CN102956285A - Transparent conductive film and touch panel using same - Google Patents
Transparent conductive film and touch panel using same Download PDFInfo
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- CN102956285A CN102956285A CN201110254972XA CN201110254972A CN102956285A CN 102956285 A CN102956285 A CN 102956285A CN 201110254972X A CN201110254972X A CN 201110254972XA CN 201110254972 A CN201110254972 A CN 201110254972A CN 102956285 A CN102956285 A CN 102956285A
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Abstract
The invention relates to a transparent conductive film which comprises a plurality of conducting strips extending along different directions and connected with each other, wherein the plurality of conducting strips are arranged in patterns, so that the transparent conductive film has impedance anisotropy; the plurality of conducting strips comprise a plurality of first conducting strips arranged at intervals and extending along a first direction, and a plurality of second conducting strips arranged at intervals and extending along a second direction; the second conducting strips are arranged between the first conducting strips and electrically connected with the first conducting strips; one of the first direction and the second direction is a low impedance direction; and the resistivity of the transparent conductive film in the low impedance direction is smaller than that in other directions. In addition, the invention also relates to a touch panel which comprises at least one layer of the transparent conductive film. The transparent conductive film has impedance anisotropy, and the touch panel using the transparent conductive film can be used for realizing multipoint touch detection.
Description
Technical field
The contact panel that the present invention relates to a kind of nesa coating and use this nesa coating.
Background technology
In recent years, contact panel (Touch Panel) has been widely used in the electronic product miscellaneous, as: global positioning system (GPS), personal digital assistant (PDA), mobile phone (cellular phone) and notebook computer etc., to replace traditional input unit (as: keyboard and mouse etc.), significantly change in this design, not only promoted the man-machine interaction compatibility of these electronic installations, more because having omitted traditional input unit, and vacate more spaces, for large-scale display floater is installed, make things convenient for the user to browse data.
Nesa coating as the medium of sensing touch, is the important component of contact panel.The material of nesa coating commonly used is with tin indium oxide (ITO), tin oxide (SnO at present
2), zinc oxide (ZnO) etc. is main.Wherein, ITO because of have high light transmittance, good conductivity and easily the advantage such as etching be widely used.
Yet contact panel of the prior art only realizes that usually single-point touches detects, and the accuracy of detection of touch point is not high.
Summary of the invention
In view of this, necessaryly a kind of nesa coating is provided and uses this nesa coating can realize that multiple point touching detects and can improve the contact panel of touch point accuracy of detection.
A kind of nesa coating, this nesa coating comprises a plurality of conduction bands along the different directions extension and interconnects, these a plurality of conduction bands are arranged in pattern, make this nesa coating have impedance anisotropy, wherein, described a plurality of conduction band comprises the arrangement of a plurality of the first bus band intervals and extends along first direction, and a plurality of the second bus band intervals are arranged and are extended along second direction, described the second conduction band is arranged between described the first conduction band and with this first bus band and is electrically connected, one of described first direction and second direction are the Low ESR direction, and the resistivity of this nesa coating on described Low ESR direction is less than the resistivity of other direction.
A kind of nesa coating, this nesa coating comprises the setting of a plurality of one dimension transparent conductive bodies space and extends along first direction, between the adjacent one dimension transparent conductive body by a plurality of transparent conductive body electrical ties, wherein, described nesa coating has impedance anisotropy, described first direction is the Low ESR direction, and the resistivity of this nesa coating on described Low ESR direction is less than the resistivity of other direction.
A kind of nesa coating, this nesa coating comprises a plurality of transparent conductive bodies space setting or arranged in a crossed manner, be provided with a plurality of one dimension transparent conductive bodies between the adjacent transparent conductive body, this a plurality of one dimension transparent conductive bodies interval arranges and stretches along second direction edge, wherein, described nesa coating has impedance anisotropy, and described second direction is the Low ESR direction, and the resistivity of this nesa coating on described Low ESR direction is less than the resistivity of other direction.
A kind of contact panel comprises at least above-mentioned nesa coating of one deck, a substrate and a plurality of electrode, and this nesa coating is arranged at this substrate surface, and these a plurality of electrodes are electrically connected with this nesa coating respectively.
Compared to prior art, the nesa coating of the embodiment of the invention is owing to have impedance anisotropy, so that the resistance of conducting film differs greatly at different directions between touch point and each different electrode of distance, thereby the changing value of the sensing signal that reads from those electrodes before and after touching also differs greatly, and utilizes the changing value size of the sensing signal that this characteristic can be directly reads according to electrode to determine the position coordinates of one or more touch points.And because the impedance anisotropy of this nesa coating changes obviously the signal value of the one or more electrodes corresponding with the touch point before and after touching, can change the accuracy of detection that obvious signal value improves the touch point position coordinates according to this.
Description of drawings
The plan structure schematic diagram of the nesa coating that Fig. 1 provides for the embodiment of the invention 1.
The second direction that Fig. 2 provides for the embodiment of the invention is the plan structure schematic diagram of the nesa coating of Low ESR direction.
The nesa coating that comprises arc shape the second conduction band that Fig. 3 provides for the embodiment of the invention.
Fig. 4 for the embodiment of the invention provide comprise change width first the conduction band nesa coating.
The plan structure schematic diagram of the nesa coating that Fig. 5 provides for the embodiment of the invention 2.
The plan structure schematic diagram of the nesa coating that Fig. 6 provides for the embodiment of the invention 3.
The plan structure schematic diagram of the contact panel that Fig. 7 provides for the embodiment of the invention.
The side-looking structural representation of the contact panel that Fig. 8 provides for the embodiment of the invention.
The change in voltage curve at place, touch point in the contact panel that Fig. 9 provides for the embodiment of the invention.
The main element symbol description
| Nesa |
10 |
| The |
12 |
| The |
14 |
| |
16，102 |
| |
18 |
| |
100 |
| The |
104 |
| The |
106 |
| The |
112 |
| The |
114 |
Following embodiment further specifies the present invention in connection with above-mentioned accompanying drawing.
Embodiment
See also Fig. 1, the embodiment of the invention provides a kind of nesa coating 10, this nesa coating 10 comprises a plurality of conduction bands along the different directions extension and interconnects, these a plurality of conduction bands are arranged in pattern, make this nesa coating 10 have impedance anisotropy, wherein, described a plurality of conduction band comprises that a plurality of the first conduction bands 12 are spaced and these a plurality of first conduction bands 12 extend along first direction, and a plurality of the second conduction bands 14 are spaced and these a plurality of second conduction bands 14 extend along second direction, described the second conduction band 14 is arranged between described the first conduction band 12 and with this first conduction band 12 and is electrically connected, one of described first direction and second direction are Low ESR direction D, and the resistivity of this nesa coating 10 on described Low ESR direction D is less than the resistivity of other direction.
Because this nesa coating 10 is different in the structure of different directions, makes this nesa coating 10 have different resistivity in different directions.Can bring by a plurality of interconnective bus that forms different resistance values at different directions and form this nesa coating 10, thereby make this nesa coating 10 have impedance anisotropy.
The conduction band that this different directions has different resistance values can adopt identical or different material.When adopting identical material, preferably a uniform pattern for transparent conductive layer can be changed into banded a plurality of conduction band that interconnects and extend along different directions, utilize the bearing of trend of this conduction band and width or/and variations such as length, make the conduction band of this different directions have different resistance values, so that this nesa coating 10 impedance anisotropy on the whole.
When the conduction band of described different directions adopts different materials, can utilize the difference of conductivity between the material, make the conduction band of this different directions have different resistance.In addition, the conditions such as the width of conduction band of this different directions different materials and/or length that also can change make the conduction band of this different directions have different resistance, so that this nesa coating 10 has impedance anisotropy on the whole.Form the conduction band of different resistance in the embodiment of the invention in described first direction and second direction.
Be appreciated that the mode that other can also be arranged forms nesa coating 10, only need to guarantee this nesa coating 10 one party to resistivity less than the resistivity of other direction.
One of described first direction and second direction can be Low ESR direction D, and simultaneously, other direction is high impedance direction H, and the resistivity of this nesa coating 10 on described high impedance direction H is greater than the resistivity of other direction.First direction described in the embodiment of the invention is Low ESR direction D, and described second direction is high impedance direction H.
Described Low ESR direction D has different resistivity from high impedance direction H, but this nesa coating 10 still has conductivity at high impedance direction H, just compared to other direction, this nesa coating 10 is larger in the resistance value of high impedance direction H, and conductivity is lower.
The ratio of the resistivity of this nesa coating 10 on the resistivity on the Low ESR direction D and this high impedance direction H can be 1:30 to 1:1000.Preferably, this ratio is 1:50 to 1:200.The angle of this Low ESR direction D and this high impedance direction H can be more than or equal to 10 degree less than or equal to 90 degree.This Low ESR direction D is substantially vertical with this high impedance direction H in the embodiment of the invention.
The embodiment of the invention is that Low ESR direction D or second direction are that Low ESR direction D describes respectively with regard to described first direction.
See also Fig. 1, when described first direction was described Low ESR direction D, described second direction was high impedance direction H.This nesa coating 10 can comprise the first conduction band 12 and the second less conduction band 14 of length direction conductivity that the length direction conductivity is larger.The first conduction band 12 that this conductivity is larger extends along Low ESR direction D substantially, and the second conduction band 14 that this conductivity is less extends along high impedance direction H substantially.Perhaps, in this nesa coating 10, the quantity of the first conduction band 12 that the conductivity of extending along Low ESR direction D is larger is much larger than the second larger conduction band 14 of the conductivity of extending along high impedance direction H, thereby makes this nesa coating 10 have on the whole impedance anisotropy.The resistance of the first conduction band 12 that extends along described Low ESR direction D is much smaller than the resistance of this nesa coating 10 in other direction, and the resistance value of the second conduction band 14 that extends along described high impedance direction H is much larger than the resistance value of this nesa coating 10 in other direction.Thereby make these a plurality of first conduction bands 12 and the second conduction band 14 be connected to form network configuration by 14 electrical connections of described the second conduction band between described the first conduction band 12.When this first conduction band 12 and the second conduction band 14 adopt identical material, these each the first conduction band 12 integral body can have larger width and/or less length, and these each the second conduction band 14 integral body can have less width and/or long length.Can increase by the width that reduces described the second conduction band 14 and/or described second modes such as length of conducting electricity band 14 that increase the resistance value of this second conduction band 14, make this nesa coating 10 have impedance anisotropy.The ratio of the width of this first conduction band 12 and the second conduction band 14 can be 100:1 to 500:1.When this first conduction band 12 and the second conduction band 14 adopt different materials, can adopt the material with high conductivity to form described the first conduction band 12 at described Low ESR direction D, so that this first conduction band 12 has less resistance at this Low ESR direction D, and adopt the material with low conductivity to form the second conduction band 14 at described high impedance direction H, so that this second conduction band 14 has larger resistance at this high impedance direction H (being bearing of trend).Certainly, also can make the first conduction band 12 have less resistance at Low ESR direction D (being bearing of trend) by the first conduction band 12 and/or the second width, length or other condition of conducting electricity band 14 that changes this different materials, simultaneously, this second conduction band 14 has larger resistance at high impedance direction H.When this first direction was Low ESR direction D, this first conduction band 12 can be the one dimension transparent conductive body, and this second conduction band 14 can be one dimension or two-dimentional transparent conductive body, and this second conduction band 14 is used for being electrically connected adjacent described the first conduction band 12.But the second conduction band 14 intervals or arranged in a crossed manner between adjacent described the first conduction band 12.Described the second conduction band 14 bearing of trends can not limit, and only need to guarantee that the resistivity of this nesa coating 10 on described Low ESR direction D is much smaller than the resistivity of other direction.
See also Fig. 2, this nesa coating 10 is Low ESR direction D in described second direction, and described first direction is high impedance direction H.This nesa coating 10 comprises the first conduction band 12 that the length direction conductivity is less, and the second larger conduction band 14 of length direction conductivity.This first conduction band 12 extends along described high impedance direction H substantially, and this second conduction band 14 extends along described Low ESR direction D substantially.The resistance of the second conduction band 14 that this extends along described Low ESR direction D is much smaller than the resistance of this nesa coating 10 in other direction, and the resistance of the first conduction band 12 that extends along described high impedance direction H is much larger than the resistance of this nesa coating 10 in other direction.Similarly, when this first conduction band 12 and the second conduction band 14 adopt identical material, can be by increasing the width of this second conduction band 14, and the modes such as width that reduce this first conduction band 12 make this nesa coating 10 at the resistance of the described Low ESR direction D resistance much smaller than other direction, and at the resistance of the described high impedance direction H resistance much larger than other direction.When this first conduction band 12 and the second conduction band 14 when adopting respectively different materials, can adopt the material with high conductivity to form described the second conduction band 14 at described Low ESR direction D, so that this second conduction band 14 has less resistance at this Low ESR direction D, and adopt the material with low conductivity to form the first conduction band 12 at described high impedance direction H, so that this second conduction band 14 has larger resistance at this high impedance direction H.In addition, can utilize simultaneously and increase described the second conduction band 14 width, reduce the mode such as described the first bus strip length 12 so that this nesa coating 10 integral body have impedance anisotropy.When this second direction was described Low ESR direction, this second conduction band 14 was the one dimension transparent conductive body, and extends along described second direction.This first conduction band 12 can be one dimension or two-dimentional transparent conductive body, and space set or arranged in a crossed manner for being electrically connected this second adjacent conduction band 14 between this adjacent first conduction band 12.Namely this first conduction band 12 can not extend along described first direction, only needs to guarantee that the resistivity of this nesa coating 10 on described second direction is much smaller than the resistivity of other direction.
The embodiment of the invention is set between described a plurality of conduction bands that should extend along different directions and was not had public part, and for example, conduction band can arise from the edge of another conduction band and terminate in the edge of the 3rd conduction band.In the embodiment of the invention, there is not public part between described the first conduction band 12 and the second conduction band 14, described the second conduction band 14 is arranged between adjacent described two the first conduction bands 12, and adjacent two first conduction bands 12 with this are electrically connected.
The material of this first conduction band 12 and the second conduction band 14 can be transparent conductive material.Described transparent conductive material can be metal oxide, metal nitride, metal fluoride, conducting polymer or the carbonaceous material etc. with transparent and electrically conductive performance.Described metal oxide can be the pure metal oxides such as tin oxide (SnO2), zinc oxide (ZnO), cadmium oxide (CdO), indium oxide (In2O3), or tin indium oxide (In2O3:Sn, ITO), indium zinc oxide (ZnO:In, IZO), zinc oxide is sowed (ZnO:Ga, GZO), zinc oxide aluminum (ZnO:Al, or In2O3-ZnO, CdIn2O4, the mixed-metal oxides such as Cd2SnO4, Zn2SnO4 AZO) or the metal oxide that mixes such as titanium oxide tantalum (TiO2:Ta).Described metal nitride can be titanium nitride (TiN) etc.Described metal fluoride can be the tin oxide (SnO2:F) of fluorine doping etc.Described conducting polymer can be poly-ethyl bis ether thiophene (poly (and 3,4-ethylenedioxythiophen), PEDOT) or the synthetic (PEDOT-PSS) of PEDOT and Polystyrene Sulronate (polystyrene sulfonate, PSS) etc.Described carbonaceous material can be Graphene or carbon nano tube transparent conducting film etc., and this carbon nano tube transparent conducting film can be the composite transparent conductive film of pure nano-carbon tube nesa coating or carbon nano-tube and other transparent material.The material of this nesa coating 10 is tin indium oxide (ITO) in the embodiment of the invention.
The shape of this first conduction band 12 and this second conduction band 14 is not limit, and only need guarantee the resistivity on this nesa coating 10 is along the resistivity on the described Low ESR direction D much smaller than other direction.The shape of this first conduction band 12 and the second conduction band 14 can be vertical bar band, square waveform band, zigzag band, stairstepping band, zigzag band, arc band or wavy band etc.See also Fig. 1, the first conduction band 12 described in the embodiment of the invention and the second conduction band 14 are the vertical bar band.See also Fig. 3, in another embodiment of the present invention, this second conduction band 14 is the arc band.See also Fig. 4, the second conduction band 14 is the square waveform band described in another embodiment of the present invention.The band that can be wide band or change width of this first conduction band 12 and the second conduction band 14.See also Fig. 3, this first conduction band 12 is the band of change width in the embodiment of the invention.The shape of this first conduction band 12 can be identical or different with the shape of this second conduction band 14.Can further increase the impedance anisotropy of this nesa coating 10 by the shape that changes this first conduction band 12 or the second conduction band 14.
Can be equidistantly or the spacing that changes between the second conduction band 14 between described the first conduction band 12.When this nesa coating 10 was applied in the contact panel, the distance between adjacent two described the first conduction bands 12 and adjacent two described the second conduction bands 14 was to be difficult for being visually principle.In the embodiment of the invention, described first direction is Low ESR direction D, second direction is high impedance direction H, spaced set between this second conduction band 14, distance W between adjacent two described the first conduction bands 12 can be less than or equal to 50 microns, in the embodiment of the invention, this distance W is 30 microns.Distance L between adjacent two described the second conduction bands 14 is less than or equal to 10 millimeters, and in the embodiment of the invention, this distance L is 5 millimeters.
In addition, distance between described the first conduction band 12, the distance between the second conduction band 14, described the first conduction band 12 are not limited to above-mentioned scope with described the second conduction band 14 Widths, can determine according to field and mode that described nesa coating 10 is used.
As when this nesa coating 10 is applied to large touch panel, described distance and Width can change according to the size of this contact panel is corresponding.
The quantity of this first conduction band 12 and the second conduction band 14 can be determined according to the concrete application mode of this nesa coating 10.As, when this nesa coating 10 was applied in the contact panel as the transparency conducting layer of sensing touch, the quantity of this first conduction band 12 and the second conduction band 14 was relevant with position and the quantity of described contact panel electrode setting.Therefore, can determine according to the quantity of the electrode that is electrically connected with this first conduction band 12 or the second conduction band 14 respectively the quantity of this first conduction band 12 and the second conduction band 14.In addition, the quantity of two described the first conductions, second between the band 12 conduction band 14 can equate or not wait.Described the second conduction that length direction is adjacent can be on the same straight line between the band 14 or be crisscross arranged.
See also Fig. 6, the described nesa coating 10 of the embodiment of the invention further is provided with a plurality of optical compensation films 18 between adjacent described the first conduction band 12 or described the second adjacent conduction band 14, this optical compensation films 18 arranges with this first conduction band 12 and this second conduction band 14 equal intervals.This each described optical compensation films 18 can be the continuous film of integral body, or a plurality of spaced blooming forms this optical compensation films.The purpose that this optical compensation films 18 is set is to make described the first conduction band 12 and the second conduction band 14 to be difficult for by visual.This optical compensation films 18 has the light transmittance identical or close with this first conduction band 12 and this second conduction band 14.This optical compensation films 18 can second be conducted electricity the identical material of band 14 and forms with this by this first conduction band 12.The shape of this optical compensation films 18 is not limit in addition, only needs to guarantee equal electric insulation between this optical compensation films 18 and this first conduction band 12 and the second conduction band 14.This optical compensation films 18 is shaped as rectangle in the embodiment of the invention.This optical compensation films 18 can arrange separately, also can form with this first conduction band 12 and the second conduction band 14 in the lump patterning.
Forming the banded a plurality of of this nesa coating 10 interconnects and can form respectively or simultaneously by the mode of various patternings along the conduction band that different directions extends.Such as silk screen printing or with a uniform nesa coating global pattern.
Adopt in the embodiment of the invention homogeneous transparent conductive layer pattern with same material change into banded a plurality of interconnect and bring along the bus that different directions extends form described nesa coating 10.Because the conduction band that extends along different directions can be the patterning band that forms by the complete transparency conducting layer of patterning, therefore should conduction band is actual can be for being each other an integral body of seamless link.The method can comprise the steps:
S1 provides a substrate 16;
S2 is arranged at these substrate 16 surfaces with described transparent conductive material and forms a film, and
S3, this film of patterning forms described the first conduction band 12 and the second conduction band 14 at this film surface.
In above-mentioned steps S1, described substrate 16 plays a supportive role, and this substrate can be the transparent material substrate.Described transparent material substrate can comprise glass or macromolecule transparent material substrate.Wherein, described macromolecule transparent material substrate can be and includes polymethyl methacrylate (Polymethylmethacrylate, PMMA), polyethylene terephthalate (Polyethylene terephthalate, PET) or the substrate of the material such as polycarbonate resin (Polycarbonate, PC).
In above-mentioned steps S2, described transparent conductive material can pass through the methods such as vacuum vapour deposition, sputtering method, ion plating method, vacuum plasma CVD method, spray pyrolysis (spray pyrolysis) method, hot CVD method or sol-gal process and form described film on described substrate 16 surfaces.The embodiment of the invention adopts sputtering method that tin indium oxide is plated on described substrate 16 surfaces.
In above-mentioned steps S3, according to determining described Thinfilm pattern processing of the Low ESR direction D of the required structure of this nesa coating 10 and this nesa coating 10, make film form a plurality of the first conduction band 12 and a plurality of spaced the second conduction bands 14 of being spaced.Further, can form described optical compensation films 18 to this Thinfilm pattern processing simultaneously.The method of this patterning can be concavo-convex transfer printing, wet etch method, dry ecthing method, laser patterning method, scrape division or adhesive tape removes the method such as method and forms.
Wherein scrape division for directly with instruments such as blade, stranding cuttves unwanted described film portion being scraped, only stay the patterning nesa coating 10 that wish forms; Adhesive tape removes method for adhesive tape is adhered to the unwanted part of described film surface, and when adhesive tape removed, the viscose glue on the adhesive tape can be taken away the unwanted part of described film surface, only stays the patterning nesa coating 10 that wish forms; The laser patterning genealogy of law is with the described film surface of Ear Mucosa Treated by He Ne Laser Irradiation, by laser directly heating removing the film zone that is shone, the patterning nesa coating 10 that the position by the control Ear Mucosa Treated by He Ne Laser Irradiation forms to stay wish; Dry ecthing method and wet etch method are first in the mode of micro-photographing process and stay the photoresistance of patterning at described film surface, with ionic bombardment or the etched mode of liquid this film etching are gone out respectively the nesa coating 10 of the patterning that wish forms again; The mould of concavo-convex transfer printing genealogy of law utilization design is formed in the insulating cement bodily form on the described film, and the part that allows this film expose is the patterning nesa coating 10 that wish forms.Be appreciated that described patterned process is not limited with above-mentioned example, also can be other patterned process.Adopt the method for laser ablation that described film surface is removed described the first conduction band 12 and the second conduction band 14 in the embodiment of the invention, or the partial etching removal except described the first conduction band 12, the second conduction band 14 and described optical compensation films 18.
In the embodiment of the invention, the first direction of described nesa coating 10 is Low ESR direction D, and described second direction is high impedance direction H.Below by specific embodiment this being patterned to banded nesa coating 10 is described further.
Embodiment 1
The transparent conductive material tin indium oxide is sputtered in transparency carrier pet sheet face forms film, utilize the method for laser ablation to form wide straight banded the first conduction band 12 at this film surface according to Low ESR direction D, and high impedance direction H forms wide straight banded the second conduction band 14, thereby form described nesa coating 10, see also Fig. 1.This first conduction band 12 is basically perpendicular to this second conduction band 14.Distance W between this adjacent first conduction band 12 is 30 microns.Distance L between adjacent two described the second conduction bands 14 is 5 millimeters.
Embodiment 2
See also Fig. 5, this nesa coating 10 is basic identical with nesa coating 10 described in the embodiment 1, its difference is, the second conduction band 14 of this nesa coating 10 is the square waveform band, on the constant basis of width, the length that further increase the second conduction band 14 between these two the first conduction bands 12 increase the resistance value of this second conduction band 14.
Embodiment 3
See also Fig. 6, this nesa coating 10 is basic identical with nesa coating 10 described in the embodiment 1, its difference is, when laser ablation forms described the first conduction band 12 and the second conduction band 14, further etching forms described optical compensation films 18, and this optical compensation films 18 arranges with this first conduction band 12 and these the second conduction band 14 equal intervals.
Described nesa coating 10 can be applicable to be used in the contact panel sensing touch, the embodiment of the invention further provides a kind of contact panel, comprise at least described nesa coating 10 of one deck, a substrate and a plurality of electrode, this nesa coating 10 is arranged at this substrate surface, the mutual space isolation of these a plurality of electrodes, and be electrically connected with this nesa coating 10 respectively.Preferably, these a plurality of electrodes are arranged at respectively the one or both ends perpendicular to this nesa coating 10 Low ESR direction D.Can decide according to the design of control circuit these a plurality of electrodes to be arranged at respectively one or both ends perpendicular to this nesa coating 10 Low ESR direction D.This nesa coating 10 is arranged at the zone that this contact panel is used for the sensing position of touch.
Described contact panel can be resistance-type or capacitance type touch-control panel.Use this contact panel that is used for the nesa coating 10 of sensing position of touch and can realize multiple point touching, and because this nesa coating 10 has impedance anisotropy, no matter electric resistance touch-control panel or capacitance type touch-control panel, when using touch control object to touch this contact panel, the a plurality of electrodes adjacent with the touch point counter electrode change obvious signal value before and after all can detecting and touching, and utilize those to change the accuracy of detection that obvious signal value is easier to detect the position coordinates of touch point and can improves the touch point position coordinates.Describe with capacitance type touch-control panel in the embodiment of the invention.
See also Fig. 7 and Fig. 8, the embodiment of the invention is applied to a surface capacitance type touch panel 100 with single transparency conducting layer with this nesa coating 10, this touch panel 100 comprises a substrate 102, is arranged at described single-layer and transparent conducting film 10 and a plurality of the first electrode 104 and a plurality of the second electrode 106 on this substrate 102.These a plurality of first electrodes 104 and a plurality of the second electrode 106 are arranged at respectively described nesa coating 10 two sides vertical with Low ESR direction D, and are electrically connected with this conducting film 10 respectively.The side that defines 104 settings of described a plurality of the first electrode is first side 112, and the side that defines 106 settings of described a plurality of the second electrode is second side 114.
The described nesa coating 10 that is applied to this contact panel 100 is nesa coating 10 shown in Figure 1, and the quantity of the first conduction band 12 of this nesa coating 10 is identical with the quantity of described the first electrode 104 and the second electrode 106.Described the first electrode 104 and the second electrode 106 are electrically connected respectively with the two ends that the first conduction band 12 length directions of this nesa coating 10 extend.Described the first electrode 104 and the second electrode 106 are both as providing the drive electrode that drives signal for this contact panel 100, again as the sensing electrode that reads induced signal after touching.This driving and sensing all can be realized by a control circuit (not shown).
When the user touches this contact panel 100 with finger or other conductor, can form a coupling capacitance between the finger that contacts with this contact panel or other conductor and the described nesa coating 10, thereby cause voltage that the electrode place reads or the variation of current signal, come detected touch point according to the variation of this signal.Because this nesa coating 10 has impedance anisotropy, utilize the variation difference of the induced signal that this nesa coating 10 senses at Low ESR direction D and high impedance direction H, this contact panel 100 can realize that the multiple point touching of single transparency conducting layer detects.
The detection of described touch point can realize by the following method:
B1 provides respectively first electrode 104 and second electrode 106 of driving voltage to described contact panel 100;
B2 adopts the touch conductor to touch this contact panel 100, and the electric capacity of touch location is changed;
B3 measures and reads the first electrode 104 of described contact panel 100 and the induced signal of the second electrode 106 places output, and
B4 analyzes above-mentioned induced signal, to determine the position, touch point.
In above-mentioned steps B3, described induced signal can be the changing value of electric current, voltage, electric capacity or those parameters.The changing value curve of the voltage that this induced signal reads for described the first electrode 104 before and after touching and the second electrode 106 places in the embodiment of the invention.
In above-mentioned steps B4, can obtain the position coordinates of this touch point by the variation of the described induced signal that reads before and after touching.The embodiment of the invention provides a kind of method of determining this touch point position coordinates based on above-mentioned contact panel 100, and the method further comprises the steps:
B41 determines the position coordinates of this touch point on high impedance direction H by the voltage change curve of this first electrode 104 or the second electrode 106, and
B42 determines the position coordinates of this touch point on Low ESR direction D in conjunction with the voltage swing curve of this first electrode 104 and the second electrode 106.
See also Fig. 9, Fig. 9 is the magnitude of voltage change curve schematic diagram that described each first electrode 104 of the embodiment of the invention and the second electrode 106 places read.So that describe, at first the parameter among this figure and numbering are described: P, Q are that two fingers touch the touch point that this contact panel 100 produces simultaneously, and the coordinate of wherein establishing touch point P is (x
p, y
p), the coordinate of touch point Q is (x
q, y
q).Herein, this y
pAnd y
qBe the touch point to the distance of described first side 112.These a plurality of the first electrode 104 number consecutivelies are M
1, M
2, M
3, M
4, M
5, M
6, M
7, M
8These a plurality of the second electrode 106 number consecutivelies are N
1, N
2, N
3, N
4, N
5, N
6, N
7, N
8These a plurality of first electrodes 104 are described the second bus strip length bearing of trend at high impedance direction H() coordinate be followed successively by X
1, X
2, X
3, X
4, X
5, X
6, X
7, X
8And because described a plurality of the second electrodes 106 are relative one by one with described a plurality of the first electrodes 104, therefore, this second electrode 106 respect to one another is also identical at the coordinate of high impedance direction H with the first electrode 104, and namely these a plurality of second electrodes 106 also are X at the coordinate of high impedance direction H
1, X
2, X
3, X
4, X
5, X
6, X
7, X
8Below when describing each first electrode 104 or each the second electrode 106, will substitute with its numbering separately respectively.In addition, Δ V
1iM for described the first electrode 104
iVoltage change before and after the touch that the electrode place reads, n=1,2 ... 8; Correspondingly, Δ V
2iN for described the second electrode 106
iThe changing value of voltage before and after the touch that the electrode place reads.
(1) determines that this touch point P and Q are at the position coordinates of high impedance direction H
This touch point P and Q can obtain by the magnitude of voltage change curve of this first electrode 104 or the second electrode 106 at the position coordinates of high impedance direction H.The embodiment of the invention is take the magnitude of voltage change curve of this first electrode 104 as example: as can be seen from Figure 9, in the magnitude of voltage change curve of this first electrode 104, the M relative with touch point P
3And the electrode M relative with touch point Q
6The voltage change Δ V that reads out
13And Δ V
16Maximum is in the crest location of the magnitude of voltage change curve of whole the first electrode 104.And and M
3Adjacent M
2And M
4Two value Δ V that read
12With Δ V
14Be worth close and less than M
3The value Δ V that reads out
13, similarly, with M
6Two value Δ V that adjacent M5 and M7 read
15With Δ V
17Close and less than M
6The value Δ V that reads out
16And the Δ V that other first electrodes 104 far away apart from the distance of these two touch point P, Q read
1iBe worth less, this mainly be because this touch point P over against M
3, touch point Q is over against M
6Therefore, can directly judge this touch point I according to this wave mode is x at the coordinate of high impedance direction H
p=X
3, x
q=X
6In addition, when described touch point during not over against described the first electrode 104, this touch point P can utilize and this variation Δ V greatly at the coordinate of high impedance direction H
13The coordinate of left and right sides adjacent electrode or all electrodes with and voltage change calculate, can be such as this formula:
Similarly, touch point Q at the coordinate of high impedance direction H is
Be appreciated that and also can calculate with other formula this touch point P and the position coordinates of Q on high impedance direction H.
(2) determine this touch point P and the Q coordinate on Low ESR direction D
Because the nesa coating 10 of this contact panel 100 is the impedance anisotropic membrane, therefore, the sensing voltage value at the electrode place of close this touch point P or Q changes greatly on conductive path.Namely on Low ESR direction D, the touch point is the closer to electrode, and the voltage change that reads from this electrode is larger.Take touch point P as example, as can be seen from Figure 9, this touch point P is to the first electrode M
3Distance with respect to this touch point P to the second electrode N
3Close together, the first electrode M
3The voltage change that the place senses is with respect to the second electrode N
3The voltage change that the place senses is larger.Therefore, can according to this touch point P the size of the voltage change that reads of corresponding the first electrode 104 or the second electrode 106 places judge that this touch point is at the position coordinates of Low ESR direction D.The ratio of the voltage change that also can read according to one or more the first electrodes 104 corresponding to described touch point P and one or more the second electrodes 106 places in addition, obtains this touch point P to the first side 112 of described contact panel 100 or the distance of second side.As
Or
, wherein L is that described first side 112 is to the vertical range of described second side 114.Be appreciated that and also can calculate with other formula this touch point P and the position coordinates of Q on high impedance direction H.
Only take the detection of two touch points as example, also can detect more touch point according to said method in the embodiment of the invention.
Compared to prior art, because nesa coating provided by the invention has impedance anisotropy, so that the resistance of nesa coating differs greatly at different directions between touch point and each different electrode of distance, thereby the changing value of the sensing signal that reads from those electrodes before and after touching also differs greatly, and utilizes the changing value size of the sensing signal that this characteristic can be directly reads according to electrode to determine the position coordinates of one or more touch points.And because the impedance anisotropy of this nesa coating changes obviously the signal value of the one or more electrodes corresponding with the touch point before and after touching, can improve the accuracy of detection of touch point position coordinates according to the obvious signal value of these a plurality of variations.
In addition, those skilled in the art also can do other variation in spirit of the present invention, and certainly, the variation that these are done according to spirit of the present invention all should be included within the present invention's scope required for protection.
Claims (20)
1. nesa coating, this nesa coating comprises a plurality of conduction bands along the different directions extension and interconnects, these a plurality of conduction bands are arranged in pattern, make this nesa coating have impedance anisotropy, wherein, described a plurality of conduction band comprises the arrangement of a plurality of the first bus band intervals and extends along first direction, and a plurality of the second bus band intervals are arranged and are extended along second direction, described the second conduction band is arranged between described the first conduction band and with this first bus band and is electrically connected, one of described first direction and second direction are the Low ESR direction, and the resistivity of this nesa coating on described Low ESR direction is less than the resistivity of other direction.
2. nesa coating as claimed in claim 1 is characterized in that, has a plurality of the second conduction bands between the first adjacent conduction band, and these a plurality of second bus bands are electrically connected this first adjacent conduction band.
3. nesa coating as claimed in claim 1, it is characterized in that, described first direction is the Low ESR direction, described second direction is the high impedance direction, the resistivity of this nesa coating on described high impedance direction is greater than the resistivity of other direction, and described nesa coating is 1:30 to 1:1000 at the ratio of the resistivity on the described Low ESR direction and the resistivity on the high impedance direction.
4. nesa coating as claimed in claim 3 is characterized in that, the material of described the first conduction band and the second conduction band is identical, and this first conduction band is 100:1 to 500:1 with the ratio of the width of this second conduction band.
5. nesa coating as claimed in claim 3 is characterized in that, the material of described the first conduction band and the second conduction band is different.
6. nesa coating as claimed in claim 5, it is characterized in that, the material of described the first conduction band is metal oxide, metal nitride or the metal fluoride of transparent and electrically conductive, and the material of the second conduction band is conducting polymer, carbon nano-tube or the Graphene of transparent and electrically conductive.
7. nesa coating as claimed in claim 1, it is characterized in that, described second direction is the Low ESR direction, described first direction is the high impedance direction, the resistivity of this nesa coating on described high impedance direction is greater than the resistivity of other direction, and the ratio of the resistivity of described nesa coating on the resistivity on the Low ESR direction and high impedance direction is 1:30 to 1:1000.
8. nesa coating as claimed in claim 1 is characterized in that, the angle of described Low ESR direction and high impedance direction is less than or equal to 90 degree more than or equal to 10 degree.
9. nesa coating as claimed in claim 1, it is characterized in that the material of described the first conduction band and the second band is metal oxide, metal nitride, metal fluoride, conducting polymer, the Graphene with transparent and electric conductivity or the carbon nano tube transparent conducting film that comprises a plurality of carbon nano-tube.
10. nesa coating as claimed in claim 9, it is characterized in that at least a in the material of described nesa coating is that tin oxide, zinc oxide, cadmium oxide, indium oxide, tin indium oxide, indium zinc oxide, zinc oxide are sowed, zinc oxide aluminum, titanium oxide tantalum, titanium nitride fluorine mix tin oxide, poly-ethyl bis ether thiophene and the poly-ethyl bis ether thiophene-Polystyrene Sulronate.
11. nesa coating as claimed in claim 1, it is characterized in that, described the first conduction band and the second conduction band be shaped as vertical bar band, square waveform band, in a zigzag band, stairstepping band, zigzag band, arc band or wavy band.
12. nesa coating as claimed in claim 11 is characterized in that, described the first conduction band and the second conduction band are the conduction band of wide or change width.
13. nesa coating as claimed in claim 1 is characterized in that, further is provided with a plurality of optical compensation films between described the first adjacent conduction band or described the second adjacent conduction band.
14. nesa coating as claimed in claim 13 is characterized in that, each described optical compensation films forms for whole continuous membrane structure or by a plurality of spaced bloomings.
15. nesa coating, this nesa coating comprises the setting of a plurality of one dimension transparent conductive bodies space and extends along first direction, be electrically connected by a plurality of transparent conductive bodies between the adjacent one dimension transparent conductive body, wherein, described nesa coating has impedance anisotropy, described first direction is the Low ESR direction, and the resistivity of this nesa coating on described Low ESR direction is less than the resistivity of other direction.
16. nesa coating, this nesa coating comprises a plurality of transparent conductive bodies space setting or arranged in a crossed manner, be provided with a plurality of one dimension transparent conductive bodies between the adjacent transparent conductive body, this a plurality of one dimension transparent conductive bodies interval arranges and extends along a second direction, wherein, described nesa coating has impedance anisotropy, and described second direction is the Low ESR direction, and the resistivity of this nesa coating on described Low ESR direction is less than the resistivity of other direction.
17. contact panel, it is characterized in that, comprise at least each described nesa coating, a substrate and a plurality of electrode in one deck such as the claim 1 to 16, this nesa coating is arranged at this substrate surface, and these a plurality of electrodes are electrically connected with this nesa coating respectively.
18. contact panel as claimed in claim 17 is characterized in that, described contact panel is electric resistance touch-control panel or capacitance type touch-control panel.
19. contact panel as claimed in claim 17 is characterized in that, the distance between adjacent described the first conduction band is less than or equal to 50 microns.
20. contact panel as claimed in claim 17 is characterized in that, the distance between adjacent the second conduction band between adjacent two described the first conduction bands is less than or equal to 10 millimeters.
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| CN201110254972XA CN102956285A (en) | 2011-08-31 | 2011-08-31 | Transparent conductive film and touch panel using same |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201110254972XA CN102956285A (en) | 2011-08-31 | 2011-08-31 | Transparent conductive film and touch panel using same |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105448386A (en) * | 2014-08-18 | 2016-03-30 | 深圳欧菲光科技股份有限公司 | Touch control element and conducting film thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080252608A1 (en) * | 2007-04-12 | 2008-10-16 | 3M Innovative Properties Company | Touch sensor with electrode array |
| US20090167710A1 (en) * | 2007-12-27 | 2009-07-02 | Tsinghua University | Touch panel and display device using the same |
| CN101859216A (en) * | 2010-06-11 | 2010-10-13 | 北京富纳特创新科技有限公司 | Touch screen |
| CN101937279A (en) * | 2009-06-30 | 2011-01-05 | 群康科技(深圳)有限公司 | Touch screen and driving method thereof |
| CN102016768A (en) * | 2008-02-28 | 2011-04-13 | 3M创新有限公司 | Touch screen sensor having varying sheet resistance |
-
2011
- 2011-08-31 CN CN201110254972XA patent/CN102956285A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080252608A1 (en) * | 2007-04-12 | 2008-10-16 | 3M Innovative Properties Company | Touch sensor with electrode array |
| US20090167710A1 (en) * | 2007-12-27 | 2009-07-02 | Tsinghua University | Touch panel and display device using the same |
| CN102016768A (en) * | 2008-02-28 | 2011-04-13 | 3M创新有限公司 | Touch screen sensor having varying sheet resistance |
| CN101937279A (en) * | 2009-06-30 | 2011-01-05 | 群康科技(深圳)有限公司 | Touch screen and driving method thereof |
| CN101859216A (en) * | 2010-06-11 | 2010-10-13 | 北京富纳特创新科技有限公司 | Touch screen |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105448386A (en) * | 2014-08-18 | 2016-03-30 | 深圳欧菲光科技股份有限公司 | Touch control element and conducting film thereof |
| CN105448386B (en) * | 2014-08-18 | 2018-10-12 | 深圳欧菲光科技股份有限公司 | Touch control component and its conductive film |
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Application publication date: 20130306 |