EP4116084A4 - Electroconductive laminate, optical device in which same is used, and method for producing electroconductive laminate - Google Patents
Electroconductive laminate, optical device in which same is used, and method for producing electroconductive laminate Download PDFInfo
- Publication number
- EP4116084A4 EP4116084A4 EP21764394.9A EP21764394A EP4116084A4 EP 4116084 A4 EP4116084 A4 EP 4116084A4 EP 21764394 A EP21764394 A EP 21764394A EP 4116084 A4 EP4116084 A4 EP 4116084A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- electroconductive laminate
- same
- optical device
- producing
- laminate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/50—Forming devices by joining two substrates together, e.g. lamination techniques
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3644—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the metal being silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3668—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
- C03C17/3671—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use as electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/048—Interaction techniques based on graphical user interfaces [GUI]
- G06F3/0487—Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser
- G06F3/0488—Interaction techniques based on graphical user interfaces [GUI] using specific features provided by the input device, e.g. functions controlled by the rotation of a mouse with dual sensing arrangements, or of the nature of the input device, e.g. tap gestures based on pressure sensed by a digitiser using a touch-screen or digitiser, e.g. input of commands through traced gestures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/38—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith formed by a conductive layer on an insulating support
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
- H10K85/324—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
- H10K85/326—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising gallium
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/30—Coordination compounds
- H10K85/371—Metal complexes comprising a group IB metal element, e.g. comprising copper, gold or silver
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/944—Layers comprising zinc oxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01Q—ANTENNAS, i.e. RADIO AERIALS
- H01Q1/00—Details of, or arrangements associated with, antennas
- H01Q1/36—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith
- H01Q1/364—Structural form of radiating elements, e.g. cone, spiral, umbrella; Particular materials used therewith using a particular conducting material, e.g. superconductor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K2102/00—Constructional details relating to the organic devices covered by this subclass
- H10K2102/10—Transparent electrodes, e.g. using graphene
- H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Human Computer Interaction (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Laminated Bodies (AREA)
- Manufacturing Of Electric Cables (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020035784A JP2021137993A (en) | 2020-03-03 | 2020-03-03 | Conductive laminate and optical device comprising the same and method for producing conductive laminate |
PCT/JP2021/007001 WO2021177124A1 (en) | 2020-03-03 | 2021-02-25 | Electroconductive laminate, optical device in which same is used, and method for producing electroconductive laminate |
Publications (2)
Publication Number | Publication Date |
---|---|
EP4116084A1 EP4116084A1 (en) | 2023-01-11 |
EP4116084A4 true EP4116084A4 (en) | 2024-04-03 |
Family
ID=77614242
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP21764394.9A Pending EP4116084A4 (en) | 2020-03-03 | 2021-02-25 | Electroconductive laminate, optical device in which same is used, and method for producing electroconductive laminate |
Country Status (7)
Country | Link |
---|---|
US (1) | US20230119906A1 (en) |
EP (1) | EP4116084A4 (en) |
JP (1) | JP2021137993A (en) |
KR (1) | KR20220131310A (en) |
CN (1) | CN115210066A (en) |
TW (1) | TW202200809A (en) |
WO (1) | WO2021177124A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI850936B (en) * | 2022-12-29 | 2024-08-01 | 財團法人工業技術研究院 | Antenna device based on transparent substrate and method of configuring antenna device |
KR102717978B1 (en) * | 2023-06-08 | 2024-10-16 | 한국항공우주연구원 | Composite Panel Module having an Electromagnetic Wave Absorption Function including Core Part and Sandwich Structure including the Same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007250430A (en) * | 2006-03-17 | 2007-09-27 | Sumitomo Metal Mining Co Ltd | Transparent conductive thin film and transparent conductive film using same |
FR2998564A1 (en) * | 2012-11-23 | 2014-05-30 | Saint Gobain | SUBSTRATE WITH PARTIALLY METALLIC LAYER STACK, GLAZING, USE AND METHOD. |
JP2016012555A (en) * | 2014-06-02 | 2016-01-21 | Tdk株式会社 | Transparent conductive film and touch panel |
EP3300084A1 (en) * | 2015-12-11 | 2018-03-28 | TDK Corporation | Transparent conductor |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3592380A (en) | 1969-05-28 | 1971-07-13 | Jiffy Mfg Co | Cushioned shipping bag |
US5763064A (en) * | 1995-06-26 | 1998-06-09 | Asahi Glass Company Ltd. | Laminate |
JPH09221340A (en) * | 1996-02-09 | 1997-08-26 | Nippon Sheet Glass Co Ltd | Substrate with transparent conductive film |
DE10196704B3 (en) * | 2000-09-29 | 2013-03-14 | Nippon Sheet Glass Co., Ltd. | Transparent layered product with a low emissivity coating |
JP4820738B2 (en) | 2003-08-25 | 2011-11-24 | 旭硝子株式会社 | Electromagnetic wave shielding laminate and display device using the same |
KR101351198B1 (en) * | 2005-01-12 | 2014-01-14 | 이데미쓰 고산 가부시키가이샤 | TRANSPARENT CONDUCTIVE FILM LAMINATE CIRCUIT BOARD PROVIDED WITH Al WIRING AND PRODUCTION METHOD THEREFOR, AND OXIDE TRANSPARENT CONDUCTIVE FILM MATERIAL |
JP2006195077A (en) * | 2005-01-12 | 2006-07-27 | Idemitsu Kosan Co Ltd | TRANSPARENT CONDUCTIVE FILM LAYERED SUBSTRATE EQUIPPED WITH Al WIRING, AND ITS MANUFACTURING METHOD |
JP2011063500A (en) * | 2009-08-17 | 2011-03-31 | Central Glass Co Ltd | Heat ray shielding laminated film |
JP5473990B2 (en) * | 2011-06-17 | 2014-04-16 | 日東電工株式会社 | A conductive laminate, a transparent conductive laminate with a patterned wiring, and an optical device. |
JP2014034701A (en) | 2012-08-08 | 2014-02-24 | Dexerials Corp | Thin film deposition device and thin film deposition method |
FR2999807B1 (en) * | 2012-12-13 | 2015-01-02 | Saint Gobain | CONDUCTIVE BRACKET FOR OLED DEVICE AND INCORPORATING OLED DEVICE |
JP6282142B2 (en) * | 2014-03-03 | 2018-02-21 | 日東電工株式会社 | Infrared reflective substrate and manufacturing method thereof |
JP6048526B2 (en) * | 2015-03-26 | 2016-12-21 | Tdk株式会社 | Transparent conductor and touch panel |
JP7119772B2 (en) | 2018-08-27 | 2022-08-17 | オムロン株式会社 | light sensor |
-
2020
- 2020-03-03 JP JP2020035784A patent/JP2021137993A/en active Pending
-
2021
- 2021-02-25 CN CN202180017242.XA patent/CN115210066A/en active Pending
- 2021-02-25 KR KR1020227029039A patent/KR20220131310A/en not_active Application Discontinuation
- 2021-02-25 WO PCT/JP2021/007001 patent/WO2021177124A1/en unknown
- 2021-02-25 EP EP21764394.9A patent/EP4116084A4/en active Pending
- 2021-02-25 US US17/908,263 patent/US20230119906A1/en active Pending
- 2021-03-03 TW TW110107528A patent/TW202200809A/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007250430A (en) * | 2006-03-17 | 2007-09-27 | Sumitomo Metal Mining Co Ltd | Transparent conductive thin film and transparent conductive film using same |
FR2998564A1 (en) * | 2012-11-23 | 2014-05-30 | Saint Gobain | SUBSTRATE WITH PARTIALLY METALLIC LAYER STACK, GLAZING, USE AND METHOD. |
JP2016012555A (en) * | 2014-06-02 | 2016-01-21 | Tdk株式会社 | Transparent conductive film and touch panel |
EP3300084A1 (en) * | 2015-12-11 | 2018-03-28 | TDK Corporation | Transparent conductor |
Non-Patent Citations (1)
Title |
---|
See also references of WO2021177124A1 * |
Also Published As
Publication number | Publication date |
---|---|
TW202200809A (en) | 2022-01-01 |
EP4116084A1 (en) | 2023-01-11 |
US20230119906A1 (en) | 2023-04-20 |
CN115210066A (en) | 2022-10-18 |
WO2021177124A1 (en) | 2021-09-10 |
KR20220131310A (en) | 2022-09-27 |
JP2021137993A (en) | 2021-09-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP4106437A4 (en) | Data transmission method and data transmission apparatus | |
EP4108455A4 (en) | Adhesive layer, laminate, optical laminate, method for producing optical laminate, and optical device | |
EP4099591A4 (en) | Data transmission method and apparatus | |
EP4116083A4 (en) | Optical laminate, article, and method for producing optical laminate | |
EP4161130A4 (en) | Data transmission method and apparatus | |
EP4203542A4 (en) | Data transmission method and apparatus | |
EP4116084A4 (en) | Electroconductive laminate, optical device in which same is used, and method for producing electroconductive laminate | |
EP4181433A4 (en) | Application management method and apparatus | |
EP4123467A4 (en) | Data transmission method and apparatus | |
EP3911006A4 (en) | Method and device used for duplicate data transmission | |
EP4221349A4 (en) | Data transmission method and apparatus | |
EP4175400A4 (en) | Data transmission method and apparatus | |
EP4096108A4 (en) | Data transmission method and apparatus | |
EP4129669A4 (en) | Multilayered film, method for producing same, and use thereof | |
EP4213514A4 (en) | Data transmission method and apparatus | |
EP4092925A4 (en) | Data transmission method and apparatus | |
EP4167626A4 (en) | Data transmission method and apparatus | |
EP4191910A4 (en) | Data transmission method and apparatus | |
EP4117338A4 (en) | Data transmission method and apparatus | |
EP4207084A4 (en) | 3d virtual-reality display device, head-mounted display, and 3d virtual-reality display method | |
EP4187844A4 (en) | Data transmission method and apparatus | |
EP4124162A4 (en) | Data transmission method and apparatus | |
EP4099597A4 (en) | Data transmission method and apparatus | |
EP4075896A4 (en) | Data transmission method and apparatus | |
EP4131438A4 (en) | Laminate, piezoelectric device using same, production method for laminate, and production method for piezoelectric device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20220929 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
DAV | Request for validation of the european patent (deleted) | ||
DAX | Request for extension of the european patent (deleted) | ||
A4 | Supplementary search report drawn up and despatched |
Effective date: 20240301 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: C23C 14/08 20060101ALI20240226BHEP Ipc: H01Q 1/36 20060101ALI20240226BHEP Ipc: C23C 14/18 20060101ALI20240226BHEP Ipc: C03C 17/36 20060101ALI20240226BHEP Ipc: G06F 3/041 20060101ALI20240226BHEP Ipc: B32B 7/025 20190101ALI20240226BHEP Ipc: C23C 14/06 20060101ALI20240226BHEP Ipc: B32B 9/00 20060101AFI20240226BHEP |