HK7486A - Wafer tilt compensation in zone plate alignment system - Google Patents

Wafer tilt compensation in zone plate alignment system

Info

Publication number: HK7486A
Authority: HK; Hong Kong
Prior art keywords: alignment system; zone plate; plate alignment; tilt compensation; wafer tilt
Prior art date: 1981-04-15

Application number

HK74/86A

Other languages

English (en)

Inventor

Martin Feldman

Alan David White

Donald Lawrence White

Original Assignee

At & T Technologies Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-04-15

Filing date

1986-01-30

Publication date

1986-02-07

1986-01-30 Application filed by At & T Technologies Inc filed Critical At & T Technologies Inc

1986-02-07 Publication of HK7486A publication Critical patent/HK7486A/xx

Links

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Multimedia (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Length Measuring Devices By Optical Means (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

HK74/86A 1981-04-15 1986-01-30 Wafer tilt compensation in zone plate alignment system HK7486A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US06/254,486 US4398824A (en)	1981-04-15	1981-04-15	Wafer tilt compensation in zone plate alignment system

Publications (1)

Publication Number	Publication Date
HK7486A true HK7486A (en)	1986-02-07

Family

ID=22964476

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
HK74/86A HK7486A (en)	1981-04-15	1986-01-30	Wafer tilt compensation in zone plate alignment system

Country Status (10)

Country	Link
US (1)	US4398824A (xx)
JP (1)	JPS57178343A (xx)
BE (1)	BE892840A (xx)
CA (1)	CA1166363A (xx)
DE (1)	DE3213338C2 (xx)
FR (1)	FR2504288B1 (xx)
GB (1)	GB2098728B (xx)
HK (1)	HK7486A (xx)
IT (1)	IT1205252B (xx)
NL (1)	NL8201571A (xx)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE3306840A1 (de) *	1983-02-26	1984-09-06	GdA Gesellschaft für digitale Automation mbH, 8000 München	Messanordnung zum justieren des werkzeugflansches eines industrieroboters
US4636080A (en) *	1984-05-07	1987-01-13	At&T Bell Laboratories	Two-dimensional imaging with line arrays
JPH0814484B2 (ja) *	1985-04-09	1996-02-14	株式会社ニコン	パタ−ン位置測定装置
US4790642A (en) *	1986-12-01	1988-12-13	Gca Corporation/Tropel Division	Integrated metrology for microlithographic objective reducing lens
US5325176A (en) *	1988-02-16	1994-06-28	Canon Kabushiki Kaisha	Position detecting method and apparatus including Fraunhofer diffraction detector
US5327221A (en) *	1988-02-16	1994-07-05	Canon Kabushiki Kaisha	Device for detecting positional relationship between two objects
US5294980A (en) *	1988-03-24	1994-03-15	Canon Kabushiki Kaisha	Positioning detecting method and apparatus
US5235408A (en) *	1988-09-05	1993-08-10	Canon Kabushiki Kaisha	Position detecting method and apparatus
JP2626076B2 (ja) *	1988-09-09	1997-07-02	キヤノン株式会社	位置検出装置
US5155370A (en) *	1988-09-09	1992-10-13	Canon Kabushiki Kaisha	Device for detecting the relative position of first and second objects
JP2546350B2 (ja) *	1988-09-09	1996-10-23	キヤノン株式会社	位置合わせ装置
EP0358511B1 (en) *	1988-09-09	2001-07-18	Canon Kabushiki Kaisha	Device for detecting positional relationship between two objects
JP2734004B2 (ja) *	1988-09-30	1998-03-30	キヤノン株式会社	位置合わせ装置
JP2704001B2 (ja) *	1989-07-18	1998-01-26	キヤノン株式会社	位置検出装置
US5114236A (en) *	1989-08-04	1992-05-19	Canon Kabushiki Kaisha	Position detection method and apparatus
DE4135959C2 (de) *	1991-10-31	1994-01-20	Leica Ag Heerbrugg	Verfahren zur Messung der Neigungen von Grenzflächen in einem optischen System
FR2789068B1 (fr) *	1999-02-03	2001-03-16	Optique Et Microsystemes Sa	Dispositif d'alignement pour l'assemblage de microsystemes et pour la micro distribution sur microsystemes ou sur microcomposants biotechnologiques
DE19963345A1 (de)	1999-12-27	2001-07-05	Leica Microsystems	Optische Messanordnung und Verfahren zur Neigungsmessung
US6778266B2 (en) *	2002-01-12	2004-08-17	Taiwan Semiconductor Manufacturing Co., Ltd	Semiconductor wafer tilt monitoring on semiconductor fabrication equipment plate
CN1495540B (zh) *	2002-09-20	2010-08-11	Asml荷兰有限公司	利用至少两个波长的光刻系统的对准系统和方法
JP4773329B2 (ja) *	2005-12-22	2011-09-14	パナソニック株式会社	界面位置測定方法および測定装置、層厚測定方法および測定装置、並びに、光ディスクの製造方法および製造装置
DE102013207243B4 (de) *	2013-04-22	2019-10-02	Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.	Vorrichtung und verfahren zur herstellung einer struktur aus aushärtbarem material durch abformung

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3990798A (en) *	1975-03-07	1976-11-09	Bell Telephone Laboratories, Incorporated	Method and apparatus for aligning mask and wafer
US4037969A (en) *	1976-04-02	1977-07-26	Bell Telephone Laboratories, Incorporated	Zone plate alignment marks
US4326805A (en) *	1980-04-11	1982-04-27	Bell Telephone Laboratories, Incorporated	Method and apparatus for aligning mask and wafer members

1981
- 1981-04-15 US US06/254,486 patent/US4398824A/en not_active Expired - Lifetime
1982
- 1982-03-22 CA CA000398956A patent/CA1166363A/en not_active Expired
- 1982-04-08 FR FR8206159A patent/FR2504288B1/fr not_active Expired
- 1982-04-08 DE DE3213338A patent/DE3213338C2/de not_active Expired
- 1982-04-13 IT IT20712/82A patent/IT1205252B/it active
- 1982-04-13 GB GB8210654A patent/GB2098728B/en not_active Expired
- 1982-04-14 BE BE0/207813A patent/BE892840A/fr not_active IP Right Cessation
- 1982-04-14 NL NL8201571A patent/NL8201571A/nl not_active Application Discontinuation
- 1982-04-15 JP JP57061853A patent/JPS57178343A/ja active Granted
1986
- 1986-01-30 HK HK74/86A patent/HK7486A/xx unknown

Also Published As

Publication number	Publication date
DE3213338A1 (de)	1982-11-04
JPH0145736B2 (xx)	1989-10-04
NL8201571A (nl)	1982-11-01
BE892840A (fr)	1982-08-02
IT1205252B (it)	1989-03-15
CA1166363A (en)	1984-04-24
FR2504288A1 (fr)	1982-10-22
GB2098728B (en)	1985-06-05
JPS57178343A (en)	1982-11-02
IT8220712A0 (it)	1982-04-13
DE3213338C2 (de)	1986-07-10
GB2098728A (en)	1982-11-24
FR2504288B1 (fr)	1985-06-28
US4398824A (en)	1983-08-16

Publication	Publication Date	Title
HK7486A (en)	1986-02-07	Wafer tilt compensation in zone plate alignment system
GB2104401B (en)	1985-03-20	Support plate for centrifuges
GB2166375B (en)	1988-05-05	Edge face grinding apparatus for glass plate
GB8514094D0 (en)	1985-07-10	Beam alignment system
AU549126B2 (en)	1986-01-16	Aligning planar members
GB8301165D0 (en)	1983-02-16	Weighing system
GB2104667B (en)	1986-06-18	Weighing system
GB8416761D0 (en)	1984-08-08	Electro-optical scanning system
GB2167732B (en)	1988-04-20	Apparatus for the lateral alignment of flat objects
GB2157078B (en)	1987-09-30	Wafer alignment apparatus
GB8407761D0 (en)	1984-05-02	Base plate system
GB8402835D0 (en)	1984-03-07	Heat-reflecting glass plate
JPS57211162A (en)	1982-12-24	Apparatus for delivering plate
GB8526487D0 (en)	1985-12-04	Tilt mechanism for chairs
GB8315500D0 (en)	1983-07-13	Cooling plate
AU568954B2 (en)	1988-01-14	Submerisble mixer for vertical or horizontal orientation
JPS57167746A (en)	1982-10-15	Vertical crusher
JPS57122808A (en)	1982-07-30	Top plate
GB8430297D0 (en)	1985-01-09	Face plate fixing
JPS57143078A (en)	1982-09-04	Glass plate support apparatus
JPS57156996A (en)	1982-09-28	Device for tilting bed plate
DE3567108D1 (en)	1989-02-02	Alignment correction system
JPS56107489A (en)	1981-08-26	Heater for plate glass
JPS57175877A (en)	1982-10-28	Fixing of side plate retaining frame on top table of refrigerator
KR820000666Y1 (en)	1982-04-13	On-dol plate