CN1035135C - 高温全息光栅及其制造方法 - Google Patents

高温全息光栅及其制造方法 Download PDF

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CN1035135C
CN1035135C CN93106837A CN93106837A CN1035135C CN 1035135 C CN1035135 C CN 1035135C CN 93106837 A CN93106837 A CN 93106837A CN 93106837 A CN93106837 A CN 93106837A CN 1035135 C CN1035135 C CN 1035135C
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high temperature
holographic grating
grating
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CN1088312A (zh
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谢惠民
戴福隆
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Tsinghua University
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Abstract

高温全息光栅,它是将可动光源制作全息光栅技术与真空镀膜技术结合研制出来的,是一种具有高灵敏度的位移测量基本元件。它是采用双镀层光刻法制作,由两抗氧化能力强的金属镀层构成。两镀层的金属材料相同时如Cr-Cr,则构成位相型高温全息光栅,若两镀层金属材料不同,如Au-Cr则构成振幅型高温全息光栅。本发明的高温全息光栅,频率高,f≤2400L/mm,工作温度范围由常温到950℃均可,抗氧化力强,为光学测量方法在高温领域中的应用奠定了基础。

Description

高温全息光栅及其制造方法
本发明所属技术领域为光测力学,无损检测。
高频位相栅是云纹干涉法进行物体变形测量的基本元件,目前常温高频位相栅的制作工艺和试件栅转移技术已趋成熟,随着新型材料高温力学性能研究和航空、航天、动力工业发展对高温元件的变形实测工作的需要,发展云纹干涉法在高温领域的应用日益受到国内、外学者的关注。
目前云纹干涉法在高温领域测量的温度范围较低,一般只能对200℃以下的变形构件进行分析,1988年柯鲁德提出使用镍网制作高温栅,该光栅需要使用高温陶瓷胶与物体固化连接,限制了其在现埸条件下的应用。后来波斯特曾提出利用等离子体刻蚀技术制作高温位相栅,至今未能实现。目前光测实验力学中使用的高温云纹光栅,多采用光栅拷贝法并结合真空镀膜技术制作的单镀层高温栅,属于高温振幅型粗栅,其栅线频率在100L/mm。
相近技术的引用材料
1.波斯特等,″云纹干涉法中的零厚度试件栅″,《实验力学》美,1991年第2期,P45-47页。
2.柯鲁德″长期高温条件下使用的云纹光栅″,《实验力学》美,1979年10月,P19-21页。
本发明的目的,针对现有技术存在的问题,本发明者提出双镀层高温全息光栅,可做为高温变形测量的基本元件使用,为云纹干涉法,光栅应变计法及超细网格法在高温领域高灵敏度光学测量工作的开展奠定了基础。
本发明的目的由以下主要技术实现的
用可动光源制作高温全息光栅技术与真空镀膜技术结合起来研制出的高温全息光栅,本发明者提出用双镀层光刻法制作,由两抗氧化能力强的金属镀膜构成。具体工艺流程如下:
首先对试件基体表面抛光,在其上镀一层在高温下难氧化的金属膜,然后涂布光刻胶,可用正型光刻胶,用可动光源制作全息光栅,在制作的光栅上镀一层高温下难氧化的金属膜,除去光刻胶,而形成双镀层高温全息光栅。
高温全息光栅分为振幅型和位相型。由金属Au-Cr构成的双镀层高温全息光栅为振幅型,由金属Cr-Cr构成的双镀层高温全息光栅为位相型。它们的几何形状均为方波形,其频率f≤2400L/mm,工作温度从常温到950℃范围内均可。
附图
图1双镀层光刻法制作高温全息光栅工艺流程图
图2高温全息光栅结构形状示意图
图3制作全息光栅的光路系统图
结合附图说明实现本发明的具体技术方案和具体结构。
目前在光测实验力学中使用的高温云纹光栅,一般使用单镀层并结合光栅拷贝技术制作,这种光栅的频率在100L/mm以下,无法应用于高灵敏度的光学方法对高温物体变形的测量。本发明的高温全息光栅采用双镀层光刻法制作,它由两抗氧化能力强的金属镀层构成。双镀层光刻法制作高温全息光栅的工艺流程图见图1。首先在试件表面抛光1,然后在其表面镀一层在高温条件下难氧化的金属膜2,涂布光刻胶3,经曝光制作全息光栅4,在光栅上镀一层在高温条件下难氧化的金属膜5,用有机溶剂一般用丙酮除去光刻胶6,则在试件表面上形成双镀层高温全息光栅,两层金属镀膜可选用相同金属材料,也可选用不同金属材料。根据需要若第一层金属镀膜7,和第二层金属镀膜8选用相同金属材料,如Cr-Cr则构成位相型高温全息光栅;若第一层金属镀膜7和第二层金属镀膜8选用不同金属材料,第一层金属镀膜7为金(Au),第二属金属镀膜8选用与第一层金层镀7具有高反差的金属材料铬(Cr),则试件表面形成由Au-Cr构成的振幅型高温全息光栅,它特别适用于网格法对高温物体变形的测量。
采用双镀层光刻法制作的高温全息光栅几何形状及结构见图2。它由基体9,第一层金属镀膜7,光刻胶一般用正型光刻胶,第二层金属镀膜8,构成方波形高温全息光栅。将可动光源制作全息光栅技术应用于制作高温栅,把高温栅的频率提高了10-20倍,一般频率f≤2400l/mm,其工作温度从常温到950℃的温度范围均适用。
全息光栅的光学系统见图3。激光器11发出的光由带有楔角的楔块12经电机带动旋转,使入射激光光速成为可动光源。BE为扩束镜,L为准直镜,M,M1,M2,M3为反射镜,BS为分光比为1∶1的分光镜,SP为光栅记录面。将涂有光刻胶的试样放入光路中进行曝光,经显影、定影之后,在试样表面记录下频率为f的全息光栅。
f=2smα/λ    式中λ为使用激光波长
采用上述可动光源制作高温全息光栅,可以通过降低光源的相干性,消除散斑噪声,提高光栅的衍射效率,并改善了光栅表面的均匀性。
本发明的高温全息光栅,频率高,工作温度从常温到950℃范围均可以,抗氧化能力强,光栅的衍射效率高,光栅表面均匀性好。高温全息光栅的制作成功为云纹干涉法,光栅应变计法等高灵敏度光学测量方法在高温领域的应用奠定了基础。

Claims (7)

1、一种高温全息光栅,它由基体9,金属镀膜和光刻10构成,其特征在于该光栅为双镀层,第一层金属镀膜7,第二层金属镀膜8均为抗氧化能力强的金属镀膜,该光栅的几何形状为方波形,其频率f≤2400L/mm。
2、按照权利要求1所说的高温全息光栅,其特征在于所说的双镀层两抗氧化能力强的金属层材料为Cr-Cr,则构成位相型高温全息光栅。
3、按照权利要求1所说的高温全息光栅,其特征在于所说的双镀层两抗氧化能力强的金属层为不同金属材料Au-Cr,则构成振幅型高温全息光栅。
4、一种如权利要求1或2或3所说的高温全息光栅的制造方法,其特征在于该方法是将可动光源制作全息光栅技术与真空镀膜技术结合起来,用双镀层光刻法制作,其具体的步骤是,首先对试件基体9的表面抛光,在其上镀一层在高温下难氧化的金属膜7,然后涂布光刻胶10,再用可动光源制作全息光栅,在制作的光栅上镀一层在高温条件下难氧化的金属镀膜8,而后用有机溶剂除去光刻胶,则制成双镀层高温全息光栅。
5、按照权利要求4所说的高温全息光栅制作方法,其特征在于所说的光刻胶为正型光刻胶。
6、按照权利要求4所说的高温全息光栅制作方法,其特征在于除去光刻胶的有机溶剂为丙酮。
7、按照权利要求4所说的高温全息光栅制作方法,其特征在于所说的可动光源制作全息光栅技术,其光路系统为激光器11发出的光由带有楔角的楔块12,经电机带动旋转,使入射光速成为可动光源,BE为扩束镜,M,M1,M2,M3为反射镜,BS为分光比为1∶1的分光镜,SP为光栅记录面。
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CN100418010C (zh) * 2004-11-01 2008-09-10 中国科学院半导体研究所 同一半导体芯片不同周期全息光栅的制作方法

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CN103149614B (zh) * 2013-03-06 2015-01-07 清华大学 一种高温光栅的制作及转移方法
NO20130884A1 (no) 2013-06-21 2014-12-22 Sinvent As Sensorelement med optisk forskyvning
CN104777528B (zh) * 2015-03-12 2017-03-01 浙江大学 一种基于二维光栅结构的全金属增透系统
GB201506046D0 (en) 2015-04-09 2015-05-27 Sinvent As Speech recognition
DE102015218702A1 (de) * 2015-09-29 2017-03-30 Dr. Johannes Heidenhain Gmbh Optisches Schichtsystem

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CN100418010C (zh) * 2004-11-01 2008-09-10 中国科学院半导体研究所 同一半导体芯片不同周期全息光栅的制作方法

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