DE60044790D1 - Aerogelsubstrat und seine Herstellung - Google Patents
Aerogelsubstrat und seine HerstellungInfo
- Publication number
- DE60044790D1 DE60044790D1 DE60044790T DE60044790T DE60044790D1 DE 60044790 D1 DE60044790 D1 DE 60044790D1 DE 60044790 T DE60044790 T DE 60044790T DE 60044790 T DE60044790 T DE 60044790T DE 60044790 D1 DE60044790 D1 DE 60044790D1
- Authority
- DE
- Germany
- Prior art keywords
- aerogelsubstrat
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02042—Multicore optical fibres
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/85—Arrangements for extracting light from the devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
- B05D1/20—Processes for applying liquids or other fluent materials performed by dipping substances to be applied floating on a fluid
- B05D1/202—Langmuir Blodgett films (LB films)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/75—Hydrophilic and oleophilic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/70—Properties of coatings
- C03C2217/76—Hydrophobic and oleophobic coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0093—Wafer bonding; Removal of the growth substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/913—Material designed to be responsive to temperature, light, moisture
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Laminated Bodies (AREA)
- Silicon Compounds (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP31985899 | 1999-11-10 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60044790D1 true DE60044790D1 (de) | 2010-09-16 |
Family
ID=18115030
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60039103T Expired - Lifetime DE60039103D1 (de) | 1999-11-10 | 2000-11-09 | Aerogelsubstrat und seine herstellung |
DE60044790T Expired - Lifetime DE60044790D1 (de) | 1999-11-10 | 2000-11-09 | Aerogelsubstrat und seine Herstellung |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60039103T Expired - Lifetime DE60039103D1 (de) | 1999-11-10 | 2000-11-09 | Aerogelsubstrat und seine herstellung |
Country Status (7)
Country | Link |
---|---|
US (1) | US6740416B1 (de) |
EP (2) | EP1153739B1 (de) |
JP (1) | JP3674585B2 (de) |
KR (1) | KR100437526B1 (de) |
CN (1) | CN1197702C (de) |
DE (2) | DE60039103D1 (de) |
WO (1) | WO2001034382A1 (de) |
Families Citing this family (104)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003133070A (ja) * | 2001-10-30 | 2003-05-09 | Seiko Epson Corp | 積層膜の製造方法、電気光学装置、電気光学装置の製造方法、有機エレクトロルミネッセンス装置の製造方法、及び電子機器 |
JP4182467B2 (ja) | 2001-12-27 | 2008-11-19 | セイコーエプソン株式会社 | 回路基板、電気光学装置及び電子機器 |
WO2003064025A1 (en) * | 2002-01-29 | 2003-08-07 | Cabot Corporation | Heat resistant aerogel insulation composite and method for its preparation; aerogel binder composition and method for its preparation |
JP4479161B2 (ja) * | 2002-03-25 | 2010-06-09 | 住友金属鉱山株式会社 | 透明導電膜とこの透明導電膜形成用塗布液および透明導電性積層構造体と表示装置 |
DE10228938A1 (de) * | 2002-06-28 | 2004-01-15 | Philips Intellectual Property & Standards Gmbh | Elektrolumineszierende Vorrichtung mit Farbfilter |
KR100483622B1 (ko) * | 2002-08-16 | 2005-04-19 | 삼성전기주식회사 | 광도파로 소자를 인쇄회로기판에 부착하는 방법 |
DE10252903A1 (de) | 2002-11-12 | 2004-05-19 | Philips Intellectual Property & Standards Gmbh | Organische elektrolumineszente Lichtquelle mit Antireflexionsschicht |
GB2400728B (en) * | 2003-02-26 | 2006-06-21 | Dainippon Printing Co Ltd | Thin film laminate and luminescent element |
DE102004005300A1 (de) * | 2004-01-29 | 2005-09-08 | Atotech Deutschland Gmbh | Verfahren zum Behandeln von Trägermaterial zur Herstellung von Schltungsträgern und Anwendung des Verfahrens |
US7144828B2 (en) * | 2004-01-30 | 2006-12-05 | Chartered Semiconductor Manufacturing Ltd. | He treatment to improve low-k adhesion property |
JP5005164B2 (ja) * | 2004-03-03 | 2012-08-22 | 株式会社ジャパンディスプレイイースト | 発光素子,発光型表示装置及び照明装置 |
JP4470627B2 (ja) * | 2004-07-15 | 2010-06-02 | 日本電気株式会社 | 光学基板、発光素子および表示装置 |
US20060263587A1 (en) * | 2004-11-24 | 2006-11-23 | Ou Duan L | High strength aerogel panels |
FR2879188B1 (fr) * | 2004-12-13 | 2007-06-22 | Saint Gobain | Procede et installation pour le traitement d'un substrat verrier incorporant une ligne magnetron et un dispositif generant un plasma a pression atmospherique. |
KR20070095359A (ko) * | 2004-12-24 | 2007-09-28 | 마츠시다 덴코 가부시키가이샤 | 액정 표시 장치용 광학 적층 필름 |
WO2006074449A2 (en) * | 2005-01-07 | 2006-07-13 | Aspen Aerogels, Inc. | A thermal management system for high temperature events |
US20060216219A1 (en) * | 2005-03-22 | 2006-09-28 | Defriend Kimberly A | Aerogel monolith with improved strength |
KR100726241B1 (ko) * | 2005-05-02 | 2007-06-11 | 삼성전기주식회사 | 금-구리 층을 포함하는 도전성 기판, 모터, 진동모터 및전기 접점용 금속 단자 |
US8029871B2 (en) * | 2005-06-09 | 2011-10-04 | Hoya Corporation | Method for producing silica aerogel coating |
US7390078B2 (en) * | 2005-06-30 | 2008-06-24 | Lexmark International, Inc. | Reduction of heat loss in micro-fluid ejection devices |
CA2619860A1 (en) * | 2005-08-25 | 2007-03-01 | Robert R. Keller, Sr. | Aerogel and method of manufacturing same |
US7618608B1 (en) | 2005-12-13 | 2009-11-17 | Keller Companies, Inc. | Aerogel and method of manufacturing same |
US20070069615A1 (en) * | 2005-09-26 | 2007-03-29 | Samsung Corning Co., Ltd. | Surface light source device |
WO2007047970A2 (en) * | 2005-10-21 | 2007-04-26 | Cabot Corporation | Aerogel based composites |
US7750056B1 (en) | 2006-10-03 | 2010-07-06 | Sami Daoud | Low-density, high r-value translucent nanocrystallites |
KR20080047150A (ko) * | 2006-11-24 | 2008-05-28 | 한국생산기술연구원 | 에어로겔 단열시트가 내장된 휴대용 정보기기 |
KR100948578B1 (ko) | 2006-12-12 | 2010-03-18 | 한국생산기술연구원 | 에어로겔 단열시트를 구비하는 단열관 |
JP4656074B2 (ja) * | 2007-03-12 | 2011-03-23 | セイコーエプソン株式会社 | 電気光学装置及び電気光学装置の製造方法 |
KR100926981B1 (ko) * | 2008-01-09 | 2009-11-17 | 한국생산기술연구원 | 플라즈마 표면처리를 이용한 에어로겔 파우더 성형방법 및장치 |
US8851442B2 (en) * | 2008-01-22 | 2014-10-07 | Honeywell International Inc. | Aerogel-bases mold for MEMS fabrication and formation thereof |
EP2109163A1 (de) * | 2008-04-08 | 2009-10-14 | Alcan Technology & Management Ltd. | Substrat mit aufgedruckter Struktur |
JP5532550B2 (ja) * | 2008-05-29 | 2014-06-25 | パナソニック株式会社 | プラズマディスプレイの誘電体膜用ケイ素化合物 |
CH699118A1 (de) * | 2008-07-15 | 2010-01-15 | Tex A Tec Ag | Multifunktionelle, responsive Funktionsschichten auf festen Oberflächen und Verfahren zur Herstellung dazu. |
US8236118B2 (en) * | 2009-08-07 | 2012-08-07 | Guardian Industries Corp. | Debonding and transfer techniques for hetero-epitaxially grown graphene, and products including the same |
DE102009053782A1 (de) * | 2009-11-19 | 2011-06-01 | BSH Bosch und Siemens Hausgeräte GmbH | Poröses SiO2-Xerogel mit charakteristischer Porengröße, dessen trocknungsstabile Vorstufen und dessen Anwendung |
JP4893816B2 (ja) * | 2009-12-15 | 2012-03-07 | 日本電気株式会社 | 光学基板、発光素子、表示装置およびそれらの製造方法 |
US10060180B2 (en) | 2010-01-16 | 2018-08-28 | Cardinal Cg Company | Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology |
US10000411B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductivity and low emissivity coating technology |
US10000965B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductive coating technology |
JP2011165804A (ja) * | 2010-02-08 | 2011-08-25 | Fujifilm Corp | 半導体装置および半導体素子用基板の製造方法 |
US8691935B2 (en) | 2010-03-23 | 2014-04-08 | Aeonclad Coatings, Llc | Methods and manufactures related to encapsulation of silica aerogel powder |
US8283800B2 (en) | 2010-05-27 | 2012-10-09 | Ford Global Technologies, Llc | Vehicle control system with proximity switch and method thereof |
WO2012012735A2 (en) * | 2010-07-22 | 2012-01-26 | Dynamic Adsorbents, Inc. | Organic compound adsorbing material and process for making the same |
US8975903B2 (en) | 2011-06-09 | 2015-03-10 | Ford Global Technologies, Llc | Proximity switch having learned sensitivity and method therefor |
US8928336B2 (en) | 2011-06-09 | 2015-01-06 | Ford Global Technologies, Llc | Proximity switch having sensitivity control and method therefor |
KR101247271B1 (ko) | 2011-07-06 | 2013-03-25 | 지오스 에어로겔 리미티드 | 표면처리가 된 실리카 에어로겔 분말의 제조방법 및 제조시스템 |
US10004286B2 (en) | 2011-08-08 | 2018-06-26 | Ford Global Technologies, Llc | Glove having conductive ink and method of interacting with proximity sensor |
US9143126B2 (en) | 2011-09-22 | 2015-09-22 | Ford Global Technologies, Llc | Proximity switch having lockout control for controlling movable panel |
CN102531520B (zh) * | 2011-10-31 | 2013-09-25 | 深圳光启高等理工研究院 | 一种介质基板的制备方法及超材料 |
US10112556B2 (en) | 2011-11-03 | 2018-10-30 | Ford Global Technologies, Llc | Proximity switch having wrong touch adaptive learning and method |
US8994228B2 (en) | 2011-11-03 | 2015-03-31 | Ford Global Technologies, Llc | Proximity switch having wrong touch feedback |
US8878438B2 (en) | 2011-11-04 | 2014-11-04 | Ford Global Technologies, Llc | Lamp and proximity switch assembly and method |
CN103171177B (zh) * | 2011-12-26 | 2015-07-22 | 比亚迪股份有限公司 | 一种复合气凝胶及其制备方法 |
US8933708B2 (en) | 2012-04-11 | 2015-01-13 | Ford Global Technologies, Llc | Proximity switch assembly and activation method with exploration mode |
US9520875B2 (en) | 2012-04-11 | 2016-12-13 | Ford Global Technologies, Llc | Pliable proximity switch assembly and activation method |
US9197206B2 (en) | 2012-04-11 | 2015-11-24 | Ford Global Technologies, Llc | Proximity switch having differential contact surface |
US9559688B2 (en) | 2012-04-11 | 2017-01-31 | Ford Global Technologies, Llc | Proximity switch assembly having pliable surface and depression |
US9287864B2 (en) | 2012-04-11 | 2016-03-15 | Ford Global Technologies, Llc | Proximity switch assembly and calibration method therefor |
US9660644B2 (en) | 2012-04-11 | 2017-05-23 | Ford Global Technologies, Llc | Proximity switch assembly and activation method |
US9065447B2 (en) | 2012-04-11 | 2015-06-23 | Ford Global Technologies, Llc | Proximity switch assembly and method having adaptive time delay |
US9944237B2 (en) | 2012-04-11 | 2018-04-17 | Ford Global Technologies, Llc | Proximity switch assembly with signal drift rejection and method |
US9531379B2 (en) | 2012-04-11 | 2016-12-27 | Ford Global Technologies, Llc | Proximity switch assembly having groove between adjacent proximity sensors |
US9184745B2 (en) | 2012-04-11 | 2015-11-10 | Ford Global Technologies, Llc | Proximity switch assembly and method of sensing user input based on signal rate of change |
US9568527B2 (en) | 2012-04-11 | 2017-02-14 | Ford Global Technologies, Llc | Proximity switch assembly and activation method having virtual button mode |
US9831870B2 (en) | 2012-04-11 | 2017-11-28 | Ford Global Technologies, Llc | Proximity switch assembly and method of tuning same |
US9219472B2 (en) | 2012-04-11 | 2015-12-22 | Ford Global Technologies, Llc | Proximity switch assembly and activation method using rate monitoring |
US9136840B2 (en) | 2012-05-17 | 2015-09-15 | Ford Global Technologies, Llc | Proximity switch assembly having dynamic tuned threshold |
US8981602B2 (en) | 2012-05-29 | 2015-03-17 | Ford Global Technologies, Llc | Proximity switch assembly having non-switch contact and method |
US9337832B2 (en) | 2012-06-06 | 2016-05-10 | Ford Global Technologies, Llc | Proximity switch and method of adjusting sensitivity therefor |
US9641172B2 (en) | 2012-06-27 | 2017-05-02 | Ford Global Technologies, Llc | Proximity switch assembly having varying size electrode fingers |
US8922340B2 (en) | 2012-09-11 | 2014-12-30 | Ford Global Technologies, Llc | Proximity switch based door latch release |
US10446920B1 (en) | 2012-10-16 | 2019-10-15 | United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | Aerogel-based antennas for aerospace and terrestrial applications |
US9356341B1 (en) * | 2012-10-16 | 2016-05-31 | The United States Of America As Represented By The Administrator Of National Aeronautics And Space Administration | Aerogel-based antennas for aerospace and terrestrial applications |
US8796575B2 (en) | 2012-10-31 | 2014-08-05 | Ford Global Technologies, Llc | Proximity switch assembly having ground layer |
US9311204B2 (en) | 2013-03-13 | 2016-04-12 | Ford Global Technologies, Llc | Proximity interface development system having replicator and method |
KR102114314B1 (ko) * | 2013-06-26 | 2020-05-25 | 삼성디스플레이 주식회사 | 유기발광 디스플레이 장치 및 그 제조방법 |
JP6361022B2 (ja) * | 2013-09-17 | 2018-07-25 | パナソニックIpマネジメント株式会社 | 複合シート |
TWI565681B (zh) | 2013-10-15 | 2017-01-11 | 中原大學 | 多孔二氧化矽氣凝膠複合薄膜及其製造方法以及二氧化碳吸收裝置 |
CN104276851A (zh) * | 2014-09-10 | 2015-01-14 | 吴建坤 | 二氧化硅气凝胶隔热膜制作工艺 |
US10038443B2 (en) | 2014-10-20 | 2018-07-31 | Ford Global Technologies, Llc | Directional proximity switch assembly |
WO2016121757A1 (ja) | 2015-01-27 | 2016-08-04 | 日立化成株式会社 | エアロゲル積層体及び断熱材 |
WO2016137748A1 (en) * | 2015-02-26 | 2016-09-01 | The Regents Of The University Of California | Multi-stage thermoelectric generator monolithically integrated on a light absorber |
US9654103B2 (en) | 2015-03-18 | 2017-05-16 | Ford Global Technologies, Llc | Proximity switch assembly having haptic feedback and method |
US10473621B2 (en) | 2015-05-11 | 2019-11-12 | Carrier Corporation | Methods of creation and use of a non-radioactive detection methodology |
US9548733B2 (en) | 2015-05-20 | 2017-01-17 | Ford Global Technologies, Llc | Proximity sensor assembly having interleaved electrode configuration |
US20180245205A1 (en) * | 2015-08-24 | 2018-08-30 | Bar-Ilan University | Nanoporous metal-based film supported on aerogel substrate and methods for the preparation thereof |
CN108475748B (zh) | 2015-12-15 | 2021-08-20 | 苹果公司 | 微孔绝缘体 |
CN105582866B (zh) * | 2016-03-08 | 2022-12-09 | 浙江圣润纳米科技有限公司 | 一种射频辐射快速制备气凝胶的方法及生产线 |
CN107265468A (zh) * | 2016-04-08 | 2017-10-20 | 南京唯才新能源科技有限公司 | 一种气凝胶材料及其表面改性方法 |
CN107268912A (zh) * | 2016-04-08 | 2017-10-20 | 南京唯才新能源科技有限公司 | 一种带装饰面的气凝胶保温防火板及其制备方法 |
TWI752199B (zh) * | 2017-03-28 | 2022-01-11 | 美商康寧公司 | 具有保留製品強度與抗刮性之硬膜及裂紋減輕複合結構的玻璃基底製品 |
US10724132B2 (en) | 2017-04-04 | 2020-07-28 | General Electric Company | Method of preparing aerogel particles and aerogel coated component |
CN109135723A (zh) * | 2017-06-15 | 2019-01-04 | 湖南尚成新材料科技有限责任公司 | 一种具有热致变色功能的气凝胶复合材料及其制备方法 |
CN109133991A (zh) * | 2017-06-15 | 2019-01-04 | 湖南尚成新材料科技有限责任公司 | 一种具有红外反射功能的气凝胶复合材料及其制备方法 |
US10818903B1 (en) | 2017-08-15 | 2020-10-27 | Apple Inc. | Polypropylene carbonate and catalysts |
US11028012B2 (en) | 2018-10-31 | 2021-06-08 | Cardinal Cg Company | Low solar heat gain coatings, laminated glass assemblies, and methods of producing same |
WO2020097532A2 (en) | 2018-11-08 | 2020-05-14 | Viken Detection Corporation | Coated aerogels |
CN109693422B (zh) * | 2019-02-25 | 2024-02-09 | 深圳德宝天成科技有限公司 | 一种超薄隔热膜 |
CN112071796B (zh) * | 2020-09-03 | 2023-06-02 | 深圳市华星光电半导体显示技术有限公司 | 柔性基板及其制作方法、柔性显示装置 |
US12099217B2 (en) * | 2020-09-23 | 2024-09-24 | Innoviz Technologies Ltd. | Ultra-light optical element |
CN112924906B (zh) * | 2021-01-26 | 2022-04-05 | 西安交通大学 | 基于磁热效应的无线柔性磁传感器及制备方法和检测方法 |
WO2022191815A1 (en) * | 2021-03-08 | 2022-09-15 | Hewlett-Packard Development Company, L.P. | Multi-layered thermal insulating films for electronic devices |
US20230286812A1 (en) * | 2022-03-09 | 2023-09-14 | Cardinal Cg Company | Silica wet gel and aerogel |
CN114804818B (zh) * | 2022-05-24 | 2023-04-11 | 巩义市泛锐熠辉复合材料有限公司 | 一种低成本气凝胶复合材料及其制备方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4402927A (en) | 1980-04-22 | 1983-09-06 | Dardel Guy Von | Silica aerogel |
FR2507171A1 (fr) | 1981-06-04 | 1982-12-10 | Zarzycki Jerzy | Aerogels de silice monolithiques, leur preparation et leur utilisation pour la preparation d'articles en verre de silice et de materiaux thermiquement isolants |
US4610863A (en) | 1985-09-04 | 1986-09-09 | The United States Of America As Represented By The United States Department Of Energy | Process for forming transparent aerogel insulating arrays |
DE4038784A1 (de) | 1990-12-05 | 1992-06-11 | Basf Ag | Verbundschaumstoffe mit niedriger waermeleitfaehigkeit |
US5086085A (en) | 1991-04-11 | 1992-02-04 | The United States Of America As Represented By The Department Of Energy | Melamine-formaldehyde aerogels |
US5358776A (en) * | 1992-01-31 | 1994-10-25 | The United States Of America As Represented By The Secretary Of The Air Force | Lightweight aerogel reflector |
JP2659155B2 (ja) | 1992-02-03 | 1997-09-30 | 松下電工株式会社 | 疎水性エアロゲルの製造方法 |
WO1993016125A1 (en) | 1992-02-18 | 1993-08-19 | Matsushita Electric Works, Ltd. | Process for producing hydrophobic aerogel |
US5221364A (en) * | 1992-02-20 | 1993-06-22 | The United States Of America As Represented By The Secretary Of The Air Force | Lightweight solar cell |
US5565142A (en) | 1992-04-01 | 1996-10-15 | Deshpande; Ravindra | Preparation of high porosity xerogels by chemical surface modification. |
JPH0733248B2 (ja) | 1993-01-29 | 1995-04-12 | 工業技術院長 | シリカエアロゲル表面への金属酸化物被覆方法及びその方法により得られた金属酸化物で被覆されたシリカエアロゲル |
US5420168A (en) | 1993-04-01 | 1995-05-30 | The Regents Of The University Of California | Method of low pressure and/or evaporative drying of aerogel |
JP2725573B2 (ja) | 1993-11-12 | 1998-03-11 | 松下電工株式会社 | 疎水性エアロゲルの製法 |
JP2642860B2 (ja) | 1994-02-04 | 1997-08-20 | 工業技術院長 | 無機キセロゲル膜およびその製造方法ならびに無機キセロゲル膜からなる気体分離膜 |
US5525857A (en) * | 1994-08-19 | 1996-06-11 | Texas Instruments Inc. | Low density, high porosity material as gate dielectric for field emission device |
DE4439217A1 (de) | 1994-11-03 | 1996-05-09 | Hoechst Ag | Verfahren zur Herstellung von Aerogelen |
US5638599A (en) * | 1995-03-29 | 1997-06-17 | Texas Instruments Incorporated | Method of fabricating hybrid uncooled infrared detectors |
JPH10324579A (ja) | 1997-05-22 | 1998-12-08 | Kobe Steel Ltd | 断熱用透明多孔体とその製造方法及び製造装置 |
JPH10324585A (ja) | 1997-05-22 | 1998-12-08 | Kobe Steel Ltd | 断熱用透明多孔体とその製造方法 |
-
2000
- 2000-11-09 WO PCT/JP2000/007856 patent/WO2001034382A1/ja active IP Right Grant
- 2000-11-09 CN CNB008025045A patent/CN1197702C/zh not_active Expired - Fee Related
- 2000-11-09 DE DE60039103T patent/DE60039103D1/de not_active Expired - Lifetime
- 2000-11-09 DE DE60044790T patent/DE60044790D1/de not_active Expired - Lifetime
- 2000-11-09 EP EP00974836A patent/EP1153739B1/de not_active Expired - Lifetime
- 2000-11-09 US US09/830,572 patent/US6740416B1/en not_active Expired - Lifetime
- 2000-11-09 EP EP06015292A patent/EP1719614B1/de not_active Expired - Lifetime
- 2000-11-09 JP JP2001536359A patent/JP3674585B2/ja not_active Expired - Fee Related
- 2000-11-09 KR KR10-2001-7006988A patent/KR100437526B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
EP1719614B1 (de) | 2010-08-04 |
EP1153739A1 (de) | 2001-11-14 |
EP1153739A4 (de) | 2004-11-03 |
CN1335805A (zh) | 2002-02-13 |
KR20010090862A (ko) | 2001-10-19 |
JP3674585B2 (ja) | 2005-07-20 |
EP1719614A2 (de) | 2006-11-08 |
WO2001034382A1 (en) | 2001-05-17 |
CN1197702C (zh) | 2005-04-20 |
EP1153739B1 (de) | 2008-06-04 |
EP1719614A3 (de) | 2007-08-15 |
DE60039103D1 (de) | 2008-07-17 |
US6740416B1 (en) | 2004-05-25 |
KR100437526B1 (ko) | 2004-06-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE60044790D1 (de) | Aerogelsubstrat und seine Herstellung | |
DE60038200D1 (de) | ren Herstellung und Verwendung | |
DE60041916D1 (de) | Elektonikbauteil-träger und seine herstellung | |
DE60004899D1 (de) | SiC-C/C Verbundwerkstoff und seine Verwendungen | |
ATE293644T1 (de) | Polyolefin und die herstellung davon | |
DE69924155D1 (de) | Fluoren-copolymere und daraus hergestellte vorrichtungen | |
DE60032247D1 (de) | Fluorchemisches oligomer und seine verwendung | |
DE69838849D1 (de) | Mehrchipmodulstruktur und seine herstellung | |
DE69929456D1 (de) | Nahfeldabtastkopf und herstellungsverfahren | |
DE60132998D1 (de) | Speiseeisprodukt und dessen herstellung | |
DE60015004D1 (de) | Russ, seine Herstellung und Verwendungen | |
DE60017012D1 (de) | Orginalitätsverschluss und Herstellungverfahren | |
EE200200286A (et) | Uued aminopropüülfosfiinhapped ning nende kasutamine | |
DE60239896D1 (de) | Velourskunstleder und seine herstellung | |
DE60002526D1 (de) | Herstellung von Tricyclodecandicarbaldehyd, Pentacyclopentadecandicarbaldehyd und der entsprechenden Dimethanole | |
DE60020737D1 (de) | Sic-einkristall und herstellungsverfahren dafür | |
DE60017477D1 (de) | Modifiziertes Dienelastomer und seine Herstellung | |
DE60033457D1 (de) | Kleinstmotor und sein Herstellungsverfahren | |
DE60032829D1 (de) | Toner und Tonerherstellungsverfahren | |
DE60128647D1 (de) | Sigec halbleiterkristall und seine herstellung | |
DE60028486D1 (de) | Videocoder und -decoder | |
DE50115516D1 (de) | Alkalimetallfluorzinkat und seine herstellung | |
DE60033353D1 (de) | Elektronisches gerät und herstellung | |
DE60032898D1 (de) | Arylthiazolidindion- und aryloxazolidinderivate | |
ATE505459T1 (de) | Dibenzoäb,füazepin-derivate und ihre herstellung |