AU4847799A - High electron mobility transistor - Google Patents
High electron mobility transistorInfo
- Publication number
- AU4847799A AU4847799A AU48477/99A AU4847799A AU4847799A AU 4847799 A AU4847799 A AU 4847799A AU 48477/99 A AU48477/99 A AU 48477/99A AU 4847799 A AU4847799 A AU 4847799A AU 4847799 A AU4847799 A AU 4847799A
- Authority
- AU
- Australia
- Prior art keywords
- electron mobility
- high electron
- mobility transistor
- transistor
- mobility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66446—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET]
- H01L29/66462—Unipolar field-effect transistors with an active layer made of a group 13/15 material, e.g. group 13/15 velocity modulation transistor [VMT], group 13/15 negative resistance FET [NERFET] with a heterojunction interface channel or gate, e.g. HFET, HIGFET, SISFET, HJFET, HEMT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
- H01L21/28587—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds characterised by the sectional shape, e.g. T, inverted T
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
- H01L29/7782—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET
- H01L29/7783—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material
- H01L29/7785—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material with more than one donor layer
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12758898A | 1998-07-31 | 1998-07-31 | |
US09127588 | 1998-07-31 | ||
PCT/US1999/014805 WO2000007248A1 (en) | 1998-07-31 | 1999-06-29 | High electron mobility transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
AU4847799A true AU4847799A (en) | 2000-02-21 |
Family
ID=22430879
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU48477/99A Abandoned AU4847799A (en) | 1998-07-31 | 1999-06-29 | High electron mobility transistor |
Country Status (2)
Country | Link |
---|---|
AU (1) | AU4847799A (en) |
WO (1) | WO2000007248A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6489639B1 (en) * | 2000-05-24 | 2002-12-03 | Raytheon Company | High electron mobility transistor |
US6888179B2 (en) | 2003-04-17 | 2005-05-03 | Bae Systems Information And Electronic Systems Integration Inc | GaAs substrate with Sb buffering for high in devices |
EP2080228B1 (en) | 2006-10-04 | 2020-12-02 | LEONARDO S.p.A. | Single voltage supply pseudomorphic high electron mobility transistor (phemt) power device and process for manufacturing the same |
CN108701714B (en) * | 2016-02-22 | 2021-09-07 | 英特尔公司 | Apparatus and method for creating an active channel with indium rich side and bottom surfaces |
CN115579392B (en) * | 2022-12-09 | 2023-02-14 | 泉州市三安集成电路有限公司 | P-HEMT semiconductor structure and manufacturing method thereof |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4963949A (en) * | 1988-09-30 | 1990-10-16 | The United States Of America As Represented Of The United States Department Of Energy | Substrate structures for InP-based devices |
JP3086748B2 (en) * | 1991-07-26 | 2000-09-11 | 株式会社東芝 | High electron mobility transistor |
JP3116731B2 (en) * | 1994-07-25 | 2000-12-11 | 株式会社日立製作所 | Lattice-mismatched stacked crystal structure and semiconductor device using the same |
-
1999
- 1999-06-29 AU AU48477/99A patent/AU4847799A/en not_active Abandoned
- 1999-06-29 WO PCT/US1999/014805 patent/WO2000007248A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2000007248A1 (en) | 2000-02-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |