR ³⁸ . Here, R ³⁸ represents an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl group. R ³⁷ represents —C (X ² ) ₃ , an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, or a substituted alkenyl group.

In the general formula (7), R ³⁹ is an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aryl group, a substituted aryl group, a halogen atom, an alkoxy group, a substituted alkoxyl group, a nitro group or a cyano group, X ³ is a halogen atom, and n is an integer of 1 to 3.

In the general formula (8), R ⁴⁰ is an aryl group or a substituted aryl group, R ⁴¹ is a group or halogen shown below, and Z ⁶ is —C (═O) — or —C (═S). - or -SO ₂ - is.

R ⁴² and R ⁴³ are an alkyl group, a substituted alkyl group, an alkenyl group, a substituted alkenyl group, an aryl group or a substituted aryl group, R ⁴⁴ is the same as R ³⁸ in the general formula (6), and X ³ Is a halogen atom, and m is 1 or 2.

In the general formula (9), R ⁴⁵ is an optionally substituted aryl group or heterocyclic group, R ⁴⁶ is a trihaloalkyl group or trihaloalkenyl group having 1 to 3 carbon atoms, and p is 1 2 or 3.

The general formula (10) is a carbonylmethylene heterocyclic compound having a trihalogenomethyl group, in which L ⁷ is a hydrogen atom or the formula: CO— (R ⁴⁷ ) q (C (X ⁴ ) ₃ ) r Q ² is a sulfur, selenium or oxygen atom, dialkylmethylene group, alkene-1,2-ylene group, 1,2-phenylene group or N—R group, and M ⁴ is a substituted or unsubstituted group. An alkylene group or an alkenylene group, or a 1,2-arylene group, R ⁴⁸ is an alkyl group, an aralkyl group or an alkoxyalkyl group, and R ⁴⁷ is a carbocyclic or heterocyclic divalent aromatic group. X ⁴ is a chlorine, bromine or iodine atom and q = 0 and r = 1 or q = 1 and r = 1 or 2. ).

General formula (11) is a 4-halogeno-5- (halogenomethyl-phenyl) -oxazole derivative, wherein X ⁵ is a halogen atom, t is an integer of 1 to 3, and s is 1 to 1 4 of an integer, R ⁴⁹ is a hydrogen atom or a CH _3-t X ⁵ _t group, R ⁵⁰ represents an s-valent optionally substituted unsaturated organic group.

General formula (12) is a 2- (halogenomethyl-phenyl) -4-halogeno-oxazole derivative, wherein X ⁶ is a halogen atom, v is an integer of 1 to 3, and u is 1 to 1 4 of an integer, R ⁵¹ is a hydrogen atom or a CH _3-v X ⁶ _v group, R ⁵² represents an unsaturated organic group which may be substituted for u-valent.

  Specific examples of such a compound having a carbon-halogen bond include, for example, Wakabayashi et al., Bull. Chem. Soc. Japan, 42, 2924 (1969), such as 2-phenyl 4,6-bis (trichloromethyl) -S-triazine, 2- (p-chlorophenyl) -4,6-bis (trichloromethyl)- S-triazine, 2- (p-tolyl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxyphenyl) -4,6-bis (trichloromethyl) -S-triazine, 2 -(2 ', 4'-dichlorophenyl) -4,6-bis (trichloromethyl) -S-triazine, 2,4,6-tris (trichloromethyl) -S-triazine, 2-methyl-4,6 -Bis (trichloromethyl) -S-triazine, 2-n-nonyl-4,6-bis (trichloromethyl) -S-triazine, 2- (α, α, β-trichloroethyl) -4,6 Bis (trichloromethyl) -S- triazine. In addition, compounds described in British Patent 1388492, for example, 2-styryl-4,6-bis (trichloromethyl) -S-triazine, 2- (p-methylstyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4,6-bis (trichloromethyl) -S-triazine, 2- (p-methoxystyryl) -4-amino-6-trichloromethyl-S-triazine, etc. And compounds described in JP-A-53-133428, such as 2- (4-methoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- (4-ethoxy-naphtho). -1-yl) -4,6-bis-trichloromethyl-S-triazine, 2- [4- (2-ethoxyethyl) -naphth-1-yl] -4,6-bis-to Chloromethyl-S-triazine, 2- (4,7-dimethoxy-naphth-1-yl) -4,6-bis-trichloromethyl-S-triazine), 2- (acenaphtho-5-yl) -4,6- Examples include compounds described in German Patent No. 3333724, such as bis-trichloromethyl-S-triazine, and the like.

F.F. C. See J. Schaefer et al. Org. Chem. 29, 1527 (1964), such as 2-methyl-4,6-bis (tribromomethyl) -S-triazine, 2,4,6-tris (tribromomethyl) -S-triazine, 2,4 , 6-tris (dibromomethyl) -S-triazine, 2-amino-4-methyl-6-tribromomethyl-S-triazine, 2-methoxy-4-methyl-6-trichloromethyl-S-triazine, etc. Can do. Furthermore, for example, the following compounds described in JP-A-62-258241 can be exemplified.

  Furthermore, for example, the following compounds described in JP-A-5-281728 can be exemplified.

  Alternatively, M. P. Hutt, E .; F. Elslager and L.L. M.M. The following compounds that can be easily synthesized by those skilled in the art according to the synthesis method described in “Journalof Heterocyclic Chemistry”, Volume 7 (No. 3) by Herbel, page 511 et seq. (1970) Examples of the group include the following compounds.

  Still more preferred examples of the polymerization initiator in the present invention include the above-mentioned (a) aromatic ketones, (b) onium salt compounds, (c) organic peroxides, (e) hexaarylbiimidazole compounds, (i) ) Metallocene compounds, (k) compounds having a carbon halogen bond, and most preferred examples include aromatic iodonium salts, aromatic sulfonium salts, titanocene compounds, and trihalo represented by the general formula (6). Mention may be made of methyl-S-triazine compounds.

  Moreover, the oxime ester compound which can be used suitably as a polymerization initiator in this invention is demonstrated below. Preferred oxime ester compounds include the following general formula (i).

In general formula (i), X represents a carbonyl group, a sulfone group, or a sulfoxide group, and Y represents a cyclic or chain alkyl group having 1 to 12 carbon atoms, an alkenyl group, an alkynyl group, or an aryl group having 6 to 18 carbon atoms. Represents a heterocyclic group. Examples of the aryl group include aromatic hydrocarbon compounds such as a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene group, a pyrene group, and a triphenylene group. Examples of the heterocyclic ring include aromatic compounds having at least one nitrogen atom, sulfur atom, and oxygen atom in the ring structure. For example, pyrrole group, furan group, thiophene group, selenophenone group, pyrazole group, imidazole group, triazole Group, tetrazole group, oxazole group, thiazole group, indole group, benzofuran group, benzimidazole group, benzoxazole group, benzothiazole group, pyridine group, pyrimidine group, pyrazine group, triazine group, quinoline group, carbazole group, acridine group, Examples thereof include phenoxazine and phenothiazine. These substituents represented by Y are halogen atoms, hydroxyl groups, nitrile groups, nitro groups, carboxyl groups, aldehyde groups, alkyl groups, thiol groups, aryl groups or alkenyl groups, alkynyl groups, ether groups, ester groups, ureas. Group, amino group, amide group, sulfide group, disulfide group, sulfoxide group, sulfo group, sulfone group, hydrazine group, carbonyl group, imino group, halogen atom, hydroxyl group, nitrile group, nitro group, carboxyl group, carbonyl group, urethane It can be substituted by a compound containing a group, an alkyl group, a thiol group, an aryl group, a phosphoroso group, a phospho group, or a carbonyl ether group.

  Z in the general formula (i) is synonymous with Y or represents a nitrile group, a halogen atom, a hydrogen atom, or an amino group. These compounds of Z are halogen atoms, hydroxyl groups, nitrile groups, nitro groups, carboxyl groups, aldehyde groups, alkyl groups, thiol groups, aryl groups or alkenyl groups, alkynyl groups, ether groups, ester groups, urea groups, amino groups, Amide group, sulfide group, disulfide group, sulfoxide group, sulfo group, sulfone group, hydrazine group, carbonyl group, imino group, halogen atom, hydroxyl group, nitrile group, nitro group, carboxyl group, carbonyl group, urethane group, alkyl group, It can be substituted by a compound containing a thiol group, an aryl group, a phosphoroso group, a phospho group, or a carbonyl ether group.

  W in the general formula (i) represents a divalent organic group, and represents a methylene group, a carbonyl group, a sulfoxide group, a sulfone group, or an imino group. The methylene group and imino group are an alkyl group, an aryl group, an ester group, and a nitrile. It can be substituted by a compound containing a group, a carbonyl ether group, a sulfo group, a sulfo ether group, an ether group or the like. n represents an integer of 0 or 1.

V in the general formula (i) is a cyclic or chain alkyl group having 1 to 12 carbon atoms, an alkenyl group, an alkynyl group, an aryl group having 6 to 18 carbon atoms, an alkoxy group, or an aryloxy group. Aromatic hydrocarbon compounds such as benzene ring, naphthalene ring, anthracene ring, phenanthrene group, pyrene group, triphenylene group, pyrrole group, furan group, thiophene group, selenophene group, pyrazole group, imidazole group, triazole group, tetrazole group, oxazole Group, thiazole group, indole group, benzofuran group, benzimidazole group, benzoxazole group, benzothiazole group, pyridine group, pyrimidine group, pyrazine group, triazine group, quinoline group, carbazole group, acridine group, phenoxazine, phenothiazine, etc. Heteroatom containing Aromatic compounds and the like. These V compounds are halogen atoms, hydroxyl groups, nitrile groups, nitro groups, carboxyl groups, aldehyde groups, alkyl groups, thiol groups, aryl groups or alkenyl groups, alkynyl groups, ether groups, ester groups, urea groups, amino groups, amides. Group, sulfide group, disulfide group, sulfoxide group, sulfo group, sulfone group, hydrazine group, carbonyl group, imino group, halogen atom, hydroxyl group, nitrile group, nitro group, carboxyl group, carbonyl group, urethane group, alkyl group, thiol It can be substituted by a compound containing a group, an aryl group, a phosphoroso group, a phospho group or a carbonyl ether group.
V and Z may be bonded to each other to form a ring.

As the oxime ester compound represented by the general formula (i), from the viewpoint of sensitivity, X is carbonyl, Y is an aryl group or benzoyl group, Z group is an alkyl group or aryl group, W is a carbonyl group, V Is preferably an aryl group. More preferably, the aryl group of V has a thioether substituent.
Note that the structure of the N—O bond in the general formula (i) may be E-form or Z-form.

Other oxime ester compounds that can be suitably used in the present invention include Progress in Organic Coatings, 13 (1985) 123-150; C. S Perkin II (1979) 1653-1660; Journal of Photopolymer Science and Technology (1995) 205-232; C. S Perkin II (1979) 156-162;
000-66385; a compound described in JP-A-2000-80068.

  Although the specific example of the oxime ester compound which can be used suitably for this invention is shown below, it is not limited to this.

These (C) polymerization initiators are preferably set to a total solid content of the image recording layer of the negative image recording material of the present invention from the viewpoints of sensitivity and contamination of the non-image area generated during printing. 1 to 50% by mass, more preferably 0.5 to 30% by mass, and particularly preferably 1 to 20% by mass can be added. These (C) polymerization initiators may be used alone or in combination of two or more. Moreover, these (C) polymerization initiators may be added to the same layer as other components, or another layer may be provided and added thereto.
In addition, when applying to a lithographic printing plate precursor, the same content is preferable.

[Sensitizing dye]
In the present invention, it is preferable to add a sensitizing dye that absorbs light of a predetermined wavelength in addition to the above-described essential components. Exposure to a wavelength that can be absorbed by the sensitizing dye promotes the radical generation reaction of the component (C) and the polymerization reaction of the component (B). Examples of such a sensitizing dye include a known spectral sensitizing dye or dye, or a dye or pigment that absorbs light and interacts with a photopolymerization initiator. Depending on the wavelength of light absorbed by the sensitizing dye, the polymerizable composition of the present invention can be sensitive to various wavelengths from ultraviolet rays to visible rays and infrared rays. For example, when an infrared absorber is used as the sensitizing dye, it is sensitive to infrared light having a wavelength of 760 nm to 1200 nm. In addition, by using a pigment having a maximum absorption wavelength from 350 nm to 450 nm, it is sensitive to blue to purple visible light.

(Spectral sensitizing dye or dye)
Spectral sensitizing dyes or dyes preferred as sensitizing dyes used in the present invention are polynuclear aromatics (eg, pyrene, perylene, triphenylene), xanthenes (eg, fluorescein, eosin, erythrosine, rhodamine B, rose bengal). ), Cyanines (eg thiacarbocyanine, oxacarbocyanine), merocyanines (eg merocyanine, carbomerocyanine), thiazines (eg thionine, methylene blue, toluidine blue), acridines (eg acridine orange, chloroflavin) , Acriflavine), phthalocyanines (eg, phthalocyanine, metal phthalocyanine), porphyrins (eg, tetraphenylporphyrin, central metal-substituted porphyrin), chlorophylls (eg, chlorophyll) Chlorophyllin, center metal-substituted chlorophyll), metal complexes (for example, the following compound), anthraquinones, such as (anthraquinone), squaryliums, for example (squarylium), and the like.

The example of a more preferable spectral sensitizing dye or dye is illustrated below.
A styryl dye described in JP-B-37-13034; a cationic dye described in JP-A-62-143044; a quinoxalinium salt described in JP-B-59-24147; described in JP-A-64-33104 A new methylene blue compound; anthraquinones described in JP-A 64-56767; benzoxanthene dyes described in JP-A-2-17714; acridines described in JP-A-2-226148 and JP-A-2-226149 Pyryllium salts described in JP-B-40-28499; Cyanines described in JP-B-46-42363; Benzofuran dyes described in JP-A-2-63053; JP-A-2-85858, JP-A-2-216154 Conjugated ketone dyes; dyes described in JP-A-57-1605; Azocinnamylidene derivatives described in Japanese Patent No. 0321; cyanine dyes described in Japanese Patent Laid-Open No. 1-287105; Japanese Patent Laid-Open Nos. 62-31844, 62-31848, 62-1443043 Xanthene dyes described above; aminostyryl ketone described in JP-B-59-28325; dye described in JP-A-2-17943; merocyanine dye described in JP-A-2-244050; described in JP-B-59-28326 Merocyanine dyes described in JP-A-59-89303; merocyanine dyes described in JP-A-8-129257; benzopyran dyes described in JP-A-8-334897.

(Infrared absorber)
In addition, the following infrared absorbers (dyes or pigments) are also preferably used as sensitizing dyes.
As the dye, commercially available dyes and known dyes described in documents such as “Dye Handbook” (edited by the Society for Synthetic Organic Chemistry, published in 1970) can be used. Specifically, dyes such as azo dyes, metal complex azo dyes, pyrazolone azo dyes, naphthoquinone dyes, anthraquinone dyes, phthalocyanine dyes, carbonium dyes, quinoneimine dyes, methine dyes, cyanine dyes, squarylium dyes, pyrylium salts, metal thiolate complexes, etc. Is mentioned.
Preferred dyes include, for example, cyanine dyes described in JP-A-58-125246, JP-A-59-84356, JP-A-59-202829, JP-A-60-78787, and the like. Methine dyes described in JP-A-58-173696, JP-A-58-181690, JP-A-58-194595, JP-A-58-112793, JP-A-58-224793, JP-A-59- 48187, JP-A-59-73996, JP-A-60-52940, JP-A-60-63744, etc., naphthoquinone dyes, JP-A-58-112792, etc. And cyanine dyes described in British Patent 434,875.

Also, a near infrared absorption sensitizer described in US Pat. No. 5,156,938 is preferably used, and a substituted arylbenzo (thio) pyrylium salt described in US Pat. No. 3,881,924, Trimethine thiapyrylium salts described in JP-A-57-142645 (US Pat. No. 4,327,169), JP-A-58-181051, 58-220143, 59-41363, 59-84248 Nos. 59-84249, 59-146063, 59-146061, pyranlium compounds, cyanine dyes described in JP-A-59-216146, US Pat. No. 4,283,475 The pentamethine thiopyrylium salts described above and the pyrylium compounds disclosed in Japanese Patent Publication Nos. 5-13514 and 5-19702 are also preferably used. . Moreover, as another example preferable as a dye, the near-infrared absorptive dye described as the formula (I) and (II) in US Patent 4,756,993 can be mentioned.
Other preferable examples of the infrared absorbing dye in the present invention include specific indolenine cyanine dyes described in Japanese Patent Application Nos. 2001-6326 and 2001-237840 as exemplified below.

  Particularly preferred among these dyes are cyanine dyes, squarylium dyes, pyrylium salts, nickel thiolate complexes, and indolenine cyanine dyes. Further, cyanine dyes and indolenine cyanine dyes are preferred, and particularly preferred examples include cyanine dyes represented by the following general formula (a).

In formula (a), X ¹ represents a hydrogen atom, a halogen atom, -NPh _2, X ² -L ¹ or a group shown below. Here, X ² represents an oxygen atom, a nitrogen atom, or a sulfur atom, and L ¹ represents a hydrocarbon group having 1 to 12 carbon atoms, an aromatic ring having a hetero atom, or 1 to 1 carbon atom containing a hetero atom. 12 hydrocarbon groups are shown. Here, the hetero atom means N, S, O, a halogen atom,
Se is shown. Xa ^- the Za described later ^- is defined as for, R ^a represents a hydrogen atom, an alkyl group, an aryl group, a substituted or unsubstituted amino group, substituted or unsubstituted amino group and a halogen atom.

R ¹ and R ² each independently represents a hydrocarbon group having 1 to 12 carbon atoms. From the storage stability of the recording layer coating solution, R ¹ and R ² are preferably hydrocarbon groups having 2 or more carbon atoms, and R ¹ and R ² are bonded to each other to form a 5-membered ring or It is particularly preferable that a 6-membered ring is formed.

Ar ¹ and Ar ² may be the same or different and each represents an aromatic hydrocarbon group which may have a substituent. Preferred aromatic hydrocarbon groups include a benzene ring and a naphthalene ring. Moreover, as a preferable substituent, a C12 or less hydrocarbon group, a halogen atom, and a C12 or less alkoxy group are mentioned. Y ¹ and Y ² may be the same or different and each represents a sulfur atom or a dialkylmethylene group having 12 or less carbon atoms. R ³ and R ⁴ may be the same or different and each represents a hydrocarbon group having 20 or less carbon atoms which may have a substituent. Preferred substituents include alkoxy groups having 12 or less carbon atoms, carboxyl groups, and sulfo groups. R ⁵ , R ⁶ , R ⁷ and R ⁸ may be the same or different and each represents a hydrogen atom or a hydrocarbon group having 12 or less carbon atoms. From the availability of raw materials, a hydrogen atom is preferred. Za ⁻ represents a counter anion. However, Za ⁻ is not necessary when the cyanine dye represented by formula (a) has an anionic substituent in its structure and charge neutralization is not necessary. Preferred Za ⁻ is a halogen ion, a perchlorate ion, a tetrafluoroborate ion, a hexafluorophosphate ion, and a sulfonate ion, particularly preferably a perchlorate ion, a hexagonal salt, in view of the storage stability of the recording layer coating solution. Fluorophosphate ion and aryl sulfonate ion.

  Specific examples of the cyanine dye represented by formula (a) that can be suitably used in the present invention include paragraph numbers [0017] to [0019] of JP-A No. 2001-133969 and JP-A No. 2002-40638. Examples thereof include those described in paragraph numbers [0012] to [0038] of the publication and paragraph numbers [0012] to [0023] of JP 2002-23360 A.

(Dye having a maximum absorption wavelength at 350 to 450 nm)
Other preferred embodiments of the sensitizing dye include dyes belonging to the following compound group and having a maximum absorption wavelength at 350 to 450 nm.
For example, polynuclear aromatics (eg, pyrene, perylene, triphenylene), xanthenes (eg, fluorescein, eosin, erythrosine, rhodamine B, rose bengal), cyanines (eg, thiacarbocyanine, oxacarbocyanine), merocyanine (Eg, merocyanine, carbomerocyanine), thiazines (eg, thionine, methylene blue, toluidine blue), acridines (eg, acridine orange, chloroflavin, acriflavine), anthraquinones (eg, anthraquinone), squalium (eg, , Squalium).

  More preferable examples of the sensitizing dye include compounds represented by the following general formulas (XIV) to (XVIII).

(In the formula (XIV), A ¹ represents a sulfur atom or NR ⁵⁰ , R ⁵⁰ represents an alkyl group or an aryl group, and L ² represents the basic nucleus of the dye in combination with the adjacent A ¹ and the adjacent carbon atom. Represents a nonmetallic atomic group to be formed, R ⁵¹ and R ⁵² each independently represent a hydrogen atom or a monovalent nonmetallic atomic group, and R ⁵¹ and R ⁵² are bonded to each other to form an acidic nucleus of the dye. W represents an oxygen atom or a sulfur atom.)
Preferred specific examples [(A-1) to (A-5)] of the compound represented by the general formula (XIV) are shown below.

(In Formula (XV), Ar ¹ and Ar ² each independently represent an aryl group, and are linked via a bond with —L ³ —, where L ³ represents —O— or —S—. W has the same meaning as that shown in formula (XIV).)
Preferable examples of the compound represented by the general formula (XV) include the following [(A-6) to (A-8)].

(In the formula (XVI), A ² represents a sulfur atom or NR ⁵⁹ , L ⁴ represents a nonmetallic atomic group that forms a basic nucleus of the dye in combination with adjacent A ² and a carbon atom, R ⁵³ , R ⁵⁴ , R ⁵⁵ , R ⁵⁶ , R ⁵⁷ and R ⁵⁸ each independently represent a monovalent nonmetallic atomic group, and R ⁵⁹ represents an alkyl group or an aryl group.)
Preferable examples of the compound represented by the general formula (XVI) include the following [(A-9) to (A-11)].

(In formula (XVII), A ³ and A ⁴ each independently represent —S— or —NR ⁶³ — or —NR ⁶⁴ —, and R ⁶³ and R ⁶⁴ each independently represents a substituted or unsubstituted alkyl group, substituted Alternatively, it represents an unsubstituted aryl group, and L ⁵ and L ⁶ each independently represents a nonmetallic atomic group that forms a basic nucleus of a dye in combination with adjacent A ³ , A ⁴ and adjacent carbon atoms. , R ⁶¹ and R ⁶² are each independently a monovalent non-metallic atomic group or can be bonded to each other to form an aliphatic or aromatic ring.
Preferable examples of the compound represented by the general formula (XVII) include the following [(A-12) to (A-15)].

  In addition, examples of suitable sensitizing dyes used in the present invention include those represented by the following formula (XVIII).

In the general formula (XVIII), A represents an aromatic ring or a hetero ring which may have a substituent, X represents an oxygen atom or a sulfur atom or —N (R ¹ ) —, and Y represents an oxygen atom or -N (R < ¹ >)-is represented. R ¹ , R ² and R ³ each independently represents a hydrogen atom or a monovalent non-metallic atomic group, and A and R ¹ , R ² and R ³ are bonded to each other to form an aliphatic group. Alternatively, an aromatic ring can be formed.

Here, when R ¹ , R ² and R ³ represent a monovalent nonmetallic atomic group, they preferably represent a substituted or unsubstituted alkyl group or aryl group.
Next, preferred examples of R ¹ , R ² and R ³ will be specifically described. Examples of preferable alkyl groups include linear, branched, and cyclic alkyl groups having 1 to 20 carbon atoms. Specific examples thereof include a methyl group, an ethyl group, a propyl group, Butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, undecyl, dodecyl, tridecyl, hexadecyl, octadecyl, eicosyl, isopropyl, isobutyl, s-butyl, Examples thereof include t-butyl group, isopentyl group, neopentyl group, 1-methylbutyl group, isohexyl group, 2-ethylhexyl group, 2-methylhexyl group, cyclohexyl group, cyclopentyl group and 2-norbornyl group. Of these, linear alkyl groups having 1 to 12 carbon atoms, branched alkyl groups having 3 to 12 carbon atoms, and cyclic alkyl groups having 5 to 10 carbon atoms are more preferable.

As the substituent of the substituted alkyl group, a monovalent non-metallic atomic group other than hydrogen is used. Preferred examples include halogen atoms (—F, —Br, —Cl, —I), hydroxyl groups, alkoxy groups. Group, aryloxy group, mercapto group, alkylthio group, arylthio group, alkyldithio group, aryldithio group, amino group, N-alkylamino group, N, N-dialkylamino group, N-arylamino group, N, N-diaryl Amino group, N-alkyl-N-arylamino group, acyloxy group, carbamoyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, N, N-dialkylcarbamoyloxy group, N, N-diarylcarbamoyloxy Group, N-alkyl-N-arylcarbamoyloxy group, alkylsulfoxy , Arylsulfoxy group, acyloxy group, acylthio group, acylamino group, N-alkylacylamino group, N-arylacylamino group, ureido group, N′-alkylureido group, N ′, N′-dialkylureido group, N '-Arylureido group, N', N'-diarylureido group, N'-alkyl-N'-arylureido group, N-alkylureido group, N-arylureido group, N'-alkyl-N-alkylureido group N′-alkyl-N-arylureido group, N ′, N′-dialkyl-N-alkylureido group, N ′, N′-dialkyl-N-arylureido group, N′-aryl-N-alkylureido group N′-aryl-N-arylureido group, N ′, N′-diaryl-N-alkylureido group, N ′, N′-diaryl-N-aryluree Id group, N′-alkyl-N′-aryl-N-alkylureido group, N′-alkyl-N′-aryl-N-arylureido group, alkoxycarbonylamino group, aryloxycarbonylamino group, N-alkyl- N-alkoxycarbonylamino group, N-alkyl-N-aryloxycarbonylamino group, N-aryl-N-alkoxycarbonylamino group, N-aryl-N-aryloxycarbonylamino group, formyl group, acyl group, carboxyl group , Alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group, N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N, N-diarylcarbamoyl group, N-alkyl-N-arylcarbamoyl group An alkylsulfinyl group, Arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, sulfo group (—SO ₃ H) and its conjugate base group (hereinafter referred to as sulfonate group), alkoxysulfonyl group, aryloxysulfonyl group, sulfinamoyl group, N-alkyls Rufinamoyl group, N, N-dialkylsulfinamoyl group, N-arylsulfinamoyl group, N, N-diarylsulfinamoyl group, N-alkyl-N-arylsulfinamoyl group, sulfamoyl group, N-alkyl Sulfamoyl group, N, N-dialkylsulfamoyl group, N-arylsulfamoyl group, N, N-diarylsulfamoyl group, N-alkyl-N-arylsulfamoyl group, phosphono group (—PO ₃ H ₂₎ and its conjugated base group (hereinafter referred to as phosphonato group), di Rukiruhosuhono group _{(-PO 3 (alkyl) 2)} , diaryl phosphono group (-PO ₃ a (aryl) _2), alkyl aryl phosphono group _{(-PO 3 (alkyl) (aryl} )), monoalkyl phosphono group ( -PO ₃ H (alkyl)) and its conjugated base group (hereinafter referred to as alkylphosphonato group), monoarylphosphono group (-PO ₃ H (aryl)) and its conjugated base group (hereinafter, aryl phosphate Hona preparative group ), Phosphonooxy group (—OPO ₃ H ₂ ) and its conjugate base group (hereinafter referred to as phosphonatoxy group), dialkylphosphonooxy group (—OPO ₃ (alkyl) ₂ ), diarylphosphonooxy group (—OPO). ₃ (aryl) ₂ ), alkylarylphosphonooxy group (—OPO ₃ (alkyl) (aryl)), monoalkylphospho Nooxy group (—OPO ₃ H (alkyl)) and its conjugate base group (hereinafter referred to as alkylphosphonatooxy group), monoarylphosphonooxy group (—OPO ₃ H (aryl)) and its conjugate base group (hereinafter referred to as “alkylphosphonateoxy group”) And cyano group, nitro group, aryl group, heteroaryl group, alkenyl group, alkynyl group, and silyl group.
Specific examples of the alkyl group in these substituents include the aforementioned alkyl groups, which may further have a substituent.

  Specific examples of the aryl group include phenyl group, biphenyl group, naphthyl group, tolyl group, xylyl group, mesityl group, cumenyl group, chlorophenyl group, bromophenyl group, chloromethylphenyl group, hydroxyphenyl group, methoxyphenyl group. , Ethoxyphenyl group, phenoxyphenyl group, acetoxyphenyl group, benzoyloxyphenyl group, methylthiophenyl group, phenylthiophenyl group, methylaminophenyl group, dimethylaminophenyl group, acetylaminophenyl group, carboxyphenyl group, methoxycarbonylphenyl Group, ethoxyphenylcarbonyl group, phenoxycarbonylphenyl group, N-phenylcarbamoylphenyl group, phenyl group, cyanophenyl group, sulfophenyl group, sulfonatophenyl group, phosphonophene Group, can be exemplified phosphonophenyl phenyl group.

  As the heteroaryl group, a group derived from a monocyclic or polycyclic aromatic ring containing at least one of nitrogen, oxygen and sulfur atoms is used, and examples of the heteroaryl ring in the particularly preferred heteroaryl group include Is, for example, thiophene, thiathrene, furan, pyran, isobenzofuran, chromene, xanthene, phenoxazine, pyrrole, pyrazole, isothiazole, isoxazole, pyrazine, pyrimidine, pyridazine, indolizine, isoindolizine, indolizine, indazole, indazole, Purine, quinolidine, isoquinoline, phthalazine, naphthyridine, quinazoline, sinoline, pteridine, carbazole, carboline, phenanthrine, acridine, perimidine, phenanthrolin, phthalazine, phenalazine, phenoxazine, fura Emissions, phenoxazine and the like, and these are further may be benzo-fused or may have a substituent.

Examples of alkenyl groups include vinyl, 1-propenyl, 1-butenyl, cinnamyl, 2-chloro-1-ethenyl, etc. Examples of alkynyl include ethynyl, 1 -Propynyl group, 1-butynyl group, trimethylsilylethynyl group and the like. Examples of G ¹ in the acyl group (G ¹ CO—) include hydrogen and the above alkyl groups and aryl groups. Among these substituents, even more preferred are halogen atoms (—F, —Br, —Cl, —I), alkoxy groups, aryloxy groups, alkylthio groups, arylthio groups, N-alkylamino groups, N, N— Dialkylamino group, acyloxy group, N-alkylcarbamoyloxy group, N-arylcarbamoyloxy group, acylamino group, formyl group, acyl group, carboxyl group, alkoxycarbonyl group, aryloxycarbonyl group, carbamoyl group, N-alkylcarbamoyl group N, N-dialkylcarbamoyl group, N-arylcarbamoyl group, N-alkyl-N-arylcarbamoyl group, sulfo group, sulfonate group, sulfamoyl group, N-alkylsulfamoyl group, N, N-dialkylsulfamoyl group Group, N-arylsulfide Moyl group, N-alkyl-N-arylsulfamoyl group, phosphono group, phosphonate group, dialkyl phosphono group, diaryl phosphono group, monoalkyl phosphono group, alkyl phosphonate group, monoaryl phosphono group, aryl phosphine group Examples include an onato group, a phosphonooxy group, a phosphonateoxy group, an aryl group, an alkenyl group, and an alkylidene group (such as a methylene group).

  On the other hand, examples of the alkylene group in the substituted alkyl group include divalent organic residues obtained by removing any one of the hydrogen atoms on the alkyl group having 1 to 20 carbon atoms. Can include linear alkylene groups having 1 to 12 carbon atoms, branched chains having 3 to 12 carbon atoms, and cyclic alkylene groups having 5 to 10 carbon atoms.

Specific examples of preferred substituted alkyl groups as R ¹ , R ² , or R ³ obtained by combining the above substituents and alkylene groups include chloromethyl group, bromomethyl group, 2-chloroethyl group, trifluoromethyl group, methoxy Methyl group, methoxyethoxyethyl group, allyloxymethyl group, phenoxymethyl group, methylthiomethyl group, tolylthiomethyl group, ethylaminoethyl group, diethylaminopropyl group, morpholinopropyl group, acetyloxymethyl group, benzoyloxymethyl group, N -Cyclohexylcarbamoyloxyethyl group, N-phenylcarbamoyloxyethyl group, acetylaminoethyl group, N-methylbenzoylaminopropyl group, 2-oxoethyl group, 2-oxopropyl group, carboxypropyl group, methoxycarbonyl Bonylethyl group, allyloxycarbonylbutyl group, chlorophenoxycarbonylmethyl group, carbamoylmethyl group, N-methylcarbamoylethyl group, N, N-dipropylcarbamoylmethyl group, N- (methoxyphenyl) carbamoylethyl group, N-methyl- N- (sulfophenyl) carbamoylmethyl group, sulfobutyl group, sulfonatopropyl group, sulfonatobutyl group, sulfamoylbutyl group, N-ethylsulfamoylmethyl group, N, N-dipropylsulfamoylpropyl group, N-tolyl Sulfamoylpropyl group, N-methyl-N- (phosphonophenyl) sulfamoyloctyl group, phosphonobutyl group, phosphonatohexyl group, diethylphosphonobutyl group, diphenylphosphonopropyl group, methylphosphonobutyl Group, methylphosphonatobutyl group, tolylphosphonohexyl group, tolylphosphonatohexyl group, phosphonooxypropyl group, phosphonatoxybutyl group, benzyl group, phenethyl group, α-methylbenzyl group, 1-methyl-1- Phenylethyl group, p-methylbenzyl group, cinnamyl group, allyl group, 1-propenylmethyl group, 2-butenyl group, 2-methylallyl group, 2-methylpropenylmethyl group, 2-propynyl group, 2-butynyl group, 3 -Butynyl group, etc. can be mentioned.

Specific examples of preferred aryl groups as R ¹ , R ² , or R ³ include those in which 1 to 3 benzene rings form a condensed ring, and those in which a benzene ring and a 5-membered unsaturated ring form a condensed ring Specific examples include a phenyl group, a naphthyl group, an anthryl group, a phenanthryl group, an indenyl group, an acenaphthenyl group, and a fluorenyl group. Among these, a phenyl group and a naphthyl group are more preferable. preferable.

Specific examples of the preferred substituted aryl group as R ¹ , R ² , or R ³ include a monovalent nonmetallic atomic group (other than a hydrogen atom) as a substituent on the ring-forming carbon atom of the aryl group. What has is used. Examples of preferred substituents include the alkyl groups, substituted alkyl groups, and those previously shown as substituents in the substituted alkyl group. Preferred examples of such a substituted aryl group include biphenyl group, tolyl group, xylyl group, mesityl group, cumenyl group, chlorophenyl group, bromophenyl group, fluorophenyl group, chloromethylphenyl group, trifluoromethylphenyl group. Hydroxyphenyl group, methoxyphenyl group, methoxyethoxyphenyl group, allyloxyphenyl group, phenoxyphenyl group, methylthiophenyl group, tolylthiophenyl group, ethylaminophenyl group, diethylaminophenyl group, morpholinophenyl group, acetyloxyphenyl group, Benzoyloxyphenyl group, N-cyclohexylcarbamoyloxyphenyl group, N-phenylcarbamoyloxyphenyl group, acetylaminophenyl group, N-methylbenzoylaminophenyl group, cal Xiphenyl group, methoxycarbonylphenyl group, allyloxycarbonylphenyl group, chlorophenoxycarbonylphenyl group, carbamoylphenyl group, N-methylcarbamoylphenyl group, N, N-dipropylcarbamoylphenyl group, N- (methoxyphenyl) carbamoylphenyl group N-methyl-N- (sulfophenyl) carbamoylphenyl group, sulfophenyl group, sulfonatophenyl group, sulfamoylphenyl group, N-ethylsulfamoylphenyl group, N, N-dipropylsulfamoylphenyl group, N-tolylsulfamoylphenyl group, N-methyl-N- (phosphonophenyl) sulfamoylphenyl group, phosphonophenyl group, phosphonatophenyl group, diethylphosphonophenyl group, diphenylphosphoro Phenyl group, methylphosphonophenyl group, methylphosphonatophenyl group, tolylphosphonophenyl group, tolylphosphonatephenyl group, allylphenyl group, 1-propenylmethylphenyl group, 2-butenylphenyl group, 2-methylallylphenyl Group, 2-methylpropenylphenyl group, 2-propynylphenyl group, 2-butynylphenyl group, 3-butynylphenyl group, and the like.

In addition, more preferable examples of R ² and R ³ include a substituted or unsubstituted alkyl group. A more preferable example of R ¹ includes a substituted or unsubstituted aryl group. The reason for this is not clear, but by having such a substituent, the interaction between the electronically excited state caused by light absorption and the initiator compound becomes particularly large, generating radicals, acids or bases of the initiator compound. It is estimated that the efficiency is improved.

Next, A in the general formula (XVIII) will be described. A represents an aromatic ring or a hetero ring which may have a substituent. Specific examples of the aromatic ring or hetero ring which may have a substituent include R ¹ and R ² in the general formula (XVIII). Or R ³ may be the same as those exemplified in the previous description.
Among these, preferable A includes an alkoxy group, a thioalkyl group, and an aryl group having an amino group, and particularly preferable A includes an aryl group having an amino group.

  Next, Y in the formula (XVIII) will be described. Y represents a nonmetallic atomic group necessary for forming a heterocyclic ring in cooperation with the above-mentioned A and adjacent carbon atoms. Examples of such a heterocyclic ring include 5-, 6-, and 7-membered nitrogen-containing or sulfur-containing heterocyclic rings that may have a condensed ring, and preferably 5- or 6-membered heterocyclic rings.

Examples of nitrogen-containing heterocycles include, for example, LG Brooker et al., Journal of American Chemical Society, Vol. 73 (1951), p. Any of those known to constitute a basic nucleus in merocyanine dyes described in 5326-5358 and references can be suitably used.
Specific examples include thiazoles (for example, thiazole, 4-methylthiazole, 4-phenylthiazole, 5-methylthiazole, 5-phenylthiazole, 4,5-dimethylthiazole, 4,5-diphenylthiazole, 4,5- Di (p-methoxyphenylthiazole), 4- (2-thienyl) thiazole, 4,5-di (2-furyl) thiazole, etc.), benzothiazoles (for example, benzothiazole, 4-chlorobenzothiazole, 5-chloro Benzothiazole, 6-chlorobenzothiazole, 7-chlorobenzothiazole, 4-methylbenzothiazole, 5-methylbenzothiazole, 6-methylbenzothiazole, 5-bromobenzothiazole, 4-phenylbenzothiazole, 5-phenylbenzothiazole 4-methoxybenzo Azole, 5-methoxybenzothiazole, 6-methoxybenzothiazole, 5-iodobenzothiazole, 6-iodobenzothiazole, 4-ethoxybenzothiazole, 5-ethoxybenzothiazole, tetrahydrobenzothiazole, 5,6-dimethoxybenzothiazole, 5,6-dioxymethylenebenzothiazole, 5-hydroxybenzothiazole, 6-hydroxybenzothiazole, 6-dimethylaminobenzothiazole, 5-ethoxycarbonylbenzothiazole, etc.), naphthothiazoles (for example, naphtho [1,2 ] Thiazole, naphtho [2,1] thiazole, 5-methoxynaphtho [2,1] thiazole, 5-ethoxynaphtho [2,1] thiazole, 8-methoxynaphtho [1,2] thiazole, 7-methoxynaphtho [ , 2] thiazole, etc.), thianaphtheno-7 ′, 6 ′, 4,5-thiazole (for example, 4′-methoxythianaphtheno-7 ′, 6 ′, 4,5-thiazole, etc.), oxazole ( For example, 4-methyl oxazole, 5-methyl oxazole, 4-phenyl oxazole, 4,5-diphenyl oxazole, 4-ethyl oxazole, 4,5-dimethyl oxazole, 5-phenyl oxazole, etc.), benzoxazoles (benzoxazole, 5-chlorobenzoxazole, 5-methylbenzoxazole, 5-phenylbenzoxazole, 6-methylbenzoxazole, 5,6-dimethylbenzoxazole, 4,6-dimethylbenzoxazole, 6-methoxybenzoxazole, 5-methoxybenzo Oxazole, 4-ethoxybe Nzooxazole, 5-chlorobenzoxazole, 6-methoxybenzoxazole, 5-hydroxybenzoxazole, 6-hydroxybenzoxazole, etc.), naphthoxazoles (for example, naphtho [1,2] oxazole, naphtho [2,1 Oxazole, etc.), selenazoles (eg, 4-methylselenazole, 4-phenylselenazole, etc.), benzoselenazoles (eg, benzoselenazole, 5-chlorobenzoselenazole, 5-methoxybenzoselenazole) , 5-hydroxybenzoselenazole, tetrahydrobenzoselenazole, etc.), naphthoselenazoles (for example, naphtho [1,2] selenazole, naphtho [2,1] selenazole, etc.), thiazolines (for example, thiazoline, 4 -Methyl thiazoline, , 5-dimethylthiazoline, 4-phenylthiazoline, 4,5-di (2-furyl) thiazoline, 4,5-diphenylthiazoline, 4,5-di (p-methoxyphenyl) thiazoline, etc.), 2-quinolines ( For example, quinoline, 3-methylquinoline, 5-methylquinoline, 7-methylquinoline, 8-methylquinoline, 6-chloroquinoline, 8-chloroquinoline, 6-methoxyquinoline, 6-ethoxyquinoline, 6-hydroxyquinoline, 8 -Hydroxyquinoline, etc.), 4-quinolines (eg, quinoline, 6-methoxyquinoline, 7-methylquinoline, 8-methylquinoline, etc.), 1-isoquinolines (eg, isoquinoline, 3,4-dihydroisoquinoline, Etc.), 3-isoquinolines (for example, isoquinoline etc.), benzimidazoles For example, 1,3-dimethylbenzimidazole, 1,3-diethylbenzimidazole, 1-ethyl-3-phenylbenzimidazole, etc., 3,3-dialkylindolenine (for example, 3,3-dimethylindolenine, 3,3,5-trimethylindolenine, 3,3,7-trimethylindolenine, etc.), 2-pyridines (eg, pyridine, 5-methylpyridine, etc.), 4-pyridine (eg, pyridine, etc.), etc. Can be mentioned. Moreover, the substituents of these rings may combine to form a ring.

Examples of the sulfur-containing heterocycle include a dithiol partial structure in dyes described in JP-A-3-296759.
Specific examples include benzodithiols (eg, benzodithiol, 5-t-butylbenzodithiol, 5-methylbenzodithiol, etc.), naphthodithiols (eg, naphtho [1,2] dithiol, naphtho [2,1 Dithiols, etc.), dithiols (for example, 4,5-dimethyldithiols, 4-phenyldithiols, 4-methoxycarbonyldithiols, 4,5-dimethoxycarbonyldithiols, 4,5-diethoxycarbonyldithiols) 4,5-ditrifluoromethyldithiol, 4,5-dicyanodithiol, 4-methoxycarbonylmethyldithiol, 4-carboxymethyldithiol, etc.).

  In the general formula (XVIII) described above, Y is a moiety of the following general formula (XVIII-2) among the examples of nitrogen-containing or sulfur-containing heterocycles formed together with the above-mentioned A and adjacent carbon atoms. A dye having a structure represented by the structural formula is particularly preferable because it gives a photosensitive composition having high sensitizing ability and extremely excellent storage stability. The dye having the structure represented by the general formula (XVIII-2) is a compound previously described in detail in the specification of Japanese Patent Application No. 2003-311253 by the present applicant as a novel compound.

(In the general formula (XVIII-2), A represents an aromatic ring or a hetero ring which may have a substituent, and X represents an oxygen atom, a sulfur atom or -N (R ¹ )-. R ¹ , R ⁴ , R ⁵ , R ⁶ each independently represents a hydrogen atom or a monovalent non-metallic atomic group, and A and R ¹ , R ⁴ , R ⁵ , R ⁶ are bonded to each other to form a fat An aromatic or aromatic ring can be formed.)
In formula (XVIII-2), A and R ¹ are the same as in the general formula (XVIII), R ⁴ and R ² in the general formula (XVIII), R ⁵ is R ³ in the general formula (XVIII) And R ⁶ has the same meaning as R ¹ in formula (XVIII).

  Next, the compound represented by formula (XVIII-3), which is a preferred embodiment of the compound represented by formula (XVIII) used in the present invention, will be described.

In the general formula (XVIII-3), A represents an aromatic ring or a hetero ring which may have a substituent, and X represents an oxygen atom, a sulfur atom, or —N (R ¹ ) —. R ¹ , R ⁴ and R ⁵ are each independently a hydrogen atom or a monovalent nonmetallic atomic group, and A and R ¹ , R ⁴ and R ⁵ are each aliphatic or aromatic. Can be linked to form a ring. Ar represents an aromatic ring or a heterocyclic ring having a substituent. However, the substituents on the Ar skeleton need to have a sum of Hammett values greater than zero. Here, the sum of the Hammett values is greater than 0 means that the substituent has one substituent, and the Hammett value of the substituent may be greater than 0, and has a plurality of substituents. The sum of Hammett values at may be greater than zero.

In formula (XVIII-3), A and R ¹ have the same meanings as in formula (XVIII), R ⁴ and R ² in the general formula (1), R ⁵ is R ³ in the general formula (XVIII) It is synonymous with. Ar represents an aromatic ring or heterocycle having a substituent, and specific examples thereof include an aromatic ring or heterocycle having a substituent among those previously described in the description of A in the general formula (XVIII). The specific example which concerns on is mentioned similarly. However, as a substituent that can be introduced into Ar in the general formula (XVIII-3), it is essential that the sum of Hammett values is 0 or more. Examples of such a substituent include a trifluoromethyl group, Examples include a carbonyl group, an ester group, a halogen atom, a nitro group, a cyano group, a sulfoxide group, an amide group, and a carboxyl group. The Hammett values of these substituents are shown below. Trifluoromethyl group (—CF ₃ , m: 0.43, p: 0.54), carbonyl group (eg, —COHm: 0.36, p: 0.43), ester group (—COOCH ₃ , m: 0 .37, p: 0.45), halogen atom (for example, Cl, m: 0.37, p: 0.23), cyano group (—CN, m: 0.56, p: 0.66), sulfoxide group (For example, —SOCH ₃ , m: 0.52, p: 0.45), an amide group (for example, —NHCOCH ₃ , m: 0.21, p: 0.00), a carboxyl group (—COOH, m: 0. 37, p: 0.45). The parenthesis represents the introduction position of the substituent in the aryl skeleton and the Hammett value, and (m: 0.50) is the Hammett value of 0.50 when the substituent is introduced at the meta position. Indicates that there is. Among these, preferable examples of Ar include a phenyl group having a substituent, and preferable substituents on the Ar skeleton include an ester group and a cyano group. The substitution position is particularly preferably located at the ortho position on the Ar skeleton.

  Although the preferable specific example (Exemplary compound D1-Exemplary compound D56) of the sensitizing dye represented by general formula (XVIII) based on this invention is shown below, this invention is not limited to these.

  Among the sensitizing dyes applicable to the present invention, the compound represented by the general formula (XVIII) is preferable from the viewpoint of sensitivity.

With respect to the sensitizing dye, various chemical modifications as described below can be performed for the purpose of improving the characteristics of the polymerizable composition of the present invention. For example, by combining a sensitizing dye and an addition polymerizable compound structure (for example, an acryloyl group or a methacryloyl group) by a method such as a covalent bond, an ionic bond, or a hydrogen bond, An improvement in the effect of suppressing the unnecessary precipitation of the dye from the crosslinked cured film can be obtained.

  In the present invention, as pigments used as sensitizing dyes, commercially available pigments and Color Index (CI) Handbook, “Latest Pigment Handbook” (edited by Japan Pigment Technical Association, published in 1977), “Latest Pigment Application Technology” (CMC Publishing, published in 1986) and “Printing Ink Technology” published by CMC Publishing, published in 1984) can be used.

  Examples of the pigment include black pigments, yellow pigments, orange pigments, brown pigments, red pigments, purple pigments, blue pigments, green pigments, fluorescent pigments, metal powder pigments, and other polymer-bonded dyes. Specifically, insoluble azo pigments, azo lake pigments, condensed azo pigments, chelate azo pigments, phthalocyanine pigments, anthraquinone pigments, perylene and perinone pigments, thioindigo pigments, quinacridone pigments, dioxazine pigments, isoindolinone pigments , Quinophthalone pigments, dyed lake pigments, azine pigments, nitroso pigments, nitro pigments, natural pigments, fluorescent pigments, inorganic pigments, carbon black, and the like. Among these pigments, carbon black is preferable.

  These pigments may be used without surface treatment, or may be used after surface treatment. The surface treatment method includes a method of surface coating with a resin or wax, a method of attaching a surfactant, a method of bonding a reactive substance (eg, silane coupling agent, epoxy compound, polyisocyanate, etc.) to the pigment surface, etc. Can be considered. The above-mentioned surface treatment methods are described in “Characteristics and Applications of Metal Soap” (Yokoshobo), “Printing Ink Technology” (CMC Publishing, 1984) and “Latest Pigment Application Technology” (CMC Publishing, 1986). Yes.

  The particle diameter of the pigment is preferably in the range of 0.01 μm to 10 μm, more preferably in the range of 0.05 μm to 1 μm, particularly from the viewpoint of the stability in the coating solution and the uniformity of the photosensitive layer. It is preferably in the range of 0.1 μm to 1 μm.

  As a method for dispersing the pigment, a known dispersion technique used in ink production, toner production, or the like can be used. Examples of the disperser include an ultrasonic disperser, a sand mill, an attritor, a pearl mill, a super mill, a ball mill, an impeller, a disperser, a KD mill, a colloid mill, a dynatron, a three-roll mill, and a pressure kneader. Details are described in "Latest Pigment Applied Technology" (CMC Publishing, 1986).

Further, when the polymerizable composition of the present invention is applied to a lithographic printing plate precursor, these sensitizing dyes may be added to the same layer as the other components of the recording layer, but a separate layer is added thereto. However, the same effect can be obtained, but when a negative lithographic printing plate precursor is produced, the optical density at the absorption maximum in the wavelength range of 300 nm to 1200 nm of the recording layer is 0.1-3. It is preferably between 0. When this range is deviated, the sensitivity tends to be low. Since the optical density is determined by the addition amount of the sensitizing dye and the thickness of the recording layer, the predetermined optical density can be obtained by controlling both conditions.
The optical density of the recording layer can be measured by a conventional method. As a measuring method, for example, on a transparent or white support, a recording layer having a thickness appropriately determined in a range where the coating amount after drying is necessary as a lithographic printing plate is formed, and a transmission optical densitometer is used. Examples thereof include a measuring method, a method of forming a recording layer on a reflective support such as aluminum, and measuring a reflection density.

The content of the sensitizing dye contained in the polymerizable composition of the present invention is the polymerizable composition from the viewpoint of the uniformity of the sensitizing dye dispersed in the composition and the durability of the formed film. Is preferably in the range of 0.01 to 50% by mass, more preferably in the range of 0.1 to 30% by mass, and most preferably 0.5 to 10% by mass. preferable.

  The preferred components of the polymerizable composition of the present invention are as described above. As a preferred combination of these components, (A) a binder polymer, a unit having a monosaccharide structure in the side chain, A copolymer comprising a unit having a polymerizable group represented by the formula (A) or (B) and a unit having a carboxylic acid group represented by the general formula (I) is used as a sensitizing dye. A composition comprising a compound represented by the formula (XVIII-3), more preferably (C) a composition using a hexaarylbiimidazole compound, an onium salt compound, or a metallocene compound as the polymerization initiator. Most preferably, a hexaarylbiimidazole compound is used.

[Other ingredients]
In addition to the above essential components, the photosensitive layer in the lithographic printing plate precursor according to the invention may further contain other components suitable for its use and production method. Hereinafter, preferred additives will be exemplified.

(Polymerization inhibitor)
In the photosensitive layer of the lithographic printing plate precursor according to the present invention, a small amount of heat is used in order to prevent unnecessary thermal polymerization of a compound having a polymerizable ethylenically unsaturated double bond during the production or storage of the photosensitive layer. It is desirable to add a polymerization inhibitor. Suitable thermal polymerization inhibitors include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol ), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt, and the like. The addition amount of the thermal polymerization inhibitor is preferably about 0.01% by mass to about 5% by mass with respect to the mass of the nonvolatile components in the entire composition. If necessary, a higher fatty acid derivative such as behenic acid or behenic acid amide may be added to prevent polymerization inhibition due to oxygen, and it may be unevenly distributed on the surface of the photosensitive layer in the course of drying after coating. . The addition amount of the higher fatty acid derivative is preferably about 0.5% by mass to about 10% by mass with respect to the nonvolatile components in the entire composition.

(Coloring agent)
For the purpose of coloring, a dye or a pigment may be added to the photosensitive layer in the lithographic printing plate precursor according to the invention. Thereby, so-called plate inspection properties such as visibility after plate making and suitability for an image density measuring machine as a printing plate can be improved. As a colorant, since many dyes cause a decrease in the sensitivity of the photopolymerization type photosensitive layer, it is particularly preferable to use a pigment. Specific examples include pigments such as phthalocyanine pigments, azo pigments, carbon black and titanium oxide, and dyes such as ethyl violet, crystal violet, azo dyes, anthraquinone dyes, and cyanine dyes. The addition amount of the dye and the pigment is preferably about 0.5% by mass to about 5% by mass with respect to the nonvolatile components in the whole composition.

(Other additives)
Furthermore, in order to improve the physical properties of the cured film, known additives such as inorganic fillers, other plasticizers, and a sensitizer capable of improving the ink inking property on the surface of the photosensitive layer may be added.
Examples of plasticizers include dioctyl phthalate, didodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, tricresyl phosphate, dioctyl adipate, dibutyl sebacate, triacetyl glycerin, and addition polymerization with binder polymer. Generally, it can be added in a range of 10% by mass or less based on the total mass with the compound.
Further, for the purpose of improving the film strength (printing durability), which will be described later, a UV initiator, a thermal crosslinking agent, or the like can be added to enhance the effect of heating and exposure after development.

Such a photosensitive layer is formed by dissolving a photosensitive layer component in various organic solvents and coating the coating solution on a support or an intermediate layer described later.
Solvents used here include acetone, methyl ethyl ketone, cyclohexane, ethyl acetate, ethylene dichloride, tetrahydrofuran, toluene, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol dimethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, Acetylacetone, cyclohexanone, diacetone alcohol, ethylene glycol monomethyl ether acetate, ethylene glycol ethyl ether acetate, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether acetate, 3-methoxypropanol, methoxymethoxyethanol, diethylene glycol monomethyl ether, Ethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-methoxypropyl acetate, N, N-dimethylformamide, dimethyl sulfoxide, γ-butyrolactone, methyl lactate, lactic acid There is ethyl. These solvents can be used alone or in combination. The solid content in the coating solution is suitably 2 to 50% by mass.

The coating amount of the photosensitive layer mainly affects the sensitivity of the photosensitive layer, the developability, the strength and the printing durability of the exposed film, and is preferably selected appropriately according to the application. When the coating amount is too small, the printing durability is not sufficient. On the other hand, if the amount is too large, the sensitivity is lowered, it takes time for exposure, and a longer time is required for development processing, which is not preferable. For the lithographic printing plate precursor for scanning exposure which is the main object of the present invention, the coating amount is suitably in the range of about 0.1 g / m ² to about 10 g / m ² in terms of the mass after drying. More preferably from 0.5 to 5 g / m ^2.

[Support]
As the support for the lithographic printing plate precursor according to the invention, a conventionally known hydrophilic support for use in a lithographic printing plate precursor can be used without limitation.
The support used is preferably a dimensionally stable plate, for example, paper, paper laminated with plastic (eg, polyethylene, polypropylene, polystyrene, etc.), metal plate (eg, aluminum, zinc). , Copper, etc.), plastic films (eg, cellulose diacetate, cellulose triacetate, cellulose propionate, cellulose butyrate, cellulose acetate butyrate, cellulose nitrate, polyethylene terephthalate, polyethylene, polystyrene, polypropylene, polycarbonate, polyvinyl acetal, etc.), Paper or plastic film, etc. on which such metals are laminated or vapor-deposited are included. Appropriately known physical and chemical treatments are applied to these surfaces for the purpose of imparting hydrophilicity and improving strength as necessary. You may give it.

  In particular, preferred supports include paper, polyester film or aluminum plate, among which dimensional stability is good, relatively inexpensive, and a surface with excellent hydrophilicity and strength is provided by surface treatment as required. An aluminum plate that can be formed is more preferable. A composite sheet in which an aluminum sheet is bonded to a polyethylene terephthalate film as described in Japanese Patent Publication No. 48-18327 is also preferable.

An aluminum plate is a metal plate mainly composed of dimensionally stable aluminum. In addition to a pure aluminum plate, an alloy plate containing aluminum as a main component and containing a trace amount of foreign elements, or aluminum (alloy) is laminated. Or it is chosen from the vapor-deposited plastic film or paper. In the following description, the above-mentioned support made of aluminum or an aluminum alloy is generically used as an aluminum support. Examples of the foreign element contained in the aluminum alloy include silicon, iron, manganese, copper, magnesium, chromium, zinc, bismuth, nickel, and titanium. The content of the foreign element in the alloy is 10% by mass or less. In the present invention, a pure aluminum plate is suitable, but completely pure aluminum is difficult to manufacture in terms of refining technology, and therefore may contain a slightly different element. Thus, the composition of the aluminum plate applied to the present invention is not specified, but conventionally known and used materials such as JISA 1050, JIS A 1100, JIS A 3103, JIS A 3005, etc. It can be used as appropriate.
Moreover, the thickness of the aluminum support body used for this invention is about 0.1 mm-about 0.6 mm. This thickness can be changed as appropriate according to the size of the printing press, the size of the printing plate, and the desire of the user. The aluminum support may be subjected to a support surface treatment described later as necessary. Of course, it may not be applied.

(Roughening treatment)
Examples of the surface roughening method include mechanical surface roughening, chemical etching, and electrolytic grain as disclosed in JP-A-56-28893. Furthermore, the electrochemical surface roughening method in which the surface is electrochemically roughened in hydrochloric acid or nitric acid electrolyte solution, the aluminum surface is scratched with a metal wire, the wire brush grain method, the surface of the aluminum is polished with a polishing ball and an abrasive. A mechanical graining method such as a pole grain method, a brush grain method in which the surface is roughened with a nylon brush and an abrasive, can be used, and the above roughening methods can be used alone or in combination. Among them, a method usefully used for roughening is an electrochemical method in which roughening is performed chemically in hydrochloric acid or nitric acid electrolyte, and a suitable amount of electricity at the time of anode is 50 C / dm ^{2 to} 400 C / dm ² . It is a range. More specifically, in the electrolytic solution containing from 0.1 to 50% hydrochloric acid or nitric acid, the temperature 20 to 80 ° C., for 1 second to 30 minutes, alternating at a current density of 100C / dm ² ~400C / dm ² It is preferable to perform direct current electrolysis.

  The roughened aluminum support may be chemically etched with acid or alkali. Etching agents suitably used are caustic soda, sodium carbonate, sodium aluminate, sodium metasilicate, sodium phosphate, potassium hydroxide, lithium hydroxide, and the like. Preferred ranges of concentration and temperature are 1 to 50% and 20%, respectively. ~ 100 ° C. Pickling is performed to remove dirt (smut) remaining on the surface after etching. As the acid used, nitric acid, sulfuric acid, phosphoric acid, chromic acid, hydrofluoric acid, borohydrofluoric acid and the like are used. In particular, as a method for removing smut after the electrochemical surface roughening treatment, contact with 15 to 65 mass% sulfuric acid at a temperature of 50 to 90 ° C. as described in JP-A-53-12739 is preferable. And the alkali etching method described in Japanese Patent Publication No. 48-28123. After the treatment as described above, the method condition is not particularly limited as long as the center line average roughness Ra of the treatment surface is preferably 0.2 to 0.5 μm.

(Anodizing treatment)
The aluminum support treated as described above is preferably anodized after that.
In the anodizing treatment, sulfuric acid, phosphoric acid, oxalic acid, or an aqueous solution of boric acid / sodium borate is used alone or in combination as a main component of the electrolytic bath. In this case, the electrolyte solution may of course contain at least components normally contained in at least an Al alloy plate, an electrode, tap water, groundwater and the like. Further, the second and third components may be added. Here, the second and third components are, for example, metal ions such as Na, K, Mg, Li, Ca, Ti, Al, V, Cr, Mn, Fe, Co, Ni, Cu, and Zn, and ammonium ions. Examples include cations, nitrate ions, carbonate ions, chloride ions, phosphate ions, fluorine ions, sulfite ions, titanate ions, silicate ions, borate ions and the like, and the concentration is 0 to 10,000 ppm. May be included. The conditions for anodizing treatment are not particularly limited, but preferably 30 to
It is processed by direct current or alternating current electrolysis at a current density of 0.1 to 40 A / m ² at a treatment liquid temperature of 10 to 70 ° C. at 500 g / liter. The thickness of the formed anodic oxide film is in the range of 0.5 to 1.5 μm. Preferably it is the range of 0.5-1.0 micrometer. The support prepared by the above treatment is treated so that the pore diameter of the micropores existing in the anodized film is in the range of 5 to 10 nm and the pore density is in the range of 8 × 10 ¹⁵ to 2 × 10 ¹⁶ pieces / m ^2. It is preferred that the conditions are selected.

A widely known method can be applied as the hydrophilic treatment on the surface of the support. As a particularly preferable treatment, a hydrophilic treatment with silicate or polyvinylphosphonic acid is performed. A film | membrane is formed by 2-40 mg / m < ² > as Si or P element amount, More preferably, it is 4-30 mg / m < ² >. The coating amount can be measured by fluorescent X-ray analysis.

  The hydrophilization treatment is carried out by applying an anodized film to an aqueous solution containing 1 to 30% by mass, preferably 2 to 15% by mass of alkali metal silicate or polyvinylphosphonic acid, and having a pH of 10 to 13 at 25 ° C. This is carried out by immersing the aluminum support on which is formed, for example, at 15 to 80 ° C. for 0.5 to 120 seconds.

  As the alkali metal silicate used for the hydrophilization treatment, sodium silicate, potassium silicate, lithium silicate, or the like is used. Examples of the hydroxide used for increasing the pH of the aqueous alkali metal silicate solution include sodium hydroxide, potassium hydroxide, and lithium hydroxide. In addition, you may mix | blend alkaline-earth metal salt or Group IVB metal salt with said process liquid. Alkaline earth metal salts include nitrates such as calcium nitrate, strontium nitrate, magnesium nitrate, and barium nitrate, and water-soluble substances such as sulfate, hydrochloride, phosphate, acetate, oxalate, and borate. Salt. Group IVB metal salts include titanium tetrachloride, titanium trichloride, potassium fluoride titanium, potassium oxalate, titanium sulfate, titanium tetraiodide, zirconium chloride, zirconium dioxide, zirconium oxychloride, zirconium tetrachloride, etc. Can be mentioned.

  Alkaline earth metal salts or Group IVB metal salts can be used alone or in combination of two or more. A preferable range of these metal salts is 0.01 to 10% by mass, and a more preferable range is 0.05 to 5.0% by mass. Silicate electrodeposition as described in US Pat. No. 3,658,662 is also effective. Surface obtained by combining a support with electrolytic grains as disclosed in JP-B-46-27481, JP-A-52-58602, JP-A-52-30503, and the above anodizing treatment and hydrophilization treatment Processing is also useful.

[Middle layer]
In the lithographic printing plate precursor according to the invention, an intermediate layer (also referred to as an undercoat layer) may be provided for the purpose of improving the adhesion and soiling between the photosensitive layer and the support. Specific examples of such an intermediate layer include JP-B-50-7481, JP-A-54-72104, JP-A-59-101651, JP-A-60-149491, JP-A-60-232998, JP-A-3-56177, JP-A-4-282737, JP-A-5-16558, JP-A-5-246171, JP-A-7-159983, JP-A-7-314937, JP-A-8-202025, Special Kaihei 8-320551, JP 9-34104, JP 9-236911, JP 9-269593, JP 10-69092, JP 10-115931, JP 10-161317, JP 10-260536, JP-A-10-282682, JP-A-11-84684, Japanese Patent Application No. 8-225335, Japanese Patent Application No. 8-270098, Japanese Patent Application No. 9-195863, Japanese Patent Application No. 9-195864, Japanese Patent Application No. 9-89646, Japanese Patent Application No. 9-106068, Japanese Patent Application No. 9-183834, Japanese Patent Application No. 9-264411, Japanese Patent Application No. 9 -127232, Japanese Patent Application No. 9-245419, Japanese Patent Application No. 10-127602, Japanese Patent Application No. 10-170202, Japanese Patent Application No. 11-36377, Japanese Patent Application No. 11-165661, Japanese Patent Application No. 11-284091 No., Japanese Patent Application No. 2000-14697, and the like.

[Protective layer]
As in the present invention, a lithographic printing plate precursor having a negative photosensitive layer is usually exposed in the air, and therefore a protective layer (also referred to as an overcoat layer) is further formed on the photosensitive layer. It is preferable to provide it. The protective layer prevents exposure of low molecular weight compounds such as oxygen and basic substances present in the atmosphere that hinder the image formation reaction caused by exposure in the photosensitive layer, and enables exposure in the atmosphere. To do. Therefore, the properties desired for such a protective layer are low permeability of low-molecular compounds such as oxygen, and further, transmission of light used for exposure is not substantially inhibited, and adhesion to the photosensitive layer is excellent. And it is desirable that it can be easily removed in the development process after exposure. Such a device relating to the protective layer has been conventionally devised and is described in detail in US Pat. No. 3,458,311 and Japanese Patent Publication No. 55-49729.

As a material that can be used for the protective layer, for example, a water-soluble polymer compound having relatively excellent crystallinity is preferably used. Specifically, polyvinyl alcohol, polyvinyl pyrrolidone, acidic celluloses, gelatin, gum arabic, Water-soluble polymers such as acrylic acid are known, but among these, using polyvinyl alcohol as the main component gives the best results in terms of basic properties such as oxygen barrier properties and development removability. The polyvinyl alcohol used for the protective layer may be partially substituted with an ester, an ether and an acetal as long as it contains an unsubstituted vinyl alcohol unit for having necessary oxygen barrier properties and water solubility. Similarly, some of them may have other copolymer components. Specific examples of polyvinyl alcohol include those having a hydrolysis rate of 71 to 100% and a molecular weight in the range of 300 to 2400.
Specifically, Kuraray Co., Ltd. PVA-105, PVA-110, PVA-117, PVA-117H, PVA-120, PVA-124, PVA-124H, PVA-CS, PVA-CST, PVA-HC, PVA-203, PVA-204, PVA-205, PVA-210, PVA-217, PVA-220, PVA-224, PVA-217EE, PVA-217E, PVA-220E, PVA-224E, PVA-405, PVA- 420, PVA-613, L-8 and the like.

Components of the protective layer (selection of PVA, use of additives), coating amount, and the like are selected in consideration of fogging, adhesion, and scratch resistance in addition to oxygen barrier properties and development removability. In general, the higher the hydrolysis rate of the PVA used (the higher the content of the unsubstituted vinyl alcohol unit in the protective layer), the thicker the film thickness, the higher the oxygen barrier property, which is advantageous in terms of sensitivity. However, when the oxygen barrier property is extremely increased, there arises a problem that unnecessary polymerization reaction occurs during production and raw storage, and unnecessary fogging and image line thickening occur during image exposure. In addition, adhesion to the image area and scratch resistance are extremely important in handling the plate. That is, when a hydrophilic layer made of a water-soluble polymer is laminated on an oleophilic photosensitive layer, film peeling due to insufficient adhesive force is likely to occur, and the peeled part causes defects such as poor film hardening due to inhibition of oxygen polymerization. On the other hand, various proposals have been made to improve the adhesion between these two layers. For example, U.S. Patent Application No. 292,501 and U.S. Patent Application No. 44,563 disclose an acrylic emulsion or a water-insoluble vinylpyrrolidone-vinyl acetate copolymer in a hydrophilic polymer mainly composed of polyvinyl alcohol. It is described that sufficient adhesiveness can be obtained by mixing 20 to 60% by mass and the like and laminating on the photosensitive layer.
Any of these known techniques can be applied to the protective layer in the present invention. Such a coating method of the protective layer is described in detail in, for example, US Pat. No. 3,458,311 and JP-B-55-49729.

[Plate making]
In order to make the lithographic printing plate precursor according to the present invention, at least exposure and development processes are performed. As the exposure light source of the lithographic printing plate precursor according to the invention, any known light source can be used as long as it can be exposed at a wavelength of 300 to 800 nm. Specifically, various lasers are preferably used as the light source. The exposure mechanism may be any of an internal drum system, an external drum system, a flat bed system, and the like.

  In addition, as other exposure beams for the lithographic printing plate precursor of the present invention, ultra-high pressure, high pressure, medium pressure, low pressure mercury lamps, chemical lamps, carbon arc lamps, xenon lamps, metal halide lamps, various visible and ultraviolet laser lamps Fluorescent lamps, tungsten lamps, sunlight, etc. can also be used.

  The lithographic printing plate precursor according to the invention is developed after being exposed. As the developer used for such development processing, an alkaline aqueous solution having a pH of 14 or less is particularly preferred, and an alkaline aqueous solution having a pH of 8 to 12 containing an anionic surfactant is more preferably used. For example, tribasic sodium phosphate, potassium, ammonium, dibasic sodium phosphate, potassium, ammonium, sodium carbonate, potassium, ammonium, sodium bicarbonate, potassium, ammonium, sodium borate, Examples include inorganic alkaline agents such as potassium, ammonium, sodium hydroxide, ammonium, potassium and lithium. Moreover, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropylamine, triisopropylamine, n-butylamine, monoethanolamine, diethanolamine, triethanolamine, monoisopropanolamine, diisopropanolamine, Organic alkali agents such as ethyleneimine, ethylenediamine, and pyridine are also used. These alkali agents are used alone or in combination of two or more.

In the development processing of the lithographic printing plate precursor according to the invention, 1 to 20% by mass of an anionic surfactant is added to the developer, and more preferably 3 to 10% by mass. If the amount is too small, the developability deteriorates. If the amount is too large, the strength such as the abrasion resistance of the image deteriorates. Anionic surfactants include, for example, sodium salt of lauryl alcohol sulfate, ammonium salt of lauryl alcohol sulfate, sodium salt of octyl alcohol sulfate, such as sodium salt of isopropyl naphthalene sulfonic acid, sodium salt of isobutyl naphthalene sulfonic acid, polyoxy Higher carbon number such as sodium salt of ethylene glycol mononaphthyl ether sulfate ester, sodium salt of dodecylbenzene sulfonic acid, alkylaryl sulfonate such as sodium salt of metanitrobenzene sulfonic acid, secondary sodium alkyl sulfate, etc. Aliphatic alcohol phosphates such as alcohol sulfates, sodium salts of cetyl alcohol phosphates, eg C _{17 H 33 CON (CH 3)} CH 2 CH 2 SO 3 sulfonates of alkylamides such as Na, for example, sodium sulfosuccinate dioctyl ester, sulfonate of dibasic aliphatic esters such as sodium sulfosuccinate dihexyl ester Salts are included.

If necessary, an organic solvent such as benzyl alcohol mixed with water may be added to the developer. As the organic solvent, those having a solubility in water of about 10% by mass or less are suitable, and preferably selected from those having 5% by mass or less. For example, 1-phenylethanol, 2-phenylethanol, 3-phenylpropanol, 1,4-phenylbutanol, 2,2-phenylbutanol, 1,2-phenoxyethanol, 2-benzyloxyethanol, o-methoxybenzyl alcohol, m Examples include -methoxybenzyl alcohol, p-methoxybenzyl alcohol, benzyl alcohol, cyclohexanol, 2-methylcyclohexanol, 4-methylcyclohexanol, and 3-methylcyclohexanol. The content of the organic solvent is preferably 1 to 5% by mass with respect to the total mass of the developer at the time of use. The amount used is closely related to the amount of surfactant used, and it is preferable to increase the amount of anionic surfactant as the amount of organic solvent increases. This is because when the amount of the organic solvent is large and the amount of the anionic surfactant is small, the organic solvent is not dissolved, so that it is impossible to expect good developability.

Furthermore, additives such as an antifoaming agent and a hard water softening agent can be further contained as necessary. Examples of the hard water softener include Na ₂ P ₂ O ₇ , Na ₅ P ₃ O ₃ , Na ₃ P ₃ O ₉ , Na ₂ O ₄ P (NaO ₃ P) PO ₃ Na ₂ , Calgon (sodium polymetaphosphate) Such as polyphosphates, aminopolycarboxylic acids (for example, ethylenediaminetetraacetic acid, its potassium salt, its sodium salt; diethylenetriaminepentaacetic acid, its potassium salt, its sodium salt; triethylenetetraminehexaacetic acid, its potassium salt, its sodium salt Hydroxyethylethylenediaminetriacetic acid, its potassium salt, its sodium salt; nitrilotriacetic acid, its potassium salt, its sodium salt; 1,2-diaminocyclohexanetetraacetic acid, its potassium salt, its sodium salt; 1,3-diamino-2 -Propanol tetraacetic acid, its potassium salt, Sodium salt), other polycarboxylic acids (eg 2-phosphonobutanetricarboxylic acid-1,2,4, potassium salt thereof, sodium salt thereof; 2-phosphonobutanone tricarboxylic acid-2,3,4, Potassium salt, sodium salt thereof, etc., organic phosphonic acids (eg, 1-phosphonoethanetricarboxylic acid-1,2,2, potassium salt, sodium salt thereof; 1-hydroxyethane-1,1-diphosphonic acid, Potassium salt, sodium salt thereof; aminotri (methylenephosphonic acid), potassium salt thereof, sodium salt thereof and the like. The optimum amount of such a hard water softener varies depending on the hardness of the hard water used and the amount used, but is generally 0.01 to 5% by weight, more preferably in the developer at the time of use. It is made to contain in 0.01-0.5 mass%.

  Furthermore, when the lithographic printing plate precursor is developed using an automatic developing machine, the developing solution becomes fatigued according to the processing amount, so that the processing ability is restored by using a replenishing solution or a fresh developing solution. May be. In this case, it is preferable to replenish by the method described in US Pat. No. 4,882,246. Developers described in JP-A-50-26601, 58-54341, JP-B-56-39464, 56-42860, and 57-7427 are also preferable.

  The lithographic printing plate precursor thus developed is subjected to washing water, surface activity as described in JP-A Nos. 54-8002, 55-11545, 59-58431, and the like. It may be post-treated with a rinsing liquid containing an agent, a desensitizing liquid containing gum arabic, starch derivatives, and the like. These treatments can be used in various combinations for the post-treatment of the lithographic printing plate precursor according to the invention.

As the plate-making process of the lithographic printing plate precursor according to the invention, the entire surface may be heated before exposure, during exposure, and between exposure and development, if necessary. By such heating, the image forming reaction in the photosensitive layer is promoted, and advantages such as improvement in sensitivity and printing durability and stabilization of sensitivity may occur. Further, for the purpose of improving the image strength and printing durability, it is also effective to subject the developed image to full post heating or full exposure.
Usually, heating before development is preferably performed under mild conditions of 150 ° C. or less from the viewpoint of occurrence of an undesired curing reaction. Also, very strong conditions can be used for heating after development. Usually, the heating temperature is in the range of 200 to 500 ° C. from the viewpoint of image strengthening action and thermal decomposition of the image area.

The planographic printing plate obtained by the above processing is loaded on an offset printing machine and used for printing a large number of sheets.
Note that the stain on the planographic printing plate subjected to printing can be removed by a plate cleaner. As plate cleaners used for removing stains on the plate during printing, conventionally known plate cleaners for PS plates are used. For example, CL-1, CL-2, CP, CN-4, CN, CG-1, PC-1, SR, IC (made by Fuji Photo Film Co., Ltd.), etc. are mentioned.

  EXAMPLES Hereinafter, although an Example demonstrates this invention, this invention is not limited to these.

[Synthesis Example 1: Synthesis of Monomer 1]
MOI (manufactured by Showa Denko KK) (155 g), D-glucose (manufactured by Tokyo Chemical Industry) (181 g), Neostan U-600 (manufactured by Nitto Kasei Corporation) (0.5 g), 1,4-benzoquinone (Tokyo) Kasei) (0.5 g) and THF (manufactured by Wako Pure Chemical Industries, Ltd.) (1000 g) were placed in a 3 L eggplant flask (with stirrer and condenser) and heated and stirred at 60 ° C. for 48 hours. After allowing to cool, this solution was concentrated under reduced pressure, and the resulting concentrated solution was purified by column chromatography (silica gel, hexane / ethyl acetate = 1/3 (v / v)) to give monomer 1 (30 g). Obtained.
Monomer 2 was identified by NMR and IR spectra.

[Synthesis Example 2: Synthesis of Binder Polymer (P-1)]
Monomer 2 (140 g), methacrylic acid (manufactured by Tokyo Chemical Industry) (17 g), monomer 1 (101 g), and dimethyl-2-2′-azobis (2-methylpropionate) (manufactured by Wako Pure Chemical Industries) (1. 4 g) of an N, N-dimethylacetamide (300 g) solution was dropped into N, N-dimethylacetamide (300 g) at 80 ° C. under a nitrogen stream over 2.5 hours. After dropping, the mixture was further stirred at 80 ° C. for 2 hours.
After allowing to cool, N, N-dimethylacetamide (862 g), p-methoxyphenol (manufactured by Wako Pure Chemical Industries, Ltd.) (1.5 g), 1,8-diazabicyclo [5.4.0] -7-undecene ( Wako Pure Chemical Industries, Ltd. (266 g) was added and stirred at room temperature for 12 hours. Thereafter, methanesulfonic acid (manufactured by Wako Pure Chemical Industries, Ltd.) (170 g) was added dropwise at 0 ° C., and then the solution was poured into vigorously stirred water (20 L) and stirred for 30 minutes. The precipitated white solid was filtered and dried to obtain a binder polymer P-1.
P-1 was identified by gel permeation chromatography, acid value titration (0.1 M aqueous sodium hydroxide), NMR, and IR spectrum. The weight average molecular weight was 70000 in terms of polystyrene, and the acid value was 0.91 mmol / g.

  The structures of the monomers 1 and 2 and the binder polymer (P-1) are shown below.

[Examples 1 to 45, Comparative Examples 1 to 6]
(Preparation of support 1)
An aluminum plate made of material 1S having a thickness of 0.30 mm was used with a No. 8 nylon brush and an 800 mesh Bamiston water suspension, and the surface was grained and washed thoroughly with water. Etching was performed by immersing in 10% sodium hydroxide at 70 ° C. for 60 seconds, washing with running water, neutralizing with 20% HNO ₃ , and washing with water. This was subjected to an electrolytic surface roughening treatment in a 1% nitric acid aqueous solution with a anodic electricity quantity of 300 coulomb / dm ² using a sinusoidal alternating current under the condition of V _A = 12.7V. When the surface roughness was measured, it was 0.45 μm (Ra indication). Next, after dipping in a 30% H ₂ SO ₄ aqueous solution and desmutting at 55 ° C. for 2 minutes, a cathode was placed on the grained surface in 33 ° C., 20% H ₂ SO ₄ aqueous solution to obtain a current density. When anodized at 5 A / dm ² for 50 seconds, the thickness was 2.7 g / m ² .

Next, the following surface coating undercoat liquid composition was applied to the support 1 so that the Si amount was about 0.001 g / m ^2, and dried at 100 ° C. for 1 minute.

(Liquid composition for undercoat)
The liquid composition for undercoat generated heat after about 5 minutes by mixing and stirring the following components. After reacting as it was for 60 minutes, the contents were transferred to another container, and 30,000 parts by mass of methanol was further added. Shall be.

-Composition of the undercoat liquid composition-
-Unichemical Co., Ltd. Phosmer PE 20 parts by mass-Methanol 130 parts by mass-Water 20 parts by mass-Paratoluenesulfonic acid 5 parts by mass-Tetraethoxysilane 50 parts by mass-3-Methacryloxypropyltriethoxysilane 50 parts by mass

(Preparation of support 2)
In the production of the support 1, a material that was not subjected to undercoating was produced, and this was used as the support 2.

Then, the following back coat coating solution is applied with a bar coater to the back surface (the surface on which a recording layer to be described later is not provided) of the support thus treated, and dried at 100 ° C. for 1 minute. A backcoat layer having an amount of 70 mg / m ² was provided.

(Backcoat coating solution)
In the sol-gel reaction liquid, the following components (sol-gel reaction liquid) were mixed and stirred to generate heat in about 5 minutes. After reacting as they were for 60 minutes, the solution A having the following components was added. As a result, a backcoat coating solution was prepared.

-Sol-gel reaction liquid-
・ Tetraethyl silicate 50 mass parts ・ Water 20 mass parts ・ Methanol 15 mass parts ・ Phosphoric acid 0.05 mass parts

-Composition of solution A-
・ Pyrogallol formaldehyde condensation resin 4 parts by mass (molecular weight 2000)
・ Dimethyl phthalate 5 parts by mass ・ Fluorosurfactant 0.7 parts by mass (N-butylperfluorooctanesulfonamidoethyl acrylate /
Polyoxyethylene acrylate copolymer: molecular weight 20,000)
・ Methanol silica sol 50 parts by mass (manufactured by Nissan Chemical Industries, Ltd., methanol 30% by mass)
・ 800 parts by mass of methanol

(Formation of recording layer)
The recording layer coating solution having the following composition was applied to the surface of the aluminum support thus treated (the surface on which the backcoat layer was not provided) so that the dry coating amount was 1.5 g / m ^2, and 100 ° C. And dried for 1 minute to form a recording layer.

(Coating liquid for recording layer)
・ Binder polymer (described in Tables 2 to 4)
Polymerizable compound (described in Tables 2 to 4)
・ Polymerization initiators (described in Tables 2 to 4)
・ Sensitizing dyes (described in Tables 2 to 4)
Additive [S] (described in Tables 2 to 4)
・ Fluorine surfactant 0.03g
(Megafuck F-177: manufactured by Dainippon Ink & Chemicals, Inc.)
・ Thermal polymerization inhibitor 0.01g
(N-nitrosophenylhydroxylamine aluminum salt)
・ Pigment dispersion (composition below) 2.0g
・ Methyl ethyl ketone 20g
・ Propylene glycol monomethyl ether 20g

(Composition of pigment dispersion)
Pigment Blue 15: 6 15 parts by mass Allyl methacrylate / methacrylic acid copolymer 10 parts by mass (copolymerization molar ratio 83/17)
· 15 parts by mass of cyclohexanone · 20 parts by mass of methoxypropyl acetate · 40 parts by mass of propylene glycol monomethyl ether

  Polymerizable compounds [(M-1) and (M-2)], polymerization initiators [(I-1) to (I-4)], sensitizing dyes [(S-1 ) To (S-3)], additives [(H-1) and (H-2)] and comparative polymer binders [(CP-1) and (CP-2)] used in Comparative Examples Is shown below. The binder polymers [(P-1) to (P-15)] used in the examples are the exemplified polymers of the present invention described above.

(Formation of protective layer)
After forming the recording layer as described above, for a part (shown in Tables 2 to 4), a 3% by mass aqueous solution of polyvinyl alcohol (saponification degree 98 mol%, polymerization degree 550) is dried on the recording layer. The protective layer was formed by applying the coating mass to 2 g / m ² and drying at 100 ° C. for 2 minutes.
As described above, lithographic printing plate precursors of Examples and Comparative Examples were obtained.

(exposure)
Each lithographic printing plate precursor obtained as described above was exposed using different light sources depending on the exposure wavelength. In this example, the exposure was performed in the atmosphere using a 400 nm semiconductor laser, a 532 nm FD-YAG laser, and an 830 nm infrared semiconductor laser.

(Development processing)
After the exposure, the film was developed using an automatic processor Stablon 900NP manufactured by Fuji Photo Film Co., Ltd. As the developer, either developer 1 or 2 below was used. The temperature of the developing bath was 30 ° C., and the developing time was 12 seconds.
As described above, each planographic printing plate was obtained.

<Developer 1>
1: 8 water diluted solution of DP-4 manufactured by Fuji Photo Film Co., Ltd. <Developer 2>
1: 4 water dilution of DV-2 from Fuji Photo Film Co., Ltd.

(Evaluation of printing durability and stain resistance)
Each obtained lithographic printing plate was printed using a printing press Lithron manufactured by Komori Corporation. At this time, the number of sheets that can be printed while maintaining a sufficient ink density was measured visually to evaluate the printing durability and stains on the non-image area. The results are shown in Tables 2-4.

  As is apparent from Tables 2 to 4, the lithographic printing plate prepared from the lithographic printing plate precursor containing the photopolymerizable composition of the present invention in the photosensitive layer is excellent in printing durability and hardly stained.

Claims (2)

(A) an alkali-soluble binder polymer having an ethylenically unsaturated bond-containing unit together with a sugar structure-containing unit,
A photopolymerizable composition comprising (B) a polymerizable compound and (C) a polymerization initiator.   A lithographic printing plate precursor comprising a photosensitive layer containing the photopolymerizable composition according to claim 1 on a support.