Differentiable Computational Lithogrpahy Framework
smo
opc
lithography
mask-optimization
design-for-manufacturing
differentiable-programming
computational-lithography
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Updated
Mar 19, 2024 - Python
Differentiable Computational Lithogrpahy Framework
GDSHelpers is an open-source package for automatized pattern generation for nano-structuring.
Generate ASCII Job files for an ASML PAS 5500 Stepper Lithography system, by the UCSB Nanofabrication Facility.
Maskless photolithography system targeting 5um resolution. Open hardware design.
Software used to write conductive nanostructures at the interface of LaAlO3 and SrTiO3
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