CN107611066A - The chamber and annealing device of annealing device - Google Patents
The chamber and annealing device of annealing device Download PDFInfo
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- CN107611066A CN107611066A CN201710846916.2A CN201710846916A CN107611066A CN 107611066 A CN107611066 A CN 107611066A CN 201710846916 A CN201710846916 A CN 201710846916A CN 107611066 A CN107611066 A CN 107611066A
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- chamber
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- side wall
- annealing device
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
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Abstract
The present invention provides the chamber and annealing device of annealing device, for the chamber of annealing device, even large-scale, also can further reduce and make spent labour and time.The chamber (4) of annealing device (1) has：The side wall (12) of tubular, it is used to surround treated object；And end wall (13), the opening portion (12b) of a side of its closed side wall (12).Chamber (4) is that multiple parts (side wall (12), end wall (13), column connecting member (14), beam-like connecting member (15)) mechanical bond using silica as main component is got up and formed.
Description
The application be Application No. 201410356050.3, the applying date be on July 24th, 2014, it is entitled " heat at
The divisional application of the application for a patent for invention of the chamber and annealing device of reason device ".
Technical field
The present invention relates to the chamber of the annealing device for being handled under heated environment treated object, with
And annealing device.
Background technology
It is known to for the annealing device being heat-treated to the processing substrate such as glass substrate (for example, referring to patent text
Offer 1).As an example of annealing device, the annealing device described in patent document 1 has heat treatment container.The heat
Process container is quartz ampoule.
Citation
Patent document 1：Japanese Unexamined Patent Publication 2010-177653 publications (0017 section)
In recent years, as the maximization of processing substrate, the size of quartz ampoule also have the tendency of maximization.Wherein, due to strong
The reasons why in terms of degree etc., it is difficult to replace quartz ampoule with metal pipe.Therefore, larger sized quartz ampoule is sought.However, system
It is high to make large-scale quartz ampoule complexity.Specifically, above-mentioned quartz ampoule is an independent part.Thus, for example making
During quartz ampoule, such operation can be produced：Make the side wall and end wall of quartz ampoule respectively, then, by these large-scale side walls and
End wall welds.Such weld job is to spend labour and time.
The content of the invention
The present invention in view of the foregoing, it is intended that for the chamber of annealing device, even large-scale,
It can further reduce and make spent labour and time.
(1) in order to solve above-mentioned problem, the chamber of the annealing device in terms of some of the invention is characterised by, its
Possess：The side wall of tubular, it is used to surround treated object；And end wall, it closes the opening portion of a side of the side wall, described
Chamber is that multiple part mechanical bonds using silica as main component are got up and formed.
In addition, above-mentioned " mechanical bond " refers to, multiple parts are being maintained into (can separate for single part each other
) in the state of state, be combined with each other.
According to the structure, chamber is formed by the part using silica as main component.Thus, the intensity and heat resistance of chamber
It is excellent, it can fully bear use in high temperature environments.Also, chamber is that multiple part mechanical bonds are got up and formed
's.According to the structure, when making chamber, the such cost labour of the multiple parts of welding and the work of time can be reduced as far as possible
Industry.Limited therefore, it is possible to the size not by chamber, further reduce labour and time that the making of chamber is spent.According to
The above, according to the present invention, for the chamber of annealing device, even large-scale, it also can further reduce making
The labour spent and time.
(2) preferably, the material of the multiple part includes at least one of glass, quartz and ceramics.
According to the structure, the chamber of intensity and excellent heat resistance can be relatively easily realized.
(3) preferably, the multiple part includes multiple flat-shaped parts and multiple 1st connecting members, multiple described
Flat-shaped part is arranged in a manner of being formed tubular on the whole, the flat-shaped part that the 1st connecting member will abut against that
This is linked up.
According to the structure, by combining multiple flat-shaped parts, the side wall of tubular can be realized.Also, multiple tabulars
Part can for example be conveyed with overlapping state.Therefore, it is possible to easily carry out conveying operation, the i.e. side of flat-shaped part
The conveying operation of wall.Also, by the flat-shaped part of combined planar shape, the side wall of three-dimensional shape can be formed.Thus, energy
The labour and time that enough manufactures for further reducing side wall are spent.
(4) it is further preferred that the multiple part includes the 2nd connecting member of beam-like, the 2nd connecting member will be will be more
Individual flat-shaped part mode connected to each other is set up in multiple flat-shaped parts.
According to the structure, multiple flat-shaped parts are be combined with each other using beam parts.Thereby, it is possible to prevent the flat board of side wall
Shape part is toppled over.
(5) preferably, the end wall is formed as tabular, and is placed in one end of the side wall.
According to the structure, can be realized as by loading easy operation as flat end wall in one end of side wall
Utilize the structure of one end of end wall covering side wall.
(6) in order to solve above-mentioned problem, the annealing device in terms of some of the invention possesses：Above-mentioned annealing device
Chamber；And air pressure adjustment mechanism, the air pressure that it is used to make the space in the chamber is than the space outside the chamber
Air pressure is high.
According to the structure, chamber is formed by the part using silica as main component.Thus, the intensity and heat resistance of chamber
It is excellent, it can fully bear use in high temperature environments.Also, chamber is that multiple part mechanical bonds are got up and formed
's.According to the structure, when making chamber, the such cost labour of the multiple parts of welding and the work of time can be reduced as far as possible
Industry.Limited therefore, it is possible to the size not by chamber, further reduce labour and time that the making of chamber is spent.According to
The above, according to the present invention, for the chamber of annealing device, even large-scale, it also can further reduce making
The labour spent and time.Also, air pressure adjustment mechanism so that the space in chamber air pressure than chamber outside space gas
High mode is pressed to be acted.Thereby, it is possible to suppress to invade the sky in chamber in foreign matter existing for the outside of chamber (particle)
Between.Therefore, even in producing gap between the side wall of modular chamber and end wall etc., can also suppress chamber outside it is different
Thing invades the space in chamber.Therefore, it is possible to suppress the situation that above-mentioned foreign matter is attached to treated object.Thus, according to this hair
Bright heat treatment measure, in the same manner as the situation that chamber is formed as an independent part, it can suppress to be located because foreign matter is attached to
Caused by managing thing, treated object produce bad situation.
Invention effect
According to the present invention, for the chamber of annealing device, even large-scale, it also can further reduce and make institute
The labour of cost and time.
Brief description of the drawings
Fig. 1 is the sectional view of the annealing device of embodiments of the present invention.
Fig. 2 is the stereogram of the chamber of annealing device.
Fig. 3 is the exploded perspective view of chamber.
Fig. 4 is the sectional view of chamber, and shows the state of chamber viewed from above.
Fig. 5 is the enlarged drawing of Fig. 3 major part.
Fig. 6 is the sectional view of the major part of variation.
Label declaration
1：Annealing device；
4：Chamber；
9：Gas supply device (air pressure adjustment mechanism)；
12：Side wall (multiple parts)；
13：End wall (multiple parts)；
14：1st connecting member (multiple parts)；
15：2nd connecting member (multiple parts)；
16：Flat-shaped part；
100：Treated object.
Embodiment
Below, the mode for implementing the present invention is illustrated referring to the drawings.In addition, the present invention can be widely used in
The annealing device being heat-treated to treated object.
Fig. 1 is the sectional view of the annealing device 1 of embodiments of the present invention, shows the annealing device from side
1 state.Fig. 2 is the stereogram of the chamber 4 of annealing device 1.Fig. 3 is the exploded perspective view of chamber 4.Fig. 4 is cuing open for chamber 4
View, and the state of chamber 4 viewed from above is shown.
Reference picture 1, annealing device 1 are configured to implement heat treatment to the surface of treated object 100.It is more specific next
Say, annealing device 1 is configured to, can be by supplying heated gas towards treated object 100, to treated object 100
Surface implement heat treatment.
Treated object 100 is, for example, glass substrate or semiconductor substrate etc., in the present embodiment, is formed as the flat of rectangle
Tabular.
Annealing device 1 has：Substrate 2, heater 3, chamber 4, seal member 5,6, supporting mass (boat) 7, lift
Structure 8 and gas supply device 9.
Substrate 2 is arranged to the part of supports heaters 3 and chamber 4.In the center of substrate 2 formed with through hole.Heating
Device 3 is configured to cover the through hole from top.
Heater 3 is, for example, electrothermal heater, in the present embodiment, is configured to gas being heated to 600 DEG C of left sides
It is right.Heater 3 is integrally formed as box-like, and with opening portion 3a unlimited down.The opening portion 3a of heater 3 is by substrate 2
Supporting.There is chamber 4 in the space configuration surrounded by heater 3.
Chamber 4 is structured to the process chamber being heat-treated to treated object 100.Chamber 4 is integrally formed as box-like,
And with opening portion 4a unlimited down.The opening portion 4a of chamber 4 contacts with seal member 5, and is propped up via the seal member 5
Hold in substrate 2.Seal member 5 is the endless member for having heat resistance, and it is by the opening portion 4a of chamber 4 and substrate 2 upper surface
Between airtightly seal.Space 4b in chamber 4 through substrate 2 through hole and continuously to the space of the lower section of substrate 2.
The detailed construction of chamber 4 is described below.When annealing device 1 carries out heat treatment action, the space 4b configurations in chamber 4
There is treated object 100.Treated object 100 is for example supported in supporting mass 7 with the state vertically erected.
Supporting mass 7 is set in order to which treated object 100 is configured in chamber 4.Supporting mass 7 is for example formed as plectane
Shape, and there is pedestal in center.The bottom of multiple treated objects 100 is fixed on the pedestal.Each treated object 100 is with mutual
The state being arranged in parallel is supported in pedestal.Seal member 6 is configured with the upper surface of the peripheral part of supporting mass 7.Sealing
Part 6 is the endless member for having heat resistance, and it will be airtight between the upper surface of the peripheral part of supporting mass 7 and the lower surface of substrate 2
Ground seals.Supporting mass 7 is supported by elevating mechanism 8, can be together with treated object 100 by the action of elevating mechanism 8
Shift in the vertical direction.Gas supply device 9 is installed in supporting mass 7.
Gas supply device 9 is configured to supply the gas for heat treatment to the inside of chamber 4.Gas supply device 9 is
One example of " maintenance unit " of the present invention.Gas supply device 9 has flue 10 and pump 11.Flue 10 runs through
Supporting mass 7, the space 4b of one end of flue 10 into chamber 4 are opened wide.Pump 11 passes through the gas from gas tank (not shown)
Flue 10 and be supplied to the space 4b in chamber 4.Thus, the space 4b in chamber 4 is slightly pressurizeed (micro- pressurization).Thus,
The air pressure of space 4b in chamber 4 is higher than the air pressure outside chamber 4.
Action when being heat-treated as annealing device 1, first, treated object 100 is being supported by what body 7 supported
It is configured under state in the space 4b in chamber 4.Then, gas supply device 9 is supplied gas in the 4b of space and added
The heating action of hot device 3.Thus, the space 4b in chamber 4 is heated, so as to carry out the heat treatment of treated object 100.
Then, the detailed construction of chamber 4 is illustrated.1~Fig. 4 of reference picture, chamber 4 are by with silica (SiO2) be
Multiple parts of main component mechanically combine and formed.
Specifically, chamber 4 has：Side wall 12, end wall 13, the 1st connecting member 14 and the 2nd connecting member 15.
In the present embodiment, each part (side wall 12, end wall 13, the 1st connecting member 14, the 2nd connecting member of chamber 4
15) all it is the quartzy material made.In addition, the material of each part of chamber 4 is not limited to quartz or glass, can also be
Ceramics.So, chamber 4 is for example including at least one of glass, quartz and ceramics.
Side wall 12 is set to surround treated object 100, and it is integrally formed as tubular.In present embodiment
In, side wall 12 is integrally formed as polygonal shape (octagon-shaped).Side wall 12, which is formed as having, can accommodate multiple located
Manage the size of thing 100.
Side wall 12 has multiple (being in the present embodiment 8) flat-shaped parts 16 (16a~16h).In addition, it is being referred to as
In the case of multiple flat-shaped part 16a~16h, referred to simply as flat-shaped part 16.
Each flat-shaped part 16 is formed as the tabular of rectangle.The thickness of each flat-shaped part 16 is, for example, several mm or so.
Flat-shaped part 16 can be conveyed with overlapped state.The edge of each flat-shaped part 16 be by machining and
What shaping formed.Flat-shaped part 16 is lined up in a manner of being integrally formed as tubular.Specifically, put down for adjacent 2
Plate-shaped member 16 is configured with the state to be inclined towards each other in top view.2 adjacent flat-shaped parts 16 connect using the 1st
Knot part 14 and be interconnected.
Fig. 5 is the enlarged drawing of Fig. 3 major part.3~Fig. 5 of reference picture, in the present embodiment, the 1st connecting member 14
Quantity it is identical with the quantity of flat-shaped part 16.1st connecting member 14 is configured between 2 adjacent flat-shaped parts 16.
Each 1st connecting member 14 is the post part vertically slenderly extended, in the present embodiment, is formed as quadrangular
Shape.Each 1st connecting member 14 has a pair of groove portions 14a, 14b.
The part that 2 flat-shaped parts 16 that groove portion 14a, 14b is arranged to will abut against link up.Groove portion 14a, 14b
A pair of sides of the 1st connecting member 14 are formed at, and lower end is extended to from the upper end of the 1st connecting member 14.In top view,
Groove portion 14a, 14b is formed on the direction to incline towards each other.Groove portion 14a, 14b and an edge of corresponding flat-shaped part 16 are embedding
Close.Thus, 2 adjacent flat-shaped parts 16 link up via the 1st connecting member 14.In the upper of each 1st connecting member 14
Surface is formed with convex portion 14c.Convex portion 14c is arranged to the projection being embedded in the through hole described later of end wall 13.According to upper
The structure stated, multiple flat-shaped parts 16 are linked up successively using the 1st connecting member 14 of column along the circumference of side wall 12,
Form the side of the closure of polygon-shaped (tubular).
2nd connecting member 15 is arranged to the part of 2 flat-shaped parts 16a, 16e beam-like linked up, its quilt
It is set up in described flat-shaped part 16a, 16e.
In the present embodiment, provided with 2 the 2nd connecting members 15.Each 2nd connecting member 15 will be arranged side by side in parallel to each other
2 flat-shaped parts 16a, 16e are connected to each other.
Each 2nd connecting member 15 has beam portion 15a and a pair of end portions 15b, 15c.
Beam portion 15a is formed as elongated shaft-like, in the present embodiment, is formed as quadrangular shape.Beam portion 15a is configured in
In parallel to each other between 2 flat-shaped parts 16a, 16e arranged side by side upper end.Formed with a pair of end portions on beam portion 15a
15b、15c。
A pair of end portions 15b, 15c is arranged to the part combined with corresponding flat-shaped part 16a, 16e.A pair of end portions
15b, 15c are respectively formed as bulk.A pair of end portions 15b, 15c is tied with corresponding flat-shaped part 16a, 16e upper end respectively
Close.
Specifically, in flat-shaped part 16a upper end formed with groove portion 18a, 18a, in the upper of flat-shaped part 16e
End is formed with groove portion 18b, 18b.Groove portion 18a, 18a is with the corresponding side of end 15b, 15b of the side with the 2nd connecting member 15
Formula is formed.Each groove portion 18a, 18a is, for example, to be formed as the groove of rectangle during side view observation.End 15b, 15b of one side is embedded in groove
Portion 18a, 18a.Depressed part 15d is respectively formed with end 15b, 15b of a side lower surface.Depressed part 15d is supported on pair
The bottom for groove portion 18a, 18a answered.In addition, end 15c and flat-shaped part the opposing party to(for) each 2nd connecting member 15
The mode of 16e corresponding groove portion 18b mechanical bond, due to also same as described above, so omitting the description.
According to above-mentioned structure, the height of the upper surface of the 1st connecting member 14, the height of the upper surface of the 2nd connecting member 15
What the height of the upper end of degree and flat-shaped part 16 (16a~16h) was generally flush with.In a pair of end portions of each 2nd connecting member 15
15b, 15c upper surface are for example formed with 2 convex portion 15e.Convex portion 15e is arranged to be embedded in the insertion described later of end wall 13
Projection in hole.
Reference picture 2, Fig. 3 and Fig. 5, end wall 13 are arranged to the opening portion 12a on the top of closed side wall 12 part.End wall
13 are integrally formed as tabular, and are placed in the upper end of side wall 12.In top view, shape and the side wall 12 of end wall 13
Shape it is corresponding.Specifically, in the present embodiment, end wall 13 is formed as octagon-shaped.In the present embodiment, end wall
13 thickness is set to identical with the thickness of side wall 12.
End wall 13 has multiple (being in the present embodiment 3) flat-shaped parts 19 (19a~19c).In addition, it is being referred to as
In the case of flat-shaped part 19a~19c, referred to simply as flat-shaped part 19.
Flat-shaped part 19b is formed as the tabular of rectangle.Flat-shaped part 19a, 19c are shaped generally as trapezoidal shape.
According to flat-shaped part 19a, 19b, 19c order, these flat-shaped parts 19 are configured, thus, have generally formed octagon
The end wall 13 of shape.Flat-shaped part 19a~19c can be conveyed with overlapped state.Each flat-shaped part 19a~
19c edge is formed by machining and shaping.
On the flat-shaped part 19 of end wall 13 formed with the through hole chimeric with the convex portion 14c of the 1st connecting member 14, with
And the through hole chimeric with the convex portion 15e of the 2nd connecting member 15.It is embedding in the through hole of the flat-shaped part 19 of end wall 13
Entering has corresponding convex portion 14c, 15e.Also, the flat-shaped part 19 of end wall 13 be supported in side wall 12 flat-shaped part 16,
1st connecting member 14 and the 2nd connecting member 15.
Thus, the machinery of flat-shaped part 16 of the connecting member 14 of end wall 13 and the 1st, the 2nd connecting member 15 and side wall 12
Ground combines.According to above-mentioned structure, the space surrounded by side wall 12 and end wall 13 turns into the space 4b in chamber 4.
It is not special between each part (side wall 12, end wall 13, the 1st connecting member 14, the 2nd connecting member 15) of chamber 4
Sealing mechanism is not set.Accordingly, it is considered to for example it is possible to from flat board to the particle etc. to be floated in the space of the outside of chamber 4
Invaded between the connecting member 14 of shape part 16 and the 1st or between flat-shaped part 1 and end wall 13.However, using shown in Fig. 1
Gas supply device 9, the air pressure of the space 4b in chamber 4 is set higher than the air pressure of the outside of chamber 4.Thus, even if
Seal construction is not set between each part of chamber 4, can also suppress particle and invade space 4b in chamber 4.
Chamber 4 with above-mentioned structure is in conveying as the state being decomposed.In delivery chamber 4, side wall 12
Each flat-shaped part 19 of each flat-shaped part 16 and end wall 13 is for example conveyed with the state of coincidence.Moreover, in operating personnel
When assembling chamber 4, it is be combined with each other between 2 flat-shaped parts 16 that operating personnel will abut against first by the 1st connecting member 14.
Thus, side wall 12 is completed.Then, operating personnel sets up in be parallel to each other 2 of side wall 12 between flat-shaped part 16a, 16e
2nd connecting member 15.Thereby, it is possible to prevent each flat-shaped part 16 of side wall 12 from toppling over.Then, operating personnel sets end wall 13
Put in the upper end of side wall 12.End wall 13 due to being supported by the 1st connecting member 14, the 2nd connecting member 15 and flat-shaped part 16 and
Inhibit flexure.Thus, chamber 4 is completed.
As described above, according to the annealing device 1 of present embodiment, chamber 4 is by using silica as main component
Part (side wall 12, end wall 13, the 1st connecting member 14 and the 2nd connecting member 15) formation.Thus, the intensity of chamber 4 and heat-resisting
Property is excellent, can fully bear use in high temperature environments.Also, chamber 4 be by multiple parts (side wall 12, end wall 13,
1st connecting member 14 and the 2nd connecting member 15) mechanical bond gets up and formed.According to the structure, when making chamber 4, energy
Enough reduce as far as possible welds the such cost labour of multiple parts and the operation of time.Therefore, it is possible to not by the size of chamber 4
Limitation, further reduce labour and time that the making of chamber 4 is spent.According to above content, for the chamber of annealing device 1
Room 4, even large-scale, it also can further reduce and make spent labour and time.
Here, the larger volume chambers of the existing quartz system to being formed multiple part integrations using welding etc. are said
It is bright, according to such chamber, when making instrument etc. easily and quartz contact, so as to which breakage easily occurs for quartz chamber.Also,
Existing larger volume chambers can not decompose when being conveyed, so as to need carefully to handle so as not to occur caused by contact etc.
Breakage, processing is difficult.Also, the manufacturing cost of larger volume chambers increases.
On the other hand, according to the chamber 4 of present embodiment, when making chamber 4, each portion of chamber 4 is respectively formed
Part (side wall 12, end wall 13, the 1st connecting member 14, the 2nd connecting member 15).Therefore, it is possible to reduce the instrument when making chamber 4
Etc. the possibility being in contact, as a result, chamber 4 is not susceptible to breakage.Also, can be respectively defeated in delivery chamber 4
Serve and state all parts.Thus, in delivery chamber 4, it can easily suppress above-mentioned all parts and instrument etc. and contact and send out
It is raw damaged.Thus, the processing of chamber 4 is easy.Also, need not be integrated by the above-mentioned all parts of chamber 4 by welding etc.,
So as to further reduce the manufacturing cost of chamber 4.
Also, according to annealing device 1, the material of chamber 4 includes at least one of glass, quartz and ceramics (at this
It is quartz in embodiment).According to the structure, the chamber of intensity and excellent heat resistance can be relatively easily realized.
Also, according to annealing device 1, by combining multiple flat-shaped parts 16 (16a~16h), tubular can be realized
Side wall 12.Also, each flat-shaped part 16a~16h can for example be conveyed with overlapping state.Therefore, it is possible to easy
The conveying operation of the conveying operation of ground progress flat-shaped part 16, i.e. side wall 12.Also, pass through the tabular of combined planar shape
Part 16, the side wall 12 of three-dimensional shape can be formed.Labour that manufacture thereby, it is possible to further reduce side wall 12 is spent and
Time.
Also, according to annealing device 1, multiple flat-shaped part 16a, 16e phase using the 2nd connecting member 15 of beam-like
Mutually combine.Thereby, it is possible to prevent the flat-shaped part 16 of side wall 12 from toppling over.
Also, according to annealing device 1, end wall 13 is formed as tabular, and is placed in the upper end of side wall 12.According to this
Structure, it can be realized as utilizing end wall 13 by loading easy operation as flat end wall 13 in the upper end of side wall 12
Cover the structure of the upper end of side wall 12.
Also, according to annealing device 1, gas supply device 9 so that the space 4b in chamber 4 air pressure than chamber 4 outside
The high mode of air pressure in space acted.Thereby, it is possible to suppress to invade in foreign matter (particle) existing for the outside of chamber 4
Space 4b in chamber 4.Therefore, even in producing gap between the side wall 12 of modular chamber and end wall 13 etc., also can
The foreign matter of the outside of suppression chamber 4 invades the space of the inside of chamber 4.It is attached to therefore, it is possible to suppressing above-mentioned foreign matter and is located
Manage the situation of thing 100.Thus, in the same manner as the situation for being formed as an independent part with chamber 4, can suppress because foreign matter is attached to
Caused by treated object 100, treated object 100 produce bad situation.
More than, embodiments of the present invention are illustrated, but the present invention is not limited to above-mentioned embodiment.This hair
It is bright to carry out various changes in the range of claims record.
(1) in the above-described embodiment, with using the gas supply device 9 configured in the lower section of chamber 4 come in chamber 4
Space 4b gas pressurized mode exemplified by be illustrated.However, it is also possible to it is not so.For example, it is also possible to using to
The structure of the inert gases such as nitrogen is imported between 1st connecting member 14 of column and the flat-shaped part 16 of side wall 12.If
The space 4b introduced inert gas into chamber 4 structure, the present invention can be applied to the process of low oxygen concentration.
(2) in addition, in the above-described embodiment, in a manner of side wall 12 is octagon-shaped when top view exemplified by enter
Explanation is gone.However, it is also possible to it is not so.For example, side wall 12 can also be quadrangle form in top view.In the feelings
Under condition, as shown in fig. 6, groove portion 14a, 14b of the 1st connecting member 14 is formed as being mutually perpendicular to during top view.In this case,
Be formed as rectangle using 4 flat-shaped parts 16, and by end wall 13.
The chamber of annealing device of the invention as being handled under heated environment treated object,
And annealing device can be used widely.
Claims (5)
- A kind of 1. chamber of annealing device, it is characterised in thatThe chamber of the annealing device possesses：The side wall of tubular, it is used to surround treated object；AndEnd wall, it closes the opening portion of a side of the side wall,The chamber is that multiple part mechanical bonds using silica as main component are got up and formed,The multiple part includes being used to form multiple side wall flat-shaped parts of the side wall, for forming the end wall Multiple end wall flat-shaped parts and beam-like connecting member,The end wall has the structure that multiple end walls are configured successively with flat-shaped part, so as to be integrally formed as flat board Shape,Multiple side walls are arranged with flat-shaped part in a manner of being formed tubular on the whole,The beam-like connecting member is with by arranged side by side in parallel to each other 2 side in multiple side wall flat-shaped parts Wall is set up in multiple side wall flat-shaped parts with flat-shaped part mode connected to each other.
- 2. the chamber of annealing device according to claim 1, it is characterised in thatThe multiple part includes multiple column connecting members,The side wall flat-shaped part that the column connecting member is configured to will abut against is connected to each other,The column connecting member has a pair of groove portions,The pair of groove portion is chimeric with an edge of planar portion material with the side wall.
- 3. the chamber of annealing device according to claim 1, it is characterised in thatThe end wall is placed in one end of the side wall and the beam-like connecting member.
- 4. the chamber of annealing device according to claim 1, it is characterised in thatThe material of the multiple part includes at least one of glass, quartz and ceramics.
- A kind of 5. annealing device, it is characterised in thatThe annealing device possesses：The chamber of annealing device described in any one of 1~claim 4 of claim；AndAir pressure adjustment mechanism, it is used to make the air pressure in the space in the chamber higher than the air pressure in the space outside the chamber.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP2013-155916 | 2013-07-26 | ||
| JP2013155916A JP2015025623A (en) | 2013-07-26 | 2013-07-26 | Chamber for thermal treatment equipment, and thermal treatment equipment |
| CN201410356050.3A CN104347454B (en) | 2013-07-26 | 2014-07-24 | The chamber and annealing device of annealing device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410356050.3A Division CN104347454B (en) | 2013-07-26 | 2014-07-24 | The chamber and annealing device of annealing device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107611066A true CN107611066A (en) | 2018-01-19 |
| CN107611066B CN107611066B (en) | 2021-05-07 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410356050.3A Active CN104347454B (en) | 2013-07-26 | 2014-07-24 | The chamber and annealing device of annealing device |
| CN201710846916.2A Active CN107611066B (en) | 2013-07-26 | 2014-07-24 | Chamber for heat treatment apparatus and heat treatment apparatus |
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| CN201410356050.3A Active CN104347454B (en) | 2013-07-26 | 2014-07-24 | The chamber and annealing device of annealing device |
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| JP (1) | JP2015025623A (en) |
| KR (2) | KR101612614B1 (en) |
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| WO2018089412A1 (en) | 2016-11-08 | 2018-05-17 | O.I. Corporation | Catalyst guard |
| JP6960845B2 (en) * | 2017-12-21 | 2021-11-05 | 株式会社Ｃｆｃデザイン | Muffle structure for cylindrical furnaces made of carbon / carbon composite material |
| TWM581661U (en) * | 2019-03-07 | 2019-08-01 | 群翌能源股份有限公司 | Combined protection barrel for high-temperature manufacturing process protected by inert atmosphere protection |
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2013
- 2013-07-26 JP JP2013155916A patent/JP2015025623A/en active Pending
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2014
- 2014-06-25 TW TW106132267A patent/TWI644072B/en active
- 2014-06-25 TW TW103121853A patent/TWI616633B/en active
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| US4897140A (en) * | 1986-05-19 | 1990-01-30 | Peter Opsvik | Method for making a pipe-shaped body of wood |
| JP2000000147A (en) * | 1998-06-17 | 2000-01-07 | Takeguchi Shinichi | Glass structure and its structural material |
| US20070169701A1 (en) * | 2006-01-21 | 2007-07-26 | Integrated Materials, Inc. | Tubular or Other Member Formed of Staves Bonded at Keyway Interlocks |
| US20100009489A1 (en) * | 2008-07-08 | 2010-01-14 | Chan Albert Tu | Method and system for producing a solar cell using atmospheric pressure plasma chemical vapor deposition |
| CN103125012A (en) * | 2010-09-27 | 2013-05-29 | 东丽工程株式会社 | Substrate treatment system |
| CN202393209U (en) * | 2011-08-24 | 2012-08-22 | 徐玉继 | Special assembled furnace kiln device for cover-type round large workpiece |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201802423A (en) | 2018-01-16 |
| KR101562768B1 (en) | 2015-10-22 |
| TWI644072B (en) | 2018-12-11 |
| TW201809570A (en) | 2018-03-16 |
| TWI616633B (en) | 2018-03-01 |
| TW201516366A (en) | 2015-05-01 |
| KR20150101442A (en) | 2015-09-03 |
| JP2015025623A (en) | 2015-02-05 |
| CN104347454A (en) | 2015-02-11 |
| KR20150013027A (en) | 2015-02-04 |
| KR101612614B1 (en) | 2016-04-14 |
| TWI644071B (en) | 2018-12-11 |
| CN104347454B (en) | 2017-10-13 |
| CN107611066B (en) | 2021-05-07 |
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