DE69834521D1 - Löthöckererzeugung - Google Patents
LöthöckererzeugungInfo
- Publication number
- DE69834521D1 DE69834521D1 DE69834521T DE69834521T DE69834521D1 DE 69834521 D1 DE69834521 D1 DE 69834521D1 DE 69834521 T DE69834521 T DE 69834521T DE 69834521 T DE69834521 T DE 69834521T DE 69834521 D1 DE69834521 D1 DE 69834521D1
- Authority
- DE
- Germany
- Prior art keywords
- löthöckererzeugung
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/013—Alloys
- H01L2924/014—Solder alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/12—Passive devices, e.g. 2 terminal devices
- H01L2924/1204—Optical Diode
- H01L2924/12042—LASER
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3457—Solder materials or compositions; Methods of application thereof
- H05K3/3473—Plating of solder
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP08133197A JP3352352B2 (ja) | 1997-03-31 | 1997-03-31 | めっき装置、めっき方法およびバンプの形成方法 |
JP8133197 | 1997-03-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69834521D1 true DE69834521D1 (de) | 2006-06-22 |
DE69834521T2 DE69834521T2 (de) | 2006-09-21 |
Family
ID=13743407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69834521T Expired - Lifetime DE69834521T2 (de) | 1997-03-31 | 1998-03-30 | Löthöckererzeugung |
Country Status (6)
Country | Link |
---|---|
US (2) | US6030512A (de) |
EP (1) | EP0869549B1 (de) |
JP (1) | JP3352352B2 (de) |
KR (1) | KR100297120B1 (de) |
DE (1) | DE69834521T2 (de) |
TW (1) | TWM248792U (de) |
Families Citing this family (37)
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WO2000038218A2 (de) * | 1998-12-22 | 2000-06-29 | Steag Microtech Gmbh | Vorrichtung und verfahren zum behandeln von substraten |
KR100325974B1 (ko) * | 1999-06-24 | 2002-03-07 | 한수철 | 반도체용 웨이퍼의 니켈 도금장치 |
KR100313706B1 (ko) * | 1999-09-29 | 2001-11-26 | 윤종용 | 재배치 웨이퍼 레벨 칩 사이즈 패키지 및 그 제조방법 |
JP4750926B2 (ja) * | 2000-06-06 | 2011-08-17 | 富士通セミコンダクター株式会社 | 半導体装置 |
FR2819143B1 (fr) * | 2000-12-28 | 2003-03-07 | Thomson Csf | Procede de realisation de plots de connexion sur un circuit imprime |
US6818545B2 (en) * | 2001-03-05 | 2004-11-16 | Megic Corporation | Low fabrication cost, fine pitch and high reliability solder bump |
US7902679B2 (en) * | 2001-03-05 | 2011-03-08 | Megica Corporation | Structure and manufacturing method of a chip scale package with low fabrication cost, fine pitch and high reliability solder bump |
US20060011487A1 (en) * | 2001-05-31 | 2006-01-19 | Surfect Technologies, Inc. | Submicron and nano size particle encapsulation by electrochemical process and apparatus |
US6572010B2 (en) | 2001-06-12 | 2003-06-03 | Applied Materials Inc. | Integrated solder bump deposition apparatus and method |
JP4368543B2 (ja) * | 2001-07-25 | 2009-11-18 | シャープ株式会社 | メッキ方法およびメッキ装置 |
JP3615206B2 (ja) * | 2001-11-15 | 2005-02-02 | 富士通株式会社 | 半導体装置の製造方法 |
US7239747B2 (en) * | 2002-01-24 | 2007-07-03 | Chatterbox Systems, Inc. | Method and system for locating position in printed texts and delivering multimedia information |
WO2003085713A1 (en) * | 2002-04-03 | 2003-10-16 | Applied Materials, Inc. | Homogeneous copper-tin alloy plating for enhancement of electro-migration resistance in interconnects |
US6774026B1 (en) * | 2002-06-20 | 2004-08-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Structure and method for low-stress concentration solder bumps |
US20040007779A1 (en) * | 2002-07-15 | 2004-01-15 | Diane Arbuthnot | Wafer-level method for fine-pitch, high aspect ratio chip interconnect |
US20040118699A1 (en) * | 2002-10-02 | 2004-06-24 | Applied Materials, Inc. | Homogeneous copper-palladium alloy plating for enhancement of electro-migration resistance in interconnects |
JP3851607B2 (ja) | 2002-11-21 | 2006-11-29 | ローム株式会社 | 半導体装置の製造方法 |
JP2006513041A (ja) * | 2002-12-05 | 2006-04-20 | サーフェクト テクノロジーズ インク. | コーティングされた磁性粒子及びその応用 |
JP4417259B2 (ja) * | 2002-12-20 | 2010-02-17 | 日本カニゼン株式会社 | 異方成長バンプ形成用無電解ニッケルめっき浴及び異方成長バンプの形成方法 |
US20060049038A1 (en) * | 2003-02-12 | 2006-03-09 | Surfect Technologies, Inc. | Dynamic profile anode |
JP4758614B2 (ja) * | 2003-04-07 | 2011-08-31 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 電気めっき組成物および方法 |
TWI225699B (en) * | 2003-07-22 | 2004-12-21 | Advanced Semiconductor Eng | Bumping process |
WO2005076977A2 (en) * | 2004-02-04 | 2005-08-25 | Surfect Technologies, Inc. | Plating apparatus and method |
US7452803B2 (en) | 2004-08-12 | 2008-11-18 | Megica Corporation | Method for fabricating chip structure |
US20060087039A1 (en) * | 2004-10-22 | 2006-04-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Ubm structure for improving reliability and performance |
US20070045840A1 (en) * | 2005-09-01 | 2007-03-01 | Delphi Technologies, Inc. | Method of solder bumping a circuit component and circuit component formed thereby |
TWI427175B (zh) * | 2005-12-23 | 2014-02-21 | Hon Hai Prec Ind Co Ltd | 陽極板及包括該陽極板之濺鍍裝置 |
TW200731430A (en) * | 2006-02-08 | 2007-08-16 | Jung-Tang Huang | Controllable method for manufacturing uniform planarity of plating-based solder bumps on multi-layer flip chip used in the three-dimensional packaging |
CN101501989B (zh) * | 2006-08-07 | 2012-06-27 | 京瓷株式会社 | 弹性表面波装置的制造方法 |
DE102007026633B4 (de) | 2007-06-06 | 2009-04-02 | Atotech Deutschland Gmbh | Vorrichtung und Verfahren zum elektrolytischen Behandeln von plattenförmiger Ware |
US20100289129A1 (en) * | 2009-05-14 | 2010-11-18 | Satya Chinnusamy | Copper plate bonding for high performance semiconductor packaging |
US8747639B2 (en) | 2011-03-31 | 2014-06-10 | Pratt & Whitney Canada Corp. | Metal plating method and apparatus |
KR101451483B1 (ko) * | 2012-12-28 | 2014-10-15 | 삼성전기주식회사 | 전해도금 장치 |
US9704769B2 (en) | 2014-02-27 | 2017-07-11 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming encapsulated wafer level chip scale package (EWLCSP) |
TW202012705A (zh) * | 2018-07-30 | 2020-04-01 | 德商雷納科技有限公司 | 流體產生器、沉積裝置及材料沉積之方法 |
EP3876234A1 (de) * | 2020-03-06 | 2021-09-08 | Paul Scherrer Institut | Stromgesteuerte magnetische domänenwandlogik |
JP7329268B2 (ja) * | 2022-01-24 | 2023-08-18 | アスカコーポレーション株式会社 | 噴流式めっき装置 |
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DE2620647A1 (de) * | 1975-05-12 | 1976-11-25 | Marco Dr Ginatta | Verfahren und vorrichtung zur elektrolytischen raffination und elektrochemischen gewinnung von metallen, nichtmetallischen grundstoffen, verbindungen und legierungen |
US4304641A (en) * | 1980-11-24 | 1981-12-08 | International Business Machines Corporation | Rotary electroplating cell with controlled current distribution |
JPS6045720B2 (ja) * | 1981-12-16 | 1985-10-11 | 日本鋼管株式会社 | 電気メツキ装置 |
US4661375A (en) * | 1985-04-22 | 1987-04-28 | At&T Technologies, Inc. | Method for increasing the height of solder bumps |
US4931149A (en) * | 1987-04-13 | 1990-06-05 | Texas Instruments Incorporated | Fixture and a method for plating contact bumps for integrated circuits |
US5000827A (en) * | 1990-01-02 | 1991-03-19 | Motorola, Inc. | Method and apparatus for adjusting plating solution flow characteristics at substrate cathode periphery to minimize edge effect |
JPH0561359A (ja) * | 1991-09-02 | 1993-03-12 | Fujitsu Ltd | 像担持体からの媒体分離構造 |
US5421987A (en) * | 1993-08-30 | 1995-06-06 | Tzanavaras; George | Precision high rate electroplating cell and method |
JP3008768B2 (ja) * | 1994-01-11 | 2000-02-14 | 松下電器産業株式会社 | バンプの形成方法 |
US5545429A (en) * | 1994-07-01 | 1996-08-13 | International Business Machines Corporation | Fabrication of double side fully metallized plated thru-holes, in polymer structures, without seeding or photoprocess |
JPH0825619A (ja) * | 1994-07-13 | 1996-01-30 | Fuji Xerox Co Ltd | インクジェット記録装置 |
JP2892960B2 (ja) * | 1995-02-06 | 1999-05-17 | 株式会社アステックコーポレーション | 印刷開始行識別装置 |
US5597110A (en) * | 1995-08-25 | 1997-01-28 | Motorola, Inc. | Method for forming a solder bump by solder-jetting or the like |
JPH09219404A (ja) * | 1996-02-13 | 1997-08-19 | Fujitsu Ltd | バンプ電極の形成方法 |
JPH1060684A (ja) * | 1996-08-06 | 1998-03-03 | Kenshin Ka | 吹着け電気メッキ法 |
US6119927A (en) * | 1997-02-18 | 2000-09-19 | Edm Supplies, Inc. | Method and apparatus for placing and attaching solder balls to substrates |
-
1997
- 1997-03-31 JP JP08133197A patent/JP3352352B2/ja not_active Expired - Lifetime
-
1998
- 1998-03-23 US US09/045,919 patent/US6030512A/en not_active Expired - Lifetime
- 1998-03-23 TW TW091206752U patent/TWM248792U/zh not_active IP Right Cessation
- 1998-03-30 EP EP98302458A patent/EP0869549B1/de not_active Expired - Lifetime
- 1998-03-30 DE DE69834521T patent/DE69834521T2/de not_active Expired - Lifetime
- 1998-03-31 KR KR1019980011234A patent/KR100297120B1/ko not_active IP Right Cessation
-
2000
- 2000-02-11 US US09/502,446 patent/US6413404B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH10275811A (ja) | 1998-10-13 |
KR100297120B1 (ko) | 2001-10-25 |
EP0869549A3 (de) | 1999-01-13 |
US6413404B1 (en) | 2002-07-02 |
EP0869549B1 (de) | 2006-05-17 |
DE69834521T2 (de) | 2006-09-21 |
KR19980080929A (ko) | 1998-11-25 |
JP3352352B2 (ja) | 2002-12-03 |
TWM248792U (en) | 2004-11-01 |
US6030512A (en) | 2000-02-29 |
EP0869549A2 (de) | 1998-10-07 |
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