FR2230755B1 - - Google Patents
Info
- Publication number
- FR2230755B1 FR2230755B1 FR7417413A FR7417413A FR2230755B1 FR 2230755 B1 FR2230755 B1 FR 2230755B1 FR 7417413 A FR7417413 A FR 7417413A FR 7417413 A FR7417413 A FR 7417413A FR 2230755 B1 FR2230755 B1 FR 2230755B1
- Authority
- FR
- France
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24405—Faraday cages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Physical Vapour Deposition (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH760273A CH566399A5 (fr) | 1973-05-26 | 1973-05-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2230755A1 FR2230755A1 (fr) | 1974-12-20 |
FR2230755B1 true FR2230755B1 (fr) | 1978-12-29 |
Family
ID=4327704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7417413A Expired FR2230755B1 (fr) | 1973-05-26 | 1974-05-20 |
Country Status (6)
Country | Link |
---|---|
US (1) | US3949187A (fr) |
CH (1) | CH566399A5 (fr) |
DE (2) | DE7414979U (fr) |
FR (1) | FR2230755B1 (fr) |
GB (1) | GB1420545A (fr) |
NL (1) | NL156860B (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2634061B1 (fr) * | 1988-07-06 | 1991-04-05 | Commissariat Energie Atomique | Evaporateur a bombardement electronique muni de moyens de recuperation des electrons retrodiffuses |
DE4430534A1 (de) * | 1994-08-27 | 1996-04-11 | Hell Ag Linotype | Elektronenstrahl-Erzeuger |
CN1119829C (zh) * | 1996-09-17 | 2003-08-27 | 浜松光子学株式会社 | 光电阴极及装备有它的电子管 |
DE19745771B4 (de) | 1997-10-16 | 2005-12-22 | Unaxis Deutschland Holding Gmbh | Verfahren für den Betrieb eines Hochleistungs-Elektronenstrahls |
SE0400582D0 (sv) * | 2004-03-05 | 2004-03-05 | Forskarpatent I Uppsala Ab | Method for in-line process control of the CIGS process |
DE102009013310B4 (de) * | 2009-03-18 | 2013-10-10 | Von Ardenne Anlagentechnik Gmbh | Verfahren und Vorrichtung zur Vakuumbedampfung unter Kontrolle der Beschichtungsrate und Messeinrichtung dafür |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3046936A (en) * | 1958-06-04 | 1962-07-31 | Nat Res Corp | Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof |
US3390249A (en) * | 1965-09-20 | 1968-06-25 | Air Reduction | Vaporization monitoring apparatus |
DE1915933B2 (de) * | 1969-03-28 | 1975-10-16 | Robert Bosch Gmbh, 7000 Stuttgart | Vorrichtung zur Steuerung oder Regelung der Aufdampfrate beim Aufdampfen von Metallen im Vakuum |
US3690635A (en) * | 1969-05-16 | 1972-09-12 | Air Reduction | Condensate collection means |
US3756193A (en) * | 1972-05-01 | 1973-09-04 | Battelle Memorial Institute | Coating apparatus |
-
1973
- 1973-05-26 CH CH760273A patent/CH566399A5/xx not_active IP Right Cessation
- 1973-07-09 NL NL7309573.A patent/NL156860B/xx not_active IP Right Cessation
-
1974
- 1974-04-26 GB GB1835274A patent/GB1420545A/en not_active Expired
- 1974-04-29 DE DE19747414979U patent/DE7414979U/de not_active Expired
- 1974-04-29 DE DE2420656A patent/DE2420656C3/de not_active Expired
- 1974-05-17 US US05/471,134 patent/US3949187A/en not_active Expired - Lifetime
- 1974-05-20 FR FR7417413A patent/FR2230755B1/fr not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE7414979U (de) | 1979-04-19 |
US3949187A (en) | 1976-04-06 |
NL156860B (nl) | 1978-05-16 |
NL7309573A (fr) | 1974-11-28 |
DE2420656B2 (de) | 1978-08-03 |
DE2420656A1 (de) | 1974-12-12 |
FR2230755A1 (fr) | 1974-12-20 |
DE2420656C3 (de) | 1979-04-12 |
CH566399A5 (fr) | 1975-09-15 |
GB1420545A (en) | 1976-01-07 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |