CN1851401A - Symmetric-structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope - Google Patents

Symmetric-structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope Download PDF

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Publication number
CN1851401A
CN1851401A CNA2006100100999A CN200610010099A CN1851401A CN 1851401 A CN1851401 A CN 1851401A CN A2006100100999 A CNA2006100100999 A CN A2006100100999A CN 200610010099 A CN200610010099 A CN 200610010099A CN 1851401 A CN1851401 A CN 1851401A
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decoupling
grade
crystal
mode
mass
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CN100473948C (en
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刘晓为
陈伟平
霍明学
谭晓昀
陈宏�
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Harbin Institute of Technology
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Harbin Institute of Technology
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Abstract

The invention relates to a symmetric structure doublestage decoupling single crystal silicon micro mechanic gyroscope that includes glass base sheet, silicon sheet and the structure etched on the silicon sheet. The structure includes mass block, comb type driver and comb type detector. The fixed electrode is connected to bonding area. And the active electrode is connected to the frame. The detecting decoupling beam is set between the driving frame and the mass block. Flexible beam is set between the two ends of the frame. The invention could gain high quality gene under air environment and make the micro mechanic gyroscope have high sensitivity.

Description

The symmetrical structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope
(1) technical field
What the present invention relates to is a kind of micro-mechanical gyroscope, belongs to microelectromechanical systems field and inertia measurement field.
(2) background technology
Compare with traditional inertia device, the silicon micro mechanical inertia device has that volume is little, cost is low, low in energy consumption and easily and advantage such as the CMOS interface circuit is integrated.Along with the successful Application of micro-mechanical accelerometer in automobile electronic system, as the main element of micro-mechanical inertia device, the gyrostatic research of high-performance computer tool enjoys attention.There are following three key points restricting the further raising of micro-mechanical gyroscope performance at present.
1, the matching problem of the resonance frequency of the driving mode of micromechanical gyro and detection mode.Micromechanical gyro mainly contains two vertical mode of oscillations when work, promptly drive mode of oscillation and detect mode of oscillation.In order to improve sensitivity, usually need when design will with driving direction resonance frequency and detection side to resonance frequency coupling as far as possible.
2, the coupling between driving mode of oscillation and the detection mode of oscillation.Be the vibration of driving direction also can cause the detection side to vibration, thereby increased difficulty to input.
3, the quality factor that improves system improves sensitivity.Usually adopt the mode of Vacuum Package at present, this can increase device cost, reduces the long-term reliability of system simultaneously.
(3) summary of the invention
The object of the invention is to provide a kind of resonance frequency that drives mode of oscillation and detection mode of oscillation to be easy to coupling, can reduce by two couplings between the mode, under atmospheric environment, work and also can obtain the higher quality factor, highly sensitive symmetrical structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope.
The object of the present invention is achieved like this: the structure that it comprises glass substrate, sputter at metal electrode on the glass substrate, be bonded in the silicon chip on the glass substrate and etch on silicon chip by bonding region, its structure comprises the mass in the middle of being positioned at, be symmetrically distributed in the comb actuator of mass both sides, be symmetrically distributed in the mass pectination detecting device of both sides in addition, fixed electorde links to each other with bonding region, float electrode links to each other with frame, drive the decoupling zero of detection beam is arranged between frame and the mass, the decoupling zero of driving beam is arranged between detection block and the mass, and the two ends of frame are connected with elastic beam.
The present invention can also comprise:
1, elastic beam and decoupling zero beam all adopt twin-stage folding girder construction.
2, drive frame and be limited in the motion of driving direction directions X, detection block then is limited in the detection side and moves to the Y direction.
3, driving and detected activity electrode all adopt the tangential motion mode, drive mode of oscillation and detect mode of oscillation all based on slide-film damping, and two dampings are mated fully.
The present invention adopts the device architecture of complete symmetry, and tangential driving and tangential motion detection mode reduce system damping and obtain higher quality factor, and elastic beam and decoupling zero girder construction all can reduce the coupling between the mode.The present invention is a kind of brand-new micro mechanical vibration formula gyroscopic mechanism, make the resonance frequency that drives mode of oscillation and detection mode of oscillation be easy to coupling, simultaneously by the coupling between two mode of double-grade decoupling structure reduction, under atmospheric environment, work and also can obtain the higher quality factor, thereby make micromechanical gyro that higher sensitivity be arranged.
(4) description of drawings
Fig. 1 is a structural representation of the present invention;
Fig. 2 is the vertical view of Fig. 1.
(5) embodiment
For a more detailed description to the present invention for example below in conjunction with accompanying drawing:
In conjunction with Fig. 1 and Fig. 2, it comprises glass substrate 15, sputter at the metal electrode on the glass substrate, by whole bonding region 1, drive fixed electorde bonding region 4, detect the structure that fixed electorde bonding region 10 is bonded in the silicon chip on the glass substrate and etches on silicon chip, its structure comprises the mass 14 in the middle of being positioned at, be symmetrically distributed in the comb actuator of mass both sides, be symmetrically distributed in the mass pectination detecting device of both sides in addition, drive fixed electorde 3a, 3b links to each other with driving fixed electorde bonding region, detect fixed electorde 9a, 9b links to each other with detection fixed electorde bonding region, driving float electrode 6 links to each other with driving frame 5, drive the decoupling zero of detection beam 7 is arranged between frame and the mass, detected activity electrode 11 links to each other with detection block 13, the decoupling zero of driving beam 12 is arranged between detection block and the mass, the two ends that drive frame are connected with and drive elastic beam 2, the two ends joint detection elastic beam 8 of detection block.Elastic beam and decoupling zero beam all adopt twin-stage folding girder construction.Drive frame and be limited in the motion of driving direction directions X, detection block then is limited in the detection side and moves to the Y direction.Driving and detected activity electrode all adopt the tangential motion mode, drive mode of oscillation and detect mode of oscillation all based on slide-film damping, and two dampings are mated fully.
When between fixed electorde 3a, 3b, 9a, 9b and the float electrode 6,11 of comb actuator, applying ac signal, apply voltage V on the fixed electorde a/3a 1=V DC+ V ACSin (ω t) applies voltage V on the fixed electorde b/3b 2=V DC-V ACSin (ω t) then produces the electrostatic force of alternation on float electrode, inertial mass 14 is defined as driving direction along X axis and produces vibration and be defined as the driving mode of oscillation under the traction of float electrode.When the Z direction has the angular velocity input, mass in Y-axis to the effect that is subjected to coriolis force, on this direction, produce vibration, thereby drive another float electrode 11 is defined as sensitive direction and responsive mode of oscillation along the Y direction vibration, electric capacity between detected activity electrode 11 and the detection fixed electorde a/9a increases at this moment, electric capacity equivalent between detected activity electrode 11 and the detection fixed electorde b/9b reduces simultaneously, and then the differential capacitance of differential capacitance detecting device produces an alternating signal.This capacitance variations amplitude is directly proportional with input angular velocity, can record angular velocity signal thereby detect capacitance variations by interface circuit.Owing to adopted bilingual coupling structure, the double-grade decoupling structure has been eliminated the coupling that drives and detect between the mode of oscillation effectively, the detected activity electrode only vibrates at sensitive direction, only vibrate and drive float electrode at driving direction, all work under the slide-film damping, under atmospheric environment, work and to obtain bigger quality factor, thereby the sensitivity of micromechanical gyro is improved.The gyro structure is symmetrical fully simultaneously, drives and detects vibration modal frequency and easily mate, and also helps eliminating because the frequency difference that fabrication error brings.

Claims (5)

1, a kind of symmetrical structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope, it comprises glass substrate, sputter at the metal electrode on the glass substrate, the structure that is bonded in the silicon chip on the glass substrate and on silicon chip, etches by bonding region, it is characterized in that: its structure comprises the mass in the middle of being positioned at, be symmetrically distributed in the comb actuator of mass both sides, be symmetrically distributed in the mass pectination detecting device of both sides in addition, fixed electorde links to each other with bonding region, float electrode links to each other with frame, drive the decoupling zero of detection beam is arranged between frame and the mass, the decoupling zero of driving beam is arranged between detection block and the mass, and the two ends of frame are connected with elastic beam.
2, symmetrical structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope according to claim 1 is characterized in that: elastic beam and decoupling zero beam all adopt twin-stage folding girder construction, constitute the double-grade decoupling structure.
3, symmetrical structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope according to claim 1 and 2 is characterized in that: drive frame and be limited in the motion of driving direction directions X, detection block then is limited in the detection side and moves to the Y direction.
4, symmetrical structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope according to claim 1 and 2, it is characterized in that: driving and detected activity electrode all adopt the tangential motion mode, drive mode of oscillation and detect mode of oscillation, and two dampings are mated fully all based on slide-film damping.
5, symmetrical structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope according to claim 3, it is characterized in that: driving and detected activity electrode all adopt the tangential motion mode, drive mode of oscillation and detect mode of oscillation, and two dampings are mated fully all based on slide-film damping.
CNB2006100100999A 2006-05-31 2006-05-31 Symmetric-structure double-grade decoupling single-crystal-silicon micro mechanical gyroscope Expired - Fee Related CN100473948C (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102042830A (en) * 2010-10-15 2011-05-04 北京信息科技大学 Silicon micromachining gyroscope
CN102706338A (en) * 2012-06-19 2012-10-03 清华大学 Giant magnetoresistive effect-based micro mechanical gyro
CN103575263A (en) * 2012-07-19 2014-02-12 水木智芯科技(北京)有限公司 Four mass block complete-decoupling capacitance type single-shaft micromechanical gyroscope
CN111551161A (en) * 2020-06-28 2020-08-18 江苏睦荷科技有限公司 MEMS vibrating gyroscope structure and manufacturing method thereof
CN112113553A (en) * 2020-09-15 2020-12-22 浙江大学 Gyro full-matching tuning electrode
CN112444239A (en) * 2019-08-30 2021-03-05 北京大学 Geometric compensation type (100) silicon micro-mechanical ring-shaped resonant gyroscope
CN113390403A (en) * 2020-03-12 2021-09-14 北京微元时代科技有限公司 Single-mass double-decoupling double-shaft silicon micro gyroscope
CN115164861A (en) * 2022-08-26 2022-10-11 南京高华科技股份有限公司 MEMS gyroscope and preparation method thereof

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102042830B (en) * 2010-10-15 2013-01-30 北京信息科技大学 Silicon micromachining gyroscope
CN102042830A (en) * 2010-10-15 2011-05-04 北京信息科技大学 Silicon micromachining gyroscope
CN102706338A (en) * 2012-06-19 2012-10-03 清华大学 Giant magnetoresistive effect-based micro mechanical gyro
CN103575263A (en) * 2012-07-19 2014-02-12 水木智芯科技(北京)有限公司 Four mass block complete-decoupling capacitance type single-shaft micromechanical gyroscope
CN103575263B (en) * 2012-07-19 2017-03-29 水木智芯科技(北京)有限公司 Four mass full decoupling condenser type single shaft micro-mechanical gyroscopes
CN112444239A (en) * 2019-08-30 2021-03-05 北京大学 Geometric compensation type (100) silicon micro-mechanical ring-shaped resonant gyroscope
CN113390403B (en) * 2020-03-12 2023-05-12 北京微元时代科技有限公司 Double-shaft silicon micro-gyroscope with single-element double decoupling
CN113390403A (en) * 2020-03-12 2021-09-14 北京微元时代科技有限公司 Single-mass double-decoupling double-shaft silicon micro gyroscope
CN111551161A (en) * 2020-06-28 2020-08-18 江苏睦荷科技有限公司 MEMS vibrating gyroscope structure and manufacturing method thereof
CN112113553A (en) * 2020-09-15 2020-12-22 浙江大学 Gyro full-matching tuning electrode
CN112113553B (en) * 2020-09-15 2022-06-21 浙江大学 Gyro full-matching tuning electrode
CN115164861A (en) * 2022-08-26 2022-10-11 南京高华科技股份有限公司 MEMS gyroscope and preparation method thereof
CN115164861B (en) * 2022-08-26 2024-03-08 南京高华科技股份有限公司 MEMS gyroscope and preparation method thereof

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