EP0475098A2 - X-ray microscope - Google Patents
X-ray microscope Download PDFInfo
- Publication number
- EP0475098A2 EP0475098A2 EP91113635A EP91113635A EP0475098A2 EP 0475098 A2 EP0475098 A2 EP 0475098A2 EP 91113635 A EP91113635 A EP 91113635A EP 91113635 A EP91113635 A EP 91113635A EP 0475098 A2 EP0475098 A2 EP 0475098A2
- Authority
- EP
- European Patent Office
- Prior art keywords
- ray
- microscope according
- source
- condenser
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
Definitions
- X-ray microscopes which differ more or less in their optical structure with regard to the beam source used, the optics for focusing the X-ray beam on the object to be examined and those for imaging the object on the imaging X-ray detector used.
- X-ray microscopes have been described in which mirror optics are used to image the object on the detector, for example Wolter optics that image the object with grazing incidence of the X-rays.
- the quality of the microscopic image generated with such microscopes is not particularly good, since the mirror optics are sometimes subject to considerable image errors.
- image errors - in the case of mirror optics that work under grazing incidence this is, for example, the so-called angular tangent error - limit the resolution of the optics aperture, which is possible in principle and which can be achieved with the microscope.
- zone plates are used both for focusing the X-radiation on the object and for imaging the object on the detector. Similar to very thin lenses, these zone plates allow a largely image-free and thus high-resolution image of the object. However, they have a significantly poorer efficiency than mirror optics. In practice, it is between 5% and 15%, i.e. only a maximum of 15% of the X-rays incident on the zone plate are used for the imaging.
- zone plate used as a condenser not only serves to focus the X-ray radiation on the object, but also acts as a monochromator and separates the monochromatic radiation required for high-resolution imaging from the more or less extensive wavelength range emitted by the X-ray source. This is done simply by means of a suitable pinhole on the optical axis, which has the effect that only one of the monochromatic images resulting from the wavelength dependence of the focal length of the zone plate on the optical axis passes through the diaphragm.
- the X-ray microscope described is relatively weak due to the use of zone plates with the mentioned low efficiency, so that long exposure times result, which e.g. can cause motion blur during exposure when recording live cells.
- One is therefore dependent on X-ray sources that are as intensive as possible.
- synchrotron radiation from electron storage rings is used almost exclusively for X-ray microscopy.
- this has the disadvantage that the X-ray microscope is not self-sufficient, i.e. the user is bound to one of the few electron storage rings in terms of space and the measurement time available to him.
- the so-called plasma focus source is also known as the X-ray source.
- X-ray sources for example described in DE-OS 33 32 711, do not emit X-rays continuously, but instead deliver individual short X-ray pulses which are followed by a relatively long dead time during which the capacitors of the X-ray source have to be recharged.
- the X-ray energy contained in a pulse is in many cases not sufficient,
- the available X-ray energy is optimally used.
- the use of mirror optics on the illumination side does not have a disadvantage, since the image errors of the mirror condenser are significantly less critical when illuminated than on the imaging side of the microscope.
- 20 to 30 times the light gain is achieved compared to a zone plate on the lighting side.
- the mirror condenser cannot be used as a monochromator, this is not necessary either, since X-ray sources such as, for example the plasma focus already provides a sufficiently intense monochromatic line radiation.
- the zone plate with its excellent imaging properties can be retained on the imaging side.
- the mirror condenser can be a segment of an ellipsoid that focuses the X-ray radiation on the object with grazing incidence. It is expedient if the mirror condenser is coated with a multilayer to increase the reflectivity. In this way, the efficiency of the microscope can be further improved.
- the zone plate used for imaging the object on the detector is expediently a phase zone plate which has a higher efficiency than an amplitude zone plate.
- the condenser images the X-ray source directly onto the object in the manner of the so-called “critical lighting”.
- critical lighting which is usually used in microscopy
- the mirror condenser is protected by one or more foils through which the X-ray beam passes.
- the sensitive mirror surfaces can be shielded against dust and dirt from the environment, possibly also against vapors from the plasma focus source, which would otherwise be deposited on the optical surfaces of the condenser and reduce its efficiency.
- Either a photo plate or an X-ray sensitive CCD camera can be used as the detector.
- An image memory is expediently connected downstream of the camera, into which the images of the objects to be examined, each generated with an x-ray pulse, are then read and further processed, for example, using the known methods of image processing.
- (1) denotes the X-ray source.
- This X-ray source is a plasma focus source of the type as described in DE-OS 33 32 711.
- This plasma focus source briefly provides a point-like plasma which emits X-rays with a dominant emission wavelength on the Lyman-a line of the six-fold ionized nitrogen.
- the plasma focus source (1) is operated with a capacitor bank (2) which is electrically charged in the period between the discharges.
- the X-ray radiation emanating from the plasma focus (1 a) is focused on the object placed on a slide (4) with the aid of a mirror condenser (3).
- the mirror condenser (3) has the shape of an ellipsoid of revolution and reflects the X-rays striking its mirror surfaces under grazing incidence.
- the mirror condenser (3) is closed at both ends by a film (15) and (16), which protects the sensitive mirror surfaces against dirt.
- the foils are made of a material that is as weakly absorbent as possible in the spectral range of the X-rays, e.g. Made polyimide.
- micro zone plate (5) is arranged above the object level.
- This micro zone plate represents the actual imaging optics of the X-ray microscope. Its distance from the object plane is greatly exaggerated in the representation. In fact, the micro zone plate has a diameter of approximately 20-50 ⁇ m and is only a few tenths of a millimeter above the object to be examined.
- the micro zone plate (5) images the object in a greatly enlarged manner on a detector (6).
- the detector (6) is a solid-state camera, such as that which can be obtained from Valvo under the name NXA 1011, and which is sensitized to X-rays by removing the cover glass and the photosensitive surface with a fluorescent dye such as Gd 2 0 2 S: Tb was occupied.
- the CCD camera (6) is attached to a carrier (7) which, as indicated by the arrow, can be moved along the optical axis with the aid of an adjusting device (8) for the purpose of focusing.
- the components of the X-ray microscope described above are located in a cylindrical column (9) built onto the capacitor bank (2), which is under vacuum or with a gas which is only weakly absorbent in the area of the X-ray radiation used, e.g. Helium or hydrogen is filled.
- a gas which is only weakly absorbent in the area of the X-ray radiation used e.g. Helium or hydrogen is filled.
- the signal lines of the CCD camera (6) are passed through the setting device (8) and connected to an electronic unit (10), which reads out the image from the CCD camera (6).
- This camera electronics (10) is synchronized via a control unit (11) with the electronics (not shown) for the operation of the plasma focus source in such a way that after each x-ray pulse emitted by the plasma focus source (1) an image is drawn in and stored in an image memory (13) .
- the images stored there can then be viewed using a monitor (12) which is also connected to the electronic unit (10).
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Liquid Crystal Substances (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
Description
Es sind verschiedenartige Röntgenmikroskope bekannt, die sich in ihrem optischen Aufbau hinsichtlich der benutzten Strahlquelle, der Optik zur Fokussierung des Röntgenstrahls auf das zu untersuchende Objekt und die zur Abbildung des Objekts auf den verwendeten bildgebenden Röntgendetektor mehr oder weniger stark unterscheiden.Various types of X-ray microscopes are known which differ more or less in their optical structure with regard to the beam source used, the optics for focusing the X-ray beam on the object to be examined and those for imaging the object on the imaging X-ray detector used.
So sind beispielsweise Röntgenmikroskope beschrieben worden, in denen Spiegeloptik für die Abbildung des Objekts auf den Detektor benutzt wird zum Beispiel eine Wolter-Optik, die das Objekt unter streifendem Einfall der Röntgenstrahlung abbildet. Die Qualität des mit solchen Mikroskopen erzeugten mikroskopischen Bildes ist jedoch nicht sonderlich gut, da die Spiegeloptiken zum Teil mit erheblichen Bildfehlern behaftet sind. Diese Bildfehler - bei Spiegeloptiken, die unter streifendem Einfall arbeiten, ist das beispielsweise der sogenannte Winkeltangentenfehler - begrenzen die von der Apertur der Optik vorgegebene, prinzipiell mögliche Auflösung, die sich mit dem Mikroskop erzielen läßt.For example, X-ray microscopes have been described in which mirror optics are used to image the object on the detector, for example Wolter optics that image the object with grazing incidence of the X-rays. However, the quality of the microscopic image generated with such microscopes is not particularly good, since the mirror optics are sometimes subject to considerable image errors. These image errors - in the case of mirror optics that work under grazing incidence, this is, for example, the so-called angular tangent error - limit the resolution of the optics aperture, which is possible in principle and which can be achieved with the microscope.
Es sind auch Röntgenmikroskope beschrieben, in denen sowohl zur Fokussierung der Röntgenstrahlung auf das Objekt als auch zur Abbildung des Objekts auf den Detektor sogenannte Zonenplatten Verwendung finden. Diese Zonenplatten ermöglichen ähnlich sehr dünnen Linsen eine weitgehend bildfehlerfreie und damit hochaufgelöste Abbildung des Objekts. Sie haben jedoch einen bedeutend schlechteren Wirkungsgrad als Spiegeloptiken. Er liegt in der Praxis zwischen 5% und 15%, d.h. es werden nur maximal 15% der auf die Zonenplatte auftreffenden Röntgenstrahlung für die Abbildung benutzt.X-ray microscopes are also described in which so-called zone plates are used both for focusing the X-radiation on the object and for imaging the object on the detector. Similar to very thin lenses, these zone plates allow a largely image-free and thus high-resolution image of the object. However, they have a significantly poorer efficiency than mirror optics. In practice, it is between 5% and 15%, i.e. only a maximum of 15% of the X-rays incident on the zone plate are used for the imaging.
Eine Übersicht über die verschiedenen Röntgenmikroskope gibt das Buch mit dem Titel "X-ray microscopy", Herausgeber G. Schmahl und D. Rudolph, Springer Series in Optical Science, Band 43, 1984.The book entitled "X-ray microscopy", edited by G. Schmahl and D. Rudolph, Springer Series in Optical Science, volume 43, 1984 provides an overview of the various X-ray microscopes.
In diesem Buch ist auf Seite 192 ff ein Röntgenmikroskop beschrieben, bei dem sowohl der Kondensor als auch das Objektiv als Zonenplatte ausgebildet ist. Die als Kondensor verwendete Zonenplatte dient dabei nicht nur zur Fokussierung der Röntgenstrahlung auf das Objekt, sondern wirkt außerdem als Monochromator und sondert die für eine hochauflösende Abbildung erforderliche monochromatische Strahlung aus den von der Röntgenquelle abgegebenen mehr oder weniger ausgedehnten Wellenlängenbereich aus. Dies geschieht einfach durch eine geeignete Lochblende auf der optischen Achse, die bewirkt, daß nur eines der infolge der Wellenlängenabhängigkeit der Brennweite der Zonenplatte auf der optischen Achse entstehenden monochromatischen Bilder durch die Blende hindurchtritt.In this book, an X-ray microscope is described on page 192 ff, in which both the condenser and the objective are designed as zone plates. The zone plate used as a condenser not only serves to focus the X-ray radiation on the object, but also acts as a monochromator and separates the monochromatic radiation required for high-resolution imaging from the more or less extensive wavelength range emitted by the X-ray source. This is done simply by means of a suitable pinhole on the optical axis, which has the effect that only one of the monochromatic images resulting from the wavelength dependence of the focal length of the zone plate on the optical axis passes through the diaphragm.
Das beschriebene Röntgenmikroskop ist wegen der Verwendung von Zonenplatten mit dem genannten niedrigen Wirkungsgrad relativ lichtschwach, so daß sich lange Belichtungszeiten ergeben, was z.B. bei der Aufnahme von lebenden Zellen zu Bewegungsunschärfe während der Belichtung führen kann. Man ist deshalb auf möglichst intensive Röntgenstrahlquellen angewiesen.The X-ray microscope described is relatively weak due to the use of zone plates with the mentioned low efficiency, so that long exposure times result, which e.g. can cause motion blur during exposure when recording live cells. One is therefore dependent on X-ray sources that are as intensive as possible.
Für die Röntgenmikroskopie wird deshalb fast ausschließlich Synchrotronstrahlung von Elektronenspeicherringen verwendet. Dies hat jedoch den Nachteil, daß das Röntgenmikroskop nicht autark ist, d.h. der Benutzer ist räumlich und hinsichtlich der ihm zur Verfügung stehenden Meßzeit an einen der wenigen Elektronenspeicherringe gebunden.For this reason, synchrotron radiation from electron storage rings is used almost exclusively for X-ray microscopy. However, this has the disadvantage that the X-ray microscope is not self-sufficient, i.e. the user is bound to one of the few electron storage rings in terms of space and the measurement time available to him.
Als Röntgenstrahlquelle ist weiterhin die sogenannte Plasmafokusquelle bekannt. Solche beispielsweise in der DE-OS 33 32 711 beschriebenen Röntgenquellen geben jedoch Röntgenstrahlung nicht kontinuierlich ab, sondern liefern einzelne kurze Röntgenpulse, denen sich eine relativ lange Totzeit anschließt, während der die Kondensatoren der Röntgenstrahlquelle wieder aufgeladen werden müssen. Die in einem Puls enthaltende Röntgenenergie ist in vielen Fällen nicht ausreichend,The so-called plasma focus source is also known as the X-ray source. However, such X-ray sources, for example described in DE-OS 33 32 711, do not emit X-rays continuously, but instead deliver individual short X-ray pulses which are followed by a relatively long dead time during which the capacitors of the X-ray source have to be recharged. The X-ray energy contained in a pulse is in many cases not sufficient,
Aus dem Vorgesagten ergibt sich, daß ein autarkes, gleichzeitig hochauflösendes und lichtstarkes Röntgenmikroskop bisher nicht existiert. Für biologische Anwendungen wird aber gerade dies u.a. wegen der dabei geforderten kurzen Belichtungszeiten für die Untersuchung von lebenden Zellen gefordert.It follows from the foregoing that an autarkic, simultaneously high-resolution and bright X-ray microscope does not yet exist. For biological applications, this is precisely what because of the short exposure times required for the examination of living cells.
Gemäß der Erfindung wird nun diese Aufgabe durch die Kombination von den im Anspruch 1 angegebenen Maßnahmen, d.h. durch ein Röntgenmikroskop mit folgendem Aufbau gelöst: Es besitzt
- - eine gepulste Röntgenquelle, die eine intensive Linienstrahlung liefert,
- - einen Spiegelkondensor, der die Strahlung der Röntgenquelle auf das zu untersuchende Objekt fokussiert,
- - eine als Zonenplatte ausgebildete Röntgenoptik, die das Objekt mit hoher Auflösung auf einen Röntgendetektor abbildet.
- - a pulsed X-ray source that delivers intense line radiation,
- a mirror condenser that focuses the radiation from the X-ray source onto the object to be examined,
- X-ray optics designed as a zone plate, which images the object with high resolution on an X-ray detector.
Durch die Kombination der gepulsten Röntgenquelle, die intensive Linienstrahlung liefert, mit einem Spiegelkondensor wird die zur Verfügung stehende Röntgenenergie optimal genutzt. Hierbei wirkt sich die Verwendung von Spiegeloptik auf der Beleuchtungsseite nicht nachteilig aus, da einmal die Bildfehler des Spiegelkondensors bei der Beleuchtung bedeutend weniger kritisch als auf der Abbildungsseite des Mikroskops sind. Hingegen wird im Vergleich zu einer Zonenplatte auf der Beleuchtungsseite ein 20 bis 30facher Lichtgewinn erzielt.By combining the pulsed X-ray source, which delivers intensive line radiation, with a mirror condenser, the available X-ray energy is optimally used. Here, the use of mirror optics on the illumination side does not have a disadvantage, since the image errors of the mirror condenser are significantly less critical when illuminated than on the imaging side of the microscope. On the other hand, 20 to 30 times the light gain is achieved compared to a zone plate on the lighting side.
Zwar kann der Spiegelkondensor nicht als Monochromator verwendet werden, dies ist jedoch auch nicht erforderlich, da Röntgenquellen wie z.B. der Plasmafokus bereits eine ausreichend intensive monochromatische Linienstrahlung liefern.Although the mirror condenser cannot be used as a monochromator, this is not necessary either, since X-ray sources such as, for example the plasma focus already provides a sufficiently intense monochromatic line radiation.
Aufgrund des genannten beleuchtungsseitig erzielten Lichtgewinns kann auf der Abbildungsseite die Zonenplatte mit ihren ausgezeichneten Abbildungseigenschaften beibehalten werden.Because of the light gain achieved on the lighting side, the zone plate with its excellent imaging properties can be retained on the imaging side.
Mit der beschriebenen Kombination hat man erstmals genügend Röntgenenergie zur Verfügung, um biologische Objekte sozusagen "mit einem Schuß" abzubilden, d.h. die in einem Röntgenpuls enthaltene Röntgenenergie wird optimal genutzt und reicht zur Aufnahme eines Röntgenbildes von biologischen Objekten aus.With the combination described, enough X-ray energy is available for the first time to image biological objects, so to speak, "with one shot", i.e. the X-ray energy contained in an X-ray pulse is optimally used and is sufficient to take an X-ray image of biological objects.
Beispielsweise kann der Spiegelkondensor ein Segment eines Ellipsoids sein, das die Röntgenstrahlung unter streifendem Einfall auf das Objekt fokussiert. Es ist zweckmäßig, wenn der Spiegelkondensor zur Erhöhung des Reflektionsvermögens mit einer Vielfachschicht belegt ist. Hierdurch läßt sich der Wirkungsgrad des Mikroskops nochmals verbessern.For example, the mirror condenser can be a segment of an ellipsoid that focuses the X-ray radiation on the object with grazing incidence. It is expedient if the mirror condenser is coated with a multilayer to increase the reflectivity. In this way, the efficiency of the microscope can be further improved.
Die für die Abbildung des Objektes auf den Detektor benutzte Zonenplatte ist zweckmäßig eine Phasenzonenplatte, die einen höheren Wirkungsgrad als eine Amplitudenzonenplatte hat.The zone plate used for imaging the object on the detector is expediently a phase zone plate which has a higher efficiency than an amplitude zone plate.
Es ist weiterhin zweckmäßig, wenn der Kondensor die Röntgenstrahlquelle direkt auf das Objekt abbildet nach Art der sogenannten "kritischen Beleuchtung". Im Gegensatz zu der sonst üblicherweise in der Mikroskopie verwendeten sogenannten "Köhlerschen Beleuchtung" hat das den Vorteil, daß man mit einer einzigen Kondensoroptik auskommt, d.h. der Wirkungsgrad auf der Beleuchtungsseite optimiert ist.It is furthermore expedient if the condenser images the X-ray source directly onto the object in the manner of the so-called "critical lighting". In contrast to the so-called "Köhler illumination", which is usually used in microscopy, this has the advantage that one can manage with a single condenser lens, i.e. the efficiency on the lighting side is optimized.
Es ist vorteilhaft, wenn der Spiegelkondensor durch eine oder mehrere Folien geschützt ist, durch die der Röntgenstrahl hindurchtritt. Mit diesen Folien lassen sich die empfindlichen Spiegelflächen abschirmen gegen Staub und Schmutz aus der Umgebung, eventuell auch gegen Dämpfe aus der Plasmafokusquelle, die sich andernfalls auf den optischen Flächen des Kondensors niederschlagen und seinen Wirkungsgrad verschlechtern.It is advantageous if the mirror condenser is protected by one or more foils through which the X-ray beam passes. With these foils, the sensitive mirror surfaces can be shielded against dust and dirt from the environment, possibly also against vapors from the plasma focus source, which would otherwise be deposited on the optical surfaces of the condenser and reduce its efficiency.
Als Detektor kann entweder eine Fotoplatte oder eine röntgenempfindliche CCD-Kamera verwendet werden. Der Kamera wird zweckmäßig ein Bildspeicher nachgeschaltet, in den dann die jeweils mit einem Röntgenpuls erzeugten Bilder der zu untersuchenden Objekte eingelesen und beispielsweise mit den bekannten Methoden der Bildverarbeitung weiter verarbeitet werden.Either a photo plate or an X-ray sensitive CCD camera can be used as the detector. An image memory is expediently connected downstream of the camera, into which the images of the objects to be examined, each generated with an x-ray pulse, are then read and further processed, for example, using the known methods of image processing.
Weitere Vorteile der Erfindung werden anhand des nachstehend in der einzigen Figur dargestellten Ausführungsbeispiels der Erfindung beschrieben.Further advantages of the invention are described with reference to the exemplary embodiment of the invention illustrated below in the single figure.
In der Figur ist das neue Röntgenmikroskop in einer stark vereinfachten, zum Teil perspektivischen Prinzipskizze dargestellt.In the figure, the new X-ray microscope is shown in a very simplified, partly perspective schematic diagram.
In dem Mikroskop ist mit (1) die Röntgenquelle bezeichnet. Bei dieser Röntgenquelle handelt es sich um eine Plasmafokusquelle des Typs wie sie in der DE-OS 33 32 711 beschrieben ist. Diese Plasmafokusquelle liefert kurzzeitig ein punktförmiges Plasma, das Röntgenstrahlung mit einer dominanten Emissionswellenlänge auf der Lyman-a-Linie des sechsfach ionisierten Stickstoffs emittiert. Betrieben wird die Plasmafokusquelle (1) mit einer Kondensatorbank (2), die in der Zeit zwischen den Entladungen elektrisch aufgeladen wird.In the microscope, (1) denotes the X-ray source. This X-ray source is a plasma focus source of the type as described in DE-OS 33 32 711. This plasma focus source briefly provides a point-like plasma which emits X-rays with a dominant emission wavelength on the Lyman-a line of the six-fold ionized nitrogen. The plasma focus source (1) is operated with a capacitor bank (2) which is electrically charged in the period between the discharges.
Die von dem Plasmafokus (1 a) ausgehende Röntgenstrahlung wird mit Hilfe eines Spiegelkondensors (3) auf das auf einen Objektträger (4) aufgelegte Objekt fokussiert. Der Spiegelkondensor (3) hat die Form eines Rotationsellipsoides und reflektiert die auf seine Spiegelflächen auffallende Röntgenstrahlung unter streifendem Einfall. An beiden Enden ist der Spiegelkondensor (3) durch je eine Folie (15) und (16) abgeschlossen, die die empfindlichen Spiegeloberflächen gegen Verschmutzung schützt. Die Folien sind aus einem im Spektralbereich der Röntgenstrahlung möglichst schwach absorbierenden Material wie z.B. Polyimid hergestellt.The X-ray radiation emanating from the plasma focus (1 a) is focused on the object placed on a slide (4) with the aid of a mirror condenser (3). The mirror condenser (3) has the shape of an ellipsoid of revolution and reflects the X-rays striking its mirror surfaces under grazing incidence. The mirror condenser (3) is closed at both ends by a film (15) and (16), which protects the sensitive mirror surfaces against dirt. The foils are made of a material that is as weakly absorbent as possible in the spectral range of the X-rays, e.g. Made polyimide.
Über der Objektebene ist eine sogenannte Mikrozonenplatte (5) angeordnet. Diese Mikrozonenplatte stellt die eigentliche Abbildungsoptik des Röntgenmikroskop dar. Ihr Abstand von der Objektebene ist in der Darstellung stark übertrieben. Tatsächlich besitzt die Mikrozonenplatte etwa einen Durchmesser von 20 - 50 um und befindet sich nur wenige zehntel mm über dem zu untersuchenden Objekt.A so-called micro zone plate (5) is arranged above the object level. This micro zone plate represents the actual imaging optics of the X-ray microscope. Its distance from the object plane is greatly exaggerated in the representation. In fact, the micro zone plate has a diameter of approximately 20-50 μm and is only a few tenths of a millimeter above the object to be examined.
Die Mikrozonenplatte (5) bildet das Objekt stark vergrößert auf einen Detektor (6) ab. Der Detektor (6) ist eine Festkörperkamera wie sie beispielweise unter der Bezeichnung NXA 1011 von der Firma Valvo bezogen werden kann, und die für Röntgenstrahlen sensibilisiert ist, indem das Deckglas entfernt und die photoempfindliche Fläche mit einem Fluoreszenzfarbstoff wie z.B. Gd202S:Tb belegt wurde.The micro zone plate (5) images the object in a greatly enlarged manner on a detector (6). The detector (6) is a solid-state camera, such as that which can be obtained from Valvo under the name NXA 1011, and which is sensitized to X-rays by removing the cover glass and the photosensitive surface with a fluorescent dye such as Gd 2 0 2 S: Tb was occupied.
Die CCD-Kamera (6) ist an einem Träger (7) befestigt, der wie durch den Pfeil angedeutet entlang der optischen Achse mit Hilfe einer Einstellvorrichtung (8) zum Zwecke der Fokussierung verschoben werden kann.The CCD camera (6) is attached to a carrier (7) which, as indicated by the arrow, can be moved along the optical axis with the aid of an adjusting device (8) for the purpose of focusing.
Die vorstehend beschriebenen Bauteile des Röntgenmikroskops befinden sich in einer auf die Kondensatorbank (2) aufgebauten zylindrischen Säule (9), die unter Vakuum steht oder mit einem im Bereich der verwendeten Röntgenstrahlung nur schwach absorbierenden Gas wie z.B. Helium oder Wasserstoff gefüllt ist.The components of the X-ray microscope described above are located in a cylindrical column (9) built onto the capacitor bank (2), which is under vacuum or with a gas which is only weakly absorbent in the area of the X-ray radiation used, e.g. Helium or hydrogen is filled.
Die Signalleitungen der CCD-Kamera (6) sind durch die Einstellvorrichtung (8) hindurchgeführt und an eine Elektronikeinheit (10) angeschlossen, die das Auslesen des Bildes aus der CCD-Kamera (6) besorgt. Diese Kameraelektronik (10) ist über eine Steuereinheit (11) mit der nicht näher dargestellten Elektronik für den Betrieb der Plasmafokusquelle synchronisiert derart, daß nach jedem von der Plasmafokusquelle (1) abgegebenen Röntgenpuls jeweils ein Bild eingezogen und in einem Bildspeicher (13) abgelegt wird. Die dort abgespeicherten Bilder können dann mittels eines ebenfalls an die Elektronikeinheit (10) angeschlossenen Monitors (12) betrachtet werden.The signal lines of the CCD camera (6) are passed through the setting device (8) and connected to an electronic unit (10), which reads out the image from the CCD camera (6). This camera electronics (10) is synchronized via a control unit (11) with the electronics (not shown) for the operation of the plasma focus source in such a way that after each x-ray pulse emitted by the plasma focus source (1) an image is drawn in and stored in an image memory (13) . The images stored there can then be viewed using a monitor (12) which is also connected to the electronic unit (10).
Es ist klar, daß im Rahmen der Erfindung Abwandlungen von dem hier im Detail beschriebenen Aufbau möglich sind. So kann anstelle der CCD-Kamera (7) auch eine Röntgenfilmkassette verwendet sein. Weiterhin ist es möglich, anstelle des unter streifendem Einfall arbeitenden Spiegelkondensors in Form eines Rotationsellipsoides andere Spiegeloptiken, beispielsweise eine Spiegelanordnung vom sogenannten Schwarzschildtyp zu verwenden.It is clear that modifications of the structure described in detail here are possible within the scope of the invention. An X-ray film cassette can also be used instead of the CCD camera (7). Furthermore, it is possible to use other mirror optics, for example a mirror arrangement of the so-called Schwarzschild type, instead of the mirror condenser operating in grazing incidence in the form of an ellipsoid of revolution.
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE4027285A DE4027285A1 (en) | 1990-08-29 | 1990-08-29 | X-RAY MICROSCOPE |
DE4027285 | 1990-08-29 |
Publications (3)
Publication Number | Publication Date |
---|---|
EP0475098A2 true EP0475098A2 (en) | 1992-03-18 |
EP0475098A3 EP0475098A3 (en) | 1992-07-22 |
EP0475098B1 EP0475098B1 (en) | 1996-02-07 |
Family
ID=6413137
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP91113635A Expired - Lifetime EP0475098B1 (en) | 1990-08-29 | 1991-08-14 | X-ray microscope |
Country Status (5)
Country | Link |
---|---|
US (1) | US5222113A (en) |
EP (1) | EP0475098B1 (en) |
JP (1) | JP3133103B2 (en) |
AT (1) | ATE134065T1 (en) |
DE (2) | DE4027285A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995008174A1 (en) * | 1993-09-15 | 1995-03-23 | Carl-Zeiss-Stiftung Handelnd Als Carl Zeiss | Phase contrast x-ray mocroscope |
WO1997025723A2 (en) * | 1996-01-12 | 1997-07-17 | Niemann, Bastian | X-ray microscope with zone plates |
US6128364A (en) * | 1996-01-10 | 2000-10-03 | Leica Microsystems Lithography Gmbh | Condenser-monochromator arrangement for X-radiation |
WO2009030390A1 (en) * | 2007-09-04 | 2009-03-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device and method for xuv microscopy |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5528646A (en) * | 1992-08-27 | 1996-06-18 | Olympus Optical Co., Ltd. | Sample vessel for X-ray microscopes |
US6091796A (en) * | 1994-11-23 | 2000-07-18 | Thermotrex Corporation | Scintillator based microscope |
US5965065A (en) * | 1994-12-05 | 1999-10-12 | Powell; Stephen Forbes | Method of filtering x-rays |
CA2285296C (en) * | 1997-04-08 | 2007-12-04 | Stephen William Wilkins | High resolution x-ray imaging of very small objects |
GB9815968D0 (en) * | 1998-07-23 | 1998-09-23 | Bede Scient Instr Ltd | X-ray focusing apparatus |
DE19956782C2 (en) * | 1999-11-25 | 2001-11-15 | Lutz Kipp | Optical focusing element, measuring system and apparatus with such an optical element and use of the same |
EP1126477A3 (en) * | 2000-02-14 | 2003-06-18 | Leica Microsystems Lithography GmbH | Method for structure investigation in a semiconductor substrate |
US6195272B1 (en) | 2000-03-16 | 2001-02-27 | Joseph E. Pascente | Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses |
JP4220170B2 (en) * | 2002-03-22 | 2009-02-04 | 浜松ホトニクス株式会社 | X-ray image magnifier |
EP1455365A3 (en) * | 2002-05-10 | 2014-12-17 | Carl Zeiss SMS GmbH | Reflective X-ray microscope and inspection system for examining objects with wavelengths 100nm |
US7245696B2 (en) * | 2002-05-29 | 2007-07-17 | Xradia, Inc. | Element-specific X-ray fluorescence microscope and method of operation |
AU2003256831A1 (en) * | 2002-08-02 | 2004-02-23 | X-Ray Optical Systems, Inc. | An optical device for directing x-rays having a plurality of optical crystals |
US7365909B2 (en) * | 2002-10-17 | 2008-04-29 | Xradia, Inc. | Fabrication methods for micro compounds optics |
DE10254026C5 (en) * | 2002-11-20 | 2009-01-29 | Incoatec Gmbh | Reflector for X-radiation |
US7072442B1 (en) * | 2002-11-20 | 2006-07-04 | Kla-Tencor Technologies Corporation | X-ray metrology using a transmissive x-ray optical element |
US7119953B2 (en) * | 2002-12-27 | 2006-10-10 | Xradia, Inc. | Phase contrast microscope for short wavelength radiation and imaging method |
DE10319269A1 (en) * | 2003-04-25 | 2004-11-25 | Carl Zeiss Sms Gmbh | Imaging system for a microscope based on extremely ultraviolet (EUV) radiation |
DE10334169A1 (en) | 2003-07-26 | 2005-02-24 | Bruker Axs Gmbh | Encapsulated x-ray mirror |
US7170969B1 (en) * | 2003-11-07 | 2007-01-30 | Xradia, Inc. | X-ray microscope capillary condenser system |
WO2005094318A2 (en) * | 2004-03-29 | 2005-10-13 | Jmar Research, Inc. | Morphology and spectroscopy of nanoscale regions using x-rays generated by laser produced plasma |
US7302043B2 (en) * | 2004-07-27 | 2007-11-27 | Gatan, Inc. | Rotating shutter for laser-produced plasma debris mitigation |
US7452820B2 (en) * | 2004-08-05 | 2008-11-18 | Gatan, Inc. | Radiation-resistant zone plates and method of manufacturing thereof |
US7466796B2 (en) * | 2004-08-05 | 2008-12-16 | Gatan, Inc. | Condenser zone plate illumination for point X-ray sources |
US7231017B2 (en) * | 2005-07-27 | 2007-06-12 | Physical Optics Corporation | Lobster eye X-ray imaging system and method of fabrication thereof |
CN101356589B (en) | 2005-08-01 | 2013-02-27 | 纽约州立大学研究基金会 | X-ray imaging systems employing point-focusing, curved monochromating optics |
US20070108387A1 (en) * | 2005-11-14 | 2007-05-17 | Xradia, Inc. | Tunable x-ray fluorescence imager for multi-element analysis |
DE102005056404B4 (en) * | 2005-11-23 | 2013-04-25 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | X-ray microscope with condenser monochromator arrangement of high spectral resolution |
US7499521B2 (en) * | 2007-01-04 | 2009-03-03 | Xradia, Inc. | System and method for fuel cell material x-ray analysis |
US9291578B2 (en) | 2012-08-03 | 2016-03-22 | David L. Adler | X-ray photoemission microscope for integrated devices |
US9129715B2 (en) | 2012-09-05 | 2015-09-08 | SVXR, Inc. | High speed x-ray inspection microscope |
US20160086681A1 (en) * | 2014-09-24 | 2016-03-24 | Carl Zeiss X-ray Microscopy, Inc. | Zone Plate and Method for Fabricating Same Using Conformal Coating |
CN114424054B (en) | 2019-06-24 | 2024-03-22 | Sms集团有限公司 | Apparatus and method for determining material properties of polycrystalline product |
DE102019124919B4 (en) | 2019-09-17 | 2021-08-26 | Ri Research Instruments Gmbh | Microscopic system for testing structures and defects on EUV lithography photomasks |
JP7572033B2 (en) * | 2020-10-23 | 2024-10-23 | 株式会社リガク | Imaging X-ray microscope |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1987000644A1 (en) * | 1985-07-19 | 1987-01-29 | Shimadzu Corporation | Soft x-ray lithographic system |
JPH0371100A (en) * | 1989-08-09 | 1991-03-26 | Nikon Corp | Image formation type soft x-ray microscope device |
EP0459833A2 (en) * | 1990-06-01 | 1991-12-04 | Canon Kabushiki Kaisha | X-ray microscope |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3332711A1 (en) * | 1983-09-10 | 1985-03-28 | Fa. Carl Zeiss, 7920 Heidenheim | DEVICE FOR GENERATING A PLASMA SOURCE WITH HIGH RADIATION INTENSITY IN THE X-RAY AREA |
DE3642457A1 (en) * | 1986-12-12 | 1988-06-30 | Zeiss Carl Fa | ROENTGEN MICROSCOPE |
US4912737A (en) * | 1987-10-30 | 1990-03-27 | Hamamatsu Photonics K.K. | X-ray image observing device |
JP2883122B2 (en) * | 1989-10-20 | 1999-04-19 | オリンパス光学工業株式会社 | X-ray microscope |
-
1990
- 1990-08-29 DE DE4027285A patent/DE4027285A1/en not_active Withdrawn
-
1991
- 1991-08-14 DE DE59107380T patent/DE59107380D1/en not_active Expired - Fee Related
- 1991-08-14 EP EP91113635A patent/EP0475098B1/en not_active Expired - Lifetime
- 1991-08-14 AT AT91113635T patent/ATE134065T1/en not_active IP Right Cessation
- 1991-08-27 JP JP03214876A patent/JP3133103B2/en not_active Expired - Fee Related
- 1991-08-29 US US07/751,792 patent/US5222113A/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1987000644A1 (en) * | 1985-07-19 | 1987-01-29 | Shimadzu Corporation | Soft x-ray lithographic system |
JPH0371100A (en) * | 1989-08-09 | 1991-03-26 | Nikon Corp | Image formation type soft x-ray microscope device |
EP0459833A2 (en) * | 1990-06-01 | 1991-12-04 | Canon Kabushiki Kaisha | X-ray microscope |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 15, no. 234 (P-1215)14. Juni 1991 & JP-03 071 100 (NIKON CORP.) 26. März 1991 * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1995008174A1 (en) * | 1993-09-15 | 1995-03-23 | Carl-Zeiss-Stiftung Handelnd Als Carl Zeiss | Phase contrast x-ray mocroscope |
US6128364A (en) * | 1996-01-10 | 2000-10-03 | Leica Microsystems Lithography Gmbh | Condenser-monochromator arrangement for X-radiation |
WO1997025723A2 (en) * | 1996-01-12 | 1997-07-17 | Niemann, Bastian | X-ray microscope with zone plates |
WO1997025723A3 (en) * | 1996-01-12 | 1997-10-02 | Niemann Bastian | X-ray microscope with zone plates |
WO2009030390A1 (en) * | 2007-09-04 | 2009-03-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Device and method for xuv microscopy |
Also Published As
Publication number | Publication date |
---|---|
DE4027285A1 (en) | 1992-03-05 |
JP3133103B2 (en) | 2001-02-05 |
EP0475098A3 (en) | 1992-07-22 |
JPH04262300A (en) | 1992-09-17 |
ATE134065T1 (en) | 1996-02-15 |
US5222113A (en) | 1993-06-22 |
EP0475098B1 (en) | 1996-02-07 |
DE59107380D1 (en) | 1996-03-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0475098B1 (en) | X-ray microscope | |
EP0116321B1 (en) | Infrared spectrometer | |
DE4432811B4 (en) | Phase-contrast X-ray microscope | |
DE10156275B4 (en) | Detector arrangement and detection method | |
DE102009029831A1 (en) | Apparatus and method for multi-photon fluorescence microscopy for obtaining information from biological tissue | |
DE3307745A1 (en) | GRID ELECTRON MICROSCOPE | |
US5912939A (en) | Soft x-ray microfluoroscope | |
DE2909064A1 (en) | ROENTGEN LIGHTING ARRANGEMENT | |
DE102004053730B4 (en) | Method and arrangement for the suppression of false light | |
WO1998035214A9 (en) | Soft x-ray microfluoroscope | |
DE102019124919A1 (en) | Microscopic system for testing structures and defects on EUV lithography photomasks | |
DE102013107736A1 (en) | X-ray inspection device for material testing and method for generating high-resolution projections of a test specimen by means of X-rays | |
DE1027842B (en) | Device for the roentgenoscopic display of sectional images | |
DE102011016058B4 (en) | Method and device for adjusting properties of a beam of high-energy radiation emitted from a plasma | |
EP1691215B1 (en) | Method and device for reading X-Ray exposures stored in storage phosphor layers | |
DE2742264C3 (en) | Method for imaging an object with low magnification by means of a particle beam device, in particular an electron microscope and particle beam device for carrying out the method | |
DE69403129T2 (en) | X-ray analyzer | |
DE2823458A1 (en) | OPTICAL DEVICE FOR CHANGING THE DIRECTION OF A LIGHT BEAM | |
DE2640260C3 (en) | Transmission scanning particle beam microscope | |
DE1204350B (en) | electron microscope | |
DE102020207566A1 (en) | Device and method for characterizing a mask for microlithography | |
DE1058166B (en) | electron microscope | |
WO2009146787A1 (en) | Device for reading radiation image-imaging plates | |
JP5759257B2 (en) | X-ray equipment | |
DE102007041939A1 (en) | Apparatus and method for XUV microscopy |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT CH DE FR GB LI NL SE |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT CH DE FR GB LI NL SE |
|
17P | Request for examination filed |
Effective date: 19930113 |
|
17Q | First examination report despatched |
Effective date: 19940727 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT CH DE FR GB LI NL SE |
|
REF | Corresponds to: |
Ref document number: 134065 Country of ref document: AT Date of ref document: 19960215 Kind code of ref document: T |
|
REF | Corresponds to: |
Ref document number: 59107380 Country of ref document: DE Date of ref document: 19960321 |
|
ET | Fr: translation filed | ||
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 19960417 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed | ||
REG | Reference to a national code |
Ref country code: GB Ref legal event code: IF02 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20080813 Year of fee payment: 18 Ref country code: DE Payment date: 20080822 Year of fee payment: 18 Ref country code: CH Payment date: 20080814 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: AT Payment date: 20080814 Year of fee payment: 18 Ref country code: FR Payment date: 20080813 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20080821 Year of fee payment: 18 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: SE Payment date: 20080815 Year of fee payment: 18 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL Ref country code: NL Ref legal event code: V1 Effective date: 20100301 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20090814 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090831 Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090831 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20100430 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090814 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100301 Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090831 Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20100302 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090814 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20090815 |