FI894010A0 - Foerfarande foer kontrollering av en tillvaextprocess foer en med fosfor dopad kiseldioxidfilm. - Google Patents
Foerfarande foer kontrollering av en tillvaextprocess foer en med fosfor dopad kiseldioxidfilm.Info
- Publication number
- FI894010A0 FI894010A0 FI894010A FI894010A FI894010A0 FI 894010 A0 FI894010 A0 FI 894010A0 FI 894010 A FI894010 A FI 894010A FI 894010 A FI894010 A FI 894010A FI 894010 A0 FI894010 A0 FI 894010A0
- Authority
- FI
- Finland
- Prior art keywords
- foer
- tillvaextprocess
- kiseldioxidfilm
- dopad
- fosfor
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI894010A FI894010A (fi) | 1989-08-25 | 1989-08-25 | Foerfarande foer kontrollering av en tillvaextprocess foer en med fosfor dopad kiseldioxidfilm. |
EP19900309320 EP0414562A3 (en) | 1989-08-25 | 1990-08-24 | A method of monitoring a process of growing a film of silicon dioxide doped with phosphorus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI894010A FI894010A (fi) | 1989-08-25 | 1989-08-25 | Foerfarande foer kontrollering av en tillvaextprocess foer en med fosfor dopad kiseldioxidfilm. |
Publications (2)
Publication Number | Publication Date |
---|---|
FI894010A0 true FI894010A0 (fi) | 1989-08-25 |
FI894010A FI894010A (fi) | 1991-02-26 |
Family
ID=8528891
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI894010A FI894010A (fi) | 1989-08-25 | 1989-08-25 | Foerfarande foer kontrollering av en tillvaextprocess foer en med fosfor dopad kiseldioxidfilm. |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP0414562A3 (fi) |
FI (1) | FI894010A (fi) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2199110C2 (ru) * | 1997-04-24 | 2003-02-20 | Баранов Александр Михайлович | Способ контроля параметров пленочных покрытий и поверхностей в процессе их изменения и устройство его осуществления |
RU2180439C2 (ru) * | 2000-02-11 | 2002-03-10 | Кумахов Мурадин Абубекирович | Способ получения изображения внутренней структуры объекта с использованием рентгеновского излучения и устройство для его осуществления |
PL2666544T3 (pl) * | 2012-05-24 | 2018-03-30 | Vito Nv | Proces osadzania i charakterystyka powłoki |
CN103472080A (zh) * | 2013-09-02 | 2013-12-25 | 贵州天义电器有限责任公司 | 一种锌白铜的无氰化分析测定方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2716689A1 (de) * | 1977-04-15 | 1978-10-19 | Ibm Deutschland | Herstellung von eichstandards fuer die roentgenfluoreszenzanalyse |
-
1989
- 1989-08-25 FI FI894010A patent/FI894010A/fi not_active Application Discontinuation
-
1990
- 1990-08-24 EP EP19900309320 patent/EP0414562A3/en not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
EP0414562A3 (en) | 1991-07-24 |
EP0414562A2 (en) | 1991-02-27 |
FI894010A (fi) | 1991-02-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD | Application lapsed |
Owner name: MICRONAS OY |